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1. 发明申请

US20070011867A1 Micromachined mass flow sensor and methods of making the same 有权
标题翻译：微加工质量流量传感器及其制造方法
公开(公告)号：US20070011867A1
公开(公告)日：2007-01-18
申请号：US11523436
申请日：2006-09-19
申请人： Yahong Yao , Chih-Chang Chen , Gafeng Wang , Liji Huang
发明人： Yahong Yao , Chih-Chang Chen , Gafeng Wang , Liji Huang
IPC分类号： H01B13/00
CPC分类号： G01F1/6845 , Y10T29/49082 , Y10T29/49083 , Y10T29/49117 , Y10T29/49124 , Y10T29/49155
摘要： A mass flow sensor is manufactured by a process of carrying out a micro-machining process on an N or lightly doped P-type silicon substrate with orientation . This mass flow sensor comprises a central thin-film heater and a pair of thin-film heat sensing elements, and a thermally isolated membrane for supporting the heater and the sensors out of contact with the substrate base. The mass flow sensor is arranged for integration on a same silicon substrate to form a one-dimensional or two-dimensional array in order to expand the dynamic measurement range. For each sensor, the thermally isolated membrane is formed by a process that includes a step of first depositing dielectric thin-film layers over the substrate and then performing a backside etching process on a bulk silicon with TMAH or KOH or carrying out a dry plasma etch until the bottom dielectric thin-film layer is exposed. Before backside etching the bulk silicon, rectangular openings are formed on the dielectric thin-film layers by applying a plasma etching to separate the area of heater and sensing elements from the rest of the membrane.
摘要翻译：通过在取向<100>的N或轻掺杂P型硅衬底上进行微加工工艺的方法制造质量流量传感器。该质量流量传感器包括中央薄膜加热器和一对薄膜热敏元件，以及用于支撑加热器的热隔离膜和与基板基板接触的传感器。质量流量传感器布置成集成在相同的硅衬底上以形成一维或二维阵列，以便扩大动态测量范围。对于每个传感器，热隔离膜通过包括首先在衬底上沉积电介质薄膜层然后用TMAH或KOH对体硅进行背面蚀刻工艺或进行干等离子体蚀刻的步骤来形成直到底部介电薄膜层暴露。在背面蚀刻体硅之前，通过施加等离子体蚀刻在电介质薄膜层上形成矩形开口，以将加热器的区域和感测元件与膜的其余部分分开。

2. 发明授权

US07765679B2 Method of manufacturing a flow rate sensor 有权
标题翻译：制造流量传感器的方法
公开(公告)号：US07765679B2
公开(公告)日：2010-08-03
申请号：US11523436
申请日：2006-09-19
申请人： Yahong Yao , Chih-Chang Chen , Gafeng Wang , Liji Huang
发明人： Yahong Yao , Chih-Chang Chen , Gafeng Wang , Liji Huang
IPC分类号： H05B3/00
CPC分类号： G01F1/6845 , Y10T29/49082 , Y10T29/49083 , Y10T29/49117 , Y10T29/49124 , Y10T29/49155
摘要： A mass flow sensor is manufactured by a process of carrying out a micro-machining process on an N or lightly doped P-type silicon substrate with orientation . This mass flow sensor comprises a central thin-film heater and a pair of thin-film heat sensing elements, and a thermally isolated membrane for supporting the heater and the sensors out of contact with the substrate base. The mass flow sensor is arranged for integration on a same silicon substrate to form a one-dimensional or two-dimensional array in order to expand the dynamic measurement range. For each sensor, the thermally isolated membrane is formed by a process that includes a step of first depositing dielectric thin-film layers over the substrate and then performing a backside etching process on a bulk silicon with TMAH or KOH or carrying out a dry plasma etch until the bottom dielectric thin-film layer is exposed. Before backside etching the bulk silicon, rectangular openings are formed on the dielectric thin-film layers by applying a plasma etching to separate the area of heater and sensing elements from the rest of the membrane.
摘要翻译：通过在取向<100>的N或轻掺杂P型硅衬底上进行微加工工艺的方法制造质量流量传感器。该质量流量传感器包括中央薄膜加热器和一对薄膜热敏元件，以及用于支撑加热器的热隔离膜和与基板基板接触的传感器。质量流量传感器布置成集成在相同的硅衬底上以形成一维或二维阵列，以便扩大动态测量范围。对于每个传感器，热隔离膜通过包括首先在衬底上沉积电介质薄膜层然后用TMAH或KOH对体硅进行背面蚀刻工艺或进行干等离子体蚀刻的步骤来形成直到底部介电薄膜层暴露。在背面蚀刻体硅之前，通过施加等离子体蚀刻在电介质薄膜层上形成矩形开口，以将加热器的区域和感测元件与膜的其余部分分开。

3. 发明申请

US20120216629A1 MEMS TIME-OF-FLIGHT THERMAL MASS FLOW METER 有权
标题翻译： MEMS时间飞行热量流量计
公开(公告)号：US20120216629A1
公开(公告)日：2012-08-30
申请号：US13035639
申请日：2011-02-25
申请人： Liji Huang , Chih-Chang Chen , Yahong Yao , Xiaozhong Wu
发明人： Liji Huang , Chih-Chang Chen , Yahong Yao , Xiaozhong Wu
IPC分类号： G01F1/708
CPC分类号： G01F1/7084 , G01F1/72
摘要： An apparatus comprising a micromachined (a.k.a. MEMS, Micro Electro Mechanical Systems) silicon flow sensor, a flow channel package, and a driving circuitry, which operates in a working principle of thermal time-of-flight (TOF) to measure gas or liquid flow speed, is disclosed in the present invention. The micromachining technique for fabricating this MEMS time-of-flight silicon thermal flow sensor can greatly reduce the sensor fabrication cost by batch production. This microfabrication process for silicon time-of-flight thermal flow sensors provides merits of small feature size, low power consumption, and high accuracy compared to conventional manufacturing methods. Thermal time-of-flight technology in principle can provide accurate flow speed measurements for gases regardless of its gas compositions. In addition, the present invention further discloses the package design and driving circuitry which is utilized by the correlated working principle.
摘要翻译：一种包括微加工（也称为MEMS，微机电系统）硅流量传感器，流动通道封装和驱动电路的装置，其以热时间飞行（TOF）的工作原理工作以测量气体或液体流量速度，在本发明中公开。用于制造这种MEMS飞行时间硅热流量传感器的微加工技术可以通过批量生产大大降低传感器制造成本。与传统的制造方法相比，这种用于硅时间飞行热流传感器的微加工工艺具有小特征尺寸，低功耗和高精度的优点。原理上，热时间飞行技术可以为气体提供准确的流速测量，无论其气体成分如何。此外，本发明还公开了通过相关工作原理利用的封装设计和驱动电路。

4. 发明授权

US07752910B2 Micromachined mass flow sensor and methods of making the same 有权
标题翻译：微加工质量流量传感器及其制造方法
公开(公告)号：US07752910B2
公开(公告)日：2010-07-13
申请号：US11985879
申请日：2008-04-03
申请人： Gaofeng Wang , Chih-Chang Chen , Yahong Yao , Liji Huang
发明人： Gaofeng Wang , Chih-Chang Chen , Yahong Yao , Liji Huang
IPC分类号： G01F1/68
CPC分类号： G03H1/0891 , G03H1/0244 , G03H1/08 , G03H2001/0858 , G03H2210/30 , G03H2210/454 , G03H2223/12 , G03H2240/13 , G03H2240/23
摘要： A mass flow sensor is supported on an N or P-type silicon substrate with orientation . This mass flow sensor comprises a central thin-film heater and a pair of thin-film heat sensing elements, and a thermally isolated membrane for supporting the heater and the sensors out of contact with the substrate base. The mass flow sensor is arranged for integration on a same silicon substrate to form a one-dimensional or two-dimensional array in order to expand the dynamic measurement range.
摘要翻译：质量流量传感器支撑在取向<100>的N或P型硅衬底上。该质量流量传感器包括中央薄膜加热器和一对薄膜热敏元件，以及用于支撑加热器的热隔离膜和与基板基板接触的传感器。质量流量传感器布置成集成在相同的硅衬底上以形成一维或二维阵列，以便扩大动态测量范围。

5. 发明申请

US20070017285A1 Micromachined thermal mass flow sensors and insertion type flow meters and manufacture methods 有权
标题翻译：微加工热质量流量传感器和插入式流量计及其制造方法
公开(公告)号：US20070017285A1
公开(公告)日：2007-01-25
申请号：US11157604
申请日：2005-06-21
申请人： Gaofeng Wang , Chih-Chang Chen , Yahong Yao , Liji Huang
发明人： Gaofeng Wang , Chih-Chang Chen , Yahong Yao , Liji Huang
IPC分类号： G01F1/68
CPC分类号： G01F1/6845
摘要： An integrated mass flow sensor is manufactured by a process of carrying out a micro-machining process on an N or P-type silicon substrate with orientation . This mass flow sensor comprises a central thin-film heater and a pair of thin-film heat sensing elements, and a thermally isolated membrane for supporting the heater and the sensors out of contact with the substrate base. The mass flow sensor is arranged for integration on a same silicon substrate to form a one-dimensional or two-dimensional array in order to expand the dynamic measurement range. For each sensor, the thermally isolated membrane is formed by a process that includes a step of first depositing dielectric thin-film layers over the substrate and then performing a backside etching process on a bulk silicon with TMAH or KOH or carrying out a dry plasma etch until the bottom dielectric thin-film layer is exposed. Before backside etching the bulk silicon, rectangular openings are formed on the dielectric thin-film layers by applying a plasma etching to separate the area of heater and sensing elements from the rest of the membrane. This mass flow sensor is operated with two sets of circuits, a first circuit for measuring a flow rate in a first range of flow rates and a second circuit for measuring a flow rate in a second range of flow rates, to significantly increase range of flow rate measurements, while maintains a high degree of measurement accuracy.
摘要翻译：通过在取向<100>的N型或P型硅衬底上进行微加工工艺的方法制造集成的质量流量传感器。该质量流量传感器包括中央薄膜加热器和一对薄膜热敏元件，以及用于支撑加热器的热隔离膜和与基板基板接触的传感器。质量流量传感器布置成集成在相同的硅衬底上以形成一维或二维阵列，以便扩大动态测量范围。对于每个传感器，热隔离膜通过包括首先在衬底上沉积电介质薄膜层然后用TMAH或KOH对体硅进行背面蚀刻工艺或进行干等离子体蚀刻的步骤来形成直到底部介电薄膜层暴露。在背面蚀刻体硅之前，通过施加等离子体蚀刻在电介质薄膜层上形成矩形开口，以将加热器的区域和感测元件与膜的其余部分分开。该质量流量传感器用两组电路操作，第一电路用于测量第一流量范围内的流量，以及用于测量在第二流量范围内的流量的第二电路，以显着增加流量范围速率测量，同时保持高度的测量精度。

6. 发明授权

US11927555B2 Micromachined thermal time-of-flight fluidic concentration metering device 有权
公开(公告)号：US11927555B2
公开(公告)日：2024-03-12
申请号：US17330269
申请日：2021-05-25
申请人： Liji Huang , Yahong Yao , Li Chen , Chih-Chang Chen
发明人： Liji Huang , Yahong Yao , Li Chen , Chih-Chang Chen
IPC分类号： G01N25/18 , G01F1/68 , G01F1/684 , G01F1/69 , G01F1/692 , G01F1/699 , G01F15/14
CPC分类号： G01N25/18 , G01F1/6845 , G01F1/6847 , G01F1/69 , G01F1/692 , G01F1/699 , G01F15/14
摘要： The design and structure of a fluidic concentration metering device with a full dynamic range utilizing micro-machined thermal time-of-flight sensing elements is exhibited in this disclosure. With an additional identical sensing chip but packaged at the different locations in the measurement fluidic chamber with a closed conduit, the device can simultaneously measure the fluidic concentration and the fluidic flowrate. With a temperature thermistor integrated on the same micro-machined thermal sensing chip, the disclosed device will be able to provide the key processing parameters for the fluidic applications.

7. 发明授权

US08132455B2 Robust micromachined thermal mass flow sensor with double side passivated polyimide membrane 有权
标题翻译：具有双面钝化聚酰亚胺膜的坚固的微加工热质量流量传感器
公开(公告)号：US08132455B2
公开(公告)日：2012-03-13
申请号：US12538337
申请日：2009-08-10
申请人： Chih-Chang Chen , Gaofeng Wang , Liji Huang , Yahong Yao
发明人： Chih-Chang Chen , Gaofeng Wang , Liji Huang , Yahong Yao
IPC分类号： G01F1/68
CPC分类号： G01F1/6845 , G01F1/692
摘要： A micromachined thermal mass flow sensor comprises a high mechanical strength polyimide film as a supporting layer of suspending membrane. The polyimide film provides superior thermal insulating properties to reduce the power consumption of device. Due to the tendency of humidity absorption, the polyimide suspending membrane is double side passivated on both top and bottom surfaces to sustain its long term stability from rush and humid working environment. A thin layer of silicon dioxide deposited by plasma enhanced chemical vapor deposition is overlaid between the silicon nitride and polyimide film to enhance the adhesion property of passivation layers to polyimide surface. With such embodiments, a sturdy and robust micromachined thermal mass flow sensor with high measurement accuracy could be formed.
摘要翻译：微加工热质量流量传感器包括作为悬浮膜的支撑层的高机械强度聚酰亚胺膜。聚酰亚胺薄膜提供优异的隔热性能，以降低设备的功耗。由于吸湿的趋势，聚酰亚胺悬浮膜在顶面和底面都被双面钝化，以保持其在潮湿和潮湿的工作环境下的长期稳定性。通过等离子体增强化学气相沉积沉积的薄的二氧化硅层覆盖在氮化硅和聚酰亚胺膜之间，以增强钝化层与聚酰亚胺表面的粘合性能。通过这样的实施例，可以形成具有高测量精度的坚固且可靠的微加工热质量流量传感器。

8. 发明申请

US20110030468A1 ROBUST MICROMACHINING THERMAL MASS FLOW SENSOR AND METHOD OF MAKING THE SAME 有权
标题翻译：坚固的微型冶金热流量传感器及其制造方法
公开(公告)号：US20110030468A1
公开(公告)日：2011-02-10
申请号：US12538337
申请日：2009-08-10
申请人： Chih-Chang Chen , Gaofeng Wang , Liji Huang , Yahong Yao
发明人： Chih-Chang Chen , Gaofeng Wang , Liji Huang , Yahong Yao
IPC分类号： G01F1/68
CPC分类号： G01F1/6845 , G01F1/692
摘要： The present invention is generally related to a novel micromachining thermal mass flow sensor and, more particularly, to a device incorporated with high strength and robust characteristics, which therefore is capable of operating under harsh environments. The new disclosed sensor is made of essential material which can provide robust physical structure and superior thermal properties to support the flow measuring operation. The invented thermal mass flow sensor is featuring with the advantages of micro-fabricated devices in terms of compact size, low power consumption, high accuracy and repeatability, wide dynamic range and easiness for mass production, which could avoid the drawbacks of fragility and vulnerability.
摘要翻译：本发明通常涉及一种新颖的微加工热质量流量传感器，更具体地说涉及具有高强度和鲁棒特性的装置，因此能够在恶劣环境下运行。新公开的传感器由必需材料制成，其可以提供鲁棒的物理结构和优异的热性能来支持流量测量操作。本发明的热质量流量传感器具有结构紧凑，功耗低，精度高，重复性好，动态范围广，批量生产容易的微型装置优点，可以避免脆弱性和脆弱性的缺点。

9. 发明授权

US07780343B2 Micromachined gas and liquid concentration sensor and method of making the same 有权
标题翻译：微加工气体和液体浓度传感器及其制造方法
公开(公告)号：US07780343B2
公开(公告)日：2010-08-24
申请号：US11774771
申请日：2007-07-09
申请人： Chih-Chang Chen , Yahong Yao , Gaofeng Wang , Liji Huang
发明人： Chih-Chang Chen , Yahong Yao , Gaofeng Wang , Liji Huang
IPC分类号： G01N25/00 , G01K3/00 , G01K7/00
CPC分类号： G01N25/20 , G01F1/6845 , G01F1/692
摘要： A device with micromachined (a.k.a. MEMS, Micro Electro Mechanical Systems) silicon sensor to measure gas or liquid concentration in a binary mixture formality is disclosed in the present invention. A process for fabricating the said MEMS silicon concentration sensor, which thereby can greatly reduce the sensor fabrication cost by a batch production, is revealed as well. This MEMS process can mass-produce the sensors on silicon substrate in the ways of small size, low power, and high reliability. In addition to the gas or liquid concentration measurement, the present invention further discloses that the said sensor can also readily measure gas or liquid mass flow rate while record the concentration data, which is not viable by other related working principle.
摘要翻译：在本发明中公开了一种具有微加工（a.k.a. MEMS，Micro Electro Mechanical Systems）硅传感器的装置，用于测量二元混合物形式中的气体或液体浓度。也可以揭示制造所述MEMS硅浓度传感器的方法，从而能够通过批量生产大大降低传感器制造成本。该MEMS工艺可以以小尺寸，低功率和高可靠性的方式批量生产硅衬底上的传感器。除了气体或液体浓度测量之外，本发明还公开了所述传感器还可以容易地测量气体或液体质量流量，同时记录其他相关工作原理不可行的浓度数据。

10. 发明授权

US07536908B2 Micromachined thermal mass flow sensors and insertion type flow meters and manufacture methods 有权
标题翻译：微加工热质量流量传感器和插入式流量计及其制造方法
公开(公告)号：US07536908B2
公开(公告)日：2009-05-26
申请号：US11157604
申请日：2005-06-21
申请人： Gaofeng Wang , Chih-Chang Chen , Yahong Yao , Liji Huang
发明人： Gaofeng Wang , Chih-Chang Chen , Yahong Yao , Liji Huang
IPC分类号： G01F1/68
CPC分类号： G01F1/6845
摘要： An integrated mass flow sensor is manufactured by a process of carrying out a micro-machining process on an N or P-type silicon substrate with orientation . This mass flow sensor comprises a central thin-film heater and a pair of thin-film heat sensing elements, and a thermally isolated membrane for supporting the heater and the sensors out of contact with the substrate base. The mass flow sensor is arranged for integration on a same silicon substrate to form a one-dimensional or two-dimensional array in order to expand the dynamic measurement range. For each sensor, the thermally isolated membrane is formed by a process that includes a step of first depositing dielectric thin-film layers over the substrate and then performing a backside etching process on a bulk silicon with TMAH or KOH or carrying out a dry plasma etch until the bottom dielectric thin-film layer is exposed. Before backside etching the bulk silicon, rectangular openings are formed on the dielectric thin-film layers by applying a plasma etching to separate the area of heater and sensing elements from the rest of the membrane. This mass flow sensor is operated with two sets of circuits, a first circuit for measuring a flow rate in a first range of flow rates and a second circuit for measuring a flow rate in a second range of flow rates, to significantly increase range of flow rate measurements, while maintains a high degree of measurement accuracy.
摘要翻译：通过在取向<100>的N型或P型硅衬底上进行微加工工艺的方法制造集成的质量流量传感器。该质量流量传感器包括中央薄膜加热器和一对薄膜热敏元件，以及用于支撑加热器的热隔离膜和与基板基板接触的传感器。质量流量传感器布置成集成在相同的硅衬底上以形成一维或二维阵列，以便扩大动态测量范围。对于每个传感器，热隔离膜通过包括首先在衬底上沉积电介质薄膜层然后用TMAH或KOH对体硅进行背面蚀刻工艺或进行干等离子体蚀刻的步骤来形成直到底部介电薄膜层暴露。在背面蚀刻体硅之前，通过施加等离子体蚀刻在电介质薄膜层上形成矩形开口，以将加热器的区域和感测元件与膜的其余部分分开。该质量流量传感器用两组电路操作，第一电路用于测量第一流量范围内的流量，以及用于测量在第二流量范围内的流量的第二电路，以显着增加流量范围速率测量，同时保持高度的测量精度。

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