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1. 发明授权

US06521877B1 Optical arrangement having improved temperature distribution within an optical element 有权
标题翻译：在光学元件内具有改善的温度分布的光学布置
公开(公告)号：US06521877B1
公开(公告)日：2003-02-18
申请号：US09721451
申请日：2000-11-22
申请人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G01J120
CPC分类号： G03F7/70891
摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. A refractive optical element, e.g. a lens (2), is heated by the rotationally non-symmetrical radiated impingement (3) of a light source. At least one electric heating element is coupled to the optical element. Said heating element comprises a resistance heating coating carried by the optical element. In the region of the surface (3) of the optical element acted upon by the radiation of the light source the resistance heating coating is substantially optically transparent. It comprises a plurality of parallel, electrically mutually insulated coating strips (5 to 10). A heating current source (17 to 19) is additionally part of the heating element. By virtue of the combined heating of the optical element by the radiated impingement (3) and the resistance heating, a correction of imaging defects induced by illumination in the optical element is achieved by means of a symmetrical and/or homogeneous temperature and refractive index distribution.
摘要翻译：光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。折射光学元件，例如透镜（2）被光源的旋转非对称辐射冲击（3）加热。至少一个电加热元件耦合到光学元件。所述加热元件包括由光学元件承载的电阻加热涂层。在由光源的辐射作用的光学元件的表面（3）的区域中，电阻加热涂层基本上是光学透明的。它包括多个平行的，电互相绝缘的涂层条（5至10）。加热电流源（17〜19）是加热元件的另外一部分。由于通过辐射冲击（3）和电阻加热对光学元件的组合加热，通过对称和/或均匀的温度和折射率分布来实现由光学元件中的照明引起的成像缺陷的校正。

2. 发明授权

US06466382B2 Optical arrangement 有权
标题翻译：光学布置
公开(公告)号：US06466382B2
公开(公告)日：2002-10-15
申请号：US09751132
申请日：2000-12-29
申请人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G02B702
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70891 , G03F7/70958
摘要： An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of the light source (110, 111, 112). The optical element (101) has an absorbing coating (104, 105). The absorption of the coating (104, 105) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation (107, 108, 109) of the light source (110, 111, 112). As a result of the energy absorbed in the coating (104, 105), an additional heating of the optical element (101) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.
摘要翻译：光学装置，特别是用于微光刻的投影曝光系统，特别是狭缝状图像场或非旋转对称照明。结果，光学元件（101）以非旋转对称的方式暴露于光源（110,111,112）的辐射。光学元件（101）具有吸收涂层（104,105）。涂层（104,105）的吸收以这样的方式分布，使得其以与辐射（107,108,109）的曝光的强度分布至少近似互补的方式是非旋转对称的，的光源（110,111,112）。由于在涂层（104,105）中吸收的能量的结果，发生光学元件（101）的附加加热，其导致更好的非旋转对称的温度分布，并且因此补偿光诱导的成像错误。

3. 发明授权

US06583850B2 Optical system 有权
标题翻译：光学系统
公开(公告)号：US06583850B2
公开(公告)日：2003-06-24
申请号：US09755401
申请日：2001-01-05
申请人： Wolfgang Hummel , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter
发明人： Wolfgang Hummel , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter
IPC分类号： G03B2752
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70825 , G03F7/70833 , G03F7/70883
摘要： An optical element (1) of an optical system has at least one chamber (5) that is sealed against atmospheric pressure and is enclosed by boundary surfaces and that has a fluid filling. At least one of the boundary surfaces of the chamber (5) is exposed at least partially to illumination light. It is configured so that a change in the fluid pressure inside the chamber (5) results in a change in non-rotational-symmetric imaging properties of the optical element (1) having n-fold symmetry. For this purpose, a fluid source has a fluid connection to the chamber via a fluid supply line (17). Furthermore, a control device is provided for the pressure in the fluid filling.
摘要翻译：光学系统的光学元件（1）具有至少一个室（5），其被密封以抵抗大气压并被边界表面包围并具有流体填充。室（5）的至少一个边界表面至少部分地暴露于照明光。其构造使得室（5）内的流体压力的变化导致具有n倍对称性的光学元件（1）的非旋转对称成像特性的变化。为此，流体源经由流体供应管线（17）与腔室流体连接。此外，为流体填充中的压力提供控制装置。

4. 发明授权

US06522392B1 Optical systems and methods of compensating rotationally non-symmetrical image defects in an optical system 失效
标题翻译：在光学系统中补偿旋转非对称图像缺陷的光学系统和方法
公开(公告)号：US06522392B1
公开(公告)日：2003-02-18
申请号：US09721452
申请日：2000-11-22
申请人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Werner Müller-Rissmann , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2768
CPC分类号： G03F7/70241 , G03F7/70258 , G03F7/70825
摘要： An optical system, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. The system comprises a light source (30) as well as at least one optical element, in particular a lens or a mirror. In the region of at least one surface acted upon by the radiation (1) of the light source (30) the optical element is substantially symmetrical in relation to an axis of rotational symmetry (5). The optical element or its housing (6) is rotatably connected to a frame (7) by at least one bearing (8, 9, 10). An actuator (18) sets the optical element (25) or its housing (6) in rotation about the axis of rotational symmetry (5). The actuation cooperates with a control device (23). The latter activates the actuator (18) for rotation of the optical element at least temporarily during the period, when the optical element is exposed to lumination. In such a manner rotationally non-symmetrical image defects are compensated.
摘要翻译：光学系统，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。该系统包括光源（30）以及至少一个光学元件，特别是透镜或反射镜。在由光源（30）的辐射（1）作用的至少一个表面的区域中，光学元件相对于旋转对称轴线（5）基本上是对称的。光学元件或其壳体（6）通过至少一个轴承（8,9,10）可旋转地连接到框架（7）。致动器（18）将光学元件（25）或其壳体（6）围绕旋转对称轴线（5）旋转。致动与控制装置（23）配合。当光学元件暴露于照明时，后者激活用于光学元件的致动器（18），以在光学元件暴露于照明期间的至少暂时的旋转。以这种方式，可以补偿旋转非对称的图像缺陷。

5. 发明授权

US06781668B2 Optical arrangement 失效
标题翻译：光学布置
公开(公告)号：US06781668B2
公开(公告)日：2004-08-24
申请号：US09752282
申请日：2000-12-29
申请人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2752
CPC分类号： G03F7/70058 , G03F7/70216 , G03F7/70891
摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (5) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of a light source. To temper the optical element (5), a supply apparatus (11, 19 to 23) for gas is used. The latter having at least one supply line (21) and at least one gas directing device (11). The latter is aligned relative to the optical element (5) and controllable in such a way that the gas is directed by the gas directing device (11) towards the optical element (5). The volumetric flow of the exiting gas therefore has a magnitude and spatial distribution (17), which are adapted to the intensity distribution (6) of the radiation. By virtue of such tempering, rotationally non-symmetrical light-induced image defects in the optical element (5) are avoided or compensated.
摘要翻译：光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。因此，光学元件（5）通过光源的辐射以旋转非对称的方式作用。为了回火光学元件（5），使用用于气体的供给装置（11,19〜23）。后者具有至少一个供应管线（21）和至少一个气体引导装置（11）。后者相对于光学元件（5）对准并且可以以气体被气体引导装置（11）引向光学元件（5）的方式控制。因此，出口气体的体积流量具有适于辐射的强度分布（6）的大小和空间分布（17）。由于这种回火，避免或补偿光学元件（5）中的旋转非对称的光诱导图像缺陷。

6. 发明授权

US06504597B2 Optical arrangement 有权
标题翻译：光学布置
公开(公告)号：US06504597B2
公开(公告)日：2003-01-07
申请号：US09755423
申请日：2001-01-05
申请人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
发明人： Karl-Heinz Schuster , Hubert Holderer , Rudolf Von Bünau , Christian Wagner , Jochen Becker , Stefan Xalter , Wolfgang Hummel
IPC分类号： G03B2754
CPC分类号： G03F7/70891 , G02B7/028 , G03F7/70825 , G03F7/70983
摘要： An optical arrangement, in particular a microlithographic projection printing installation, has in particular a slot-shaped image field or rotationally non-symmetrical illumination. An optical element (1) is therefore acted upon in a rotationally non-symmetrical manner by the radiation of the light source. A compensating light supply device (11, 14 to 19) is optically coupled via the peripheral surface (13) of the optical element (1) to the latter. It supplies compensating light (16, 12) to the optical element (1) in such a way that the temperature distribution in the optical element (1), which arises as a result of cumulative heating of the optical element (1) with projection light (2) and compensating light (12), is at least partially homogenized. In said manner image defects induced by the projection light are corrected.
摘要翻译：光学布置，特别是微光刻投影印刷装置，特别地具有槽形图像场或旋转非对称照明。因此，光学元件（1）通过光源的辐射以旋转非对称的方式作用。补偿光供给装置（11,14〜19）经由光学元件（1）的周面（13）光耦合到光学元件（1）。它以这样的方式向光学元件（1）供应补偿光（16,12），使得由于用投影光累积加热光学元件（1）而导致的光学元件（1）中的温度分布（2）和补偿光（12）至少部分均匀化。以所述方式校正由投影光引起的图像缺陷。

7. 发明授权

US06784977B2 Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithography 失效
标题翻译：投影曝光系统以及用于补偿投影曝光系统的投影光学元件中发生的图像缺陷的过程，特别是用于微光刻
公开(公告)号：US06784977B2
公开(公告)日：2004-08-31
申请号：US10133963
申请日：2002-04-25
申请人： Rudolf von Bünau , Christian Hembd-Söllner , Hubert Holderer
发明人： Rudolf von Bünau , Christian Hembd-Söllner , Hubert Holderer
IPC分类号： G03B2754
CPC分类号： G03F7/70191 , G03F7/70308
摘要： A projection exposure system, in particular for microlithography, serves for the generation of an image in an image plane of an object arranged in an object plane. The system comprises a light source that emits a projection light bundle. The system also comprises a projection optics arranged in the optical path between the object plane and the image plane as well as at least one optical correction component arranged in the projection light optical path in front of the image plane. In order to change the optical image properties this component is coupled to at least one correction manipulator so that an optical surface of the optical correction component illuminated by the projection light bundle is moved at least regionally. In this connection the correction manipulator operates together with a correction sensor device. The correction sensor device comprises a light source that emits at least one measuring light bundle. This light bundle passes through at least a part of the projection optics and lie sin front of the entry point to and after the exit from the projection optics outside the projection light bundle. The correction sensory device also has a position-sensitive correction sensor element for the detection of the wave front of the at least one measuring light bundle. By means of the correction sensor device a correction of image defects of the projection optics is ensured without the loss of projection light.
摘要翻译：特别是用于微光刻的投影曝光系统用于在物平面中的物体的像平面中产生图像。该系统包括发射投影光束的光源。该系统还包括布置在物平面和图像平面之间的光路中的投影光学器件以及布置在图像平面前面的投影光学光路中的至少一个光学校正元件。为了改变光学图像特性，该部件耦合到至少一个校正操纵器，使得由投影光束照射的光学校正部件的光学表面至少在区域上移动。在这方面，校正操纵器与校正传感器装置一起操作。校正传感器装置包括发射至少一个测量光束的光源。该光束穿过投影光学元件的至少一部分，并且将入射点的前面位于投影光束外部的投影光学器件的出射之后和之后。校正感觉装置还具有用于检测至少一个测量光束的波前的位置敏感校正传感器元件。通过校正传感器装置，确保投影光学器件的图像缺陷的校正，而不损失投影光。

8. 发明授权

US06388823B1 Optical system, especially a projection light facility for microlithography 有权
标题翻译：光学系统，特别是用于微光刻的投影光设备
公开(公告)号：US06388823B1
公开(公告)日：2002-05-14
申请号：US09486017
申请日：2000-07-22
申请人： Erwin Gaber , Christian Wagner , Hubert Holderer , Michael Gerhard , Erich Merz , Jochen Becker , Arie Cornelis Scheiberlich
发明人： Erwin Gaber , Christian Wagner , Hubert Holderer , Michael Gerhard , Erich Merz , Jochen Becker , Arie Cornelis Scheiberlich
IPC分类号： G02B702
CPC分类号： G03F7/70825 , G02B7/023 , G02B7/028 , G02B27/0068 , G03F7/70241 , G03F7/70358 , G03F7/70783
摘要： An optical system, in particular a projection exposure device for microlithography, with a slit-shaped image field or illumination which is not rotationally symmetrical, has an optical element, in particular, a lens or a mirror which is arranged in a mount (2), and actuators (3) which engage on the optical element (1) at least approximately perpendicularly to the optical axis. The actuators (3) bring about forces and or moments, which are not rotationally symmetrical and which deviate from the radial, on the optical element (1), for the production of bendings which take place substantially without thickness changes.
摘要翻译：光学系统，特别是用于微光刻的投影曝光装置，具有狭缝形的图像场或不是旋转对称的照明，具有光学元件，特别是布置在安装件（2）中的透镜或反射镜，，以及致动器（3），其至少大致垂直于光轴接合在光学元件（1）上。致动器（3）在光学元件（1）上产生不是旋转对称的并且与径向偏离的力或力矩，用于产生基本上没有厚度变化的弯曲。

9. 发明授权

US07990622B2 Projection objective of a microlithographic projection exposure apparatus 有权
标题翻译：微光刻投影曝光装置的投影目标
公开(公告)号：US07990622B2
公开(公告)日：2011-08-02
申请号：US12896128
申请日：2010-10-01
申请人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
发明人： Olaf Conradi , Boris Bittner , Sascha Bleidistel , Markus Hauf , Wolfgang Hummel , Arif Kazi , Baerbel Schwaer , Jochen Weber , Hubert Holderer , Payam Tayebati
IPC分类号： G02B1/06 , G02B3/12 , G02B27/02
CPC分类号： G02B27/0068 , G02B3/14 , G03F7/70266 , G03F7/70825
摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
摘要翻译：微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

10. 发明授权

US07961294B2 Imaging device in a projection exposure facility 有权
标题翻译：投影曝光设备中的成像装置
公开(公告)号：US07961294B2
公开(公告)日：2011-06-14
申请号：US12247597
申请日：2008-10-08
申请人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
发明人： Wolfgang Hummel , Juergen Fischer , Karl-Eugen Aubele , Erich Merz , Raoul Reiner , Klaus Rief , Stefan Schoengart , Markus Neumaier , Baerbel Trossbach , Ulrich Weber , Michael Muehlbeyer , Hubert Holderer , Alexander Kohl , Jochen Weber , Johannes Lippert , Thorsten Rassel
IPC分类号： G03B27/42 , G03B27/52 , G03B7/02
CPC分类号： G03F7/70258 , G03F7/70825
摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.
摘要翻译：用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

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