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1. 发明申请

US20130175447A1 Scanning Electron Microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US20130175447A1
公开(公告)日：2013-07-11
申请号：US13812451
申请日：2011-08-26
申请人： Yasunari Sohda , Hiromasa Yamanashi , Muneyuki Fukuda , Takeyoshi Ohashi , Osamu Komuro
发明人： Yasunari Sohda , Hiromasa Yamanashi , Muneyuki Fukuda , Takeyoshi Ohashi , Osamu Komuro
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/153 , H01J2237/1506 , H01J2237/1532 , H01J2237/2826
摘要： Provided is a scanning electron microscope equipped with a high-speed and high-precision astigmatism measuring means to be used when both astigmatism generated by an electron-beam column and astigmatism generated from the surroundings of a measuring sample exist. This scanning electron microscope is characterized in controlling an astigmatism corrector (201) with high-speed and high-precision, to correct the astigmatism, by using both a method of obtaining the astigmatism from the qualities of two-dimensional images to be acquired upon changing the intensity of the astigmatism corrector (201), and a method of measuring the astigmatism from the change in the position displacement of an electron beam that occurs when the electron beam is tilted using a tilt deflector (202).
摘要翻译：本发明提供一种扫描电子显微镜，其配备有当由电子束柱产生的散光和从测量样品的周围产生的散光存在时使用的高速和高精度散光测量装置。该扫描电子显微镜的特征在于以高速和高精度控制像散校正器（201），以通过使用从改变后获得的二维图像的质量获得散光的方法来校正像散散光校正器（201）的强度，以及根据使用倾斜偏转器（202）使电子束倾斜时发生的电子束的位置偏移的变化来测量像散的方法。

2. 发明授权

US08704175B2 Scanning electron microscope 有权
标题翻译：扫描电子显微镜
公开(公告)号：US08704175B2
公开(公告)日：2014-04-22
申请号：US13812451
申请日：2011-08-26
申请人： Yasunari Sohda , Muneyuki Fukuda , Takeyoshi Ohashi , Osamu Komuro , Toru Yamanashi
发明人： Yasunari Sohda , Hiromasa Yamanashi , Muneyuki Fukuda , Takeyoshi Ohashi , Osamu Komuro
IPC分类号： H01J37/28
CPC分类号： H01J37/28 , H01J37/153 , H01J2237/1506 , H01J2237/1532 , H01J2237/2826
摘要： Provided is a scanning electron microscope equipped with a high-speed and high-precision astigmatism measuring means to be used when both astigmatism generated by an electron-beam column and astigmatism generated from the surroundings of a measuring sample exist. This scanning electron microscope is characterized in controlling an astigmatism corrector (201) with high-speed and high-precision, to correct the astigmatism, by using both a method of obtaining the astigmatism from the qualities of two-dimensional images to be acquired upon changing the intensity of the astigmatism corrector (201), and a method of measuring the astigmatism from the change in the position displacement of an electron beam that occurs when the electron beam is tilted using a tilt deflector (202).
摘要翻译：本发明提供一种扫描电子显微镜，其配备有当由电子束柱产生的散光和从测量样品的周围产生的散光存在时使用的高速和高精度散光测量装置。该扫描电子显微镜的特征在于以高速和高精度控制像散校正器（201），以通过使用从改变后获得的二维图像的质量获得散光的方法来校正像散散光校正器（201）的强度，以及根据使用倾斜偏转器（202）使电子束倾斜时发生的电子束的位置偏移的变化来测量像散的方法。

3. 发明授权

US07655907B2 Charged particle beam apparatus and pattern measuring method 有权
标题翻译：带电粒子束装置和图案测量方法
公开(公告)号：US07655907B2
公开(公告)日：2010-02-02
申请号：US11704227
申请日：2007-02-09
申请人： Sayaka Tanimoto , Hiromasa Yamanashi , Muneyuki Fukuda , Yasunari Sohda
发明人： Sayaka Tanimoto , Hiromasa Yamanashi , Muneyuki Fukuda , Yasunari Sohda
IPC分类号： H01J37/26
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/04735 , H01J2237/216 , H01J2237/2817
摘要： It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point (irradiation position of the primary charged particle beam) on a wafer, a calculator obtains a probability of a surface potential at a relevant measurement point that is obtained from a surface potential distribution function of the wafer and is stored in a data storage unit. Based on the probability, the calculator determines an amplitude of a set parameter (for example, retarding voltage) of charged particle optics at the relevant measurement point. Then the calculator checks the focus state of the primary charged particle beam by changing the set parameter in the range of the determined amplitude, and determines the set parameter to be used for measurement.
摘要翻译：它是提供一种能够通过初级带电粒子束快速处理衬底上许多测量点的技术。在控制系统中，对于晶片上的每个测量点（初级带电粒子束的照射位置），计算器获得从相对测量点的表面电位分布函数获得的相关测量点的表面电位的概率，并存储在数据存储单元中。基于概率，计算器确定相关测量点处的带电粒子光学器件的设定参数（例如延迟电压）的幅度。然后，计算器通过在确定的幅度的范围内改变设定参数来检查主要带电粒子束的聚焦状态，并确定要用于测量的设定参数。

4. 发明授权

US08766183B2 Charged particle beam device 有权
标题翻译：带电粒子束装置
公开(公告)号：US08766183B2
公开(公告)日：2014-07-01
申请号：US13058712
申请日：2009-09-10
申请人： Muneyuki Fukuda , Hiromasa Yamanashi , Yasunari Sohda
发明人： Muneyuki Fukuda , Hiromasa Yamanashi , Yasunari Sohda
IPC分类号： H01J3/12 , H01J37/153
CPC分类号： H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/004 , H01J2237/1532 , H01J2237/216 , H01J2237/221
摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.
摘要翻译：散光控制处理时间通过改善像散差测量精度而降低到1秒以下。带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。控制器注册并保持电子光学系统设置参数，用于照射来自样品上的法线的光束作为带电粒子束，比较通过倾斜光束获得的观察图像，测量移动量和移动方向，从运动量和方向上矫正散光。

5. 发明申请

US20110147586A1 Charged Particle Beam Device 有权
标题翻译：带电粒子束装置
公开(公告)号：US20110147586A1
公开(公告)日：2011-06-23
申请号：US13058712
申请日：2009-09-10
申请人： Muneyuki Fukuda , Hiromasa Yamanashi , Yasunari Sohda
发明人： Muneyuki Fukuda , Hiromasa Yamanashi , Yasunari Sohda
IPC分类号： H01J37/153 , G01N23/00
CPC分类号： H01J37/153 , H01J37/265 , H01J37/28 , H01J2237/004 , H01J2237/1532 , H01J2237/216 , H01J2237/221
摘要： The astigmatism control processing time is decreased to 1 second or less by improving the astigmatic difference measurement accuracy. A charged particle beam device includes: a stage on which a sample is loaded; a transport mechanism which carries the sample onto the stage; a charged particle beam optical system which irradiates the sample on the stage with a charged particle beam and detects secondary charged particles generated from the sample; and a controller which determines setup parameters for the charged particle beam optical system and controls the charged particle beam optical system. The controller registers and holds electro-optical system setup parameters for irradiation with a beam tilted from a normal line on the sample as the charged particle beam, compares observation images obtained by the tilted beam, measures the amount and direction of movement and calculates the amount of astigmatism correction from the amount of movement and the direction.
摘要翻译：散光控制处理时间通过改善像散差测量精度而降低到1秒以下。带电粒子束装置包括：加载样品的载物台; 将样品携带到舞台上的运送机构; 带电粒子束光学系统，其用带电粒子束照射台上的样品，并检测从样品产生的二次带电粒子; 以及控制器，其确定带电粒子束光学系统的设置参数并控制带电粒子束光学系统。控制器注册并保持电子光学系统设置参数，用于用作为带电粒子束的样品上从法线上倾斜的光束照射，比较通过倾斜光束获得的观察图像，测量移动量和移动方向，从运动量和方向上矫正散光。

6. 发明授权

US07679056B2 Metrology system of fine pattern for process control by charged particle beam 失效
标题翻译：带电粒子束过程控制精细模式计量系统
公开(公告)号：US07679056B2
公开(公告)日：2010-03-16
申请号：US11687002
申请日：2007-03-16
申请人： Hiromasa Yamanashi , Muneyuki Fukuda , Sayaka Tanimoto , Yasunari Sohda
发明人： Hiromasa Yamanashi , Muneyuki Fukuda , Sayaka Tanimoto , Yasunari Sohda
IPC分类号： H01J27/02 , G01R31/26
CPC分类号： G01N23/2258 , H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/0047 , H01J2237/204 , H01J2237/221 , H01J2237/2817 , H01L21/67207 , H01L21/67253
摘要： The present invention provides a pattern inspection technique that enables measurement and inspection of a fine pattern by a charged particle beam to be performed with high throughput. A metrology system of fine pattern according to the pattern inspection technique has: a the column that includes a charged particle source, an electron optics for scanning a desired observation area on a sample with a charged particle beam emitted from the charged particle source, and a detector for detecting charged particles generated secondarily from the sample scanned by the charged particle beam; information processing means for measuring information about geometry of a pattern formed on the sample based on information on the intensity of the charged particles obtained by the detector; and a sample introduction unit for introducing the sample into the inside of the column; wherein a charge neutralizer unit for generating ions and charge neutralizing the sample with the ions and surface potential measuring means for measuring a surface potential of the sample surface are provided on a path that is inside the sample introduction unit and transports the sample to the column.
摘要翻译：本发明提供一种图案检查技术，其能够通过以高产量进行的带电粒子束来测量和检查精细图案。根据图案检查技术的精细图案的计量系统具有：包括带电粒子源的列，用于从带电粒子源发射的带电粒子束扫描样品上的期望观察区域的电子光学器件，以及检测器，用于检测由带电粒子束扫描的样品二次产生的带电粒子; 信息处理装置，用于根据关于由检测器获得的带电粒子的强度的信息来测量关于样品上形成的图案的几何形状的信息; 以及用于将样品引入柱内的样品引入单元; 其中，用于产生离子的电荷中和装置，用于测量样品表面电位的表面电位测量装置的离子和表面电位测量装置，并在样品引入单元内部的路径上传送样品至柱。

7. 发明申请

US20070272858A1 Charged particle beam apparatus and pattern measuring method 有权
标题翻译：带电粒子束装置和图案测量方法
公开(公告)号：US20070272858A1
公开(公告)日：2007-11-29
申请号：US11704227
申请日：2007-02-09
申请人： Sayaka Tanimoto , Hiromasa Yamanashi , Muneyuki Fukuda , Yasunari Sohda
发明人： Sayaka Tanimoto , Hiromasa Yamanashi , Muneyuki Fukuda , Yasunari Sohda
IPC分类号： G01N23/22
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/04735 , H01J2237/216 , H01J2237/2817
摘要： It is to provide a technology that can quickly process many measurement points on a substrate by a primary charged particle beam. In a control system, with respect to each measurement point (irradiation position of the primary charged particle beam) on a wafer, a calculator obtains a probability of a surface potential at a relevant measurement point that is obtained from a surface potential distribution function of the wafer and is stored in a data storage unit. Based on the probability, the calculator determines an amplitude of a set parameter (for example, retarding voltage) of charged particle optics at the relevant measurement point. Then the calculator checks the focus state of the primary charged particle beam by changing the set parameter in the range of the determined amplitude, and determines the set parameter to be used for measurement.
摘要翻译：它是提供一种能够通过初级带电粒子束快速处理衬底上许多测量点的技术。在控制系统中，对于晶片上的每个测量点（初级带电粒子束的照射位置），计算器获得从相对测量点的表面电位分布函数获得的相关测量点的表面电位的概率，并存储在数据存储单元中。基于概率，计算器确定相关测量点处的带电粒子光学器件的设定参数（例如延迟电压）的幅度。然后，计算器通过在确定的幅度的范围内改变设定参数来检查主要带电粒子束的聚焦状态，并确定要用于测量的设定参数。

8. 发明申请

US20070221844A1 Metrology System of Fine pattern for Process Control by Charged Particle Beam 失效
标题翻译：带电粒子束过程控制精细模式计量系统
公开(公告)号：US20070221844A1
公开(公告)日：2007-09-27
申请号：US11687002
申请日：2007-03-16
申请人： Hiromasa Yamanashi , Muneyuki Fukuda , Sayaka Tanimoto , Yasunari Sohda
发明人： Hiromasa Yamanashi , Muneyuki Fukuda , Sayaka Tanimoto , Yasunari Sohda
IPC分类号： G21K7/00 , G01N23/00
CPC分类号： G01N23/2258 , H01J37/026 , H01J37/28 , H01J2237/0044 , H01J2237/0047 , H01J2237/204 , H01J2237/221 , H01J2237/2817 , H01L21/67207 , H01L21/67253
摘要： The present invention provides a pattern inspection technique that enables measurement and inspection of a fine pattern by a charged particle beam to be performed with high throughput. A metrology system of fine pattern according to the pattern inspection technique has: a the column that includes a charged particle source, an electron optics for scanning a desired observation area on a sample with a charged particle beam emitted from the charged particle source, and a detector for detecting charged particles generated secondarily from the sample scanned by the charged particle beam; information processing means for measuring information about geometry of a pattern formed on the sample based on information on the intensity of the charged particles obtained by the detector; and a sample introduction unit for introducing the sample into the inside of the column; wherein a charge neutralizer unit for generating ions and charge neutralizing the sample with the ions and surface potential measuring means for measuring a surface potential of the sample surface are provided on a path that is inside the sample introduction unit and transports the sample to the column.
摘要翻译：本发明提供一种图案检查技术，其能够通过以高产量进行的带电粒子束来测量和检查精细图案。根据图案检查技术的精细图案的计量系统具有：包括带电粒子源的列，用于从带电粒子源发射的带电粒子束扫描样品上的期望观察区域的电子光学器件，以及检测器，用于检测由带电粒子束扫描的样品二次产生的带电粒子; 信息处理装置，用于根据关于由检测器获得的带电粒子的强度的信息来测量关于样品上形成的图案的几何形状的信息; 以及用于将样品引入柱内的样品引入单元; 其中，用于产生离子的电荷中和装置，用于测量样品表面电位的表面电位测量装置的离子和表面电位测量装置，并在样品引入单元内部的路径上传送样品至柱。

9. 发明申请

US20130026361A1 PATTERN EVALUATION METHOD, DEVICE THEREFOR, AND ELECTRON BEAM DEVICE 有权
标题翻译：图案评估方法，其设备和电子束装置
公开(公告)号：US20130026361A1
公开(公告)日：2013-01-31
申请号：US13386540
申请日：2010-07-26
申请人： Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda , Toru Yamanashi
发明人： Hiromasa Yamanashi , Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda
IPC分类号： H01J37/26 , H01J37/20
CPC分类号： H01J37/28 , G06T7/74 , G06T2207/10061 , G06T2207/30148 , G06T2207/30204 , H01J37/1478 , H01J2237/24578 , H01J2237/2611 , H01J2237/2817
摘要： An amount of pattern position displacement between observation images acquired by irradiating from two different directions is changed depending on beam deflection for moving an image acquisition position. In a pattern evaluation method that measures astigmatic difference or focus position displacement having a small amount of dose at a high speed using parallax caused by the tilted beam, a correction value obtained in advance by measurement is reflected in an amount of pattern position displacement between observation images obtained by irradiating from at least two different directions and generated in accordance with the amount of beam deflection for moving an image acquisition position. A processing unit calculates an amount of correction of an amount of pattern position displacement depending on beam deflection of a beam deflecting unit for moving an image acquisition position on the sample at a high speed.
摘要翻译：通过从两个不同方向照射获取的观察图像之间的图案位置位移量根据用于移动图像获取位置的光束偏转而改变。在使用由倾斜光束引起的视差来高速度地测量具有少量剂量的散光差异或聚焦位置位移的图案评估方法中，通过测量预先获得的校正值反映在观察之间的图案位置位移量通过从至少两个不同方向照射而产生的并且根据用于移动图像获取位置的光束偏转量而产生的图像。处理单元计算取决于用于在高速下移动样本上的图像获取位置的光束偏转单元的光束偏转的图案位置位移量的校正量。

10. 发明授权

US08816277B2 Pattern evaluation method, device therefor, and electron beam device 有权
标题翻译：图案评估方法，装置和电子束装置
公开(公告)号：US08816277B2
公开(公告)日：2014-08-26
申请号：US13386540
申请日：2010-07-26
申请人： Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda , Toru Yamanashi
发明人： Hiromasa Yamanashi , Yasunari Sohda , Takeyoshi Ohashi , Muneyuki Fukuda
IPC分类号： G01N23/04 , G01N23/00
CPC分类号： H01J37/28 , G06T7/74 , G06T2207/10061 , G06T2207/30148 , G06T2207/30204 , H01J37/1478 , H01J2237/24578 , H01J2237/2611 , H01J2237/2817
摘要： An amount of pattern position displacement between observation images acquired by irradiating from two different directions is changed depending on beam deflection for moving an image acquisition position. In a pattern evaluation method that measures astigmatic difference or focus position displacement having a small amount of dose at a high speed using parallax caused by the tilted beam, a correction value obtained in advance by measurement is reflected in an amount of pattern position displacement between observation images obtained by irradiating from at least two different directions and generated in accordance with the amount of beam deflection for moving an image acquisition position. A processing unit calculates an amount of correction of an amount of pattern position displacement depending on beam deflection of a beam deflecting unit for moving an image acquisition position on the sample at a high speed.
摘要翻译：通过从两个不同方向照射获取的观察图像之间的图案位置位移量根据用于移动图像获取位置的光束偏转而改变。在使用由倾斜光束引起的视差来高速度地测量具有少量剂量的散光差异或聚焦位置位移的图案评估方法中，通过测量预先获得的校正值反映在观察之间的图案位置位移量通过从至少两个不同方向照射而产生的并且根据用于移动图像获取位置的光束偏转量而产生的图像。处理单元计算取决于用于在高速下移动样本上的图像获取位置的光束偏转单元的光束偏转的图案位置位移量的校正量。

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