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1. 发明申请

US20050206850A1 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置以及程序和信息存储介质
公开(公告)号：US20050206850A1
公开(公告)日：2005-09-22
申请号：US10901209
申请日：2004-07-29
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B21/18 , G03F7/20
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.
摘要翻译：第二通信服务器经由第一通信服务器获取曝光装置中的调整单元的调整信息和与投影光学系统的图像形成质量（例如波前像差）有关的曝光条件下的调整信息，以及然后基于该信息计算目标曝光条件下的调整单元的最佳调整量。此外，第二通信服务器经由第一通信服务器获取投影光学系统的图像形成质量的调整和实际测量数据的调整信息，然后基于目标曝光条件计算调整单元的最佳调整量信息。并且，第二通信服务器基于计算结果经由第一通信服务器控制曝光装置中的调整单元。

2. 发明授权

US07391497B2 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置以及程序和信息存储介质
公开(公告)号：US07391497B2
公开(公告)日：2008-06-24
申请号：US11736134
申请日：2007-04-17
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/52 , G03B27/68
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.
摘要翻译：第二通信服务器经由第一通信服务器获取曝光装置中的调整单元的调整信息和与投影光学系统的图像形成质量（例如波前像差）有关的曝光条件下的调整信息，以及然后基于该信息计算目标曝光条件下的调整单元的最佳调整量。此外，第二通信服务器经由第一通信服务器获取投影光学系统的图像形成质量的调整和实际测量数据的调整信息，然后基于目标曝光条件计算调整单元的最佳调整量信息。并且，第二通信服务器基于计算结果经由第一通信服务器控制曝光装置中的调整单元。

3. 发明申请

US20070188727A1 IMAGE FORMING STATE ADJUSTING SYSTEM, EXPOSURE METHOD AND EXPOSURE APPARATUS, AND PROGRAM AND INFORMATION STORAGE MEDIUM 有权
公开(公告)号：US20070188727A1
公开(公告)日：2007-08-16
申请号：US11736177
申请日：2007-04-17
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/52
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.

4. 发明申请

US20070188726A1 IMAGE FORMING STATE ADJUSTING SYSTEM, EXPOSURE METHOD AND EXPOSURE APPARATUS, AND PROGRAM AND INFORMATION STORAGE MEDIUM 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置，以及程序和信息存储介质
公开(公告)号：US20070188726A1
公开(公告)日：2007-08-16
申请号：US11736134
申请日：2007-04-17
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/52
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.
摘要翻译：第二通信服务器经由第一通信服务器获取曝光装置中的调整单元的调整信息和与投影光学系统的图像形成质量（例如波前像差）有关的曝光条件下的调整信息，以及然后基于该信息计算目标曝光条件下的调整单元的最佳调整量。此外，第二通信服务器经由第一通信服务器获取投影光学系统的图像形成质量的调整和实际测量数据的调整信息，然后基于目标曝光条件计算调整单元的最佳调整量信息。并且，第二通信服务器基于计算结果经由第一通信服务器控制曝光装置中的调整单元。

5. 发明授权

US07230682B2 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置以及程序和信息存储介质
公开(公告)号：US07230682B2
公开(公告)日：2007-06-12
申请号：US10901209
申请日：2004-07-29
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/32 , G03B27/68
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： An exposure method of forming pattern on object via projection optical system, including deciding optimal adjustment amount of adjustment device which adjusts image forming property of the projection optical system to optimize the image forming property under pattern to be formed and exposure condition of the pattern, based on information related to wavefront aberration of the projection optical system, Zernike Sensitivity Chart corresponding to the pattern and the exposure condition, wavefront aberration variation table that denotes relation between adjustment amount of the adjustment device and change in coefficients of terms in the Zernike polynomial, and restraint condition with respect to the adjustment amount of the adjustment device, and exposing the pattern on the object under the exposure condition via the projection optical system of which the image forming property is adjusted by the adjustment device based on the decided optimal adjustment amount.
摘要翻译：一种通过投影光学系统在物体上形成图案的曝光方法，包括确定调整投影光学系统的图像形成特性的调整装置的最佳调节量，以优化待形成的图案下的图像形成特性和图案的曝光条件关于与投影光学系统的波前像差相关的信息，对应于图案和曝光条件的Zernike感光度图，表示调节装置的调整量与Zernike多项式中的项的系数的变化之间的关系的波前像差变化表，以及基于调整装置的调整量，通过调整装置调整图像形成特性的投影光学系统，根据所确定的最佳调整量，在曝光条件下将图案曝光在物体上。

6. 发明授权

US07405803B2 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
公开(公告)号：US07405803B2
公开(公告)日：2008-07-29
申请号：US11736177
申请日：2007-04-17
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/32 , G03B27/68
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： A second communications server obtains adjustment information of an adjustment unit in an exposure apparatus and information related to image forming quality (such as wavefront aberration) of a projection optical system under an exposure condition that serves as a reference, via a first communications server, and then calculates an optimal adjustment amount of the adjustment unit under a target exposure condition based on the information. In addition, the second communications server obtains adjustment information of the adjustment and actual measurement data of image forming quality of the projection optical system via the first communications server, and then calculates the optimal adjustment amount of the adjustment unit under the target exposure condition based on the information. And, the second communications server controls the adjustment unit in the exposure apparatus via the first communications server, based on the calculations results.

7. 发明授权

US09146474B2 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas 有权
标题翻译：曝光方法和装置以及在轴上区域和多个离轴区域中制造具有光线大小和不同线偏振状态的光量分布的装置的方法
公开(公告)号：US09146474B2
公开(公告)日：2015-09-29
申请号：US12382277
申请日：2009-03-12
申请人： Takehito Kudo , Shigeru Hirukawa
发明人： Takehito Kudo , Shigeru Hirukawa
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/70191 , G03B27/42 , G03F7/70091 , G03F7/701 , G03F7/70108 , G03F7/70158 , G03F7/70566
摘要： An exposure method and apparatus that illuminates a pattern with an illumination system to expose a substrate through a projection system are provided. The pattern is illuminated with illumination light having a light amount distribution, which is set such that an amount of light is larger in an on-axis area substantially including an optical axis and in a plurality of off-axis areas arranged out of the optical axis than in an area other than the on-axis area and the plurality of off-axis areas on a pupil plane of the illumination system. The polarization states of the illumination light are different between the on-axis area and the off-axis areas.
摘要翻译：提供了利用照明系统照亮图案以通过投影系统曝光基板的曝光方法和装置。用具有光量分布的照明光照射图案，该光量被设定为使得在基本上包括光轴的轴上区域中的光量以及布置在光轴外的多个离轴区域中的光量较大而不是在照明系统的光瞳平面上的除了轴上区域和多个离轴区域之外的区域中。照明光的偏振状态在轴上区域和离轴区域之间是不同的。

8. 发明授权

US08698998B2 Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device 有权
标题翻译：曝光装置，其清洁部件的方法，曝光装置的维护方法，维护装置及其制造方法
公开(公告)号：US08698998B2
公开(公告)日：2014-04-15
申请号：US11822964
申请日：2007-07-11
申请人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
发明人： Hiroyuki Nagasaka , Kenichi Shiraishi , Soichi Owa , Shigeru Hirukawa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/54 , G03B27/32 , G03F7/20
CPC分类号： G03F7/70925 , G03F7/70341 , G03F7/707 , G03F7/7085 , G03F7/7095 , G03F7/70958 , G03F7/70975
摘要： An exposure apparatus EXS forms an immersion area AR2 of a liquid LQ on the side of the image plane of a projection optical system PL and performs exposure of a substrate P via the projection optical system PL and the liquid LQ of the immersion region AR2. The exposure apparatus EXS has an optical cleaning unit (80) which irradiates a predetermined irradiation light Lu, having an optical cleaning effect, onto, for example, the upper surface (31) of the substrate stage PST which makes contact with the liquid LQ for forming the immersion area AR2. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
摘要翻译：曝光装置EXS在投影光学系统PL的像面一侧形成液体LQ的浸渍区域AR2，经由投影光学系统PL和浸渍区域AR2的液体LQ进行基板P的曝光。曝光装置EXS具有光学清洁单元（80），其将具有光学清洁效果的预定照射光Lu照射到例如与液体LQ接触的基板台PST的上表面（31）形成浸渍区域AR2。因此，可以防止由于与浸没区域中的液体接触的构件的污染导致的曝光精度和测量精度的劣化。

9. 发明授权

US08233133B2 Exposure method, exposure apparatus, and method for producing device 有权
标题翻译：曝光方法，曝光装置及其制造方法
公开(公告)号：US08233133B2
公开(公告)日：2012-07-31
申请号：US11312478
申请日：2005-12-21
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/70433 , G03F7/7085 , G03F7/70858 , G03F7/70875 , G03F7/70891
摘要： A liquid immersion photolithography system has an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. In addition, a plurality of nozzles are arranged so as to provide a substantially uniform velocity distribution of the liquid flow between the substrate and the projection optical system.
摘要翻译：液浸光刻系统具有用电磁辐射使基板曝光的曝光系统，并且包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。此外，多个喷嘴被布置成在基板和投影光学系统之间提供基本均匀的液体流速分布。

10. 发明授权

US07713889B2 Substrate processing method, photomask manufacturing method, photomask, and device manufacturing method 有权
标题翻译：基板加工方法，光掩模制造方法，光掩模和器件制造方法
公开(公告)号：US07713889B2
公开(公告)日：2010-05-11
申请号：US11600151
申请日：2006-11-16
申请人： Shigeru Hirukawa
发明人： Shigeru Hirukawa
IPC分类号： H01L21/00
CPC分类号： G03F7/705 , G03F1/36 , G03F7/70108
摘要： A device linewidth characteristic is predicted based on a sharp-edged feature of a projected image of a predetermined pattern (steps 104 to 110), and an exposure condition of the pattern is adjusted based on the device linewidth characteristic that has been predicted (step 112). Then, exposure is performed under the adjusted exposure condition. That is, patterning of a resist on a substrate is performed with the projected image of the pattern (step 114). And, by developing the substrate after patterning, a resist pattern that satisfies a desired device linewidth characteristic is formed on the substrate. Accordingly, by performing etching of the substrate with the resist pattern serving as a mask, a pattern after etching can be formed with a desired linewidth.
摘要翻译：基于预定图案的投影图像的尖锐特征预测装置线宽特性（步骤104至110），并且基于已经预测的装置线宽特性来调整图案的曝光条件（步骤112 ）。然后，在调整后的曝光条件下进行曝光。也就是说，利用图案的投影图像来执行基板上的抗蚀剂的图案化（步骤114）。并且，通过在图案化之后显影衬底，在衬底上形成满足所需器件线宽特性的抗蚀剂图案。因此，通过用抗蚀剂图案作为掩模进行基板的蚀刻，可以以期望的线宽形成蚀刻后的图案。

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