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1. 发明授权

US08805054B2 Method and system of classifying defects on a wafer 有权
标题翻译：在晶片上分类缺陷的方法和系统
公开(公告)号：US08805054B2
公开(公告)日：2014-08-12
申请号：US13269038
申请日：2011-10-07
申请人： Wei Fang , Zhao-Li Zhang , Jack Jau
发明人： Wei Fang , Zhao-Li Zhang , Jack Jau
IPC分类号： G06K9/00
CPC分类号： G06T7/0008 , G06T7/001 , G06T2207/20081 , G06T2207/30148
摘要： A method of classifying the defects on a wafer having some same chips and corresponding system is provided. After receiving images formed by scanning the wafer using a charged particle beam, these images are examined such that both defective images and defect-free images are found. Then, the defect-free images are translated into a simulated layout of the chip, or a database is used to provide the simulated layout of the chip. Finally, the defects on the defective images are classified by comparing the images with the simulated layout of the chip. The system has some modules separately corresponds to the steps of the method.
摘要翻译：提供了在具有相同芯片和相应系统的晶片上分类缺陷的方法。在接收到通过使用带电粒子束扫描晶片形成的图像之后，检查这些图像，使得发现缺陷图像和无缺陷图像。然后，将无缺陷图像转换为芯片的模拟布局，或者使用数据库来提供芯片的模拟布局。最后，通过将图像与芯片的模拟布局进行比较来分类缺陷图像上的缺陷。系统有一些模块分别对应于该方法的步骤。

2. 发明授权

US08712184B1 Method and system for filtering noises in an image scanned by charged particles 有权
标题翻译：用于过滤由带电粒子扫描的图像中的噪声的方法和系统
公开(公告)号：US08712184B1
公开(公告)日：2014-04-29
申请号：US13311043
申请日：2011-12-05
申请人： Chad Liao , Futang Peng , Chuan Li , Alina Wang , Zhao-Li Zhang , Wei Fang , Jack Jau
发明人： Chad Liao , Futang Peng , Chuan Li , Alina Wang , Zhao-Li Zhang , Wei Fang , Jack Jau
IPC分类号： G06K9/40 , G06K9/00 , G01N23/00
CPC分类号： G06K9/40 , G01N23/225 , G06K9/036 , G06T5/002 , G06T7/0002 , G06T2207/20012 , G06T2207/30148 , G06T2207/30168
摘要： A method for filtering noises in an image scanned by charged particles includes steps of grouping pixels with similar types in the image into a plurality of pixel groups; and removing noises for each pixel group in the image according to a corresponding noise model to obtain the scanned image with better quality and/or contrast. A system for filtering noises in an image scanned by charged particles is also disclosed.
摘要翻译：用于对由带电粒子扫描的图像中的噪声进行滤波的方法包括将图像中具有相似类型的像素分组为多个像素组的步骤; 并且根据相应的噪声模型去除图像中的每个像素组的噪声，以获得具有更好质量和/或对比度的扫描图像。还公开了一种用于过滤由带电粒子扫描的图像中的噪声的系统。

3. 发明授权

US08606017B1 Method for inspecting localized image and system thereof 有权
标题翻译：检查本地化图像的方法及其系统
公开(公告)号：US08606017B1
公开(公告)日：2013-12-10
申请号：US13073161
申请日：2011-03-28
申请人： Wei Fang , Jack Jau , Zhao-Li Zhang
发明人： Wei Fang , Jack Jau , Zhao-Li Zhang
IPC分类号： G06K9/46 , G06K9/50
CPC分类号： G06K9/628 , G06K9/3216
摘要： A plurality of points with identical geometric feature is compared with their SEM characteristic features to inspect defect in a localized image. Original design information is included in the geometric feature such that absolute compare can be performed in this inspection method. Further, this method can also be applied to the localized image with or without repeated or redundant pattern.
摘要翻译：将具有相同几何特征的多个点与其SEM特征相比较以检查局部图像中的缺陷。原始设计信息包含在几何特征中，使得可以在该检查方法中进行绝对比较。此外，该方法也可以应用于具有或不具有重复或冗余模式的局部图像。

4. 发明授权

US08068662B2 Method and system for determining a defect during charged particle beam inspection of a sample 有权
标题翻译：用于确定样品的带电粒子束检查期间的缺陷的方法和系统
公开(公告)号：US08068662B2
公开(公告)日：2011-11-29
申请号：US12414130
申请日：2009-03-30
申请人： Zhao-Li Zhang , Wei Fang , Jack Jau
发明人： Zhao-Li Zhang , Wei Fang , Jack Jau
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G06T2207/30148
摘要： A method for determining a defect during charged particle beam inspection of a sample locates at least one examination region within a charged particle microscopic image of the sample by making reference to a database graphic of the sample corresponding to the charged particle microscopic image. Each located examination region concerns at least one element of the sample, and each element has at least one characteristic in common. At least one point response value is then generated for each point in the located examination regions. The presence of a defect at the location of the concerned point is then determined by applying at least one decision tree operator to the generated point response values of the concerned point. Applications of the proposed method as a computing agent and a charged particle beam inspection system are also disclosed.
摘要翻译：用于在样品的带电粒子束检查期间确定缺陷的方法通过参考对应于带电粒子显微镜图像的样品的数据库图形来定位样品的带电粒子微观图像内的至少一个检查区域。每个位置的检查区域涉及样品的至少一个元件，并且每个元件具有至少一个共同的特征。然后为定位的检查区域中的每个点生成至少一个点响应值。然后通过将至少一个决策树运算符应用于相关点的生成点响应值来确定在相关点的位置处的缺陷的存在。还公开了所提出的方法作为计算代理和带电粒子束检查系统的应用。

5. 发明授权

US09251581B1 Methods for promoting semiconductor manufacturing yield and classifying defects during fabricating a semiconductor device, and computer readable mediums encoded with a computer program implementing the same 有权
标题翻译：在制造半导体器件期间促进半导体制造产率和分类缺陷的方法以及用实现其的计算机程序编码的计算机可读介质
公开(公告)号：US09251581B1
公开(公告)日：2016-02-02
申请号：US13073405
申请日：2011-03-28
申请人： Shih-Tsung Chen , Wei Fang , Yu-Tsorng Fu , Futang Peng , Zhao-Li Zhang
发明人： Shih-Tsung Chen , Wei Fang , Yu-Tsorng Fu , Futang Peng , Zhao-Li Zhang
IPC分类号： G06T7/00 , G01N21/95
CPC分类号： G06T7/001 , G01N21/9501 , G06T2207/30148
摘要： A method for promoting semiconductor manufacturing yield comprising the following steps and a computer readable medium encoded with a computer program implementing the method is provided. First, a processed layer is inspected to generate an inspected image with defects thereon. Next, the inspected image is aligned to an original design layout information of the processed layer. In addition, the defects are classified according to geometric features of the original design layout information of the processed layer and at least previous one layer and/or at least next one layer.
摘要翻译：提供一种用于促进半导体制造产量的方法，包括以下步骤和用实现该方法的计算机程序编码的计算机可读介质。首先，检查处理层以产生其上具有缺陷的检查图像。接下来，被检查图像与处理层的原始设计布局信息对齐。另外，根据处理层的原始设计布局信息和至少前一个层和/或至少下一个层的几何特征对缺陷进行分类。

6. 发明授权

US08937281B2 Method for examining a sample by using a charged particle beam 有权
标题翻译：通过使用带电粒子束来检查样品的方法
公开(公告)号：US08937281B2
公开(公告)日：2015-01-20
申请号：US13541618
申请日：2012-07-03
申请人： Yan Zhao , Jack Jau , Wei Fang
发明人： Yan Zhao , Jack Jau , Wei Fang
IPC分类号： H01J37/26 , H01J37/28
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A method for examining a sample with a scanning charged particle beam imaging apparatus. First, an image area and a scan area are specified on a surface of the sample. Herein, the image area is entirely overlapped within the scan area. Next, the scan area is scanned by using a charged particle beam along a direction neither parallel nor perpendicular to an orientation of the scan area. It is possible that only a portion of the scan area overlapped with the image area is exposed to the charged particle beam. It also is possible that both the shape and the size of the image area are essentially similar with that of the scan area, such that the size of the area projected by the charged particle beam is almost equal to the size of the image area.
摘要翻译：一种用扫描带电粒子束成像装置检查样品的方法。首先，在样品的表面上指定图像区域和扫描区域。这里，图像区域在扫描区域内完全重叠。接下来，通过使用带电粒子束沿着既不平行也不垂直于扫描区域的取向的方向来扫描扫描区域。可能的是，与图像区域重叠的扫描区域的仅一部分暴露于带电粒子束。图像区域的形状和尺寸也可能与扫描区域的形状和尺寸基本相同，使得由带电粒子束投射的区域的尺寸几乎等于图像区域的尺寸。

7. 发明授权

US08884224B2 Charged particle beam imaging assembly and imaging method thereof 有权
标题翻译：带电粒子束成像组件及其成像方法
公开(公告)号：US08884224B2
公开(公告)日：2014-11-11
申请号：US12420200
申请日：2009-04-08
申请人： Wei Fang , Jack Jau , Yan Zhao
发明人： Wei Fang , Jack Jau , Yan Zhao
IPC分类号： H01J37/28 , H01J37/30 , H01J37/02
CPC分类号： H01J37/28 , H01J37/026 , H01J2237/004 , H01J2237/0044 , H01J2237/0048
摘要： A method for enhancing the quality of a charged particle microscopic image of a sample is disclosed. The image is formed by a charged particle beam imaging system. The method comprising: scanning, using a first scanning beam, a surface of the sample in at least one first scan line; and scanning, using a second scanning beam, the sample surface in at least one second scan line, wherein said second scanning beam is scanned across said sample surface during a time interval between the end of said first scan lines and the beginning of the next said first scan lines. Application of the proposed method as a charged particle beam imaging system is also disclosed.
摘要翻译：公开了一种提高样品带电粒子显微镜图像质量的方法。该图像由带电粒子束成像系统形成。该方法包括：使用第一扫描光束在至少一个第一扫描线中扫描样品的表面; 以及使用第二扫描光束扫描至少一个第二扫描线中的样品表面，其中所述第二扫描光束在所述第一扫描线的末端与所述第一扫描线的开始之间的时间间隔期间跨越所述样品表面扫描第一条扫描线。还公开了所提出的方法作为带电粒子束成像系统的应用。

8. 发明申请

US20100278416A1 Method for Inspecting Overlay Shift Defect during Semiconductor Manufacturing and Apparatus Thereof 有权
标题翻译：半导体制造过程中检查覆盖偏移缺陷的方法及其设备
公开(公告)号：US20100278416A1
公开(公告)日：2010-11-04
申请号：US12433762
申请日：2009-04-30
申请人： Hong Xiao , Wei Fang , Jack Jau
发明人： Hong Xiao , Wei Fang , Jack Jau
IPC分类号： G06K9/00 , G01N23/00
CPC分类号： H01L21/67242 , G03F7/70633
摘要： A method of inspecting for overlay shift defects during semiconductor manufacturing is disclosed. The method can include the steps of providing a charged particle microscopic image of a sample, identifying an inspection pattern period in the charged particle microscopic image, averaging the charged particle microscopic image by using the inspection pattern period to form an averaged inspection pattern period, estimating an average width from the averaged inspection pattern period, and comparing the average width with a predefined threshold value to determine the presence of an overlay shift defect.
摘要翻译：公开了一种在半导体制造期间检查覆盖偏移缺陷的方法。该方法可以包括以下步骤：提供样品的带电粒子显微镜图像，识别带电粒子显微镜图像中的检查图案周期，通过使用检查图案周期平均化带电粒子显微镜图像以形成平均检查图案周期，估计从平均检查图案周期的平均宽度，以及将平均宽度与预定义的阈值进行比较，以确定覆盖位移缺陷的存在。

9. 发明授权

US08094924B2 E-beam defect review system 有权
标题翻译：电子束缺陷检查系统
公开(公告)号：US08094924B2
公开(公告)日：2012-01-10
申请号：US12335458
申请日：2008-12-15
申请人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
发明人： Jack Jau , Zhongwei Chen , Yi Xiang Wang , Chung-Shih Pan , Joe Wang , Xuedong Liu , Weiming Ren , Wei Fang
IPC分类号： G06K9/00
CPC分类号： G06T7/001 , G01N23/04 , G01N2223/102 , G01N2223/426 , G01N2223/611 , G06T2207/10061 , G06T2207/30148
摘要： An apparatus comprises an imaging unit to image a wafer to be reviewed, wherein imaging unit is the modified SORIL column. The modified SORIL column includes a focusing sub-system to do micro-focusing due to a wafer surface topology, wherein the focusing sub-system verifies the position of a grating image reflecting from the wafer surface to adjust the focus; and a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under a flood gun beam rather than under a primary beam. The modified SORIL column further includes a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage unit are linked by high speed network.
摘要翻译：一种装置包括成像单元以对待审查的晶片进行成像，其中成像单元是经修改的SORIL柱。改进的SORIL柱包括由于晶片表面拓扑而进行微聚焦的聚焦子系统，其中聚焦子系统验证从晶片表面反射的光栅图像的位置以调整焦点; 以及表面电荷控制，用于调节在复查过程期间由于电子辐射引起的电荷累积，其中气体分子在洪水枪光束下而不是在主光束下方注入。改进的SORIL列还包括用于存储晶片设计数据库的存储单元; 以及用于管理缺陷定位，缺陷采样和缺陷分类的主计算机，其中主计算机和存储单元通过高速网络链接。

10. 发明申请

US20120273678A1 METHOD FOR EXAMINING A SAMPLE BY USING A CHARGED PARTICLE BEAM 审中-公开
标题翻译：通过使用充电颗粒束来检验样品的方法
公开(公告)号：US20120273678A1
公开(公告)日：2012-11-01
申请号：US13541618
申请日：2012-07-03
申请人： Yan Zhao , Jack Jau , Wei Fang
发明人： Yan Zhao , Jack Jau , Wei Fang
IPC分类号： G01N23/04
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A method for examining a sample with a scanning charged particle beam imaging apparatus. First, an image area and a scan area are specified on a surface of the sample. Herein, the image area is entirely overlapped within the scan area. Next, the scan area is scanned by using a charged particle beam along a direction neither parallel nor perpendicular to an orientation of the scan area. It is possible that only a portion of the scan area overlapped with the image area is exposed to the charged particle beam. It also is possible that both the shape and the size of the image area are essentially similar with that of the scan area, such that the size of the area projected by the charged particle beam is almost equal to the size of the image area.
摘要翻译：一种用扫描带电粒子束成像装置检查样品的方法。首先，在样品的表面上指定图像区域和扫描区域。这里，图像区域在扫描区域内完全重叠。接下来，通过使用带电粒子束沿着既不平行也不垂直于扫描区域的取向的方向来扫描扫描区域。可能的是，与图像区域重叠的扫描区域的仅一部分暴露于带电粒子束。图像区域的形状和尺寸也可能与扫描区域的形状和尺寸基本相同，使得由带电粒子束投射的区域的尺寸几乎等于图像区域的尺寸。

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