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1. 发明授权

US07583433B2 Multi mirror system for an illumination system 失效
标题翻译：用于照明系统的多镜系统
公开(公告)号：US07583433B2
公开(公告)日：2009-09-01
申请号：US10921447
申请日：2004-08-19
申请人： Martin Antoni , Isabel Escudero-Sanz , Wolfgang Singer , Johannes Wangler , Jörg Schultz
发明人： Martin Antoni , Isabel Escudero-Sanz , Wolfgang Singer , Johannes Wangler , Jörg Schultz
IPC分类号： G02B5/10 , G03F7/20 , G21K5/00
CPC分类号： G02B27/0983 , G02B17/0621 , G02B19/0023 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G02B27/0905 , G03F7/70066 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70116 , G03F7/702 , G03F7/70233 , Y10S359/90
摘要： There is provided a multi-mirror-system for an illumination system, especially for lithography with wavelengths ≦193 nm. The system includes light rays traveling along a light oath from an object plane to an image plane, and an arc-shaped field in the image plane, whereby a radial direction in the middle of the arc-shaped field defines a scanning direction. The first mirror and the second mirror are arranged in the light path in such a position and having such a shape, that the edge sharpness of the arc-shaped field in the image plane is smaller than 5 mm in the scanning direction. Furthermore, the light rays are impinging on the first mirror and the second mirror with incidence angles ≦30° or ≧60° relative to a surface normal of the first and second mirror.
摘要翻译：提供了用于照明系统的多镜系统，特别是对于波长<= 193nm的光刻。该系统包括沿着从物体平面到像平面的轻誓行行进的光线，以及在图像平面中的弧形场，由此在弧形场的中间的径向限定了扫描方向。第一反射镜和第二反射镜被布置在具有这样的位置的光路中，使得像面中的弧形场的边缘锐度在扫描方向上小于5mm。此外，相对于第一和第二反射镜的表面法线，光线入射在第一反射镜和第二反射镜上，入射角<= 30°或> = 60°。

2. 发明授权

US06859515B2 Illumination system, particularly for EUV lithography 有权
标题翻译：照明系统，特别适用于EUV光刻
公开(公告)号：US06859515B2
公开(公告)日：2005-02-22
申请号：US10090470
申请日：2002-03-04
申请人： Jörg Schultz , Johannes Wangler
发明人： Jörg Schultz , Johannes Wangler
IPC分类号： G03F7/20 , G21K1/06 , G21K5/00 , G21K5/04
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K5/00
摘要： There is provided an illumination system for light having wavelengths ≦193 nm. The system includes (a) a first raster element for receiving a first diverging portion of the light and directing a first beam of the light, (b) a second raster element for receiving a second diverging portion of the light and directing a second beam of the light, where the first raster element is oriented at an angle with respect to the second raster element to cause a center ray of the first beam to intersect with a center ray of the second beam at an image plane, and (c) an optical element for imaging secondary sources of the light in an exit pupil, where the optical element is situated in a path of the light after the first and second raster elements and before the image plane.
摘要翻译：为波长<= 193nm的光提供照明系统。该系统包括（a）用于接收光的第一发散部分并引导第一光束的第一光栅元件，（b）第二光栅元件，用于接收光的第二发散部分并引导第二光束所述光，其中所述第一光栅元件相对于所述第二光栅元件以一定角度定向，以使所述第一光束的中心光线在图像平面处与所述第二光束的中心光线相交，以及（c）光学用于在出射光瞳中成像二次光源的元件，其中光学元件位于第一和第二光栅元件之后的光的路径中以及在图像平面之前。

3. 发明授权

US06859328B2 Illumination system particularly for microlithography 失效
标题翻译：照明系统，特别适用于微光刻
公开(公告)号：US06859328B2
公开(公告)日：2005-02-22
申请号：US10201652
申请日：2002-07-22
申请人： Jörg Schultz , Johannes Wangler , Karl-Hein Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Hans-Juergen Mann , Wilhelm Ulrich
发明人： Jörg Schultz , Johannes Wangler , Karl-Hein Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Hans-Juergen Mann , Wilhelm Ulrich
IPC分类号： G02B17/06 , G03F7/20 , G21K1/06 , G21K5/00 , G21K5/04 , G02B27/14 , G02B5/30 , G02B17/00
CPC分类号： B82Y10/00 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： A projection exposure apparatus for microlithography using a wavelength≦193 nm, includes (A) a primary light source, (B) an illumination system having (1) an image plane, (2) a plurality of raster elements for receiving light from the primary light source, and (3) a field mirror for receiving the light from the plurality of raster elements and for forming an arc-shaped field having a plurality of field points in the image plane, and (C) a projection objective. The illumination system has a principle ray associated with each of the plurality of field points thus defining a plurality of principle rays. The plurality of principle rays run divergently into the projection objective.
摘要翻译：使用波长<= 193nm的用于微光刻的投影曝光装置包括（A）主光源，（B）具有（1）像平面的照明系统，（2）多个光栅元件，用于接收来自初级光源，以及（3）用于接收来自所述多个光栅元件的光并用于形成在所述像平面中具有多个场点的弧形场的场反射镜，以及（C）投影物镜。照明系统具有与多个场点中的每一个相关联的原理射线，从而限定多个原则射线。多个原始光线分散地投射到投影物镜中。

4. 发明授权

US06438199B1 Illumination system particularly for microlithography 有权
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US06438199B1
公开(公告)日：2002-08-20
申请号：US09679718
申请日：2000-09-29
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni
IPC分类号： G21K504
CPC分类号： G21K1/06 , B82Y10/00 , G03F7/70075 , G03F7/70083 , G03F7/70091 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G03F7/70891 , G21K1/067 , G21K2201/06 , G21K2201/064
摘要： The invention concerns an illumination system, particularly for microlithography with wavelengths ≦193 nm, comprising a light source, a first optical component, a second optical component, an image plane and an exit pupil. The first optical component transforms the light source into a plurality of secondary light sources being imaged by the second optical component in said exit pupil. The first optical component comprises a first optical element having a plurality of first raster elements, which are imaged into said image plane producing a plurality of images being superimposed at least partially on a field in said image plane. The first raster elements deflect incoming ray bundles with first deflection angles, wherein at least two of the first deflection angles are different. The first raster elements are preferably rectangular, wherein the field is a segment of an annulus. To transform the rectangular images of the first raster elements into the segment of the annulus, the second optical component comprises a first field mirror for shaping the field to the segment of the annulus.
摘要翻译：本发明涉及一种照明系统，特别是对于具有波长<= 193nm的微光刻，其包括光源，第一光学部件，第二光学部件，图像平面和出射光瞳。第一光学部件将光源变换成由所述出射光瞳中的第二光学部件成像的多个次级光源。第一光学部件包括具有多个第一光栅元件的第一光学元件，其被成像到所述图像平面中，产生至少部分地叠加在所述图像平面中的场上的多个图像。第一光栅元件以第一偏转角偏转入射光束，其中第一偏转角中的至少两个是不同的。第一光栅元件优选地是矩形的，其中该场是环的一段。为了将第一光栅元件的矩形图像变换成环形的区段，第二光学部件包括用于将场成形为环形部分的第一场镜。

5. 发明授权

US06198793B1 Illumination system particularly for EUV lithography 有权
标题翻译：照明系统尤其适用于EUV光刻
公开(公告)号：US06198793B1
公开(公告)日：2001-03-06
申请号：US09305017
申请日：1999-05-04
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger
IPC分类号： G21K504
CPC分类号： G21K1/06 , B82Y10/00 , G02B27/0905 , G02B27/0961 , G02B27/0983 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K2201/06
摘要： The invention concerns an illumination system for wavelengths ≦193 nm, particularly for EUV lithography, with at least one light source, which has an illumination A in a predetermined surface; at least one device for producing secondary light sources; at least one mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements; one or more optical elements, which are arranged between the mirror or lens device comprising at least one mirror or one lens, which is or are organized into raster elements and the reticle plane, whereby the optical elements image the secondary light sources in the exit pupil of the illumination system. The illumination system is characterized by the fact that the raster elements of the one or more mirror or lenses are shaped and arranged in such a way that the images of the raster elements cover by means of the optical elements the major portion of the reticle plane and that the exit pupil defined by aperture and filling degree is illuminated.
摘要翻译：本发明涉及用于波长<= 193nm的照明系统，特别是对于EUV光刻，具有至少一个在预定表面具有照明A的光源; 至少一个用于产生二次光源的装置; 至少一个镜子或透镜装置，其包括至少一个反射镜或一个透镜，其被组合成光栅元件; 布置在包括至少一个反射镜或一个透镜的反射镜或透镜装置之间的一个或多个光学元件，其被组织成光栅元件和光罩平面，由此光学元件将出射光瞳中的次级光源成像照明系统的特征在于，一个或多个镜子或透镜的光栅元件被成形和布置成使得光栅元件的图像通过光学元件覆盖主要部分并且照明由孔径和填充度限定的出射光瞳。

6. 发明授权

US07126137B2 Illumination system with field mirrors for producing uniform scanning energy 有权
标题翻译：照明系统与现场镜，用于产生均匀的扫描能量
公开(公告)号：US07126137B2
公开(公告)日：2006-10-24
申请号：US10827916
申请日：2004-04-20
申请人： Wolfgang Singer , Joachim Hainz , Hans-Joachim Frasch , Johannes Wangler , Joachim Wietzorrek , Jörg Schultz
发明人： Wolfgang Singer , Joachim Hainz , Hans-Joachim Frasch , Johannes Wangler , Joachim Wietzorrek , Jörg Schultz
IPC分类号： A61G5/00
CPC分类号： B82Y10/00 , G02B17/0657 , G03F7/70083 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G21K1/06
摘要： This invention relates to an Ilumination system for scanning lithography especially for wavelengths≦193 nm, particularly EUV lithography, for the illumination of a slit, comprising at least one field mirror or at least one field lens and being characterized in that at least one of the field mirror(s) or the field lens(es) has (have) an aspheric shape.
摘要翻译：本发明涉及一种用于扫描光刻的照明系统，特别是对于<= 193nm的波长，特别是用于照明狭缝的EUV光刻，包括至少一个场反射镜或至少一个场透镜，其特征在于，至少一个场反射镜或场透镜具有非球面形状。

7. 发明授权

US06366410B1 Reticular objective for microlithography-projection exposure installations 有权
标题翻译：微光刻投影曝光装置的网格目标
公开(公告)号：US06366410B1
公开(公告)日：2002-04-02
申请号：US09125621
申请日：1999-08-12
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster
IPC分类号： G02B300
CPC分类号： G03F7/70066 , G02B13/143 , G03F7/70225
摘要： A REMA objective is realized by introduction of a few (1 to 5 units) aspherical surfaces of high-quality correction with a low number of lenses (no more than 10), and low path in glass (maximum 25% to 30%) of the object-reticle distance, thus enhancing efficiency.
摘要翻译： REMA的目标是通过引入低质量校正的几个（1至5个单位）非球面表面，具有低数量的透镜（不超过10个）和玻璃中的低通道（最大25％至30％）的对象 - 标线距离，从而提高效率。

8. 发明授权

US07443948B2 Illumination system particularly for microlithography 失效
标题翻译：照明系统特别适用于微光刻
公开(公告)号：US07443948B2
公开(公告)日：2008-10-28
申请号：US11345880
申请日：2006-02-02
申请人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Wolfgang Singer , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G21K5/04
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system. the illumination system includes (a) a source of light having a wavelength of less than or equal to 193 nm, and (b) an optical element in a path of the light, having a first raster element, a second raster element, a third raster element and a fourth raster element situated thereon. The second raster element is adjacent to the first raster element, and located a first distance from the first raster element. The fourth raster element is adjacent to the third raster element, and located a second distance from the third raster element. The second distance is different from the first distance.
摘要翻译：提供照明系统。所述照明系统包括（a）具有小于或等于193nm的波长的光源，以及（b）光的路径中的光学元件，具有第一光栅元件，第二光栅元件，第三光栅元件栅格元素和位于其上的第四光栅元素。第二光栅元素与第一光栅元素相邻，并且与第一光栅元素位于第一距离。第四光栅元素与第三光栅元素相邻，并且与第三光栅元素相距第二距离。第二距离与第一距离不同。

9. 发明授权

US07006595B2 Illumination system particularly for microlithography 失效
公开(公告)号：US07006595B2
公开(公告)日：2006-02-28
申请号：US10150650
申请日：2002-05-17
申请人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
发明人： Wolfgang Singer , Jörg Schultz , Johannes Wangler , Karl-Heinz Schuster , Udo Dinger , Martin Antoni , Joachim Wietzorrek , Joachim Hainz
IPC分类号： G21K5/04 , G21K5/10 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G02B3/0043 , B82Y10/00 , G02B3/0062 , G02B17/0657 , G03F7/70075 , G03F7/70083 , G03F7/70108 , G03F7/70166 , G03F7/702 , G03F7/70233 , G03F7/70358 , G03F7/708 , G21K1/06 , G21K1/062
摘要： There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

10. 发明授权

US06445442B2 Projection-microlithographic device 失效
标题翻译：投影微光刻装置
公开(公告)号：US06445442B2
公开(公告)日：2002-09-03
申请号：US09932355
申请日：2001-08-20
申请人： Rudolf Von Bünau , Jörg Schultz , Johannes Wangler
发明人： Rudolf Von Bünau , Jörg Schultz , Johannes Wangler
IPC分类号： G03B2754
CPC分类号： G03F7/70066 , G03F7/70358
摘要： An illuminating device of a projection-microlithographic device includes a light source, an objective, and a device which produces a particular image field configuration. The device has fields which, in the direction of scanning movement, are separated at least in parts by a free zone, and are located in a peripheral region of the circular image field of a downstream projection objective in a manner at least approximating rotation symmetry. The integral of the quantity of light passing through the fields in the scanning direction are constant over the entire extent of the image field configuration in the direction at right angles to the scanning direction. Such an image field configuration replaces a conventional rectangular scanner slot formation whose width in the scanning direction corresponds to the forementioned integral of the image field configuration. The design of the image field configuration permits an approximately rotationally symmetric illumination of the projection objective.
摘要翻译：投影微光刻装置的照明装置包括光源，物镜和产生特定图像场配置的装置。该装置具有在扫描方向上至少部分地通过自由区域分离的区域，并且以至少近似于旋转对称的方式位于下游投影物镜的圆形图像场的周边区域中。在扫描方向上通过场的光量的积分在与扫描方向成直角的方向上的图像场构造的整个范围内是恒定的。这样的图像场配置取代了扫描方向上的宽度对应于图像场配置的前述积分的常规矩形扫描器狭缝形状。图像场配置的设计允许投影物镜的大致旋转对称的照明。

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