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1. 发明申请

US20110094445A1 APPARATUS FOR MANUFACTURING THIN-FILM SOLAR CELL 审中-公开
标题翻译：制造薄膜太阳能电池的装置
公开(公告)号：US20110094445A1
公开(公告)日：2011-04-28
申请号：US12995295
申请日：2009-06-04
申请人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara , Masanori Hashimoto , Sadatsugu Wakamatsu
发明人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara , Masanori Hashimoto , Sadatsugu Wakamatsu
IPC分类号： H01L31/18
CPC分类号： H01L21/67781 , C23C16/24 , C23C16/45565 , C23C16/4587 , H01J37/32532 , H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/67754 , H01L31/202 , H01L31/206 , Y02E10/50 , Y02P70/521
摘要： An apparatus for manufacturing a thin film solar cell of the present invention includes a film forming chamber in which a film is formed on a film formation face of a substrate using a CVD method; an electrode unit including a cathode unit having cathodes to which voltages are to be applied arranged on both sides thereof, and a pair of anodes each of which is arranged to face a different one of the cathodes, at a separation distance therefrom; a mask for covering a peripheral edge portion of the substrate; and a discharge duct installed around the cathode unit. A film formation space is formed between the cathode unit and the substrate installed on the side of the anode, an evacuation passage is formed between the mask and the cathode unit, the discharge duct and the film formation space are connected together via the evacuation passage, and a film forming gas introduced into the film formation space is evacuated from the discharge duct through the evacuation passage.
摘要翻译：本发明的薄膜太阳能电池的制造装置包括使用CVD法在基板的成膜面上形成膜的成膜室; 包括阴极单元的电极单元，阴极单元具有要施加电压的阴极布置在其两侧，以及一对阳极，每个阳极以与其间隔开的距离与其他阴极对齐; 掩模，用于覆盖基板的周边部分; 以及安装在阴极单元周围的排放管。在阴极单元和安装在阳极侧的基板之间形成膜形成空间，在掩模和阴极单元之间形成排气通道，排出管和成膜空间经由排气通道连接在一起，并且从成膜空间引入的成膜气体通过排气通道从排出管排出。

2. 发明申请

US20110094446A1 THIN-FILM SOLAR CELL MANUFACTURING APPARATUS 审中-公开
标题翻译：薄膜太阳能电池制造设备
公开(公告)号：US20110094446A1
公开(公告)日：2011-04-28
申请号：US12995794
申请日：2009-06-05
申请人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Yosuke Jimbo , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara , Masanori Hashimoto , Sadatsugu Wakamatsu
发明人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Yosuke Jimbo , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara , Masanori Hashimoto , Sadatsugu Wakamatsu
IPC分类号： C23C16/50
CPC分类号： H01L31/18 , C23C16/50 , C23C16/5096 , C23C16/54 , H01J37/32568 , H01L21/67748 , H01L31/1876 , Y02E10/50 , Y02P70/521
摘要： A thin-film solar cell manufacturing apparatus, includes: a film formation space in which a substrate is disposed so that a film formation face of the substrate is substantially parallel to a direction of gravitational force, and in which a desired film is formed on the film formation face by a CVD method; a cathode unit including cathodes to which a voltage is applied, and two or more power feeding points, the cathodes being disposed at both sides of the cathode unit; and an anode distantly disposed so as to face the cathodes that are disposed at both sides of the cathode unit.
摘要翻译：薄膜太阳能电池制造装置包括：成膜空间，其中设置基板，使得基板的成膜面基本上平行于重力方向，并且其中形成所需的膜通过CVD法形成成膜面; 阴极单元，其包括施加有电压的阴极和两个或更多个馈电点，阴极设置在阴极单元的两侧; 以及与阴极单元的两侧配置的阴极相对地远离地设置的阳极。

3. 发明申请

US20110120370A1 THIN-FILM SOLAR CELL MANUFACTURING APPARATUS 审中-公开
标题翻译：薄膜太阳能电池制造设备
公开(公告)号：US20110120370A1
公开(公告)日：2011-05-26
申请号：US12995277
申请日：2009-06-03
申请人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara
发明人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara
IPC分类号： C23C16/52 , C23C16/00
CPC分类号： H01L21/67754 , C23C16/4401 , C23C16/4587 , C23C16/509 , C23C16/54 , H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/67781 , H01L31/0687 , H01L31/182 , H01L31/1824 , Y02E10/545 , Y02E10/546 , Y02P70/521
摘要： A thin-film solar cell manufacturing apparatus includes a film forming chamber which stores a substrate; and an electrode unit which performs film formation using a CVD method on the substrate in the film forming chamber. The electrode unit has an anode and a cathode; and a side wall portion which holds the anode and the cathode and forms a part of a wall portion of the film forming chamber, and is attachable to and detachable from the film forming chamber.
摘要翻译：薄膜太阳能电池制造装置包括：存储基板的成膜室; 以及电极单元，其在成膜室中的基板上使用CVD法进行成膜。电极单元具有阳极和阴极; 以及侧壁部分，其保持阳极和阴极并形成成膜室的壁部分的一部分，并且可附接到成膜室并从膜形成室拆卸。

4. 发明申请

US20110100296A1 FILM FORMATION APPARATUS 审中-公开
标题翻译：胶片形成装置
公开(公告)号：US20110100296A1
公开(公告)日：2011-05-05
申请号：US12995574
申请日：2009-06-05
申请人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara
发明人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara
IPC分类号： C23C16/44
CPC分类号： C23C16/4587 , C23C16/24 , C23C16/54 , H01L21/67161 , H01L21/67173 , H01L21/67712 , H01L21/67736 , H01L21/67754 , H01L31/076 , H01L31/1804 , Y02E10/547 , Y02E10/548 , Y02P70/521
摘要： A film formation apparatus includes: a film forming chamber in which a desired film is formed on a substrate in a vacuum; a loading-ejecting chamber fixed to the film forming chamber with a first opening-closing section interposed therebetween, being capable of reducing a pressure inside the loading-ejecting chamber so as to form a vacuum atmosphere; a second opening-closing section provided at a face opposite to the face of the loading-ejecting chamber on which the first opening-closing section is provided; and a carrier holding the substrate so that a film formation face of the substrate is substantially parallel to a direction of gravitational force, wherein the carrier or the substrate passes through the second opening-closing section, and is transported to the loading-ejecting chamber and is transported from the loading-ejecting chamber; a plurality of carriers is disposed in the loading-ejecting chamber in parallel to each other; the plurality of carriers is transported in parallel between the loading-ejecting chamber and the film forming chamber; and a film is simultaneously formed on a plurality of substrates that is held by the plurality of carriers in the film forming chamber.
摘要翻译：成膜装置包括：在真空中在基板上形成期望的膜的成膜室; 一个装载取出室，其固定在成膜室上，其中插入有第一开闭部分，能够减小装载取出室内部的压力，形成真空气氛; 第二开闭部，设置在与设置有所述第一开闭部的所述装卸取出室的面相反的面上; 以及保持基板的载体，使得基板的成膜面基本上平行于重力方向，其中载体或基板通过第二打开 - 关闭部分，并被运送到装载 - 取出室，从卸载室输送; 多个载体彼此平行地设置在装载取出室中; 多个载体在装载取出室和成膜室之间平行地输送; 并且在由成膜室中的多个载体保持的多个基板上同时形成膜。

5. 发明申请

US20110100297A1 THIN-FILM SOLAR CELL MANUFACTURING APPARATUS 审中-公开
标题翻译：薄膜太阳能电池制造设备
公开(公告)号：US20110100297A1
公开(公告)日：2011-05-05
申请号：US12995779
申请日：2009-06-03
申请人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara
发明人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara
IPC分类号： C23C16/503 , C23C16/458
CPC分类号： H01L31/1824 , C23C16/4587 , H01L21/67161 , H01L21/67167 , H01L21/67173 , H01L21/67754 , H01L21/67781 , H01L31/077 , Y02E10/545 , Y02P70/521
摘要： A thin-film solar cell manufacturing apparatus includes a film forming chamber that is evacuated to a reduced pressure and forms a film on a substrate using a CVD method; a loading-ejecting chamber that is connected to the film forming chamber via a first opening-closing part and that is switchable between atmospheric pressure and reduced pressure; transfer rail that is laid at the film forming chamber and the loading-ejecting chamber; a carrier that holds the substrate and moves along the transfer rail; and a carrier transfer mechanism that transfers the carrier, wherein, the carrier transfer mechanism is provided in the loading-ejecting chamber to transfer the carrier between the film forming chamber and the loading-ejecting chamber.
摘要翻译：薄膜太阳能电池制造装置包括：成膜室，其被抽真空至减压，并使用CVD方法在基板上形成膜; 一个卸载室，其经由第一开闭部分连接到成膜室，并可在大气压和减压之间切换; 传送轨道，其设置在成膜室和装卸室; 保持基板并沿着传送轨道移动的载体; 以及传送载体的载体传送机构，其中，所述载体传送机构设置在所述装载取出室中，以在所述成膜室和所述装载取出室之间传送载体。

6. 发明申请

US20110189384A1 THIN-FILM SOLAR CELL MANUFACTURING APPARATUS 审中-公开
标题翻译：薄膜太阳能电池制造设备
公开(公告)号：US20110189384A1
公开(公告)日：2011-08-04
申请号：US12995595
申请日：2009-06-03
申请人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara , Kazuya Saito
发明人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara , Kazuya Saito
IPC分类号： B05D5/12
CPC分类号： H01L21/67167 , C23C16/5096 , C23C16/54 , H01J37/32743 , H01L21/67161 , H01L21/67173 , H01L21/67754 , H01L21/67781 , H01L31/18
摘要： A thin-film solar cell manufacturing apparatus includes a film forming chamber that is evacuated to a reduced pressure and forms a film on a substrate using a CVD method; a loading-ejecting chamber that is connected to the film forming chamber via a first opening-closing part and that is switchable between atmospheric pressure and reduced pressure; a first carrier that holds a pre-processed substrate; and a second carrier that holds a post-processed substrate, wherein the loading-ejecting chamber simultaneously stores the first carrier and the second carrier.
摘要翻译：薄膜太阳能电池制造装置包括：成膜室，其被抽真空至减压，并使用CVD方法在基板上形成膜; 一个卸载室，其经由第一开闭部分连接到成膜室，并可在大气压和减压之间切换; 保持预处理衬底的第一载体; 以及保持后处理基板的第二载体，其中所述装载取出室同时存储所述第一载体和所述第二载体。

7. 发明申请

US20110107969A1 APPARATUS FOR MANUFACTURING THIN-FILM SOLAR CELL 审中-公开
标题翻译：制造薄膜太阳能电池的装置
公开(公告)号：US20110107969A1
公开(公告)日：2011-05-12
申请号：US12995304
申请日：2009-06-04
申请人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara
发明人： Yasuo Shimizu , Hideyuki Ogata , Koichi Matsumoto , Takafumi Noguchi , Jouji Wakamori , Satohiro Okayama , Yawara Morioka , Noriyasu Sugiyama , Takashi Shigeta , Hiroyuki Kurihara
IPC分类号： H01L31/18
CPC分类号： H01L21/67173 , C23C16/24 , C23C16/45565 , C23C16/4587 , C23C16/509 , C23C16/54 , H01L21/67161 , H01L21/67167 , H01L21/67754 , H01L21/67781 , H01L31/202 , H01L31/206 , Y02E10/50 , Y02P70/521
摘要： An apparatus for manufacturing a thin film solar cell of the present invention has a film forming chamber in which a substrate is arranged so that the film formation face of the substrate is substantially parallel to the direction of gravitational force and a film is formed on the film formation face by a CVD method; an electrode unit including a cathode unit having cathodes to which voltages are to be applied arranged on both sides thereof, and a pair of anodes each of which is arranged to face the cathodes, respectively, at a separation distance therefrom; and a conveying part which supports the substrate and conveys the substrate to between the cathode and the anode facing the cathode. The separation distance is variable.
摘要翻译：本发明的薄膜太阳能电池的制造装置具有：成膜室，其中配置基板，使得基板的成膜面基本上平行于重力方向，并且在膜上形成膜通过CVD法形成表面; 包括阴极单元的电极单元，阴极单元具有施加电压的阴极布置在其两侧，以及一对阳极，每个阳极分别与阴极隔开距离; 以及输送部，其支撑所述基板并将所述基板输送到所述阴极和面向所述阴极的所述阳极之间。分离距离是可变的。

8. 发明申请

US20120034731A1 PHOTOELECTRIC CONVERSION DEVICE MANUFACTURING SYSTEM AND PHOTOELECTRIC CONVERSION DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：光电转换装置制造系统和光电转换装置的制造方法
公开(公告)号：US20120034731A1
公开(公告)日：2012-02-09
申请号：US13262758
申请日：2010-04-06
申请人： Takafumi Noguchi , Hideyuki Ogata , Katsuhiko Mori , Yasuo Shimizu , Hiroto Uchida , Shin Asari
发明人： Takafumi Noguchi , Hideyuki Ogata , Katsuhiko Mori , Yasuo Shimizu , Hiroto Uchida , Shin Asari
IPC分类号： H01L31/18 , H01L31/105
CPC分类号： H01L31/1876 , H01L21/67173 , H01L21/67207 , H01L21/6776 , H01L31/076 , H01L31/18 , H01L31/1824 , H01L31/202 , H01L31/206 , Y02E10/545 , Y02E10/548 , Y02P70/521
摘要： A photoelectric conversion device manufacturing system in which a photoelectric conversion device is manufactured, the photoelectric conversion device including a p-type semiconductor layer, an i-type semiconductor layer, and an n-type semiconductor layer which are sequentially layered on a transparent-electroconductive film formed on a substrate in the photoelectric conversion device. The system includes: an i-layer-formation reaction chamber comprising at least a first film formation section, a second film formation section, and a third film formation section, the i-layer-formation reaction chamber forming the i-type semiconductor layer, the first film formation section, the second film formation section, and the third film formation section being sequentially arranged along a transfer direction in which the substrate is transferred; and a plurality of door valves separating the first film formation section, the second film formation section, and the third film formation section so that the length of the second film formation section is greater than the lengths of the first film formation section and the third film formation section in the transfer direction.
摘要翻译：制造光电转换元件的光电转换元件制造系统包括p型半导体层，i型半导体层和n型半导体层的光电转换元件，其依次层叠在透明导电性膜形成在光电转换装置的基板上。该系统包括：i层形成反应室，至少包括第一成膜部分，第二成膜部分和第三成膜部分，形成i型半导体层的i层形成反应室，所述第一成膜部，所述第二成膜部和所述第三成膜部沿着所述基板的转移方向依次配置; 以及分隔第一成膜部分，第二成膜部分和第三成膜部分的多个门阀，使得第二成膜部分的长度大于第一成膜部分和第三膜片的长度形成部分在传送方向。

9. 发明授权

US08957351B2 Catalytic CVD equipment, method for formation of film, process for production of solar cell, and substrate holder 有权
标题翻译：催化CVD设备，薄膜形成方法，太阳能电池的制造方法以及基板支架
公开(公告)号：US08957351B2
公开(公告)日：2015-02-17
申请号：US13435646
申请日：2012-03-30
申请人： Masaki Shima , Yoshinori Wakamiya , Shuji Osono , Satohiro Okayama , Hideyuki Ogata
发明人： Masaki Shima , Yoshinori Wakamiya , Shuji Osono , Satohiro Okayama , Hideyuki Ogata
IPC分类号： H05B3/68 , C23C16/44 , C23C16/24 , H01L21/687
CPC分类号： C23C16/44 , C23C16/24 , C23C16/325 , C23C16/345 , C23C16/4404 , C23C16/481 , H01L21/68757
摘要： In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.
摘要翻译：在催化CVD设备中，保持器包括防反射结构，用于防止从催化丝向衬底侧喷射的辐射线的反射。

10. 发明授权

US07896968B2 Winding type plasma CVD apparatus 有权
标题翻译：卷绕式等离子体CVD装置
公开(公告)号：US07896968B2
公开(公告)日：2011-03-01
申请号：US11792810
申请日：2006-05-10
申请人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
发明人： Takayoshi Hirono , Isao Tada , Atsushi Nakatsuka , Masashi Kikuchi , Hideyuki Ogata , Hiroaki Kawamura , Kazuya Saito , Masatoshi Sato
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306
CPC分类号： H01J37/3277 , B08B7/00 , C23C16/4405 , C23C16/46 , C23C16/5096 , C23C16/545 , H01J37/32009
摘要： The object of this invention is to provide a winding type plasma CVD apparatus in which quality of a layer can be made uniform by supplying a reaction gas uniformly to a deposition area of a film, and can perform a self-cleaning process of a deposition portion in the path of deposition onto the film.A film (22) is supported between a pair of movable rollers (33, 34) arranged on the upstream side and downstream side of the deposition portion (25) with regard to the traveling direction of the film, and then the film (22) is made to travel substantially linearly at the deposition position. Consequently, the distance between a shower plate (37) and the film (22) is kept constant, and the quality of the layer is made homogeneous. The film is heated by means of a metal belt (40) traveling simultaneously on the back side of the film. The moveable rollers (33, 34) ascend from the deposition position to the self-cleaning position, and the film (22) can be separated from the shower plate (37). Self-cleaning can be carried out in the path of the deposition onto the film by closing the aperture of a mask (51) with a shutter (65), thereby preventing leakage of cleaning gas.
摘要翻译：本发明的目的是提供一种绕线式等离子体CVD装置，通过将反应气体均匀地供应到膜的沉积区域，可以使层的质量均匀，并且可以进行沉积部分的自清洁处理在沉积到膜上的路径。相对于膜的行进方向，膜（22）被支撑在布置在沉积部分（25）的上游侧和下游侧的一对可动辊（33,34）之间，然后，膜（22）使其在沉积位置大致线性地移动。因此，喷淋板（37）和膜（22）之间的距离保持恒定，并且使层的质量均匀。薄膜通过金属带（40）加热，同时在薄膜背面行进。可移动辊（33,34）从沉积位置上升到自清洁位置，并且膜（22）可以与喷淋板（37）分离。通过用挡板（65）封闭掩模（51）的孔径，可以在沉积到膜上的路径中进行自清洁，从而防止清洁气体的泄漏。

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