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    • 1. 发明授权
    • Positive photosensitive material
    • 正感光材料
    • US09012126B2
    • 2015-04-21
    • US13524790
    • 2012-06-15
    • Weihong LiuPingHung LuChunwei ChenStephen MeyerMedhat ToukhySookMee Lai
    • Weihong LiuPingHung LuChunwei ChenStephen MeyerMedhat ToukhySookMee Lai
    • G03F7/039G03F7/004
    • G03F7/004G03F7/0392G03F7/0397
    • The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.
    • 本发明涉及一种新型的正性光敏组合物,其具有:至少一种光致酸发生剂; 至少一种酚醛清漆聚合物; 至少一种具有聚合物主链的聚合物,所述聚合物包含下式的结构:其中R 1 -R 5独立地是-H或-CH 3,A是直链或支链C 1 -C 10亚烷基,B是C1 -C 12烷基或脂环基,D是可以是化学键的连接基团,其中羰基碳键合到聚合物主链上的羧酸酯基团或-COOCH 2 - 基团,其中羰基碳键合到聚合物上 骨架,Ar是取代或未取代的芳基或杂芳基,E是直链或支链C 2 -C 10亚烷基,G是酸可裂解基团。 本发明还涉及使用该组合物形成图像的方法。