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1. 发明授权

US09409153B2 Supported Mo—O—K—MexOy catalyst for the synthesis of methanethiol from high H2S-containing syngas 有权
标题翻译：支持的Mo-O-K-Mex用于从高H 2 S的合成气合成甲硫醇的催化剂
公开(公告)号：US09409153B2
公开(公告)日：2016-08-09
申请号：US12810688
申请日：2008-11-28
申请人： Yiquan Yang , Yingjuan Hao , Aiping Chen , Qi Wang , Lingmei Yang , Qiaoling Li , Shenjun Dai , Weiping Fang , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher
发明人： Yiquan Yang , Yingjuan Hao , Aiping Chen , Qi Wang , Lingmei Yang , Qiaoling Li , Shenjun Dai , Weiping Fang , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher
IPC分类号： B01J21/08 , B01J23/04 , B01J23/28 , B01J23/88 , B01J23/882 , B01J23/883 , B01J23/00 , B01J23/887 , B01J37/02 , B01J37/16 , C07C319/02 , B01J21/06
CPC分类号： B01J23/28 , B01J21/063 , B01J23/002 , B01J23/8872 , B01J37/0207 , B01J37/16 , B01J2523/00 , C07C319/02 , C07C321/04 , B01J2523/13 , B01J2523/68
摘要： This invention is related to a preparation method of a supported catalyst Mo—O—K-MexOy for the synthesis of methanethiol from H2S-containing syngas. The catalyst comprises of an active component of Mo—O—K-based species, an active promoter and a support denoted as metal (or metals)-carrier. The support is prepared by electroless plating method in such a way that the metal or metals chosen are plated onto the surface of the carrier. Transition metal, especially Fe, Co or Ni are selected to be the plating metal, while SiO2, Al2O3 or TiO2 are selected to be carrier. The catalyst thus prepared is found to be efficient for the synthesis of methanethiol from H2S-containing syngasor carbon oxides/hydrogen mixtures, especially regarding a minor formation of the by-product CO2.
摘要翻译：本发明涉及用于从含H2S的合成气合成甲硫醇的负载型催化剂Mo-O-K-MexOy的制备方法。该催化剂包括Mo-O-K基活性组分，活性促进剂和表示为金属（或金属）载体的载体。通过化学镀方法制备载体，使得所选择的金属或金属镀在载体的表面上。选择过渡金属，特别是Fe，Co或Ni作为电镀金属，而选择SiO 2，Al 2 O 3或TiO 2作为载体。发现如此制备的催化剂对于从含H2S的合成气碳氢氧化物/氢混合物合成甲硫醇是有效的，特别是对副产物CO 2的次要形成。

2. 发明申请

US20100286448A1 SUPPORTED MO-O-K-MExOy CATALYST FOR THE SYNTHESIS OF METHANETHIOL FROM HIGH H2S-CONTAINING SYNGAS 有权
标题翻译：用于从含H2S的合成方法合成甲基化的MO-O-K-MEXOY催化剂
公开(公告)号：US20100286448A1
公开(公告)日：2010-11-11
申请号：US12810688
申请日：2008-11-28
申请人： Yiquan Yang , Yingjuan Hao , Aiping Chen , Qi Wang , Lingmei Yang , Qiaoling Li , Shenjun Dai , Weiping Fang , Jan-Olaf Barth , Christoph Wecbecker , Klaus Hutmacher
发明人： Yiquan Yang , Yingjuan Hao , Aiping Chen , Qi Wang , Lingmei Yang , Qiaoling Li , Shenjun Dai , Weiping Fang , Jan-Olaf Barth , Christoph Wecbecker , Klaus Hutmacher
IPC分类号： C07C319/06 , B01J23/02 , B01J23/10 , B01J23/883 , B01J23/881 , B01J23/882 , B01J21/08 , B01J21/06 , B01J29/04 , B01J27/19 , B01J23/28 , C07C319/02
CPC分类号： B01J23/28 , B01J21/063 , B01J23/002 , B01J23/8872 , B01J37/0207 , B01J37/16 , B01J2523/00 , C07C319/02 , C07C321/04 , B01J2523/13 , B01J2523/68
摘要： This invention is related to a preparation method of a supported catalyst Mo—O—K-MexOy for the synthesis of methanethiol from H2S-containing syngas. The catalyst comprises of an active component of Mo—O—K-based species, an active promoter and a support denoted as metal (or metals)-carrier. The support is prepared by electroless plating method in such a way that the metal or metals chosen are plated onto the surface of the carrier. Transition metal, especially Fe, Co or Ni are selected to be the plating metal, while SiO2, Al2O3 or TiO2 are selected to be carrier. The catalyst thus prepared is found to be efficient for the synthesis of methanethiol from H2S-containing syngasor carbon oxides/hydrogen mixtures, especially regarding a minor formation of the by-product CO2.
摘要翻译：本发明涉及用于从含H2S的合成气合成甲硫醇的负载型催化剂Mo-O-K-MexOy的制备方法。该催化剂包括Mo-O-K基活性组分，活性促进剂和表示为金属（或金属）载体的载体。通过化学镀方法制备载体，使得所选择的金属或金属镀在载体的表面上。选择过渡金属，特别是Fe，Co或Ni作为电镀金属，而选择SiO 2，Al 2 O 3或TiO 2作为载体。发现如此制备的催化剂对于从含H2S的合成气碳氢氧化物/氢混合物合成甲硫醇是有效的，特别是对副产物CO 2的次要形成。

3. 发明申请

US20100041548A1 PROCESS FOR THE MANUFACTURE OF METHYLMERCAPTAN 失效
标题翻译：甲基丙烯酸甲酯制备方法
公开(公告)号：US20100041548A1
公开(公告)日：2010-02-18
申请号：US12509120
申请日：2009-07-24
申请人： Yiquan YANG , Qi Wang , Renchun Lin , Hongbin Zhang , Youzhu Yuan , Weiping Fang , Quanxing Zheng , Shenjun Dai , Xingguo Yan , Aiping Chen , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher , Hubert Redlingshöfer , Sabine Ackermann
发明人： Yiquan YANG , Qi Wang , Renchun Lin , Hongbin Zhang , Youzhu Yuan , Weiping Fang , Quanxing Zheng , Shenjun Dai , Xingguo Yan , Aiping Chen , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher , Hubert Redlingshöfer , Sabine Ackermann
IPC分类号： B01J23/04 , B01J27/24 , B01J23/10
CPC分类号： B01J37/0203 , B01J23/28 , B01J23/8872 , B01J37/0201 , C07C319/02 , Y02P20/582 , C07C321/04
摘要： The present invention refers to a continuous process for the manufacture of methyl mercaptan using Mo—O—K-based catalysts. It is further described that the total selectivity of methylmercaptan can be increased by at least 1% by lowering the total gas hourly space velocity. The invention further refers to a process for the preparation of a solid, preformed catalyst system.
摘要翻译：本发明涉及使用Mo-O-K系催化剂制造甲硫醇的连续方法。进一步描述的是，通过降低总气体时空速度，甲基硫醇的总选择性可以增加至少1％。本发明还涉及制备固体预成型催化剂体系的方法。

4. 发明授权

US07569731B2 Process for the manufacture of methylmercaptan 失效
标题翻译：制备甲硫醇的方法
公开(公告)号：US07569731B2
公开(公告)日：2009-08-04
申请号：US10595333
申请日：2004-09-29
申请人： Yiquan Yang , Qi Wang , Renchun Lin , Hongbin Zhang , Youzhu Yuan , Weiping Fang , Quanxing Zheng , Shenjun Dai , Xingguo Yan , Aiping Chen , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher , Hubert Redlingshöfer , Sabine Ackermann
发明人： Yiquan Yang , Qi Wang , Renchun Lin , Hongbin Zhang , Youzhu Yuan , Weiping Fang , Quanxing Zheng , Shenjun Dai , Xingguo Yan , Aiping Chen , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher , Hubert Redlingshöfer , Sabine Ackermann
IPC分类号： C07C319/16
CPC分类号： B01J37/0203 , B01J23/28 , B01J23/8872 , B01J37/0201 , C07C319/02 , Y02P20/582 , C07C321/04
摘要： The present invention refers to a continuous process for the manufacture of methyl mercaptan using Mo—O—K-based catalysts. It is further described that the total selectivity of methylmercaptan can be increased by at least 1% by lowering the total gas hourly space velocity. The invention further refers to a process for the preparation of a solid, preformed catalyst system.
摘要翻译：本发明涉及使用Mo-O-K系催化剂制造甲硫醇的连续方法。进一步描述的是，通过降低总气体时空速度，甲基硫醇的总选择性可以增加至少1％。本发明还涉及制备固体预成型催化剂体系的方法。

5. 发明授权

US07833929B2 Process for the manufacture of methylmercaptan 失效
标题翻译：制备甲硫醇的方法
公开(公告)号：US07833929B2
公开(公告)日：2010-11-16
申请号：US12509120
申请日：2009-07-24
申请人： Yiquan Yang , Qi Wang , Renchun Lin , Hongbin Zhang , Youzhu Yuan , Weiping Fang , Quanxing Zheng , Shenjun Dai , Xingguo Yan , Aiping Chen , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher , Hubert Redlingshöfer , Sabine Ackermann
发明人： Yiquan Yang , Qi Wang , Renchun Lin , Hongbin Zhang , Youzhu Yuan , Weiping Fang , Quanxing Zheng , Shenjun Dai , Xingguo Yan , Aiping Chen , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher , Hubert Redlingshöfer , Sabine Ackermann
IPC分类号： B01J23/00 , B01J21/00 , B01J20/00 , B01J29/00 , B01J37/00
CPC分类号： B01J37/0203 , B01J23/28 , B01J23/8872 , B01J37/0201 , C07C319/02 , Y02P20/582 , C07C321/04
摘要： The present invention refers to a continuous process for the manufacture of methyl mercaptan using Mo—O—K-based catalysts. It is further described that the total selectivity of methylmercaptan can be increased by at least 1% by lowering the total gas hourly space velocity. The invention further refers to a process for the preparation of a solid, preformed catalyst system.
摘要翻译：本发明涉及使用Mo-O-K系催化剂制造甲硫醇的连续方法。进一步描述的是，通过降低总气体时空速度，甲基硫醇的总选择性可以增加至少1％。本发明还涉及制备固体预成型催化剂体系的方法。

6. 发明申请

US20070213564A1 PROCESS FOR THE MANUFACTURE OF METHYMERCAPTAN 失效
标题翻译：甲基蛋白的制备方法
公开(公告)号：US20070213564A1
公开(公告)日：2007-09-13
申请号：US10595333
申请日：2004-09-29
申请人： Yiquan Yang , Qi Wang , Renchun Lin , Hongbin Zhang , Youzhu Yuan , Weiping Fang , Quanxing Zheng , Shenjun Dai , Xingguo Yan , Aiping Chen , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher , Hubert Redlingshofer , Sabine Ackermann
发明人： Yiquan Yang , Qi Wang , Renchun Lin , Hongbin Zhang , Youzhu Yuan , Weiping Fang , Quanxing Zheng , Shenjun Dai , Xingguo Yan , Aiping Chen , Jan-Olaf Barth , Christoph Weckbecker , Klaus Huthmacher , Hubert Redlingshofer , Sabine Ackermann
IPC分类号： C07C319/04 , B01J23/28 , C07C321/04
CPC分类号： B01J37/0203 , B01J23/28 , B01J23/8872 , B01J37/0201 , C07C319/02 , Y02P20/582 , C07C321/04
摘要： The present invention refers to a continuous process for the manufacture of methyl mercaptan using Mo-O—K-based catalysts. It is further described that the total selectivity of methylmercaptan can be increased by at least 1% by lowering the total gas hourly space velocity. The invention further refers to a process for the preparation of a solid, preformed catalyst system.
摘要翻译：本发明涉及使用Mo-O-K系催化剂制造甲硫醇的连续方法。进一步描述的是，通过降低总气体时空速度，甲基硫醇的总选择性可以增加至少1％。本发明还涉及制备固体预成型催化剂体系的方法。

7. 发明申请

US20120272201A1 METHOD AND SYSTEM FOR MODEL-BASED DESIGN AND LAYOUT OF AN INTEGRATED CIRCUIT 有权
公开(公告)号：US20120272201A1
公开(公告)日：2012-10-25
申请号：US13535242
申请日：2012-06-27
申请人： Ya-Chieh Lai , Frank Gennari , Matthew Moskewicz , Srinivas Doddi , Junjiang Lei , Weiping Fang , Kuanghao Lay
发明人： Ya-Chieh Lai , Frank Gennari , Matthew Moskewicz , Srinivas Doddi , Junjiang Lei , Weiping Fang , Kuanghao Lay
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A approach is described for allowing electronic design, verification, and optimization tools to implement very efficient approaches to allow the tools to directly address the effects of manufacturing processes, e.g., to identify and prevent problems caused by lithography processing. Fast models and pattern checking are employed to integrate lithography and manufacturing aware processes within EDA tools such as routers.

8. 发明授权

US07861196B2 System and method for multi-exposure pattern decomposition 有权
标题翻译：多曝光模式分解的系统和方法
公开(公告)号：US07861196B2
公开(公告)日：2010-12-28
申请号：US12023512
申请日：2008-01-31
申请人： Judy Huckabay , Weiping Fang , Chung-Shin Kang , Shiying Zhou
发明人： Judy Huckabay , Weiping Fang , Chung-Shin Kang , Shiying Zhou
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： Some embodiments provide a method and system for identifying error markers for patterns within a design layout that do not meet the manufacturing constraints. Some embodiments extend a region from the error marked region to extract a pattern for decomposition analysis. Some embodiments compare the extracted pattern to known patterns stored in a library, which also stores at least one previously computed decomposition solution for each known pattern. For an extracted pattern existing within the library, some embodiments retrieve the previously computed decomposition solution from the library. For an extracted pattern that does not exist within the library, some embodiments use one or more simulations to determine a decomposition solution for the extracted pattern. The resulting decomposition solution replaces the extracted pattern within the design layout producing a variant of the original layout that contains the decomposed solution for the pattern.
摘要翻译：一些实施例提供了用于识别不符合制造约束的设计布局内的图案的误差标记的方法和系统。一些实施例将区域从错误标记区域扩展以提取用于分解分析的模式。一些实施例将提取的图案与存储在库中的已知图案进行比较，库中还存储了每个已知图案的至少一个先前计算的分解解。对于库中存在的提取模式，一些实施例从库中检索先前计算的分解解。对于在库内不存在的提取模式，一些实施例使用一个或多个模拟来确定所提取模式的分解解。所得到的分解解代替了设计布局中提取的图案，从而产生了原始布局的变体，该变体包含该模式的分解解。

9. 发明申请

US20070198958A1 Method and apparatus for using a database to quickly identify and correct a manufacturing problem area in a layout 有权
标题翻译：使用数据库快速识别和纠正布局中的制造问题区域的方法和装置
公开(公告)号：US20070198958A1
公开(公告)日：2007-08-23
申请号：US11637424
申请日：2006-12-12
申请人： Zong Wu Tang , Daniel N. Zhang , Juhwan Kim , Hua Song , Weiping Fang , Lawrence S. Melvin
发明人： Zong Wu Tang , Daniel N. Zhang , Juhwan Kim , Hua Song , Weiping Fang , Lawrence S. Melvin
IPC分类号： G06F17/50
CPC分类号： G06F17/5081 , G03F1/36 , G05B2219/45031 , G06F2217/12 , Y02P90/265
摘要： One embodiment provides a system for using a database to quickly identify a manufacturing problem area in a layout. During operation, the system receives a first check-figure which identifies a first area in a first layout, wherein the first area is associated with a first feature. Next, the system determines a first sample using the first check-figure, wherein the first sample represents the first layout's geometry within a first ambit of the first check-figure, wherein the first sample's geometry is expected to affect the shape of the first feature. The system then performs a model-based simulation using the first sample to obtain a first simulation-result which indicates whether the first feature is expected to have manufacturing problems. Next, the system stores the first simulation-result in a database which is used to quickly determine whether a second feature is expected to have manufacturing problems.
摘要翻译：一个实施例提供了一种使用数据库来快速识别布局中的制造问题区域的系统。在操作期间，系统接收第一检查图，其识别第一布局中的第一区域，其中第一区域与第一特征相关联。接下来，系统使用第一检查图确定第一样本，其中第一样本表示第一检查图的第一范围内的第一布局的几何形状，其中预期第一样本的几何形状影响第一特征的形状。然后，系统使用第一样本执行基于模型的模拟，以获得第一模拟结果，其指示第一特征是否预期具有制造问题。接下来，系统将第一模拟结果存储在用于快速确定第二特征是否期望具有制造问题的数据库中。

10. 发明申请

US20070055953A1 Distributed hierarchical partitioning framework for verifying a simulated wafer image 有权
标题翻译：用于验证模拟晶片图像的分布式分层框架
公开(公告)号：US20070055953A1
公开(公告)日：2007-03-08
申请号：US11510415
申请日：2006-08-25
申请人： Weiping Fang , Huijuan Zhang , Yibing Wang , Zongwu Tang
发明人： Weiping Fang , Huijuan Zhang , Yibing Wang , Zongwu Tang
IPC分类号： G06F17/50 , G06K9/00
CPC分类号： G03F1/36 , G03F1/68
摘要： A system that verifies a simulated wafer image against an intended design. During operation, the system receives a design. Next, the system generates a skeleton from the design, wherein the skeleton specifies cell placements and associated bounding boxes for the cell placements, but does not include geometries for the cell placements. The system then computes environments for cell placements based on the skeleton. Next, the system generates templates for cell placements, wherein a template for a cell placement specifies the cell placement and the environment surrounding the cell placement. The system then generates the simulated wafer image by performing model-based simulations for cell placements associated with unique templates.
摘要翻译：根据预期设计验证模拟晶片图像的系统。在运行过程中，系统接收到一个设计。接下来，系统从设计生成骨架，其中骨架指定单元格展示位置的单元格展示位置和相关联的边界框，但不包括单元格展示位置的几何。然后系统基于骨架计算单元格展示位置的环境。接下来，系统生成单元格展示位置的模板，其中单元格展示位置的模板指定单元格展示位置和单元格展示位置周围的环境。然后，系统通过对与唯一模板相关联的单元格展示执行基于模型的模拟来生成模拟的晶片图像。

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