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    • 7. 发明申请
    • PATTERN FORMING METHOD AND APPARATUS
    • 图案形成方法和装置
    • US20080038671A1
    • 2008-02-14
    • US11782233
    • 2007-07-24
    • Taro YAMAMOTOHitoshi KosugiYoshiaki YamadaYasuhito Saiga
    • Taro YAMAMOTOHitoshi KosugiYoshiaki YamadaYasuhito Saiga
    • G03B27/42G03C5/00
    • G03F7/38G03F7/2041G03F7/70341
    • A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and the protection film formed on the substrate in a liquid during light exposure, thereby forming a predetermined light exposure pattern on the resist film; and performing a development process of the light exposure pattern by use of a development liquid, thereby forming a predetermined resist pattern. After the immersion light exposure and before the development process, the method further includes performing a hydrophilic process of turning a surface of the resist film or the protection film serving as a substrate surface into a hydrophilic state to allow the substrate surface to be wetted with the development liquid overall.
    • 图案形成方法包括在基板的表面上依次形成抗蚀剂膜或依次形成抗蚀剂膜和保护膜; 然后,在曝光期间进行浸渍曝光,其中包括将抗蚀剂膜或抗蚀剂膜和形成在基板上的保护膜浸入液体中,从而在抗蚀剂膜上形成预定的曝光图案; 并通过使用显影液进行曝光图案的显影处理,由此形成预定的抗蚀剂图案。 在浸没曝光之后和显影处理之前,该方法还包括进行将抗蚀剂膜或用作基板表面的保护膜的表面转动成亲水性的亲水处理,以允许基板表面被 开发液体整体。