专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07532270B2 Manufacturing method of a liquid crystal display device using a photo resist having regions with different thicknesses, ashing, and reflow processing 有权
标题翻译：使用具有不同厚度的区域的光刻胶的液晶显示装置的制造方法，灰化和回流处理
公开(公告)号：US07532270B2
公开(公告)日：2009-05-12
申请号：US12020390
申请日：2008-01-25
申请人： Yoshiaki Hashimoto , Hiroaki Tanaka , Shigeru Kimura , Syuusaku Kido
发明人： Yoshiaki Hashimoto , Hiroaki Tanaka , Shigeru Kimura , Syuusaku Kido
IPC分类号： G02F1/136 , G02F1/1343
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2001/136236
摘要： A method for manufacturing a liquid crystal display that provides a wide viewing angle and in which its manufacturing processes are shortened and high reliability is provided. The method includes the steps of forming a gate electrode metal layer and forming a gate electrode by patterning using photolithography; forming an interlayer insulating film, an a−Si layer, an n+ a−Si layer, and a drain electrode metal layer and forming a drain line and an island by performing patterning, ashing processing, reflow processing using photolithography, and peeling; forming an insulating film on a transparent insulating substrate and forming an insulating film contact used to provide a connection to a source electrode of an island at a specified position by patterning or a printing method; forming a transparent conductive film and forming a pixel electrode and common electrode by patterning using photolithography.
摘要翻译：一种提供宽视角的液晶显示器的制造方法，其制造工艺缩短并提供高可靠性。该方法包括以下步骤：通过使用光刻法进行图案化形成栅极金属层并形成栅电极; 形成层间绝缘膜，a-Si层，n + a-Si层和漏电极金属层，并通过进行图案化，灰化处理，使用光刻法的回流处理和剥离来形成漏极线和岛; 在透明绝缘基板上形成绝缘膜，形成用于通过图案化或打印方法提供到指定位置处的岛状源极的连接的绝缘膜接触; 形成透明导电膜，并通过使用光刻图案化形成像素电极和公共电极。

2. 发明申请

US20080124825A1 MANUFACTURING METHOD OF LIQUID CRYSTAL DISPLAY DEVICE 有权
标题翻译：液晶显示装置的制造方法
公开(公告)号：US20080124825A1
公开(公告)日：2008-05-29
申请号：US12020390
申请日：2008-01-25
申请人： Yoshiaki Hashimoto , Hiroaki Tanaka , Shigeru Kimura , Syuusaku Kido
发明人： Yoshiaki Hashimoto , Hiroaki Tanaka , Shigeru Kimura , Syuusaku Kido
IPC分类号： H01L33/00
CPC分类号： G02F1/136227 , G02F1/134363 , G02F2001/136236
摘要： A method for manufacturing a liquid crystal display that provides a wide viewing angle and in which its manufacturing processes are shortened and high reliability is provided. The method includes a process of forming a gate electrode metal layer, gate insulator, and a—Si layer and forming an island by patterning using photolithography, a process of forming an interlayer insulating film and drain electrode metal layer and forming a drain line by patterning using photolithography, a process of forming an organic insulating film and forming an organic insulating contact used to provide a connection to a source electrode and a drain electrode at a specified position by photolithography, and a process of forming a transparent conductive layer and forming a pixel electrode and common electrode by patterning using photolithography.
摘要翻译：一种提供宽视角的液晶显示器的制造方法，其制造工艺缩短并提供高可靠性。该方法包括通过使用光刻法图案化形成栅电极金属层，栅极绝缘体和a-Si层并形成岛的工艺，形成层间绝缘膜和漏电极金属层的步骤，以及通过图案化形成漏极线使用光刻法，形成有机绝缘膜并形成用于通过光刻在特定位置提供与源电极和漏电极的连接的有机绝缘接触的工艺，以及形成透明导电层并形成像素的工艺电极和公共电极。

3. 发明申请

US20050117082A1 Color liquid crystal display device and manufacturing method of the same 有权
公开(公告)号：US20050117082A1
公开(公告)日：2005-06-02
申请号：US11028310
申请日：2005-01-04
申请人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
发明人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
IPC分类号： G02F1/1368 , G02F1/1335 , G02F1/1343 , G02F1/1362 , G09F9/00 , G09F9/30 , G09F9/35 , H01L21/336 , H01L29/786 , G02F1/136
CPC分类号： G02F1/136209 , G02F1/136227 , G02F2001/136236
摘要： In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).

4. 发明授权

US06897927B2 Color liquid crystal display device and manufacturing method of the same 有权
标题翻译：彩色液晶显示装置及其制造方法
公开(公告)号：US06897927B2
公开(公告)日：2005-05-24
申请号：US09867423
申请日：2001-05-31
申请人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
发明人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
IPC分类号： G02F1/1368 , G02F1/1335 , G02F1/1343 , G02F1/1362 , G09F9/00 , G09F9/30 , G09F9/35 , H01L21/336 , H01L29/786 , G02F1/1337
CPC分类号： G02F1/136209 , G02F1/136227 , G02F2001/136236
摘要： In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).
摘要翻译：在彩色液晶显示装置的制造方法中，在透明绝缘基板上形成第一导电膜，形成栅电极和栅极总线（第一PR处理）。沉积栅极绝缘膜，半导体层，欧姆层和第二导电膜以形成薄膜晶体管和漏极总线（第二PR处理）的岛。然后，在透明绝缘基板上的各自的预定区域中连续形成三种颜色的滤色器（第三至第五PR处理）。通过使用黑矩阵作为掩模（第六PR处理），通过去除与沟道区对应的区域上的第二导电膜和欧姆层，在岛中形成漏极和源电极。然后，形成平坦化膜和像素电极（第七和第八PR处理）。

5. 发明授权

US07041522B2 Color liquid crystal display device and manufacturing method of the same 有权
标题翻译：彩色液晶显示装置及其制造方法
公开(公告)号：US07041522B2
公开(公告)日：2006-05-09
申请号：US11028310
申请日：2005-01-04
申请人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
发明人： Hiroaki Tanaka , Michiaki Sakamoto , Takahiko Watanabe , Yoshiaki Hashimoto , Syuusaku Kido
IPC分类号： H01L21/00
CPC分类号： G02F1/136209 , G02F1/136227 , G02F2001/136236
摘要： In a manufacturing method of a color liquid crystal display device, a first conductive film is formed on a transparent insulating substrate to form a gate electrode and a gate bus line (first PR process). A gate insulating film, a semiconductor layer, an ohmic layer, and a second conductive film are deposited to form an island of a thin film transistor and a drain bus line (second PR process). Then, color filters in respective three colors are formed in their respective predetermined regions on the transparent insulating substrate in succession (third through fifth PR processes). A black matrix is formed, and a drain electrode and a source electrode are formed in the island by removing the second conductive film and ohmic layer on a region corresponding to the channel region by using the black matrix as a mask (sixth PR process). Then, a planarization film and a pixel electrode are formed (seventh and eighth PR processes).
摘要翻译：在彩色液晶显示装置的制造方法中，在透明绝缘基板上形成第一导电膜，形成栅电极和栅极总线（第一PR处理）。沉积栅极绝缘膜，半导体层，欧姆层和第二导电膜以形成薄膜晶体管和漏极总线（第二PR处理）的岛。然后，在透明绝缘基板上的各自的预定区域中连续形成三种颜色的滤色器（第三至第五PR处理）。通过使用黑矩阵作为掩模（第六PR处理），通过去除与沟道区对应的区域上的第二导电膜和欧姆层，在岛中形成漏极和源电极。然后，形成平坦化膜和像素电极（第七和第八PR处理）。

6. 发明授权

US06515719B2 Liquid crystal display apparatus and manufacturing method for the same 失效
标题翻译：液晶显示装置及其制造方法
公开(公告)号：US06515719B2
公开(公告)日：2003-02-04
申请号：US09877141
申请日：2001-06-11
申请人： Hirotaka Yamaguchi , Hiroaki Tanaka , Seiji Suzuki , Hiroaki Matsuyama , Takahiko Watanabe , Yoshihiko Hirai , Masayoshi Suzuki , Toshiya Ishii , Teruaki Suzuki , Syuusaku Kido
发明人： Hirotaka Yamaguchi , Hiroaki Tanaka , Seiji Suzuki , Hiroaki Matsuyama , Takahiko Watanabe , Yoshihiko Hirai , Masayoshi Suzuki , Toshiya Ishii , Teruaki Suzuki , Syuusaku Kido
IPC分类号： G02F11343
CPC分类号： G02F1/134336 , G02F1/133707 , G02F1/136213 , G02F2001/136236
摘要： A liquid crystal display apparatus includes a first substrate, a second substrate and a liquid crystal layer interposed between the first substrate and the second substrate. The first substrate includes on a surface facing the second substrate, a plurality of gate bus lines extending into a row direction, a plurality of drain bus lines extending into a column direction, and a plurality of pixels arranged in matrix. Each of the plurality of pixels includes a portion of one of the plurality of gate bus lines associated with the pixel, a portion of one of the plurality of drain bus lines associated with the pixel, a portion of a capacitance line associated with the pixel, a pixel transistor having a source and a drain which is connected with the associated drain bus line, a control electrode connected with the source and formed in at least a portion of a region of the pixel, and a the pixel electrode which is in an electrically floating state and which is formed to cover the control electrode and a portion of the capacitance line through at least one of a first insulating film and second insulating film.
摘要翻译：液晶显示装置包括第一基板，第二基板和介于第一基板和第二基板之间的液晶层。第一基板包括在面向第二基板的表面上，延伸到行方向的多个栅极总线，延伸到列方向的多个漏极总线以及以矩阵排列的多个像素。多个像素中的每一个包括与像素相关联的多个栅极总线之一的一部分，与像素相关联的多个漏极总线之一的一部分，与像素相关联的电容线的一部分，具有源极和漏极的像素晶体管，其与相关联的漏极总线连接;控制电极，与源极连接并形成在像素的区域的至少一部分中;以及像素电极，其处于电气并且其形成为通过第一绝缘膜和第二绝缘膜中的至少一个覆盖控制电极和电容线的一部分。

7. 发明授权

US07554207B2 Method of forming a lamination film pattern and improved lamination film pattern 有权
标题翻译：形成层压膜图案和改进的层压膜图案的方法
公开(公告)号：US07554207B2
公开(公告)日：2009-06-30
申请号：US11295462
申请日：2005-12-07
申请人： Tsuyoshi Katoh , Syuusaku Kido , Akitoshi Maeda
发明人： Tsuyoshi Katoh , Syuusaku Kido , Akitoshi Maeda
IPC分类号： H01L29/40
CPC分类号： G02F1/136286 , G02F2001/136295 , H01L27/12 , H01L27/124
摘要： In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.
摘要翻译：在形成导电层叠图案的方法中，在含铬顶层形成在绝缘膜上之前，在含铬底层的表面上形成绝缘膜，使得绝缘膜将铝 - 含有来自含铬底层的顶层。进行第一选择性湿式蚀刻工艺，以用第一蚀刻剂选择性地蚀刻含铝顶层。进行第二选择性湿式蚀刻工艺，以在存在绝缘膜的情况下用第二蚀刻剂选择性地蚀刻含铬底层，该绝缘膜抑制含铬底层和铝之间的异质金属接触电位差在第二选择性湿蚀刻工艺期间。

8. 发明申请

US20060081870A1 Method of forming a lamination film pattern and improved lamination film pattern 有权
公开(公告)号：US20060081870A1
公开(公告)日：2006-04-20
申请号：US11295462
申请日：2005-12-07
申请人： Tsuyoshi Katoh , Syuusaku Kido , Akitoshi Maeda
发明人： Tsuyoshi Katoh , Syuusaku Kido , Akitoshi Maeda
IPC分类号： H01L33/00 , H01L29/22
CPC分类号： G02F1/136286 , G02F2001/136295 , H01L27/12 , H01L27/124
摘要： In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.

9. 发明授权

US07012029B2 Method of forming a lamination film pattern and improved lamination film pattern 有权
公开(公告)号：US07012029B2
公开(公告)日：2006-03-14
申请号：US10745636
申请日：2003-12-29
申请人： Tsuyoshi Katoh , Syuusaku Kido , Akitoshi Maeda
发明人： Tsuyoshi Katoh , Syuusaku Kido , Akitoshi Maeda
IPC分类号： H01L21/302
CPC分类号： G02F1/136286 , G02F2001/136295 , H01L27/12 , H01L27/124
摘要： In a method of forming an electrically conductive lamination pattern, an insulating film is formed on a surface of a chromium-containing bottom layer, before an aluminum-containing top layer is formed over the insulating film, so that the insulating film separates the aluminum-containing top layer from the chromium-containing bottom layer. A first selective wet etching process is carried out for selectively etching the aluminum-containing top layer with a first etchant. A second selective wet etching process is carried out for selectively etching the chromium-containing bottom layer with a second etchant in the presence the insulating film which suppresses a hetero-metal-contact-potential-difference between the chromium-containing bottom layer and the aluminum-containing top layer during the second selective wet etching process.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式