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    • 1. 发明申请
    • METHOD AND SYSTEM FOR SHIELDING SEMICONDUCTOR DEVICES FROM LIGHT
    • 用于屏蔽半导体器件的方法和系统
    • US20120070145A1
    • 2012-03-22
    • US12888223
    • 2010-09-22
    • Wingshenq WongDavid GaniGlenn De Los Reyes
    • Wingshenq WongDavid GaniGlenn De Los Reyes
    • G03B17/00B05D5/06H05K9/00
    • B05D1/325B05D1/02G02B27/0018
    • The present disclosure is directed to a camera module that includes at least a semiconducting die, an image-sensing circuit, a lens, a lens aperture, and a coating that adheres to an exterior surface of the camera module. The coating is opaque to light and prevents light from accessing the camera other than through the lens aperture. The opaque coating is applied as a fluid and is cured. In one embodiment, a mask material is selectively applied to exterior surfaces of the semiconducting die, electrical interconnect layers, glass layers, the lens body, or the lens aperture. After applying the opaque coating, the selectively applied mask material is removed. Methods of selectively applying a mask material include applying a conformable and peelably releasable dope-like material, placing an array of joined, selectively shaped rigid masks over an array of assemblies, and applying a conformable mask material that is heat-expandable.
    • 本公开涉及一种照相机模块,其包括至少半导体裸片,图像感测电路,透镜,透镜孔径以及附着到相机模块的外表面的涂层。 涂层对于光是不透明的,并且防止除了通过透镜孔之外的光进入相机。 将不透明涂层作为流体施加并固化。 在一个实施例中,掩模材料被选择性地施加到半导体管芯,电互连层,玻璃层,透镜体或透镜孔的外表面。 在施加不透明涂层之后,去除选择性施加的掩模材料。 选择性地施加掩模材料的方法包括施加适形和可剥离的可剥离的涂料样材料,将一组连接的选择性形状的刚性掩模放置在组件阵列上,以及施加可热膨胀的适形掩模材料。
    • 2. 发明授权
    • Method and system for shielding semiconductor devices from light
    • 用于屏蔽半导体器件的光的方法和系统
    • US08642119B2
    • 2014-02-04
    • US12888223
    • 2010-09-22
    • Wingshenq WongDavid GaniGlenn De Los Reyes
    • Wingshenq WongDavid GaniGlenn De Los Reyes
    • B05D5/06
    • B05D1/325B05D1/02G02B27/0018
    • The present disclosure is directed to a camera module that includes at least a semiconducting die, an image-sensing circuit, a lens, a lens aperture, and a coating that adheres to an exterior surface of the camera module. The coating is opaque to light and prevents light from accessing the camera other than through the lens aperture. The opaque coating is applied as a fluid and is cured. In one embodiment, a mask material is selectively applied to exterior surfaces of the semiconducting die, electrical interconnect layers, glass layers, the lens body, or the lens aperture. After applying the opaque coating, the selectively applied mask material is removed. Methods of selectively applying a mask material include applying a conformable and peelably releasable dope-like material, placing an array of joined, selectively shaped rigid masks over an array of assemblies, and applying a conformable mask material that is heat-expandable.
    • 本公开涉及一种照相机模块,其包括至少半导体裸片,图像感测电路,透镜,透镜孔径以及附着到相机模块的外表面的涂层。 涂层对于光是不透明的,并且防止除了通过透镜孔之外的光进入相机。 将不透明涂层作为流体施加并固化。 在一个实施例中,掩模材料被选择性地施加到半导体管芯,电互连层,玻璃层,透镜体或透镜孔的外表面。 在施加不透明涂层之后,去除选择性施加的掩模材料。 选择性地施加掩模材料的方法包括施加适形和可剥离的可剥离的涂料样材料,将一组连接的选择性形状的刚性掩模放置在组件阵列上,以及施加可热膨胀的适形掩模材料。