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    • 10. 发明授权
    • Use of photosensitive compositions of matter for electroless deposition
of metals
    • 使用光敏组合物进行无电沉积金属
    • US4560643A
    • 1985-12-24
    • US551777
    • 1983-11-14
    • Jurgen FinterWalter Fischer
    • Jurgen FinterWalter Fischer
    • C23C18/18C08G85/00G03C5/58H05K3/18G03C5/00G03C5/24
    • C08G85/004G03C5/58H05K3/185
    • The use of photosensitive compositions of matter for electroless deposition of metals, containing(a) 0.1 to 20 percent by weight of a compound of the formula I ##STR1## in which Y and R.sub.1 to R.sub.6 are as defined in patent claim 1, (b) 70 to 99.8% by weight of a polymer with H donor groups and an average molecular weight of at least 2,000 Daltons, or of a polymer mixture of a polymer component with H donor groups and an average molecular weight of at least 2,000 Daltons and a second polymer component with an average molecular weight of at least 3,000 Daltons, and(c) 0.1 to 10% by weight of one or more salts of a metal of group Ib or VIII of the periodic table.Images, in particular electrically conductive coatings or patterns, can be produced with the above compositions of matter by exposing the compositions of matter to light and then depositing a metal on the zero-valent, non-conductive metal nuclei thereby formed.
    • 含有(a)0.1-20重量%的式I化合物(I)的物质的光敏组合物用于无电沉积金属,其中Y和R 1至R 6如专利权利要求1中所定义 ,(b)70至99.8重量%的具有H供体基团和平均分子量至少2,000道尔顿的聚合物,或聚合物组分与H供体基团的聚合物混合物,平均分子量为至少2,000 道尔顿和平均分子量为至少3,000道尔顿的第二聚合物组分,和(c)0.1-10重量%的周期表第Ib或VIII族金属的一种或多种盐。 通过将物质组合物暴露于光下,然后在由此形成的零价非导电金属核上沉积金属,可以用上述物质组成制备图像,特别是导电涂层或图案。