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1. 发明申请

US20100205127A1 METHOD FOR PLANNING A SEMICONDUCTOR MANUFACTURING PROCESS BASED ON USERS' DEMANDS 有权
标题翻译：基于用户需求制定半导体制造工艺的方法
公开(公告)号：US20100205127A1
公开(公告)日：2010-08-12
申请号：US12471711
申请日：2009-05-26
申请人： WEI JUN CHEN , CHUN CHI CHEN , YUN-ZONG TIAN , YI FENG LEE , TSUNG-WEI LIN
发明人： WEI JUN CHEN , CHUN CHI CHEN , YUN-ZONG TIAN , YI FENG LEE , TSUNG-WEI LIN
IPC分类号： G06N3/12 , G06N7/02 , G06F19/00
CPC分类号： G06N3/126 , G06N7/02
摘要： A method for planning a semiconductor manufacturing process based on users' demands includes the steps of: establishing a genetic algorithm model and inputting data; establishing a fuzzy system and setting one output parameter representing percent difference of each cost function in neighbor generations; setting to have a modulation parameter corresponding to each input parameter for adjusting fuzzy sets of the output parameter; executing genetic algorithm actions; executing fuzzy inference actions; eliminating chromosomes that produce output parameter smaller than a defined lower limit, and the remaining chromosomes that produces the largest output parameter is defined as the optimum chromosome, wherein the genetic algorithm actions stops being executed upon the optimum chromosome; then determining whether or not a defined number of generations has been reached, if yes, executing the optimum chromosome of the last generation; if no, continuing executing the genetic algorithm actions, thereby finding the optimum semiconductor manufacturing process for users.
摘要翻译：一种基于用户需求的半导体制造过程规划方法，包括以下步骤：建立遗传算法模型并输入数据; 建立一个模糊系统，并设置一个输出参数，代表相邻代的每个成本函数的百分比差; 设置为具有对应于每个输入参数的调制参数，用于调整输出参数的模糊集合; 执行遗传算法动作; 执行模糊推理动作; 消除产生小于规定下限的输出参数的染色体，将产生最大输出参数的剩余染色体定义为最佳染色体，其中遗传算法动作停止在最佳染色体上执行; 然后确定是否已经达到定义数量的世代，如果是，则执行最后一代的最佳染色体; 如果否，继续执行遗传算法动作，从而为用户找到最佳的半导体制造过程。

2. 发明申请

US20100233830A1 METHOD FOR MONITORING FABRICATION PARAMETER 有权
标题翻译：监测制造参数的方法
公开(公告)号：US20100233830A1
公开(公告)日：2010-09-16
申请号：US12469051
申请日：2009-05-20
申请人： YI FENG LEE , CHUN CHI CHEN , YUN-ZONG TIAN , WEI JUN CHEN
发明人： YI FENG LEE , CHUN CHI CHEN , YUN-ZONG TIAN , WEI JUN CHEN
IPC分类号： H01L21/66
CPC分类号： G05B19/41875 , G05B2219/31483 , G05B2219/32191 , G05B2219/45031 , H01L22/20 , Y02P90/22
摘要： A method for monitoring fabrication parameters comprises steps of: obtaining a normal parameter variance curve and a comparing parameter variance curve; defining a plurality of normal parameter points on the normal parameter variance curve; defining a plurality of comparing parameter points on the comparing parameter variance curve; finding out the corresponding comparing parameter points nearest to the normal parameter points; calculating the distances between the normal parameter points and the corresponding comparing parameter points thereof; summing up the distances so as to receive a total distance; and determining whether or not the total distance exceeds a limit. Via this arrangement, when fabrication parameter of tool is abnormal, it can be efficiently and immediately determined.
摘要翻译：一种用于监测制造参数的方法包括以下步骤：获得正常参数方差曲线和比较参数方差曲线; 在正常参数方差曲线上定义多个正常参数点; 在比较参数方差曲线上定义多个比较参数点; 找出最接近正常参数点的相应比较参数点; 计算正常参数点与其对应的比较参数点之间的距离; 总结距离，以获得总距离; 并确定总距离是否超过限制。通过这种布置，当工具的制造参数异常时，可以有效且立即确定。

3. 发明申请

US20100256792A1 METHOD OF ADJUSTING WAFER PROCESSING SEQUENCE 有权
标题翻译：调整加工顺序的方法
公开(公告)号：US20100256792A1
公开(公告)日：2010-10-07
申请号：US12476559
申请日：2009-06-02
申请人： YUN-ZONG TIAN , CHUN CHI CHEN , YI FENG LEE , WEI JUN CHEN , SHIH CHANG KAO , YIJ CHIEH CHU , CHENG-HAO CHEN
发明人： YUN-ZONG TIAN , CHUN CHI CHEN , YI FENG LEE , WEI JUN CHEN , SHIH CHANG KAO , YIJ CHIEH CHU , CHENG-HAO CHEN
IPC分类号： G06F17/00
CPC分类号： G05B19/41865 , G05B2219/32015 , G05B2219/32016 , G05B2219/32019 , G05B2219/45031 , Y02P90/20
摘要： A method of adjusting wafer process sequence includes steps of collecting production parameters for a plurality of lots; selecting a plurality of key parameters from the production parameters, wherein the key parameters at least includes a processing sequence; defining a formula to obtain an epsilon value; categorizing the lots into groups according to the epsilon value and the minimum point number by using density-based spatial clustering of application with noise (DBSCAN); and adjusting the processing sequences of the lots in the groups. Thereby, the lots with the same process recipe can be continuously or simultaneously sent into a machine, thereby reducing replacement of process recipes or shortening machine idle time.
摘要翻译：调整晶片工艺顺序的方法包括收集多个批次的生产参数的步骤; 从所述生产参数中选择多个关键参数，其中所述关键参数至少包括处理序列; 定义公式以获得ε值; 通过使用基于密度的噪声空间聚类（DBSCAN），根据ε值和最小点数将批次分组成组。并调整组中批次的处理顺序。因此，具有相同处理配方的批次可以连续或同时发送到机器中，从而减少过程配方的更换或缩短机器空闲时间。

4. 发明申请

US20110112999A1 METHOD FOR PREDICTING AND WARNING OF WAFER ACCEPTANCE TEST VALUE 审中-公开
标题翻译： WAFER接受测试值的预测和警告方法
公开(公告)号：US20110112999A1
公开(公告)日：2011-05-12
申请号：US12703999
申请日：2010-02-11
申请人： YI-FENG LEE , SHIH CHANG KAO , YUN-ZONG TIAN , WEI JUN CHEN
发明人： YI-FENG LEE , SHIH CHANG KAO , YUN-ZONG TIAN , WEI JUN CHEN
IPC分类号： G06N3/10 , G06F15/18
CPC分类号： H01L22/20
摘要： A method for predicting and warning of WAT value includes the steps as follows. A key process is selected and a WAT value after finishing the key process is used as a predictive goal. A predicting model is built. One batch or plural batches of predictive wafers are prepared, and a Fault Detection and Classification data (FDC data) and a metrology data from the predictive wafers of the key process are collected. The FDC data and the metrology data collected from the predictive wafers are inputted into the predicting model for processing a normal predicting procedure, and a predictive WAT value by the predicting model is outputted. The present invention can accurately predict the WAT value, effectively monitor some specific defective wafers and continuously perform the improvement for the specific defective wafer.
摘要翻译： WAT值的预测和预警方法包括以下步骤。选择关键过程，完成关键过程后的WAT值作为预测目标。建立了预测模型。准备一批或多批预测晶片，并且收集来自关键过程的预测晶片的故障检测和分类数据（FDC数据）和度量数据。从预测晶片收集的FDC数据和计量数据被输入到用于处理正常预测过程的预测模型中，并且输出由预测模型的预测WAT值。本发明可以准确地预测WAT值，有效地监视一些特定的缺陷晶片，并且连续地对特定缺陷晶片进行改进。

5. 发明申请

US20120102052A1 SPECIFICATION ESTABLISHING METHOD FOR CONTROLLING SEMICONDUCTOR PROCESS 有权
标题翻译：用于控制半导体工艺的规范建立方法
公开(公告)号：US20120102052A1
公开(公告)日：2012-04-26
申请号：US13004236
申请日：2011-01-11
申请人： CHENG-HAO CHEN , YUN-ZONG TIAN , SHIH-CHANG KAO , YIJ CHIEH CHU , WEI JUN CHEN
发明人： CHENG-HAO CHEN , YUN-ZONG TIAN , SHIH-CHANG KAO , YIJ CHIEH CHU , WEI JUN CHEN
IPC分类号： G06F17/30
CPC分类号： G05B19/41865 , G05B2219/32201 , G05B2219/45031 , H01L22/20 , Y02P90/20 , Y02P90/22
摘要： A specification establishing method for controlling semiconductor process, the steps includes: providing a database and choosing a population from the database; sampling a plurality of sample groups from the population, each sample group being a non-normal distribution and having a plurality of samples; filtering the sample groups; summarizing the filtered sample groups to form a non-normal distribution diagram; getting a value-at-risk and a median by calculating from the non-normal distribution diagram; getting a critical value by calculating the value-at-risk and the median with a critical formula; getting a plurality of state values by calculating the filtered sample groups with a proportion formula; and getting an index value by calculating the non-normal distribution diagram with the proportion formula. Thus, the state values indicate the states of the sample groups are abnormal or not by comparing the state values to the index value.
摘要翻译：一种用于控制半导体处理的规范建立方法，所述步骤包括：提供数据库并从数据库中选择人口; 从群体中抽取多个样本组，每个样本组是非正态分布并具有多个样本; 过滤样品组; 总结过滤样品组以形成非正态分布图; 通过从非正态分布图计算得到风险价值和中位数; 通过使用关键公式计算风险值和中位数来获得临界值; 通过以比例公式计算过滤的样本组来获得多个状态值; 并用比例公式计算非正态分布图，得到指标值。因此，通过将状态值与指标值进行比较，状态值表示样本组的状态异常。

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