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    • 1. 发明授权
    • Planar motor initialization method, planar motor, lithographic apparatus and device manufacturing method
    • 平面电机初始化方法,平面电机,光刻设备及器件制造方法
    • US07205741B2
    • 2007-04-17
    • US10874691
    • 2004-06-24
    • Wilhelmus Franciscus Johannes SimonsHenrikus Herman Marie CoxSven Antoin Johan Hol
    • Wilhelmus Franciscus Johannes SimonsHenrikus Herman Marie CoxSven Antoin Johan Hol
    • G05B11/01
    • G03F7/70758G03F7/70725H02K41/03H02K2201/18H02P25/06Y10S414/135
    • A planar motor is controlled by supplying a three-phase alternating current to a coil assembly. Each phase is supplied to one of three coils. The coils are positioned in a magnetic field generated by a magnet plate having alternating magnet poles at its surface for generating an alternating magnetic field. In operation, the phase of each current flowing through each coil determines the direction of a force generated due to the current in the magnetic field. For correct operation, the phase angle of each current is to be adapted to the local direction of the magnetic field by determining a commutation-offset angle. The commutation-offset angle is determined by generating a force in an unknown direction and varying the commutation-angle, and determining when the generated force is directed perpendicular to the magnet plate, while ensuring that the generated force does not exceed a horizontal friction force. By determining a maximum compression of end stops of the coil assembly, or determining a maximum pressure, it may be determined when the generated force is directed perpendicular to the magnet plate.
    • 通过向线圈组件提供三相交流电来控制平面电动机。 每相提供给三个线圈中的一个。 线圈位于由其表面上具有交替磁极的磁板产生的磁场中,用于产生交变磁场。 在操作中,流过每个线圈的每个电流的相位确定由于磁场中的电流而产生的力的方向。 为了正确的操作,通过确定换向偏移角度,每个电流的相位角将适应于磁场的局部方向。 通过产生未知方向的力并改变换向角来确定换向偏移角,并且确定所产生的力何时垂直于磁体板定向,同时确保所产生的力不超过水平摩擦力。 通过确定线圈组件的端部止动件的最大压缩或确定最大压力,可以确定何时生成的力垂直于磁体板定向。
    • 7. 发明授权
    • Lithographic apparatus having a controlled motor, and motor control system and method
    • 具有受控电机的光刻设备,以及电机控制系统和方法
    • US07468589B2
    • 2008-12-23
    • US11331337
    • 2006-01-13
    • Henrikus Herman Marie CoxHans ButlerSven Antoin Johan Hol
    • Henrikus Herman Marie CoxHans ButlerSven Antoin Johan Hol
    • H02K41/00
    • H02P25/06
    • A lithographic apparatus includes an illumination system to condition a radiation beam. A patterning support holds a patterning device that imparts the radiation beam with a pattern to form a patterned radiation beam. A substrate support holds a substrate. A projection system projects the patterned radiation beam onto the substrate. A positioning system positions the patterning support and the substrate support. The positioning system has a motor with a stator and a mover coupled to a support, and an associated motor control system with a controller providing an output for controlling currents applied to the motor. The motor control system determines a controller output required to compensate for a weight of mover and associated support, determines a deviation of this output from an output required to compensate the gravity force acting on the mover and associated support, and corrects the currents applied to the motor based on the deviation.
    • 光刻设备包括用于调节辐射束的照明系统。 图案形成支撑件保持图案形成装置,其使得辐射束具有图案以形成图案化的辐射束。 衬底支撑件保持衬底。 投影系统将图案化的辐射束投射到衬底上。 定位系统定位图形支撑件和基板支撑件。 定位系统具有带有定子的电动机和耦合到支撑件的动子,以及具有控制器的相关联的电动机控制系统,该控制器提供用于控制施加到电动机的电流的输出。 电动机控制系统确定需要补偿动力和相关支撑的重量的控制器输出,确定该输出与补偿作用在动子和相关支撑上的重力所需的输出的偏差,并校正施加到 电机基于偏差。