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    • 3. 发明申请
    • Optical gratings, lithography tools including such optical gratings and methods for using same for alignment
    • 光栅,包括这种光栅的光刻工具和用于对准的方法
    • US20080094629A1
    • 2008-04-24
    • US11584461
    • 2006-10-20
    • Wei WuWarren RobinettShih-Yuan WangJun GaoZhaoning Yu
    • Wei WuWarren RobinettShih-Yuan WangJun GaoZhaoning Yu
    • G01B11/00
    • G03F9/7049G03F9/7003
    • Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.
    • 通过使用与光刻工具和衬底相关的光栅产生几何干涉图案来对准平版印刷工具和衬底。 在一些实施例中,调整衬底和光刻工具之间的相对位置以使得至少一个几何形状具有表示可接受对准的预定尺寸或形状。 在另外的实施例中,使用呈现不同灵敏度的莫尔图案来对准衬底和光刻工具。 此外,光刻工具和衬底通过使辐射与位于光刻工具和衬底之间的光栅相互作用来对准。 平版印刷工具包括光栅,其被配置为产生表现出灵敏度的一部分干涉图案,该灵敏度随着工具和基板之间的相对位置朝向预定对准位置移动而增加。
    • 4. 发明授权
    • Optical gratings, lithography tools including such optical gratings and methods for using same for alignment
    • 光栅,包括这种光栅的光刻工具和用于对准的方法
    • US07612882B2
    • 2009-11-03
    • US11584461
    • 2006-10-20
    • Wei WuWarren RobinettShih-Yuan WangJun GaoZhaoning Yu
    • Wei WuWarren RobinettShih-Yuan WangJun GaoZhaoning Yu
    • G01B11/00G01B11/14
    • G03F9/7049G03F9/7003
    • Lithography tools and substrates are aligned by generating geometric interference patterns using optical gratings associated with the lithography tools and substrates. In some embodiments, the relative position between a substrate and lithography tool is adjusted to cause at least one geometric shape to have a predetermined size or shape representing acceptable alignment. In additional embodiments, Moiré patterns that exhibit varying sensitivity are used to align substrates and lithography tools. Furthermore, lithography tools and substrates are aligned by causing radiation to interact with optical gratings positioned between the lithography tools and substrates. Lithography tools include an optical grating configured to generate a portion of an interference pattern that exhibits a sensitivity that increases as the relative position between the tools and a substrate moves towards a predetermined alignment position.
    • 通过使用与光刻工具和衬底相关的光栅产生几何干涉图案来对准平版印刷工具和衬底。 在一些实施例中,调整衬底和光刻工具之间的相对位置以使得至少一个几何形状具有表示可接受对准的预定尺寸或形状。 在另外的实施例中,使用呈现不同灵敏度的莫尔图案来对准衬底和光刻工具。 此外,光刻工具和衬底通过使辐射与位于光刻工具和衬底之间的光栅相互作用来对准。 平版印刷工具包括光栅,其被配置为产生表现出灵敏度的一部分干涉图案,该灵敏度随着工具和基板之间的相对位置朝向预定对准位置移动而增加。
    • 5. 发明授权
    • Tunneling-resistor-junction-based microscale/nanoscale demultiplexer arrays
    • 基于隧道电阻器结的微米级/纳米级解复用器阵列
    • US07319416B2
    • 2008-01-15
    • US11343325
    • 2006-01-30
    • Warren RobinettGregory S. SniderDuncan StewartJoseph Straznicky
    • Warren RobinettGregory S. SniderDuncan StewartJoseph Straznicky
    • H03M7/14
    • G11C8/10G11C13/0023H03M13/51
    • Various embodiments of the present invention are directed to demultiplexers that include tunneling resistor nanowire junctions, and to nanowire addressing methods for reliably addressing nanowire signal lines in nanoscale and mixed-scale demultiplexers. In one embodiment of the present invention, an encoder-demultiplexer comprises a number of input signal lines and an encoder that generates an n-bit-constant-weight-code code-word internal address for each different input address received on the input signal lines. The encoder-demultiplexer includes n microscale signal lines on which an n-bit-constant-weight-code code-word internal address is output by the encoder, where each microscale signal line carries one bit of the n-bit-constant-weight-code code-word internal address. The encoder-demultiplexer also includes a number of encoder-demultiplexer-addressed nanowire signal lines interconnected with the n microscale signal lines via tunneling resistor junctions, the encoder-demultiplexer-addressed nanowire signal lines each associated with an n-bit-constant-weight-code code-word internal address.
    • 本发明的各种实施例涉及包括隧穿电阻器纳米线结的解复用器,以及纳米线寻址方法,用于在纳米尺度和混合尺度解复用器中可靠地寻址纳米线信号线。 在本发明的一个实施例中,编码器 - 解复用器包括多个输入信号线和一个编码器,其生成在输入信号线上接收的每个不同输入地址的n位恒权重码码字内部地址 。 编码器 - 解复用器包括n个微米级信号线,编码器输出n位恒定权重码码字内部地址,其中每个微信号线承载n位恒权重码内部地址的一位, 代码字内部地址。 编码器 - 解复用器还包括通过隧道电阻器结与n个微米级信号线互连的多个编码器 - 解复用器寻址的纳米线信号线,编码器 - 解复用器寻址的纳米线信号线每个与n比特恒权重信号线相关联, 代码字内部地址。
    • 7. 发明授权
    • Defect-and-failure-tolerant demultiplexer using series replication and error-control encoding
    • 使用序列复制和错误控制编码的缺陷和容错解复用器
    • US07872502B2
    • 2011-01-18
    • US11484961
    • 2006-07-12
    • Warren RobinettPhilip J. KuekesR. Stanley Williams
    • Warren RobinettPhilip J. KuekesR. Stanley Williams
    • H03K19/094
    • H03K19/007G06F11/1076H03K19/00315
    • One embodiment of the present invention is a method for constructing defect-and-failure-tolerant demultiplexers. This method is applicable to nanoscale, microscale, or larger-scale demultiplexer circuits. Demultiplexer circuits can be viewed as a set of AND gates, each including a reversibly switchable interconnection between a number of address lines, or address-line-derived signal lines, and an output signal line. Each reversibly switchable interconnection includes one or more reversibly switchable elements. In certain demultiplexer embodiments, NMOS and/or PMOS transistors are employed as reversibly switchable elements. In the method that represents one embodiment of the present invention, two or more serially connected transistors are employed in each reversibly switchable interconnection, so that short defects in up to one less than the number of serially interconnected transistors does not lead to failure of the reversibly switchable interconnection. In addition, error-control-encoding techniques are used to introduce additional address-line-derived signal lines and additional switchable interconnections so that the demultiplexer may function even when a number of individual, switchable interconnections are open-defective.
    • 本发明的一个实施例是一种用于构建缺陷和容错解复用器的方法。 该方法适用于纳米尺度,微米级或更大规模的解复用器电路。 解复用器电路可以被视为一组与门,每个与门包括多个地址线或地址线导出的信号线之间的可逆切换互连以及输出信号线。 每个可逆切换互连包括一个或多个可逆切换元件。 在某些解复用器实施例中,NMOS和/或PMOS晶体管被用作可逆切换元件。 在表示本发明的一个实施例的方法中,在每个可逆切换互连中使用两个或更多个串联连接的晶体管,使得比串联互连晶体管的数量少一个的短缺陷不会导致可逆地失效 可切换互连。 此外,误差控制编码技术用于引入附加的地址线导出的信号线和附加的可切换互连,使得即使当多个单独的可切换互连是开放缺陷时,解复用器也可以起作用。
    • 8. 发明申请
    • Defect-and-failure-tolerant demultiplexer using series replication and error-control encoding
    • 使用系列复制和错误控制编码的缺陷和容错解复用器
    • US20080013393A1
    • 2008-01-17
    • US11484961
    • 2006-07-12
    • Warren RobinettPhilip J. KuekesR. Stanley Williams
    • Warren RobinettPhilip J. KuekesR. Stanley Williams
    • G11C17/18
    • H03K19/007G06F11/1076H03K19/00315
    • One embodiment of the present invention is a method for constructing defect-and-failure-tolerant demultiplexers. This method is applicable to nanoscale, microscale, or larger-scale demultiplexer circuits. Demultiplexer circuits can be viewed as a set of AND gates, each including a reversibly switchable interconnection between a number of address lines, or address-line-derived signal lines, and an output signal line. Each reversibly switchable interconnection includes one or more reversibly switchable elements. In certain demultiplexer embodiments, NMOS and/or PMOS transistors are employed as reversibly switchable elements. In the method that represents one embodiment of the present invention, two or more serially connected transistors are employed in each reversibly switchable interconnection, so that short defects in up to one less than the number of serially interconnected transistors does not lead to failure of the reversibly switchable interconnection. In addition, error-control-encoding techniques are used to introduce additional address-line-derived signal lines and additional switchable interconnections so that the demultiplexer may function even when a number of individual, switchable interconnections are open-defective.
    • 本发明的一个实施例是一种用于构建缺陷和容错解复用器的方法。 该方法适用于纳米尺度,微米级或更大规模的解复用器电路。 解复用器电路可以被视为一组与门,每个与门包括多个地址线或地址线导出的信号线之间的可逆切换互连以及输出信号线。 每个可逆切换互连包括一个或多个可逆切换元件。 在某些解复用器实施例中,NMOS和/或PMOS晶体管被用作可逆切换元件。 在表示本发明的一个实施例的方法中,在每个可逆切换互连中使用两个或更多个串联连接的晶体管,使得比串联互连晶体管的数量少一个的短缺陷不会导致可逆地失效 可切换互连。 此外,误差控制编码技术用于引入附加的地址线导出的信号线和附加的可切换互连,使得即使当多个单独的可切换互连是开放缺陷时,解复用器也可以起作用。
    • 10. 发明申请
    • DEFECT-AND-FAILURE-TOLERANT DEMULTIPLEXER USING SERIES REPLICATION AND ERROR-CONTROL ENCODING
    • 使用系列复制和错误控制编码的缺陷和失败的解复用器
    • US20110057683A1
    • 2011-03-10
    • US12947585
    • 2010-11-16
    • Warren RobinettPhilip J. KuekesR. Stanley Williams
    • Warren RobinettPhilip J. KuekesR. Stanley Williams
    • H03K19/003
    • H03K19/007G06F11/1076H03K19/00315
    • One embodiment of the present invention is a method for constructing defect-and-failure-tolerant demultiplexers. This method is applicable to nanoscale, microscale, or larger-scale demultiplexer circuits. Demultiplexer circuits can be viewed as a set of AND gates, each including a reversibly switchable interconnection between a number of address lines, or address-line-derived signal lines, and an output signal line. Each reversibly switchable interconnection includes one or more reversibly switchable elements. In certain demultiplexer embodiments, NMOS and/or PMOS transistors are employed as reversibly switchable elements. In the method that represents one embodiment of the present invention, two or more serially connected transistors are employed in each reversibly switchable interconnection, so that short defects in up to one less than the number of serially interconnected transistors does not lead to failure of the reversibly switchable interconnection. In addition, error-control-encoding techniques are used to introduce additional address-line-derived signal lines and additional switchable interconnections so that the demultiplexer may function even when a number of individual, switchable interconnections are open-defective.
    • 本发明的一个实施例是一种用于构建缺陷和容错解复用器的方法。 该方法适用于纳米尺度,微米级或更大规模的解复用器电路。 解复用器电路可以被视为一组与门,每个与门包括多个地址线或地址线导出的信号线之间的可逆切换互连以及输出信号线。 每个可逆切换互连包括一个或多个可逆切换元件。 在某些解复用器实施例中,NMOS和/或PMOS晶体管被用作可逆切换元件。 在表示本发明的一个实施例的方法中,在每个可逆切换互连中使用两个或更多个串联连接的晶体管,使得比串联互连晶体管的数量少一个的短缺陷不会导致可逆地失效 可切换互连。 此外,误差控制编码技术用于引入附加的地址线导出的信号线和附加的可切换互连,使得即使当多个单独的可切换互连是开放缺陷时,解复用器也可以起作用。