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1. 发明授权

US5514506A Light receiving member having a multi-layered light receiving layer with an enhanced concentration of hydrogen or/and halogen atoms in the vicinity of the interface of adjacent layers 失效
标题翻译：具有在相邻层的界面附近具有增强的氢或/和卤素原子浓度的多层光接收层的光接收元件
公开(公告)号：US5514506A
公开(公告)日：1996-05-07
申请号：US165840
申请日：1993-12-14
申请人： Yasuyoshi Takai , Tetsuya Takei , Hirokazu Otoshi , Ryuji Okamura , Hiroyuki Katagiri , Satoshi Kojima
发明人： Yasuyoshi Takai , Tetsuya Takei , Hirokazu Otoshi , Ryuji Okamura , Hiroyuki Katagiri , Satoshi Kojima
IPC分类号： G03G5/082
CPC分类号： G03G5/08228 , G03G5/08242
摘要： A light receiving member comprising a substrate and a light receiving layer disposed on said substrate, said light receiving layer having a stacked structure comprising a plurality of constituent layers each being composed of a non-single crystal material containing silicon atoms as a matrix and at least either hydrogen atoms or halogen atoms, characterized in that said light receiving layer has a region containing at least one kind of atoms selected from the group consisting of hydrogen atoms and halogen atoms at an enhanced concentration distribution in the thickness direction in the vicinity of at least one layer interface of the light receiving layer.
摘要翻译：一种受光部件，包括基板和设置在所述基板上的光接收层，所述光接收层具有堆叠结构，所述层叠结构包括多个构成层，每个构成层由含有硅原子作为基质的非单晶材料构成，并且至少氢原子或卤素原子，其特征在于，所述光接收层具有包含至少一种选自氢原子和卤原子的原子的区域，其浓度分布在厚度方向上至少在附近至少光接收层的一层界面。

2. 发明授权

US5360484A Microwave plasma CVD apparatus provided with a microwave transmissive window made of specific ceramics for the formation of a functional deposited film 失效
标题翻译：微波等离子体CVD装置设置有由特定陶瓷制成的微波透射窗，用于形成功能沉积膜
公开(公告)号：US5360484A
公开(公告)日：1994-11-01
申请号：US63048
申请日：1993-05-19
申请人： Yasuyoshi Takai , Tetsuya Takei , Hirokazu Otoshi , Ryuji Okamura
发明人： Yasuyoshi Takai , Tetsuya Takei , Hirokazu Otoshi , Ryuji Okamura
IPC分类号： C23C16/50 , C23C16/511 , G03G5/08 , H01J37/32 , H01L21/205
CPC分类号： C23C16/511 , H01J37/32238 , H01J37/32467
摘要： An improved microwave plasma CVD apparatus for forming a functional deposited film which is provided with a microwave transmissive window composed of a sintered alpha-alumina ceramics body containing alpha-alumina as a matrix comprised of fine particles with a mean particle size d satisfying the equation 0.5 .mu.m.ltoreq.d.ltoreq.50 .mu.m and with a ratio of .rho..sub.2 /.rho..sub.1 between the theoretical density .rho..sub.1 and the bulk density .rho..sub.2 satisfying the equation 0.800.ltoreq..rho..sub.2 /.rho..sub.1 .ltoreq.0.995.
摘要翻译：一种用于形成功能性沉积膜的改进的微波等离子体CVD装置，其具有由α-氧化铝烧结体构成的微波透射窗，所述烧结体包含α-氧化铝作为基质，其平均粒径d满足式在理论密度rho 1和体积密度rho 2之间的rho 2 / rho 1的比值满足方程式0.800

3. 发明授权

US5597623A Process for using microwave plasma CVD 失效
标题翻译：使用微波等离子体CVD的方法
公开(公告)号：US5597623A
公开(公告)日：1997-01-28
申请号：US307099
申请日：1994-09-16
申请人： Yasuyoshi Takai , Tetsuya Takei , Hirokazu Otoshi , Ryuji Okamura
发明人： Yasuyoshi Takai , Tetsuya Takei , Hirokazu Otoshi , Ryuji Okamura
IPC分类号： C23C16/50 , C23C16/511 , G03G5/08 , H01J37/32 , H01L21/205 , H05H1/30
CPC分类号： C23C16/511 , H01J37/32238 , H01J37/32467
摘要： An improved microwave plasma CVD process for forming a functional deposited film using a microwave transmissive window composed of a sintered alpha-alumina ceramics body containing alpha-alumina as a matrix comprised of fine particles with a mean particle size d satisfying the equation 0.5 .mu.m.ltoreq.d.ltoreq.50 .mu.m and with a ratio of .rho..sub.2 /.rho..sub.1 between the theoretical density .rho..sub.1 and the bulk density .rho..sub.2 satisfying the equation 0.800.ltoreq..rho..sub.2 /.rho..sub.1 .ltoreq.0.995.
摘要翻译：一种改进的微波等离子体CVD法，用于使用由包含α-氧化铝的烧结α-氧化铝陶瓷体构成的微波透射窗形成功能性沉积膜，该α-氧化铝作为基质，其平均粒径d满足0.5μm / = d

4. 发明授权

US5443645A Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure 失效
标题翻译：微波等离子体CVD装置，包括同轴排列的多个气体管道气体馈送结构
公开(公告)号：US5443645A
公开(公告)日：1995-08-22
申请号：US173948
申请日：1993-12-28
申请人： Hirokazu Otoshi , Tetsuya Takei , Yasuyoshi Takai , Ryuji Okamura , Shigeru Shirai , Teruo Misumi
发明人： Hirokazu Otoshi , Tetsuya Takei , Yasuyoshi Takai , Ryuji Okamura , Shigeru Shirai , Teruo Misumi
IPC分类号： C23C16/24 , C23C16/44 , C23C16/455 , C23C16/511 , C23C16/50
CPC分类号： C23C16/24 , C23C16/455 , C23C16/45578 , C23C16/511
摘要： A deposited film-forming apparatus comprising a reaction chamber capable of maintaining at a reduced pressure, means for arranging a substrate on which a film is to be formed in said reaction chamber, a gas feed means for supplying a gaseous raw material into said reaction chamber and means for introducing a microwave energy into said reaction chamber, characterized in that said gas feed means is arranged in the space circumscribed by said substrate, said gas feed means comprises a multiple pipe structure, said multiple pipe structure being connected to a gas supply source for supplying said gaseous raw material, the respective constituent pipes of said multiple pipe structure being provided with a plurality of gas spouting holes such that said gas spouting holes are in communication with each other, and means for applying a bias voltage between said substrate and said gas feed means.
摘要翻译：一种沉积膜形成装置，包括能够在减压下保持的反应室，用于布置在其上形成有膜的基板的装置，用于将气态原料供给到所述反应室中的气体供给装置以及用于将微波能量引入所述反应室的装置，其特征在于，所述气体供给装置布置在由所述基板限定的空间中，所述气体供给装置包括多个管道结构，所述多个管道结构连接到气体供应源为了供应所述气态原料，所述多管结构的各构成管设置有多个气体喷出孔，使得所述气体喷出孔彼此连通，以及用于在所述基板和所述气体进料装置。

5. 发明授权

US5480627A Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member 失效
标题翻译：电子照相感光构件用基板的处理方法及电子照相感光体的制造方法
公开(公告)号：US5480627A
公开(公告)日：1996-01-02
申请号：US200651
申请日：1994-02-23
申请人： Tetsuya Takei , Hirokazu Ohtoshi , Ryuji Okamura , Hiroyuki Katagiri , Yasuyoshi Takai
发明人： Tetsuya Takei , Hirokazu Ohtoshi , Ryuji Okamura , Hiroyuki Katagiri , Yasuyoshi Takai
IPC分类号： G03G5/10 , B23B51/06
CPC分类号： G03G5/102 , G03G5/10 , Y10S29/095 , Y10T408/44 , Y10T82/10
摘要： A method of treating a substrate for an electrophotographic photosensitive member by a process comprises the steps;a) cutting the surface of the substrate to remove the surface in the desired thickness; andb) bringing the cut surface of the substrate into contact with water having a temperature of from 5.degree. C. to 90.degree. C., having a resistivity of not less than 11 M.OMEGA..multidot.cm at 25.degree. C., containing fine particles with a particle diameter of not smaller than 0.2 .mu.m in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for at least 10 seconds at a pressure of from 1 kg.multidot.f/cm.sup.2 to 300 kg.multidot.f/cm.sup.2.
摘要翻译：通过该方法处理电子照相感光构件的基板的方法包括以下步骤： a）切割基材的表面以除去所需厚度的表面; 和b）使基材的切割表面与温度为5℃至90℃的水接触，其在25℃下的电阻率不小于11M OMEGA xcm，其中包含具有每毫升不超过10,000个颗粒的粒径不小于0.2μm的粒径，含有总活细胞数不超过100毫升的微生物，并且含有不大于10的有机物质在1kgxf / cm 2至300kgxf / cm 2的压力下至少10秒钟。

6. 发明授权

US5314780A Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member 失效
标题翻译：电子照相感光体用金属基材的处理方法及电子照相感光体的制造方法
公开(公告)号：US5314780A
公开(公告)日：1994-05-24
申请号：US841989
申请日：1992-02-26
申请人： Tetsuya Takei , Hirokazu Ohtoshi , Ryuji Okamura , Hiroyuki Katagiri , Yasuyoshi Takai
发明人： Tetsuya Takei , Hirokazu Ohtoshi , Ryuji Okamura , Hiroyuki Katagiri , Yasuyoshi Takai
IPC分类号： G03G5/10 , G03G5/00
CPC分类号： G03G5/102 , G03G5/10 , Y10S29/095 , Y10T408/44 , Y10T82/10
摘要： A method of treating a substrate for an electrophotographic photosensitive member by a process comprises the steps of;a) cutting the surface of the substrate to remove the surface in the desired thickness; andb) bringing the cut surface of the substrate into contact with water having a temperature of from 5.degree. C. to 90.degree. C., having a resistivity of not less than 11 M.OMEGA..multidot.cm at 25.degree. C., containing fine particles with a particle diameter of not smaller than 0.2 .mu.m in a quantity of not more than 10,000 particles per milliliter, containing microorganisms in a total viable cell count of not more than 100 per milliliter and containing an organic matter in a quantity of not more than 10 mg per liter, for at least 10 seconds at a pressure of from 1 kg.multidot.f/cm.sup.2 to 300 kg.multidot.f/cm.sup.2.
摘要翻译：通过该方法处理电子照相感光构件的基板的方法包括以下步骤： a）切割基材的表面以除去所需厚度的表面; 和b）使基材的切割表面与温度为5℃至90℃的水接触，其在25℃下的电阻率不小于11M OMEGA xcm，其中包含具有每毫升不超过10,000个颗粒的粒径不小于0.2μm的粒径，含有总活细胞数不超过100毫升的微生物，并且含有不大于10的有机物质在1kgxf / cm 2至300kgxf / cm 2的压力下至少10秒钟。

7. 发明授权

US5284730A Electrophotographic light-receiving member 失效
标题翻译：电子照相光接收元件
公开(公告)号：US5284730A
公开(公告)日：1994-02-08
申请号：US925617
申请日：1992-08-06
申请人： Tetsuya Takei , Shigeru Shirai , Hirokazu Ohtoshi , Ryuji Okamura , Yasuyoshi Takai , Hiroyuki Katagiri
发明人： Tetsuya Takei , Shigeru Shirai , Hirokazu Ohtoshi , Ryuji Okamura , Yasuyoshi Takai , Hiroyuki Katagiri
IPC分类号： C23C16/30 , G03G5/082 , G03G5/14
CPC分类号： C23C16/30 , G03G5/08221
摘要： An electrophotographic light-receiving member has a surface layer of a non-single crystal material (Si.sub.x C.sub.y O.sub.z).sub.t H.sub.u F.sub.v (wherein 0.1.ltoreq.x.ltoreq.0.4, 0.4.ltoreq.y.ltoreq.0.7, 0.05.ltoreq.z.ltoreq.0.2, x+y+z=1, 0.299.ltoreq.t.ltoreq.0.589, 0.41.ltoreq.u.ltoreq.0.7, 0.001.ltoreq.v.ltoreq.0.1 and t+u+v=1), in which the ratio of silicon atoms bonded to carbon atoms in the surface layer is at least 50% of the total number of silicon atoms, and the ratio of silicon atoms bonded to oxygen atoms is 10 to 30 atomic % of the total number of silicon atoms.
摘要翻译：电子照相光接收元件具有非单晶材料（SixCyOz）tHuFv（其中0.1≤x≤0.4,0.4≤y≤0.7,0.05≤z≤0.2，x + y）的表面层 + z = 1，0.299 <= t <= 0.589，0.41 <= u <= 0.7，0.001 <= v <= 0.1，t + u + v = 1），其中与碳原子键合的硅原子比表面层为硅原子总数的至少50％，与氧原子键合的硅原子的比例为硅原子总数的10〜30原子％。

8. 发明授权

US5030476A Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition 失效
标题翻译：通过微波等离子体化学气相沉积在圆柱形基底上形成功能沉积膜的方法和装置
公开(公告)号：US5030476A
公开(公告)日：1991-07-09
申请号：US526536
申请日：1990-05-21
申请人： Ryuji Okamura , Hirokazu Otoshi , Tetsuya Takei
发明人： Ryuji Okamura , Hirokazu Otoshi , Tetsuya Takei
IPC分类号： C23C16/50 , C23C16/46 , C23C16/511
CPC分类号： C23C16/511 , C23C16/46
摘要： A process for forming a functional deposited film which is adapted for use in an apparatus which comprises a substantially enclosed reaction chamber, a plurality of cylindrical substrates arranged to surround a discharge space and a microwave introduction means provided at least at one end of each cylindrical substrate and wherein microwave energy is introduced so that a glow discharge plasma containing reactant gases derived from starting gases is formed in the discharge space thereby forming a deposited film on each cylindrical substrate is described. The process is characterized in that a temperature control means is provided in the inside of each of said plurality of cylindrical substrates and simultaneous with the introduction of a thermally conductive gas, the thermally conductive gas is exhausted from the one end of each cylindrical substrate in the vicinity of the microwave introduction means. The process enables the deposited film of good quality to be formed stably at high speed and the deposited film is useful as an element member for semiconductive devices, photosensitive devices for electrophotography, photovoltaic devices, other electronic elements and optical elements.
摘要翻译：一种用于形成功能性沉积膜的方法，其适用于包括基本封闭的反应室的设备，布置成围绕放电空间的多个圆柱形基板和设置在每个圆柱形基板的至少一端的微波引入装置并且其中引入微波能量，使得在放电空间中形成含有源自起始气体的反应气体的辉光放电等离子体，从而在每个圆柱形基板上形成沉积膜。该方法的特征在于，在所述多个圆柱形基板的每一个的内部设置有温度控制装置，并且与引入导热气体同时，导热气体从每个圆柱形基板的一端排出微波引入装置附近。该方法能够以高速稳定地形成高质量的沉积膜，并且沉积膜可用作半导体器件的元件部件，电子照相用光敏器件，光电器件，其它电子元件和光学元件。

9. 发明授权

US5439715A Process and apparatus for microwave plasma chemical vapor deposition 失效
标题翻译：微波等离子体化学气相沉积的工艺和装置
公开(公告)号：US5439715A
公开(公告)日：1995-08-08
申请号：US165868
申请日：1993-12-14
申请人： Ryuji Okamura , Hirokazu Otoshi , Tetsuya Takei
发明人： Ryuji Okamura , Hirokazu Otoshi , Tetsuya Takei
IPC分类号： C23C16/50 , C23C16/46 , C23C16/511 , B05D3/06
CPC分类号： C23C16/511 , C23C16/46
摘要： A process for forming a functional deposited film which is adapted for use in an apparatus which comprises a substantially enclosed reaction chamber, a plurality of cylindrical substrates arranged to surround a discharge space and a microwave introduction means provided at least at one end of each cylindrical substrate and wherein microwave energy is introduced so that a glow discharge plasma containing reactant gases derived from starting gases is formed in the discharge space thereby forming a deposited film on each cylindrical substrate is described. The process is characterized in that a temperature control means is provided in the inside of each of said plurality of cylindrical substrates and simultaneous with the introduction of a thermally conductive gas, the thermally conductive gas is exhausted from the one end of each cylindrical substrate in the vicinity of the microwave introduction means. The process enables the deposited film of good quality to be formed stably at high speed and the deposited film is useful as an element member for semiconductive devices, photosensitive devices for electrophotography, photovoltaic devices, other electronic elements and optical elements.
摘要翻译：一种用于形成功能性沉积膜的方法，其适用于包括基本封闭的反应室的设备，布置成围绕放电空间的多个圆柱形基板和设置在每个圆柱形基板的至少一端的微波引入装置并且其中引入微波能量，使得在放电空间中形成含有源自起始气体的反应气体的辉光放电等离子体，从而在每个圆柱形基板上形成沉积膜。该方法的特征在于，在所述多个圆柱形基板的每一个的内部设置有温度控制装置，并且与引入导热气体同时，导热气体从每个圆柱形基板的一端排出微波引入装置附近。该方法能够以高速稳定地形成高质量的沉积膜，并且沉积膜可用作半导体器件的元件部件，电子照相用光敏器件，光电器件，其它电子元件和光学元件。

10. 发明授权

US5273851A Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C 失效
标题翻译：具有与C结合的高比率的表面区域的电子照相光接收元件
公开(公告)号：US5273851A
公开(公告)日：1993-12-28
申请号：US780780
申请日：1991-10-23
申请人： Tetsuya Takei , Shigeru Shirai , Hirokazu Ootoshi , Ryuji Okamura , Yasuyoshi Takai
发明人： Tetsuya Takei , Shigeru Shirai , Hirokazu Ootoshi , Ryuji Okamura , Yasuyoshi Takai
IPC分类号： G03G5/08 , C23C16/30 , G03G5/082 , G03G5/14
CPC分类号： C23C16/30 , G03G5/08221
摘要： An electrophotographic light-receiving member comprises a substrate, a photoconductive layer formed on the substrate and composed of a non-single crystal material containing a base component silicon atoms and a surface layer (surface-side region) made of a non-single crystal material containing silicon, carbon and hydrogen atoms, in which the ratio of silicon atoms having at least one bond to a carbon atom in the surface layer is at least 50% of the total number of silicon atoms. The electrophotographic light-receiving member has good initial electrophotographic properties and particularly good durability under a high-humidity environment.
摘要翻译：电子照相受光部件包括：基板，形成在基板上的由非晶单晶材料构成的光电导层和由非单晶材料构成的表面层（表面侧区域）含有硅，碳和氢原子，其中具有至少一个键的硅原子与表面层中的碳原子的比例为硅原子总数的至少50％。电摄影光接收元件在高湿度环境下具有良好的初始电子照相特性和特别好的耐久性。

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