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1. 发明申请

US20100308399A1 POWER SEMICONDUCTOR DEVICE 有权
标题翻译：功率半导体器件
公开(公告)号：US20100308399A1
公开(公告)日：2010-12-09
申请号：US12728823
申请日：2010-03-22
申请人： Wataru SAITO , Syotaro ONO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
发明人： Wataru SAITO , Syotaro ONO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
IPC分类号： H01L29/78
CPC分类号： H01L29/7802 , H01L29/0619 , H01L29/0626 , H01L29/0634 , H01L29/0657 , H01L29/0696 , H01L29/0878 , H01L29/1095 , H01L29/4236 , H01L29/42368 , H01L29/4238 , H01L29/7808 , H01L29/7811 , H01L29/7828
摘要： A power semiconductor device includes: a first semiconductor layer of the first conduction type; second semiconductor layers of the first conduction type and third semiconductor layers of the second conduction type alternately provided transversely on the first semiconductor layer; fourth semiconductor layers of the second conduction type provided on the surfaces of the third semiconductor layers; fifth semiconductor layers of the first conduction type provided selectively on the surfaces of the fourth semiconductor layer; sixth semiconductor layers of the second conduction type and seventh semiconductor layers of the first conduction type alternately provided transversely on the second and the third semiconductor layers; a first main electrode electrically connected to the first semiconductor layer; an insulation film provided on the fourth semiconductor layers, the sixth semiconductor layers and the seventh semiconductor layers; a control electrode provided on the fourth semiconductor layers, the sixth semiconductor layers and the seventh semiconductor layers via the insulation film; and a second main electrode joined to the surfaces of the fourth semiconductor layers and the fifth semiconductor layers, the sixth semiconductor layers being connected to the fourth semiconductor layers and to at least one of the third semiconductor layers, which is provided between two of the fourth semiconductor layers, and an impurity concentration of the third semiconductor layers provided below the sixth semiconductor layers being higher than an impurity concentration of the third semiconductor layers provided under the fourth semiconductor layers.
摘要翻译：功率半导体器件包括：第一导电类型的第一半导体层; 第一导电类型的第二半导体层和第二导电类型的第三半导体层交替地设置在第一半导体层上; 设置在第三半导体层的表面上的第二导电类型的第四半导体层; 选择性地在第四半导体层的表面上提供第一导电类型的第五半导体层; 第二导电类型的第六半导体层和第一导电类型的第七半导体层交替地设置在第二和第三半导体层上; 电连接到第一半导体层的第一主电极; 设置在第四半导体层，第六半导体层和第七半导体层上的绝缘膜; 设置在第四半导体层上的控制电极，第六半导体层和第七半导体层经由绝缘膜; 以及与所述第四半导体层和所述第五半导体层的表面接合的第二主电极，所述第六半导体层与所述第四半导体层连接，并且至少一个所述第三半导体层设置在所述第四半导体层并且设置在第六半导体层下方的第三半导体层的杂质浓度高于设置在第四半导体层下方的第三半导体层的杂质浓度。

2. 发明申请

US20100264489A1 SEMICONDUCTOR DEVICE 审中-公开
标题翻译：半导体器件
公开(公告)号：US20100264489A1
公开(公告)日：2010-10-21
申请号：US12719475
申请日：2010-03-08
申请人： Hiroshi OHTA , Wataru SAITO , Syotaro ONO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
发明人： Hiroshi OHTA , Wataru SAITO , Syotaro ONO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
IPC分类号： H01L27/06 , H01L29/78
CPC分类号： H01L29/7811 , H01L29/0634 , H01L29/0696 , H01L29/1095 , H01L29/402 , H01L29/7395 , H01L29/7813
摘要： A transistor contains a first semiconductor layer of a first conductivity type and a drift layer having a pillar structure in which a second semiconductor layer of the first conductivity type and a third semiconductor layer of a second conductivity type are alternately disposed in a direction parallel to a surface of the first semiconductor layer. The fourth semiconductor layer of the first conductivity type and the fifth semiconductor layer of the second conductivity type are alternately disposed and parallel to the drift layer. The fifth semiconductor layer has a larger amount of impurities than the fourth semiconductor layer. The sixth semiconductor layer of the first conductivity type and the seventh semiconductor layer of the second conductivity type are alternately disposed and parallel to the fourth and the fifth semiconductor layers. The seventh semiconductor layer has a smaller amount of impurities than the sixth semiconductor layer.
摘要翻译：晶体管包含第一导电类型的第一半导体层和具有柱结构的漂移层，其中第一导电类型的第二半导体层和第二导电类型的第三半导体层在平行于第一半导体层的表面。第一导电类型的第四半导体层和第二导电类型的第五半导体层交替地设置并平行于漂移层。第五半导体层的杂质量比第四半导体层大。第一导电类型的第六半导体层和第二导电类型的第七半导体层交替地设置并平行于第四和第五半导体层。第七半导体层的杂质量比第六半导体层少。

3. 发明申请

US20110018055A1 POWER SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SAME 失效
标题翻译：功率半导体器件及其制造方法
公开(公告)号：US20110018055A1
公开(公告)日：2011-01-27
申请号：US12840201
申请日：2010-07-20
申请人： Hiroshi OHTA , Yasuto SUMI , Kiyoshi KIMURA , Wataru SEKINE , Wataru SAITO , Syotaro ONO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
发明人： Hiroshi OHTA , Yasuto SUMI , Kiyoshi KIMURA , Wataru SEKINE , Wataru SAITO , Syotaro ONO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
IPC分类号： H01L29/78 , H01L21/336
CPC分类号： H01L29/66712 , H01L29/0619 , H01L29/0634 , H01L29/0638 , H01L29/0696 , H01L29/1095 , H01L29/402 , H01L29/7811
摘要： According to one embodiment, a power semiconductor device includes a first semiconductor layer, and first, second and third semiconductor regions. The first semiconductor layer has a first conductivity type. The first semiconductor regions have a second conductivity type, and are formed with periodicity in a lateral direction in a second semiconductor layer of the first conductivity type. The second semiconductor layer is provided on a major surface of the first semiconductor layer in a device portion with a main current path formed in a vertical direction generally perpendicular to the major surface and in a terminal portion provided around the device portion. The second semiconductor region has the first conductivity type and is a portion of the second semiconductor layer sandwiched between adjacent ones of the first semiconductor regions. The third semiconductor regions have the second conductivity type and are provided below the first semiconductor regions in the terminal portion.
摘要翻译：根据一个实施例，功率半导体器件包括第一半导体层以及第一，第二和第三半导体区域。第一半导体层具有第一导电类型。第一半导体区域具有第二导电类型，并且在第一导电类型的第二半导体层中在横向方向上形成周期性。第二半导体层设置在器件部分的第一半导体层的主表面上，其主电流通道形成在大体上垂直于主表面的垂直方向上，以及设置在器件部分周围的端子部分中。第二半导体区域具有第一导电类型，并且是夹在相邻的第一半导体区域中的第二半导体层的一部分。第三半导体区域具有第二导电类型并且设置在端子部分中的第一半导体区域的下方。

4. 发明申请

US20110049615A1 POWER SEMICONDUCTOR DEVICE 失效
标题翻译：功率半导体器件
公开(公告)号：US20110049615A1
公开(公告)日：2011-03-03
申请号：US12862490
申请日：2010-08-24
申请人： Wataru SAITO , Syotaro ONO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
发明人： Wataru SAITO , Syotaro ONO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
IPC分类号： H01L29/78
CPC分类号： H01L29/7802 , H01L29/0634 , H01L29/0649 , H01L29/0653 , H01L29/0873 , H01L29/0878 , H01L29/1095 , H01L29/7843
摘要： According to one embodiment, a power semiconductor device includes a second semiconductor layer of a first conductivity type and a third semiconductor layer of a second conductivity type periodically disposed repeatedly along a surface of the first semiconductor layer on a first semiconductor layer of the first conductivity type. A first main electrode is provided to electrically connect to the first semiconductor layer. A fourth semiconductor layer of the second conductivity type is provided to connect to the third semiconductor layer. Fifth semiconductor layers of the first conductivity type are selectively provided in the fourth semiconductor layer surface. A second main electrode is provided on a surface of the fourth and fifth semiconductor layers. A control electrode is provided on a surface of the fourth, fifth, and second semiconductor layers via a gate insulating film. First insulating films are provided by filling a trench made in the second semiconductor layer.
摘要翻译：根据一个实施例，功率半导体器件包括第一导电类型的第二半导体层和在第一导电类型的第一半导体层上沿着第一半导体层的表面周期性地重复设置的第二导电类型的第三半导体层。提供第一主电极以电连接到第一半导体层。提供第二导电类型的第四半导体层以连接到第三半导体层。在第四半导体层表面中选择性地设置第一导电类型的第五半导体层。第二主电极设置在第四和第五半导体层的表面上。控制电极经由栅极绝缘膜设置在第四，第五和第二半导体层的表面上。通过填充在第二半导体层中制成的沟槽来提供第一绝缘膜。

5. 发明申请

US20110006364A1 SEMICONDUCTOR DEVICE 审中-公开
标题翻译：半导体器件
公开(公告)号：US20110006364A1
公开(公告)日：2011-01-13
申请号：US12831981
申请日：2010-07-07
申请人： Syotaro ONO , Wataru SAITO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
发明人： Syotaro ONO , Wataru SAITO , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
IPC分类号： H01L29/78
CPC分类号： H01L29/7813 , H01L29/0634 , H01L29/0638 , H01L29/0657 , H01L29/0661 , H01L29/0696 , H01L29/1095 , H01L29/402 , H01L29/404 , H01L29/407 , H01L29/41741 , H01L29/66734 , H01L29/7811
摘要： According to one embodiment, a semiconductor device includes a first-conductivity-type semiconductor layer, a first and second-conductivity-type semiconductor pillar regions, a second and first-conductivity-type semiconductor regions, a first and second main electrodes, and a control electrode. Each of the first and second-conductivity-type pillar regions extends in a first direction and is alternately provided along a second direction generally perpendicular to the first direction. The second-conductivity-type semiconductor region is provided in a cell region and connected to the second-conductivity-type semiconductor pillar region. The first-conductivity-type semiconductor region is selectively provided in a surface of the second-conductivity-type semiconductor region. The first main electrode is connected to the first-conductivity-type semiconductor layer. The second main electrode is connected to the first and second-conductivity-type semiconductor region. The control electrode is configured to control a current path between the first-conductivity-type semiconductor region and the first-conductivity-type semiconductor pillar region.
摘要翻译：根据一个实施例，半导体器件包括第一导电型半导体层，第一和第二导电型半导体柱区域，第二和第一导电型半导体区域，第一和第二主电极以及控制电极。第一和第二导电型柱状区域中的每一个在第一方向上延伸，并且沿着大致垂直于第一方向的第二方向交替地设置。第二导电型半导体区域设置在单元区域中并连接到第二导电型半导体柱区域。第一导电型半导体区域选择性地设置在第二导电型半导体区域的表面中。第一主电极与第一导电型半导体层连接。第二主电极连接到第一和第二导电型半导体区域。控制电极被配置为控制第一导电型半导体区域和第一导电型半导体柱区域之间的电流路径。

6. 发明申请

US20100230745A1 POWER SEMICONDUCTOR DEVICE 有权
标题翻译：功率半导体器件
公开(公告)号：US20100230745A1
公开(公告)日：2010-09-16
申请号：US12714002
申请日：2010-02-26
申请人： Wataru SAITO , Syotaro ONO , Hiroshi OHTA , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
发明人： Wataru SAITO , Syotaro ONO , Hiroshi OHTA , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
IPC分类号： H01L29/78 , H01L29/06
CPC分类号： H01L29/7811 , H01L29/0619 , H01L29/0634 , H01L29/0638 , H01L29/0649 , H01L29/0653 , H01L29/0661 , H01L29/0692 , H01L29/0696 , H01L29/407 , H01L29/7395 , H01L29/861 , H01L29/8611
摘要： A power semiconductor device according to an embodiment of the present invention includes a first semiconductor layer of a first or second conductivity type, a second semiconductor layer of the first conductivity type formed on the first semiconductor layer, a third semiconductor layer of the second conductivity type selectively formed on a surface of the second semiconductor layer, at least one trench formed in a periphery of the third semiconductor layer on the surface of the second semiconductor layer, a depth of a bottom surface of the at least one trench being deeper than a bottom surface of the third semiconductor layer, and shallower than a top surface of the first semiconductor layer, and some or all of the at least one trench being in contact with a side surface of the third semiconductor layer, at least one insulator buried in the at least one trench, a first main electrode electrically connected to the first semiconductor layer, and a second main electrode electrically connected to the third semiconductor layer.
摘要翻译：根据本发明实施例的功率半导体器件包括第一或第二导电类型的第一半导体层，形成在第一半导体层上的第一导电类型的第二半导体层，第二导电类型的第三半导体层选择性地形成在第二半导体层的表面上，形成在第二半导体层的表面上的第三半导体层的周边中的至少一个沟槽，至少一个沟槽的底表面的深度比底部表面，并且比第一半导体层的顶表面浅，并且至少一个沟槽的一些或全部与第三半导体层的侧表面接触，至少一个绝缘体埋在第三半导体层至少一个沟槽，与第一半导体层电连接的第一主电极和电连接的第二主电极引导到第三半导体层。

7. 发明申请

US20100102381A1 POWER SEMICONDUCTOR DEVICE 审中-公开
标题翻译：功率半导体器件
公开(公告)号：US20100102381A1
公开(公告)日：2010-04-29
申请号：US12553592
申请日：2009-09-03
申请人： Wataru SAITO , Syotaro ONO , Hiroshi OHTA , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
发明人： Wataru SAITO , Syotaro ONO , Hiroshi OHTA , Munehisa YABUZAKI , Nana HATANO , Miho WATANABE
IPC分类号： H01L29/78
CPC分类号： H01L29/7802 , H01L29/0634 , H01L29/0696 , H01L29/1095 , H01L29/4238 , H01L29/7813
摘要： A power semiconductor device according to an embodiment of the present invention includes a first semiconductor layer of a first conductivity type, second semiconductor layers of the first conductivity type and third semiconductor layers of a second conductivity type, which are formed on the first semiconductor layer, have stripe shapes extending in a first horizontal direction, and are alternately arranged along a second horizontal direction orthogonal to the first horizontal direction, a fourth semiconductor layer of the second conductivity type, selectively formed on a surface of one of the third semiconductor layers, a fifth semiconductor layer of the first conductivity type, selectively formed on a surface of the fourth semiconductor layer, and formed into a stripe shape extending in the first horizontal direction without being formed into a stripe shape extending in the second horizontal direction, and a control electrode formed on the second, third, fourth, and fifth semiconductor layers via an insulating layer, and having a plane pattern periodical in the first horizontal direction and the second horizontal direction.
摘要翻译：根据本发明实施例的功率半导体器件包括形成在第一半导体层上的第一导电类型的第一半导体层，第一导电类型的第二半导体层和第二导电类型的第三半导体层，具有沿第一水平方向延伸的条纹形状，并且沿着与第一水平方向正交的第二水平方向交替排列，第二导电类型的第四半导体层选择性地形成在第三半导体层之一的表面上，第一导电类型的第五半导体层，选择性地形成在第四半导体层的表面上，并且形成为在第一水平方向上延伸的条形，而不形成在第二水平方向上延伸的条形，以及控制电极形成在第二，第三，第四和第五半导电体上或层，并且具有在第一水平方向和第二水平方向上周期性的平面图案。

8. 发明申请

US20110227154A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME 审中-公开
标题翻译：半导体器件及其制造方法
公开(公告)号：US20110227154A1
公开(公告)日：2011-09-22
申请号：US13052032
申请日：2011-03-18
申请人： Syotaro ONO , Wataru Saito , Munehisa Yabuzaki , Shunji Taniuchi , Miho Watanabe
发明人： Syotaro ONO , Wataru Saito , Munehisa Yabuzaki , Shunji Taniuchi , Miho Watanabe
IPC分类号： H01L29/78 , H01L21/336
CPC分类号： H01L29/7802 , H01L29/0634 , H01L29/0878 , H01L29/1095 , H01L29/66712
摘要： A semiconductor device comprising: a first semiconductor layer of a first conductivity type; a second semiconductor layer of the first conductivity type formed on the first semiconductor layer; a first buried layer of the first conductivity type selectively formed in the second semiconductor layer and having a first peak impurity concentration at a first depth; a second buried layer of a second conductivity type selectively formed in the second semiconductor layer and having a second peak impurity concentration at a second depth; a base layer of the second conductivity type selectively formed in the second semiconductor layer and overlapping with an upper portion of the second buried layer; a source layer of the first conductivity type selectively formed in the base layer; and a gate electrode formed on the base layer and on the second semiconductor layer above the first buried layer with a gate insulating film being interposed therebetween.
摘要翻译：一种半导体器件，包括：第一导电类型的第一半导体层; 形成在第一半导体层上的第一导电类型的第二半导体层; 第一导电类型的第一掩埋层选择性地形成在第二半导体层中，并且在第一深度处具有第一峰值杂质浓度; 第二导电类型的第二掩埋层选择性地形成在第二半导体层中，并且在第二深度具有第二峰值杂质浓度; 第二导电类型的基极层选择性地形成在第二半导体层中并与第二掩埋层的上部重叠; 选择性地形成在所述基底层中的所述第一导电类型的源极层; 以及形成在所述第一掩埋层上的所述基极层和所述第二半导体层上的栅电极，其间插入有栅极绝缘膜。

9. 发明申请

US20100038712A1 POWER SEMICONDUCTOR DEVICE 失效
标题翻译：功率半导体器件
公开(公告)号：US20100038712A1
公开(公告)日：2010-02-18
申请号：US12540192
申请日：2009-08-12
申请人： Miho WATANABE , Masaru IZUMISAWA , Yasuto SUMI , Hiroshi OHTA , Wataru SEKINE , Wataru SAITO , Syotaro ONO , Nana HATANO
发明人： Miho WATANABE , Masaru IZUMISAWA , Yasuto SUMI , Hiroshi OHTA , Wataru SEKINE , Wataru SAITO , Syotaro ONO , Nana HATANO
IPC分类号： H01L29/78
CPC分类号： H01L29/7811 , H01L29/0634 , H01L29/1095 , H01L29/7802
摘要： A semiconductor device according to an embodiment of the present invention includes a device part and a terminal part. The device includes a first semiconductor layer, and second and third semiconductor layers formed on the first semiconductor layer, and alternately arranged along a direction parallel to a surface of the first semiconductor layer, wherein the device part is provided with a first region and a second region, each of which includes at least one of the second semiconductor layers and at least one of the third semiconductor layers, and with regard to a difference value ΔN (=NA−NB) obtained by subtracting an impurity amount NB per unit length of each of the third semiconductor layers from an impurity amount NA per unit length of each of the second semiconductor layers, a difference value ΔNC1 which is the difference value ΔN in the first region of the device part, a difference value ΔNC2 which is the difference value ΔN in the second region of the device part, and a difference value ΔNT which is the difference value ΔN in the terminal part satisfy a relationship of ΔNC1>ΔNT>ΔNC2.
摘要翻译：根据本发明实施例的半导体器件包括器件部分和端子部分。该器件包括第一半导体层，以及形成在第一半导体层上的第二和第三半导体层，并且沿着与第一半导体层的表面平行的方向交替布置，其中器件部分设置有第一区域和第二半导体层区域，其中每一个包括第二半导体层和至少一个第三半导体层中的至少一个，并且关于通过从每单位长度减去杂质量NB获得的差值Dgr; N（= NA-NB）从每个第二半导体层的每单位长度的杂质量NA中的每个第三半导体层的差分值＆Dgr; NC1，其是器件部分的第一区域中的差值＆Dgr; N，差值＆Dgr ;作为装置部分的第二区域中的差值Dgr; N的NC2，作为终端部分中的差值Dgr; N的差值＆Dgr; NT满足关系的＆Dgr; NC1>＆Dgr; NT>＆Dgr; NC2。

10. 发明申请

US20090273031A1 SEMICONDUCTOR DEVICE 审中-公开
标题翻译：半导体器件
公开(公告)号：US20090273031A1
公开(公告)日：2009-11-05
申请号：US12408415
申请日：2009-03-20
申请人： Wataru SAITO , Syotaro ONO , Nana HATANO , Masakatsu TAKASHITA , Hiroshi OHTA , Miho WATANABE
发明人： Wataru SAITO , Syotaro ONO , Nana HATANO , Masakatsu TAKASHITA , Hiroshi OHTA , Miho WATANABE
IPC分类号： H01L29/78
CPC分类号： H01L29/7802 , H01L29/0634 , H01L29/0878 , H01L29/1095
摘要： A semiconductor device includes: a first semiconductor layer of a first conductivity type; a second semiconductor layer of the first conductivity type provided on a major surface of the first semiconductor layer; a third semiconductor layer of a second conductivity type provided on the major surface of the first semiconductor layer, the third semiconductor layer forming a structure of periodical arrangement with the second semiconductor layer; a fourth semiconductor layer of the second conductivity type provided above the third semiconductor layer; a fifth semiconductor layer of the first conductivity type selectively provided on a surface of the fourth semiconductor layer; a first main electrode electrically connected to the first semiconductor layer; a second main electrode provided to contact a surface of the fifth semiconductor layer and a surface of the fourth semiconductor layer; and a control electrode provided above the fifth semiconductor layer, the fourth semiconductor layer, and the second semiconductor layer via an insulative film. A portion is provided locally in the third semiconductor layer, the portion depleting at a voltage not more than one third of a voltage at which the second semiconductor layer and the third semiconductor layer completely deplete.
摘要翻译：半导体器件包括：第一导电类型的第一半导体层; 设置在第一半导体层的主表面上的第一导电类型的第二半导体层; 设置在所述第一半导体层的主表面上的第二导电类型的第三半导体层，所述第三半导体层形成与所述第二半导体层的周期性布置的结构; 设置在第三半导体层上方的第二导电类型的第四半导体层; 选择性地设置在第四半导体层的表面上的第一导电类型的第五半导体层; 电连接到第一半导体层的第一主电极; 设置成与所述第五半导体层的表面和所述第四半导体层的表面接触的第二主电极; 以及通过绝缘膜设置在第五半导体层，第四半导体层和第二半导体层上方的控制电极。局部地设置在第三半导体层中的部分，其耗尽不超过第二半导体层和第三半导体层完全耗尽的电压的三分之一的电压。

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