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1. 发明授权

US07126137B2 Illumination system with field mirrors for producing uniform scanning energy 有权
标题翻译：照明系统与现场镜，用于产生均匀的扫描能量
公开(公告)号：US07126137B2
公开(公告)日：2006-10-24
申请号：US10827916
申请日：2004-04-20
申请人： Wolfgang Singer , Joachim Hainz , Hans-Joachim Frasch , Johannes Wangler , Joachim Wietzorrek , Jörg Schultz
发明人： Wolfgang Singer , Joachim Hainz , Hans-Joachim Frasch , Johannes Wangler , Joachim Wietzorrek , Jörg Schultz
IPC分类号： A61G5/00
CPC分类号： B82Y10/00 , G02B17/0657 , G03F7/70083 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06
摘要： This invention relates to an Ilumination system for scanning lithography especially for wavelengths≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.
摘要翻译：本发明涉及一种用于扫描光刻的照明系统，特别是对于<= 193nm的波长，特别是用于照明狭缝的EUV光刻，包括至少一个场反射镜或至少一个场透镜，其特征在于，至少一个场反射镜或场透镜具有非球面形状。

2. 发明授权

US07443948B2 Illumination system particularly for microlithography 失效
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US07443948B2
公开(公告)日：2008-10-28
申请号：US11345880
申请日：2006-02-02
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G21K5/04
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
摘要翻译：提供照明系统。所述照明系统包括（a）具有小于或等于193nm的波长的光源，以及（b）光的路径中的光学元件，具有第一光栅元件，第二光栅元件，第三光栅元件栅格元素和位于其上的第四光栅元素。第二光栅元素与第一光栅元素相邻，并且与第一光栅元素位于第一距离。第四光栅元素与第三光栅元素相邻，并且与第三光栅元素相距第二距离。第二距离与第一距离不同。

3. 发明授权

US07006595B2 Illumination system particularly for microlithography 失效
公开(公告)号：US07006595B2
公开(公告)日：2006-02-28
申请号：US10150650
申请日：2002-05-17
申请人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G21K5/04 , G21K5/10 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

4. 发明授权

US06840640B2 Multi mirror system for an illumination system 失效
标题翻译：用于照明系统的多镜系统
公开(公告)号：US06840640B2
公开(公告)日：2005-01-11
申请号：US10060909
申请日：2002-01-30
申请人： Martin Antoni , Isabel Escudero-Sanz , Wolfgang Singer , Johannes Wangler , Jörg Schultz
发明人： Martin Antoni , Isabel Escudero-Sanz , Wolfgang Singer , Johannes Wangler , Jörg Schultz
IPC分类号： G02B13/18 , G02B13/24 , G02B17/00 , G02B17/06 , G02B19/00 , G02B27/00 , G02B27/09 , G03F7/20 , G03F7/22 , H01L21/027 , G02B5/10 , G21K5/00
CPC分类号： G02B27/0983 , G02B17/0621 , G02B19/0023 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G02B27/0905 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70116 , G03F7/702 , G03F7/70233 , Y10S359/90
摘要： There is provided a multi-mirror system for an illumination system with wavelengths ≦193 nm. The multi-mirror system includes (a) an imaging system having a first mirror and a second mirror, (b) an object plane, (c) an image plane in which the imaging system forms an image of an object, and (d) an arc-shaped field in the image plane, where a radial direction in a middle of the arc-shaped field defines a scanning direction. The first and second mirrors are arranged such that an edge sharpness of the arc-shaped field is smaller than 5 mm in the scanning direction. Rays traveling from the object plane to the image plane impinge a used area of the first and second mirrors with incidence angles relative to a surface normal of the mirrors ≦30° or ≧60°.
摘要翻译：为波长<= 193nm的照明系统提供了多镜系统。多镜系统包括（a）具有第一反射镜和第二反射镜的成像系统，（b）物体平面，（c）成像系统形成物体的图像的图像平面，（d）在图像平面中的弧形场，其中弧形场的中间的径向方向限定扫描方向。第一和第二反射镜被布置成使得弧形场的边缘锐度在扫描方向上小于5mm。从物体行进到图像平面的光线相对于反射镜的表面法线<= 30°或> = 60°的入射角撞击第一和第二反射镜的使用区域。

5. 发明授权

US07583433B2 Multi mirror system for an illumination system 失效
标题翻译：用于照明系统的多镜系统
公开(公告)号：US07583433B2
公开(公告)日：2009-09-01
申请号：US10921447
申请日：2004-08-19
申请人： Martin Antoni , Isabel Escudero-Sanz , Wolfgang Singer , Johannes Wangler , Jörg Schultz
发明人： Martin Antoni , Isabel Escudero-Sanz , Wolfgang Singer , Johannes Wangler , Jörg Schultz
IPC分类号： G02B5/10 , G03F7/20 , G21K5/00
CPC分类号： G02B27/0983 , G02B17/0621 , G02B19/0023 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G02B27/0905 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70116 , G03F7/702 , G03F7/70233 , Y10S359/90
摘要： There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm. The system includes light rays traveling along a light oath from an object plane to an image plane, and an arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles ≦30° or ≧60° relative to a surface normal of the first and second mirror.
摘要翻译：提供了用于照明系统的多镜系统，特别是对于波长<= 193nm的光刻。该系统包括沿着从物体平面到像平面的轻誓行行进的光线，以及在图像平面中的弧形场，由此在弧形场的中间的径向限定了扫描方向。第一反射镜和第二反射镜被布置在具有这样的位置的光路中，使得像面中的弧形场的边缘锐度在扫描方向上小于5mm。此外，相对于第一和第二反射镜的表面法线，光线入射在第一反射镜和第二反射镜上，入射角<= 30°或> = 60°。

6. 发明授权

US06859328B2 Illumination system particularly for microlithography 失效
标题翻译：照明系统，特别适用于微光刻
公开(公告)号：US06859328B2
公开(公告)日：2005-02-22
申请号：US10201652
申请日：2002-07-22
申请人： Jörg Schultz , Johannes Wangler , Karl-Hein Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Hans-Juergen Mann , Wilhelm Ulrich
发明人： Jörg Schultz , Johannes Wangler , Karl-Hein Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Hans-Juergen Mann , Wilhelm Ulrich
IPC分类号： G02B17/06 , G03F7/20 , G21K1/06 , G21K5/00 , G21K5/04 , G02B27/14 , G02B5/30 , G02B17/00
CPC分类号： B82Y10/00 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.
摘要翻译：使用波长<= 193nm的用于微光刻的投影曝光装置包括（A）主光源，（B）具有（1）像平面的照明系统，（2）多个光栅元件，用于接收来自初级光源，以及（3）用于接收来自所述多个光栅元件的光并用于形成在所述像平面中具有多个场点的弧形场的场反射镜，以及（C）投影物镜。照明系统具有与多个场点中的每一个相关联的原理射线，从而限定多个原则射线。多个原始光线分散地投射到投影物镜中。

7. 发明授权

US06438199B1 Illumination system particularly for microlithography 有权
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US06438199B1
公开(公告)日：2002-08-20
申请号：US09679718
申请日：2000-09-29
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni
IPC分类号： G21K504
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70075 , G03F7/70083 , G03F7/70091 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G03F7/70891 , G21K1/067 , G21K2201/06 , G21K2201/064
摘要： The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.
摘要翻译：本发明涉及一种照明系统，特别是对于具有波长<= 193nm的微光刻，其包括光源，第一光学部件，第二光学部件，图像平面和出射光瞳。第一光学部件将光源变换成由所述出射光瞳中的第二光学部件成像的多个次级光源。第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像。第一光栅元件以第一偏转角偏转入射光束，其中第一偏转角中的至少两个是不同的。第一光栅元件优选地是矩形的，其中该场是环的一段。为了将第一光栅元件的矩形图像变换成环形的区段，第二光学部件包括用于将场成形为环形部分的第一场镜。

8. 发明授权

US06366410B1 Reticular objective for microlithography-projection exposure installations 有权
标题翻译：微光刻投影曝光装置的网格目标
公开(公告)号：US06366410B1
公开(公告)日：2002-04-02
申请号：US09125621
申请日：1999-08-12
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster
IPC分类号： G02B300
CPC分类号： G03F7/70066 , G02B13/143 , G03F7/70225
摘要： A REMA objective is realized by introduction of a few (1 to 5 units) aspherical surfaces of high-quality correction with a low number of lenses (no more than 10), and low path in glass (maximum 25% to 30%) of the object-reticle distance, thus enhancing efficiency.
摘要翻译： REMA的目标是通过引入低质量校正的几个（1至5个单位）非球面表面，具有低数量的透镜（不超过10个）和玻璃中的低通道（最大25％至30％）的对象 - 标线距离，从而提高效率。

9. 发明授权

US07148495B2 Illumination system, particularly for EUV lithography 有权
标题翻译：照明系统，特别适用于EUV光刻
公开(公告)号：US07148495B2
公开(公告)日：2006-12-12
申请号：US10752368
申请日：2004-01-06
申请人： Jörg Schultz , Johannes Wangler
发明人： Jörg Schultz , Johannes Wangler
IPC分类号： H01L21/428 , G03F7/20 , G21K5/04
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K5/00
摘要： There is provided an illumination system. The illumination system includes a light source for emitting light having a wavelength ≦193 nm, an optical system, and a radiation protection wall situated between the light source and the optical system.
摘要翻译：提供照明系统。照明系统包括用于发射波长<= 193nm的光的光源，光学系统和位于光源和光学系统之间的辐射防护壁。

10. 发明授权

US06680803B2 Partial objective in an illuminating systems 有权
标题翻译：照明系统的部分目标
公开(公告)号：US06680803B2
公开(公告)日：2004-01-20
申请号：US09969441
申请日：2001-10-01
申请人： Jörg Schultz , Alexander Sohmer , Alexander Epple , Johannes Wangler , Christa Müller
发明人： Jörg Schultz , Alexander Sohmer , Alexander Epple , Johannes Wangler , Christa Müller
IPC分类号： G02B300
CPC分类号： G03F7/70891 , G02B13/143 , G03F7/7005 , G03F7/70066 , G03F7/70075 , G03F7/70216
摘要： Partial objective for illumination of an image field in an illuminating device of a microlithographic projection exposure apparatus, arranged between a aperture plane and an image plane. The partial objective comprises a first lens group and a second lens group with a lens with a first aspheric lens surface. The second lens group has at least a first lens with negative refractive power and at least a second lens with positive refractive power. The maximum field height Yimmax within the image field is at least 40 mm; the image-side numerical aperture is at least 0.15. The distribution of the chief ray angles PF over the field heights Yim within the image field is given by a pupil function PF(Yim), which consists of a linear contribution c1·Yim and a non-linear contribution PFNL(Yim), the non-linear contribution PFNL(Yim) being at least +15 mrad for the maximum positive field height Yimmax.
摘要翻译：布置在孔平面和图像平面之间的微光刻投影曝光装置的照明装置中的照明场的部分目的。部分目标包括具有第一非球面透镜表面的透镜的第一透镜组和第二透镜组。第二透镜组具有至少具有负屈光力的第一透镜和至少具有正屈光力的第二透镜。图像场内的最大场高Yim 至少为40 mm; 图像侧数值孔径至少为0.15。在场域内的场高度Yim上的主射线角度PF的分布由瞳孔函数PF（Yim）给出，该光瞳函数PF（Yim）由线性贡献c1.Yim和非线性贡献PFNL（Yim）组成，线性贡献PFNL（Yim）对于最大正场高度Yim 至少为+15mrad。

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