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    • 1. 发明授权
    • Method of manufacturing CMOS thin film transistor
    • 制造CMOS薄膜晶体管的方法
    • US06753235B2
    • 2004-06-22
    • US10086629
    • 2002-03-04
    • Woo Young SoKyung Jin YooSang Il Park
    • Woo Young SoKyung Jin YooSang Il Park
    • H01L21331
    • H01L27/1288H01L27/1214
    • A method of manufacturing a CMOS TFT including forming first and second semiconductor layers on an insulating substrate using a first mask, respectively, the substrate having first and second regions, the first semiconductor layer formed on the first region, the second semiconductor layer formed on the second region; forming sequentially a first insulating layer, a first metal layer and a second insulating layer over the whole surface of the substrate; etching a portion of the first metal layer and a portion of the second insulating layer over the first region of the substrate using a second mask to form a first gate electrode and a first capping layer; forming first spacers on both side wall portion of the first gate electrode and the first capping layer; ion-implanting a first conductive-type high-density impurity into the first semiconductor layer using the first spacers and the first gate electrode as a mask to form first high-density source and drain regions; etching a portion of the first metal layer and a portion of the second insulating layer over the second region of the substrate using a third mask to form a second gate electrode and a second capping layer; and ion-implanting a second conductive-type high density impurity into the second semiconductor layer using the third mask to form second high-density source and drain regions.
    • 一种制造CMOS TFT的方法,包括分别使用第一掩模在绝缘基板上形成第一和第二半导体层,所述基板具有第一和第二区域,所述第一半导体层形成在第一区域上,第二半导体层形成在 第二区 在基板的整个表面上依次形成第一绝缘层,第一金属层和第二绝缘层; 使用第二掩模在所述衬底的所述第一区域上蚀刻所述第一金属层的一部分和所述第二绝缘层的一部分,以形成第一栅电极和第一覆盖层; 在所述第一栅电极和所述第一覆盖层的两侧壁部分上形成第一间隔物; 使用第一间隔物和第一栅电极作为掩模,将第一导电型高密度杂质离子注入第一半导体层,以形成第一高密度源极和漏极区; 使用第三掩模在所述基板的所述第二区域上蚀刻所述第一金属层的一部分和所述第二绝缘层的一部分,以形成第二栅电极和第二封盖层; 以及使用所述第三掩模将第二导电型高密度杂质离子注入到所述第二半导体层中以形成第二高密度源极和漏极区。
    • 3. 发明授权
    • Active matrix display device and manufacturing method thereof
    • 有源矩阵显示装置及其制造方法
    • US07176493B2
    • 2007-02-13
    • US10736703
    • 2003-12-17
    • Woo Young SoKyung Jin YooSang Il Park
    • Woo Young SoKyung Jin YooSang Il Park
    • H01L21/84
    • G02F1/136227H01L27/124H01L27/1244H01L27/1288H01L29/41733H01L29/458H01L29/66757
    • The present invention discloses a method of manufacturing an active matrix display device, comprising: a) forming a semiconductor layer on an insulating substrate; b) forming a gate insulating layer over the whole surface of the substrate while convering the semiconductor layer; c) forming a gate electrode on the gate insulating layer over the semiconductor layer; d) forming spacers on both side wall portions of the gate electrode while exposing both end portions of the semiconductor layer; e) ion-implaing a high-density impurity into the semiconductor layer to form high-density source and drain regions in the semiconductor layer; f) depositing sequentially a transparent conductive layer and a metal layer on the inter insulating layer; g) patterning the transparent conductive layer and the metal layer to form the source and drain electrodes, the source and drain electrodes directly contacting the high-density source and drain regions and having a dual-layered structure; h) forming a passivation layer over the whole surface of the substrate; i) etching the passivation layer and the metal layer to form an opening portion exposing a portions of the transparent conductive layer, thereby forming a pixel electrode; and j) performing a reflow process to cover the metal layer in the opening portion by the passivation layer.
    • 本发明公开了一种制造有源矩阵显示装置的方法,包括:a)在绝缘基板上形成半导体层; b)在半导体层会聚的同时在衬底的整个表面上形成栅极绝缘层; c)在半导体层上的栅极绝缘层上形成栅电极; d)在露出半导体层的两个端部部分的同时,在栅电极的两个侧壁部分上形成间隔物; e)将高密度杂质离子注入到半导体层中以在半导体层中形成高密度源极和漏极区; f)在所述绝缘层上依次沉积透明导电层和金属层; g)图案化透明导电层和金属层以形成源极和漏极,源极和漏极直接接触高密度源极和漏极区并具有双层结构; h)在衬底的整个表面上形成钝化层; i)蚀刻钝化层和金属层以形成露出透明导电层的一部分的开口部分,从而形成像素电极; 和j)进行回流处理以通过钝化层覆盖开口部分中的金属层。
    • 4. 发明授权
    • Thin film transistors with dual layered source/drain electrodes and manufacturing method thereof, and active matrix display device and manufacturing method thereof
    • 具有双层源极/漏极的薄膜晶体管及其制造方法,以及有源矩阵显示装置及其制造方法
    • US06692997B2
    • 2004-02-17
    • US10077771
    • 2002-02-20
    • Woo Young SoKyung Jin YooSang Il Park
    • Woo Young SoKyung Jin YooSang Il Park
    • H01L2184
    • G02F1/136227H01L27/124H01L27/1244H01L27/1288H01L29/41733H01L29/458H01L29/66757
    • The present invention discloses a method of manufacturing an active matrix display device, comprising: a) forming a semiconductor layer on an insulating substrate; b) forming a gate insulating layer over the whole surface of the substrate while convering the semiconductor layer; c) forming a gate electrode on the gate insulating layer over the semiconductor layer; d) forming spacers on both side wall portions of the gate electrode while exposing both end portions of the semiconductor layer; e) ion-implaing a high-density impurity into the semiconductor layer to form high-density source and drain regions in the semiconductor layer; f) depositing sequentially a transparent conductive layer and a metal layer on the inter insulating layer; g) patterning the transparent conductive layer and the metal layer to form the source and drain electrodes, the source and drain electrodes directly contacting the high-density source and drain regions and having a dual-layered structure; h) forming a passivation layer over the whole surface of the substrate; i) etching the passivation layer and the metal layer to form an opening portion exposing a portions of the transparent conductive layer, thereby forming a pixel electrode; and j) performing a reflow process to cover the metal layer in the opening portion by the passivation layer.
    • 本发明公开了一种制造有源矩阵显示装置的方法,包括:a)在绝缘基板上形成半导体层; b)在半导体层会聚的同时在衬底的整个表面上形成栅极绝缘层; c)在半导体层上的栅极绝缘层上形成栅电极; d)在露出半导体层的两个端部部分的同时,在栅电极的两个侧壁部分上形成间隔物; e)将高密度杂质离子注入到半导体层中以在半导体层中形成高密度源极和漏极区; f)在所述绝缘层上依次沉积透明导电层和金属层; g)图案化透明导电层和金属层以形成源极和漏极,源极和漏极直接接触高密度源极和漏极区并具有双层结构; h)在衬底的整个表面上形成钝化层; i)蚀刻钝化层和金属层以形成露出透明导电层的一部分的开口部分,从而形成像素电极; 和j)进行回流处理以通过钝化层覆盖开口部分中的金属层。
    • 8. 发明申请
    • OPTICAL POINTING APPARATUS AND PORTABLE ELECTRONIC APPARATUS WITH THE SAME
    • 光学指示装置和便携式电子设备
    • US20110018800A1
    • 2011-01-27
    • US12933707
    • 2009-03-03
    • Keon Joon AhnJae Dong KimSang Il Park
    • Keon Joon AhnJae Dong KimSang Il Park
    • G06F3/033
    • G06F3/042G06F1/1616G06F1/1626G06F1/169
    • An optical pointing device and a portable electronic device having the same, in which external noise light and/or noise light due to diffused reflection or the like is prevented from being introduced into an optical sensor enhancing precision of operation and providing a housing with improved structure. The device includes an infrared source; a cover having a cover plate transmitting infrared rays from the IR source for reaching a subject out of the cover plate and a cover frame that supports the cover plate; an optical unit in the cover and on which the infrared ray reflected from the subject is incident; and an optical sensor sensing the infrared ray incident thereon from the optical unit; the cover plate has a base coupled to the cover frame, and an IR band-pass filter layer provided on one side of the base.
    • 具有这样的光学指示装置和便携式电子装置,其中防止由于扩散反射等引起的外部噪声光和/或噪声光被引入到提高操作精度的光学传感器中并提供具有改进结构的壳体 。 该装置包括红外源; 具有盖板,其将来自所述IR源的红外线传送到所述盖板外的被检体,盖框支撑所述盖板; 盖子上的光学单元,从被摄体反射的红外线入射到该光学单元上; 以及感测从光学单元入射到其上的红外线的光学传感器; 盖板具有联接到盖框架的基座和设置在基座的一侧上的IR带通滤波器层。