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    • 7. 发明授权
    • Transparent conductive laminate, its manufacturing method, and display comprising transparent conductive laminate
    • 透明导电层压板,其制造方法以及包括透明导电层压板的显示器
    • US06617056B1
    • 2003-09-09
    • US09673854
    • 2000-10-23
    • Hiroshi HaraSeiji Tsuboi
    • Hiroshi HaraSeiji Tsuboi
    • B32B904
    • C23C14/5853C23C14/0036C23C14/086G06F3/041Y10T428/105Y10T428/31507Y10T428/31786
    • A transparent conductive laminate in which a crystalline transparent conductive film substantially made of In—Sn—O on a transparent substrate composed of a thermoplastic polymer film, is provided. The crystalline part of the transparent conductive film (ITO-film) has a specific crystalline structure in which the X-ray diffraction intensity from the (222) crystal plane or the (440) crystal plane is highest, and [X440/222], the ratio of the X-ray diffraction intensity from the (440) crystal plane to that from the (222) crystal plane, is within the range of 0.2 to 2.5. The laminate has a low resistivity, and it is useful as an electrode material for a liquid crystal display, an electroluminescence device, a touch panel or the like. The transparent conductive laminate can be manufactured by combining the control of film fabricating atmosphere during sputtering and a heat treatment under specific conditions after film fabricating.
    • 提供了在由热塑性聚合物膜构成的透明基板上形成由In-Sn-O构成的结晶性透明导电膜的透明导电性层叠体。 透明导电膜(ITO膜)的结晶部分具有其中(222)晶面或(440)晶面的X射线衍射强度最高的特定晶体结构,[X440 / 222] 来自(440)晶面的X射线衍射强度与(222)晶面的X射线衍射强度的比在0.2〜2.5的范围内。 该层压体具有低电阻率,并且它可用作液晶显示器,电致发光器件,触摸面板等的电极材料。 透明导电层叠体可以通过在溅射中控制膜制造气氛和在膜制造之后的特定条件下进行热处理来制造。