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1. 发明授权

US08550801B2 Imprint apparatus and method 有权
标题翻译：印刷装置和方法
公开(公告)号：US08550801B2
公开(公告)日：2013-10-08
申请号：US13230554
申请日：2011-09-12
申请人： Yohko Furutono , Shinji Mikami , Masayuki Hatano , Tetsuro Nakasugi
发明人： Yohko Furutono , Shinji Mikami , Masayuki Hatano , Tetsuro Nakasugi
IPC分类号： B29C59/02
CPC分类号： B29C59/022 , B29C35/0888 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In one embodiment, an imprint apparatus includes a template holding part configured to hold a template for imprint. The apparatus further includes a template moving part configured to move the template to press the template onto a light curing resin on a transfer target substrate or to demold the template from the light curing resin. The apparatus further includes a light source configured to irradiate the light curing resin with light to cure the light curing resin. The apparatus further includes a demold control part configured to control a demold speed or a demold angle of the template, based on a position of a shot region from which the template is to be demolded, when demolding the template from the light curing resin.
摘要翻译：在一个实施例中，压印装置包括被配置为保持用于印记的模板的模板保持部分。该装置还包括模板移动部件，其构造成移动模板以将模板按压在转印目标基板上的光固化树脂上，或者从光固化树脂脱模模板。该装置还包括配置成用光照射光固化树脂以固化光固化树脂的光源。该设备还包括脱模控制部件，当脱模模板从光固化树脂脱模时，该脱模控制部件被配置为基于模板从其脱模的喷射区域的位置来控制模板的脱模速度或脱模角度。

2. 发明申请

US20120061882A1 IMPRINT APPARATUS AND METHOD 有权
标题翻译：印刷装置和方法
公开(公告)号：US20120061882A1
公开(公告)日：2012-03-15
申请号：US13230554
申请日：2011-09-12
申请人： Yohko Furutono , Shinji Mikami , Masayuki Hatano , Tetsuro Nakasugi
发明人： Yohko Furutono , Shinji Mikami , Masayuki Hatano , Tetsuro Nakasugi
IPC分类号： B29C35/08
CPC分类号： B29C59/022 , B29C35/0888 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： In one embodiment, an imprint apparatus includes a template holding part configured to hold a template for imprint. The apparatus further includes a template moving part configured to move the template to press the template onto a light curing resin on a transfer target substrate or to demold the template from the light curing resin. The apparatus further includes a light source configured to irradiate the light curing resin with light to cure the light curing resin. The apparatus further includes a demold control part configured to control a demold speed or a demold angle of the template, based on a position of a shot region from which the template is to be demolded, when demolding the template from the light curing resin.
摘要翻译：在一个实施例中，压印装置包括被配置为保持用于印记的模板的模板保持部分。该装置还包括模板移动部件，其构造成移动模板以将模板按压在转印目标基板上的光固化树脂上，或者从光固化树脂脱模模板。该装置还包括配置成用光照射光固化树脂以固化光固化树脂的光源。该设备还包括脱模控制部件，当脱模模板从光固化树脂脱模时，该脱模控制部件被配置为基于模板从其脱模的喷射区域的位置来控制模板的脱模速度或脱模角度。

3. 发明授权

US08202463B2 Imprint method 有权
标题翻译：印记法
公开(公告)号：US08202463B2
公开(公告)日：2012-06-19
申请号：US12426527
申请日：2009-04-20
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
IPC分类号： B29C59/00
CPC分类号： B29C37/006 , B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes contacting a template on a first substrate. The template includes a pattern to be transferred on the first substrate. The first substrate includes a first semiconductor substrate, and a first light curable resin coated on the first semiconductor substrate. The method further includes separating the template from the first substrate, and removing particles adhered on the template. The particle removal includes: pressing the template on an adhesive member which is distinct from the first substrate. The adhesive member includes a dummy substrate, a particle removing film formed on the dummy substrate and configured to remove the particles, and a second light curable resin coated on the particle removing film. The second light curable resin is thicker than the first light curable resin.
摘要翻译：压印方法包括在第一衬底上接触模板。模板包括要在第一基板上转印的图案。第一基板包括第一半导体基板和涂覆在第一半导体基板上的第一光固化树脂。该方法还包括从第一基底分离模板，以及除去附着在模板上的颗粒。颗粒去除包括：将模板压在与第一基板不同的粘合剂构件上。所述粘合部件包括虚拟基板，形成在所述虚设基板上并构成为除去所述粒子的除粒膜，以及涂覆在所述除粒膜上的第二光固化树脂。第二光固化树脂比第一光固化树脂厚。

4. 发明申请

US20090315223A1 TEMPLATE AND PATTERN FORMING METHOD 审中-公开
标题翻译：模式和图案形成方法
公开(公告)号：US20090315223A1
公开(公告)日：2009-12-24
申请号：US12483705
申请日：2009-06-12
申请人： Ikuo Yoneda , Shinji Mikami , Takumi Ota , Tetsuro Nakasugi
发明人： Ikuo Yoneda , Shinji Mikami , Takumi Ota , Tetsuro Nakasugi
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A template includes a substrate, an element pattern formed on a surface of the substrate, and a light absorbing portion formed on or inside the substrate.
摘要翻译：模板包括基板，形成在基板的表面上的元件图案，以及形成在基板上或内部的光吸收部。

5. 发明申请

US20090267267A1 IMPRINT METHOD 有权
标题翻译： IMPRINT方法
公开(公告)号：US20090267267A1
公开(公告)日：2009-10-29
申请号：US12426527
申请日：2009-04-20
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
IPC分类号： B29C59/00
CPC分类号： B29C37/006 , B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes contacting a template on a substrate, the template including a pattern to be transferred on the substrate, separating the template from the substrate, and removing particle adhered on the template before contacting the template on the substrate, the removing the particle including pressing the template on an adhesive member and separating the pressed template from the adhesive member, wherein adhesiveness of the adhesive member to the template is higher than adhesiveness of the adhesive member to the substrate.
摘要翻译：压印方法包括使基板上的模板接触，所述模板包括要在基板上转印的图案，将模板与基板分离，以及在与基板之间的模板接触之前除去附着在模板上的颗粒，除去包括将模板压在粘合剂构件上并将压制模板与粘合构件分离，其中粘合剂与模板的粘合性高于粘合剂与基材的粘合性。

6. 发明授权

US07914958B2 Semiconductor device manufacturing method 有权
标题翻译：半导体器件制造方法
公开(公告)号：US07914958B2
公开(公告)日：2011-03-29
申请号：US12478408
申请日：2009-06-04
申请人： Ryoichi Inanami , Shinji Mikami , Hirofumi Inoue
发明人： Ryoichi Inanami , Shinji Mikami , Hirofumi Inoue
IPC分类号： G03C5/00 , G03F9/00 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F9/7076
摘要： A semiconductor device manufacturing method has forming a first resist pattern on the semiconductor substrate, and then, forming a first pattern on the semiconductor substrate by the use of the first resist pattern, and forming a second resist pattern on the semiconductor substrate by using an imprinter, and then, forming a second pattern on the semiconductor substrate by the use of the second resist pattern. The forming the first pattern, the first pattern smaller than a design pattern corresponding to the design data for forming a plurality of patterns on a semiconductor substrate being formed.
摘要翻译：半导体器件制造方法在半导体衬底上形成第一抗蚀剂图案，然后通过使用第一抗蚀剂图案在半导体衬底上形成第一图案，并通过使用打印机在半导体衬底上形成第二抗蚀剂图案，然后通过使用第二抗蚀剂图案在半导体衬底上形成第二图案。形成第一图案，第一图案小于与形成在半导体衬底上形成多个图案的设计数据相对应的设计图案。

7. 发明授权

US08740377B2 Imprint recipe creating device and imprint device 有权
标题翻译：印刷配方创作装置和印版装置
公开(公告)号：US08740377B2
公开(公告)日：2014-06-03
申请号：US13177763
申请日：2011-07-07
申请人： Shinji Mikami , Ryoichi Inanami
发明人： Shinji Mikami , Ryoichi Inanami
IPC分类号： B41J2/01 , B41J2/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： Certain embodiments provide an imprint recipe creating device comprising first to fifth creation units. The first creation unit creates inside-standard-shot information by use of filling amount information and residual film thickness information. The second creation unit creates first inside-substrate-surface information by use of shot position information, edge information, and the inside-standard-shot information. The third creation unit creates first correction information by use of unevenness information indicating unevenness in a substrate and unevenness distribution information indicating variations in depth of the unevenness inside the substrate surface. The fourth creation unit creates second correction information by use of post-process information indicating the variations in processing size. The fifth creation unit synthesizes the first inside-substrate-surface information, the first correction information and the second correction information, to create second inside-substrate-surface information.
摘要翻译：某些实施例提供了包括第一至第五创建单元的压印配方创建装置。第一创建单元通过使用填充量信息和残留膜厚信息来创建内标准信息。第二创建单元通过使用拍摄位置信息，边缘信息和内部标准拍摄信息来创建第一内部基板表面信息。第三创建单元通过使用指示基板不均匀的不平坦信息和指示基板表面内部的凹凸深度的不均匀性分布信息来创建第一校正信息。第四创建单元通过使用指示处理大小的变化的后处理信息来创建第二校正信息。第五创建单元合成第一内部衬底表面信息，第一校正信息和第二校正信息，以创建第二内部衬底表面信息。

8. 发明申请

US20140138197A1 DAMPER WITH VARIABLE DAMPING FORCE 有权
标题翻译：具有可变阻尼力的阻尼器
公开(公告)号：US20140138197A1
公开(公告)日：2014-05-22
申请号：US14127010
申请日：2012-06-27
申请人： Gakuyo Fujimoto , Shinji Mikami
发明人： Gakuyo Fujimoto , Shinji Mikami
IPC分类号： B60G17/08 , F16F9/46 , F16F9/34
CPC分类号： B60G17/08 , F16F9/34 , F16F9/461 , F16F9/464 , F16F2224/0283
摘要： A variable damping force member is used in a vehicle suspension device and the damping force of which can be changed. The variable damping force member is equipped with a piston which is slidably housed in a cylinder filled with a fluid and which divides the cylinder into a first fluid chamber and a second fluid chamber, and has fluid passages connecting the first and second fluid passages. A valve member is provided in the piston for blocking the fluid passages, and for opening the fluid passages when the piston slides. A piezoelectric body is connected to the valve member, and pushes the valve member towards the fluid passages when voltage is applied. A bellows is arranged on the valve member so as to seal the piezoelectric body from the fluid, and the bellows biases the piston in the direction in which the piezoelectric body is constricted.
摘要翻译：可变阻尼力构件用于车辆悬架装置中，其阻尼力可以改变。可变阻尼力构件配备有活塞，其可滑动地容纳在填充有流体的气缸中，并且将气缸分成第一流体室和第二流体室，并具有连接第一和第二流体通道的流体通道。在活塞中设置有用于阻塞流体通道的阀构件，并且当活塞滑动时用于打开流体通道。压电体连接到阀构件，并且当施加电压时将阀构件推向流体通道。在阀构件上布置有波纹管，以便将压电体与流体密封，并且波纹管沿着压电体收缩的方向偏压活塞。

9. 发明申请

US20090267268A1 IMPRINT SYSTEM AND IMPRINT METHOD 有权
标题翻译：印刷系统和印刷方法
公开(公告)号：US20090267268A1
公开(公告)日：2009-10-29
申请号：US12237435
申请日：2008-09-25
申请人： Ikuo YONEDA , Shinji Mikami
发明人： Ikuo YONEDA , Shinji Mikami
IPC分类号： B29C43/58 , B29C43/32
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon said template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon said remaining film thickness set value information, calculates a pattern density of the template from said template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from said vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, said distribution of an applied amount for filling a pattern, and said distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member, and an application section which applies the imprint member on the substrate based upon said distribution of an applied amount of the imprint member.
摘要翻译：压印系统具有存储模板信息和剩余膜厚设定值信息的设计数据存储部，存储用于补偿蒸发的施加量的多个分布的蒸发补偿存储部，算出运算部基于所述模板信息分配用于填充图案的施加量，基于所述剩余膜厚设定值信息计算形成剩余膜厚度的涂布量的分布，根据所述模板信息计算模板的图案密度，从所述蒸发待补偿存储部分中提取与该图案密度相对应的补偿蒸发量的分布，并将所提取的用于补偿蒸发的施加量的提取分布相加，将所分配的施加量分配给填充一个模式，并表示一个应用程序的分配形成剩余膜厚的量，计算压印构件的施加量的分布;以及施加部，其基于压印构件的施加量的分布，将压印构件施加在基板上。

10. 发明申请

US20080193765A1 Noble Metal Fine Particle Support and Method of Manufacturing the Same 审中-公开
标题翻译：贵金属微粒支持及其制造方法
公开(公告)号：US20080193765A1
公开(公告)日：2008-08-14
申请号：US11885302
申请日：2006-02-28
申请人： Ryohei Ogawa , Shinji Mikami , Masami Nishikawa
发明人： Ryohei Ogawa , Shinji Mikami , Masami Nishikawa
IPC分类号： B32B5/16 , B01J19/08
CPC分类号： H01M4/92 , B01J23/40 , B01J23/42 , B01J31/04 , B01J31/1633 , B01J35/0013 , B01J37/0217 , B01J37/0219 , B01J37/34 , C01B3/40 , C01B2203/107 , H01M4/90 , H01M4/9075 , H01M4/925 , H01M14/005 , Y02P20/52 , Y10T428/2991
摘要： A noble metal fine particle support and method of manufacturing the same are provided, in which noble metal fine particles are supported without unevenness on the surface of a substrate and that has almost no limitation on the type of the substrate. The present invention provides a noble metal fine particle support in which a substrate surface is coated with an amino compound, and noble metal fine particles are supported on the coating. The invention also provides a method of manufacturing a noble metal fine particle support, including coating the surface of a substrate with an amino compound to provide a positive charge for the surface, and contacting the substrate and a solution in which noble metal fine particles having a negative charge is dispersed, to cause the substrate to support the noble metal fine particles.
摘要翻译：提供了一种贵金属微粒支撑体及其制造方法，其中贵金属微粒在衬底表面上没有不均匀地被支撑，并且几乎不限于衬底的类型。本发明提供了一种贵金属微粒载体，其中基体表面涂有氨基化合物，贵金属微粒负载在涂层上。本发明还提供了一种制造贵金属微粒载体的方法，包括用氨基化合物涂覆基材的表面以对该表面提供正电荷，并使基底与具有分散负电荷，使基板支承贵金属微粒。

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