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    • 3. 发明授权
    • Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    • 电介质膜结构,使用电介质膜结构的压电致动器和喷墨头
    • US07938515B2
    • 2011-05-10
    • US12389710
    • 2009-02-20
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • B41J2/045
    • B41J2/14233H01L41/0973H01L41/316
    • The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (001′) face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, 1′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); Wc is a half-value width of a peak of the (001′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.
    • 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, 关于电介质膜是大于2的实数:u =(Cc / Ca)×(Wa / Wc)(1)其中,Cc是介电膜的(001')面的峰的计数 平面外X射线衍射测量(这里,1'是选择为Cc变为最大的自然数); Ca是In平面X射线衍射测定中的电介质膜的(h'00)面的峰值的计数数(这里,h'是选择为Cc变为最大的自然数); Wc是外平面摇摆曲线X射线衍射测定中的电介质膜的(001')面的峰值的半值宽度; Wa是In平面摇摆曲线X射线衍射测定中的电介质膜的(h'00)面的峰值的半值宽度。
    • 6. 发明授权
    • Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    • 电介质膜结构,使用电介质膜结构的压电致动器和喷墨头
    • US07513608B2
    • 2009-04-07
    • US11338774
    • 2006-01-25
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • B41J2/045
    • B41J2/14233H01L41/0973H01L41/316
    • The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (001′)face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); Wc is a half-value width of a peak of the (001′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.
    • 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, u =(Cc / Ca)×(Wa / Wc)(1)中的绝对值大于2的实数:<?in-line-formula description =“In-line formula”end =“lead” <?in-line-formula description =“In-line formula”end =“tail”?>其中,Cc是平面外的电介质膜的(001')面的峰值的计数数 X射线衍射测量(这里,l'是选择的自然数,使得Cc变为最大); Ca是In平面X射线衍射测定中的电介质膜的(h'00)面的峰值的计数数(这里,h'是选择为Cc变为最大的自然数); Wc是外平面摇摆曲线X射线衍射测定中的电介质膜的(001')面的峰值的半值宽度; Wa是In平面摇摆曲线X射线衍射测定中的电介质膜的(h'00)面的峰值的半值宽度。
    • 8. 发明申请
    • Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    • 电介质膜结构,使用电介质膜结构的压电致动器和喷墨头
    • US20060176342A1
    • 2006-08-10
    • US11338774
    • 2006-01-25
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • B41J2/045
    • B41J2/14233H01L41/0973H01L41/316
    • The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (001′) face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); WC is a half-value width of a peak of the (001′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.
    • 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, 关于电介质膜是大于2的实数:<?in-line-formula description =“In-line Formulas”end =“lead”?> u =(C C 其中C是在平面外X射线衍射测量中电介质膜的(001')面的峰的计数(这里,l'是 选择的自然数使得C 变得最大); 在平面X射线衍射测量中,电介质膜的(h'00)面的峰值的计数数(这里,h'是选择的自然数,使得C 变为最大); WC是在平面外的摇摆曲线X射线衍射测定中的电介质膜的(001')面的峰值的半值宽度; 并且W a a是在平面内的摇摆曲线X射线衍射测量中电介质膜的(h'00)面的峰值的半值宽度。
    • 9. 发明授权
    • Dielectric film structure, piezoelectric actuator using dielectric element film structure and ink jet head
    • 电介质膜结构,使用电介质膜结构的压电致动器和喷墨头
    • US07059711B2
    • 2006-06-13
    • US10769765
    • 2004-02-03
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • Hiroshi AotoKenichi TakedaTetsuro FukuiToshihiro Ifuku
    • B41J2/045
    • B41J2/14233H01L41/0973H01L41/316
    • The present invention provides a dielectric film structure having a substrate and a dielectric film provided on the substrate and in which the dielectric film has (001) face orientation with respect to the substrate, and in which a value u in the following equation (1) regarding the dielectric film is a real number greater than 2: u=(Cc/Ca)×(Wa/Wc)  (1) where, Cc is a count number of a peak of a (00l′) face of the dielectric film in an Out-of-plane X ray diffraction measurement (here, l′ is a natural number selected so that Cc becomes maximum); Ca is a count number of a peak of a (h′00) face of the dielectric film in an In-plane X ray diffraction measurement (here, h′ is a natural number selected so that Cc becomes maximum); Wc is a half-value width of a peak of the (00l′) face of the dielectric film in an Out-of-plane rocking curve X ray diffraction measurement; and Wa is a half-value width of a peak of the (h′00) face of the dielectric film in an In-plane rocking curve X ray diffraction measurement.
    • 本发明提供了一种电介质膜结构,其具有设置在基板上的基板和电介质膜,并且其中电介质膜相对于基板具有(001)面取向,并且其中以下等式(1)中的值u, 关于电介质膜是大于2的实数:<?in-line-formula description =“In-line Formulas”end =“lead”?> u =(C C 其中,C是在平面外X射线衍射测量中电介质膜的(001)面的峰值的计数(这里,l'是 选择的自然数使得C 变得最大); 在平面X射线衍射测量中,电介质膜的(h'00)面的峰值的计数数(这里,h'是选择的自然数,使得C 变为最大); 在平面外的摇摆曲线X射线衍射测量中,电介质薄膜的(001')面的峰值的半值宽度是半值宽度; 并且W a a是在平面内的摇摆曲线X射线衍射测量中电介质膜的(h'00)面的峰值的半值宽度。
    • 10. 发明授权
    • Inkjet recording apparatus
    • 喷墨记录装置
    • US07513599B2
    • 2009-04-07
    • US11748893
    • 2007-05-15
    • Satoshi WadaHiroshi Aoto
    • Satoshi WadaHiroshi Aoto
    • B41J2/155
    • B41J2/155B41J11/005
    • An inkjet recording apparatus is provided that is capable of stably maintaining image quality by preventing the degradation in image quality due to a rotational body for holding down a recording medium. The inkjet recording apparatus includes a linked-up head having a plurality of short chips arranged in a staggered arrangement in the width direction of the recording medium. The rotational bodies for holding the floating of the recording medium on the downstream side of the linked-up head in the conveying direction are arranged in the width direction of the recording medium within a range of the short chip that ejected ink earlier on the recording medium.
    • 提供一种喷墨记录装置,其能够通过防止由于用于按压记录介质的旋转体导致的图像质量的劣化来稳定地保持图像质量。 喷墨记录装置包括具有以记录介质的宽度方向以交错布置布置的多个短芯片的连接头。 在记录媒体的宽度方向上,在记录介质的上下方侧保持记录媒体的浮动的旋转体配置在记录介质上较早喷出墨的短片的范围内 。