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1. 发明申请

US20130341433A1 DUAL PLENUM, AXI-SYMMETRIC SHOWERHEAD WITH EDGE-TO-CENTER GAS DELIVERY 有权
标题翻译：双层气体，AXI-SYMMETRIC SHOWERHEAD具有边缘到中心气体输送
公开(公告)号：US20130341433A1
公开(公告)日：2013-12-26
申请号：US13531254
申请日：2012-06-22
申请人： Shambhu N. Roy , Vincent E. Burkhart , Natan Solomon , Sanjay Gopinath , Kaihan Abidi Ashtiani , Bart van Schravendijk , Jason Stevens , Dhritiman Subha Kashyap , David Cohen
发明人： Shambhu N. Roy , Vincent E. Burkhart , Natan Solomon , Sanjay Gopinath , Kaihan Abidi Ashtiani , Bart van Schravendijk , Jason Stevens , Dhritiman Subha Kashyap , David Cohen
IPC分类号： B05B1/14
CPC分类号： C23C16/45565 , C23C16/45574
摘要： A dual-plenum showerhead for semiconductor processing operations is provided. The showerhead may include a faceplate with two sets of gas distribution holes, each set fed by a separate plenum. One set of gas distribution holes may be through-holes in a faceplate of the showerhead and may allow gases trapped between the faceplate and a plasma dome to flow towards a wafer. The other set of gas distribution holes may distribute gas routed through passages or channels in the faceplate towards the wafer. The passages or channels in the faceplate may include radial channels and annular channels and may be fed from an annular gas distribution channel about the periphery of the faceplate.
摘要翻译：提供了一种用于半导体加工操作的双通风淋浴喷头。淋浴头可以包括具有两组气体分配孔的面板，每组由单独的增压室供给。一组气体分配孔可以是喷头的面板中的通孔，并且可允许捕获在面板和等离子体圆顶之间的气体朝向晶片流动。另一组气体分配孔可以将通过面板中的通道或通道的气体分配到晶片。面板中的通道或通道可以包括径向通道和环形通道，并且可以从围绕面板周边的环形气体分配通道供给。

2. 发明申请

US20100243440A1 Mechanism for continuously varying radial position of a magnetron 有权
标题翻译：连续变化磁控管径向位置的机理
公开(公告)号：US20100243440A1
公开(公告)日：2010-09-30
申请号：US12794452
申请日：2010-06-04
申请人： Keith A. Miller , Anantha K. Subramani , Maurice E. Ewert , Tza Jing Gung , Hong S. Yang , Vincent E. Burkhart
发明人： Keith A. Miller , Anantha K. Subramani , Maurice E. Ewert , Tza Jing Gung , Hong S. Yang , Vincent E. Burkhart
IPC分类号： C23C14/35
CPC分类号： H01J37/3455 , C23C14/35 , H01J37/3408
摘要： A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern.
摘要翻译：一种连续可变的多位磁控管，其以可自由选择的半径在溅射靶的背面绕中心轴旋转。该位置从外部动态地控制，例如通过连接在支撑磁控管的枢转臂和固定到轴的臂之间的液压致动器，通过两个独立可从外部控制的同轴轴并且通过青蛙支撑磁控管机构或连接在枢转臂之间并由外部滑块移动的电缆。磁控管可以以两个，三个或更多个离散的半径旋转或以连续的螺旋图案移动。

3. 发明授权

US06469283B1 Method and apparatus for reducing thermal gradients within a substrate support 有权
标题翻译：用于降低衬底支撑体内的热梯度的方法和装置
公开(公告)号：US06469283B1
公开(公告)日：2002-10-22
申请号：US09262788
申请日：1999-03-04
申请人： Vincent E. Burkhart , Steven Sansoni , Michael N. Sugarman , Anthony Chan
发明人： Vincent E. Burkhart , Steven Sansoni , Michael N. Sugarman , Anthony Chan
IPC分类号： H05B302
CPC分类号： H01L21/67248 , H01L21/67103
摘要： A method and apparatus for reducing the thermal gradients within substrate support such as a ceramic wafer support pedestal. Specifically, the present invention is a heater controller that limits the amount of power that is applied to a resistive heater embedded within a ceramic pedestal. The heater controller comprises the necessary circuitry for limiting the amount of power applied to one or more zones with respect to a single other zone. Said heater controller also contains the necessary circuitry to detect faulty or misconnected wires between heater controller and the zones to be heated.
摘要翻译：一种用于降低衬底支撑件内的热梯度的方法和装置，例如陶瓷晶片支撑座。具体地说，本发明是一种加热器控制器，其限制了施加到嵌入陶瓷基座内的电阻加热器的功率量。加热器控制器包括用于限制相对于单个其他区域施加到一个或多个区域的功率量的必要电路。所述加热器控制器还包含检测加热器控制器和待加热区域之间的错误或错误连接的必要电路。

4. 发明授权

US09337067B2 High temperature electrostatic chuck with radial thermal chokes 有权
标题翻译：高温静电吸盘带径向热扼流圈
公开(公告)号：US09337067B2
公开(公告)日：2016-05-10
申请号：US13467861
申请日：2012-05-09
申请人： Shambhu N. Roy , Vincent E. Burkhart , Scott J. Fields
发明人： Shambhu N. Roy , Vincent E. Burkhart , Scott J. Fields
IPC分类号： H01L21/683 , H01L21/687 , H01L21/67
CPC分类号： H01L21/67109 , H01L21/6831 , H01L21/68785 , H01L2924/0002 , H01L2924/00
摘要： A wafer support assembly including a wafer support and cooling plate with radial thermal chokes is provided. The cooling plate and wafer support may have limited contact and may not contact each other outside of certain limited thermal contact patches. The thermal contact patches may generally define one or more radial thermal choke regions. In some implementations, high- and low-temperature cooling systems may be placed at one or more locations across the cooling plate to assist in temperature management.
摘要翻译：提供了一种晶片支撑组件，其包括具有径向热扼流圈的晶片支撑件和冷却板。冷却板和晶片支撑件可能具有有限的接触，并且在某些有限的热接触片之外可能不会彼此接触。热接触片通常可以限定一个或多个径向热扼流圈区域。在一些实施方式中，高温和低温冷却系统可以放置在穿过冷却板的一个或多个位置以辅助温度管理。

5. 发明授权

US07138039B2 Liquid isolation of contact rings 有权
标题翻译：液体隔离接触环
公开(公告)号：US07138039B2
公开(公告)日：2006-11-21
申请号：US10348800
申请日：2003-01-21
申请人： Vincent E. Burkhart , Harald Herchen , Joseph Yahalom
发明人： Vincent E. Burkhart , Harald Herchen , Joseph Yahalom
IPC分类号： B23H3/04 , C25D17/06
CPC分类号： C25D17/06 , C25D7/123 , C25D17/005
摘要： Embodiments of the invention may further provide a contact ring for an electrochemical plating system. The contact generally includes a substrate receiving member having a substrate support surface formed thereon, a plurality of electrical contact pins extending from the substrate support surface, a first seal positioned on the substrate support surface radially inward of the plurality of electrical contacts, and a second seal positioned radially outward of the plurality of electrical contacts. Additionally, the contact ring generally includes a fluid inlet configured to supply a fluid to a volume between the first seal and the second seal.
摘要翻译：本发明的实施例还可以提供用于电化学电镀系统的接触环。触点通常包括其上形成有基板支撑表面的基板接收构件，从基板支撑表面延伸的多个电接触销，位于多个电触点的径向内侧的基板支撑表面上的第一密封件，以及第二密封件定位在多个电触头的径向外侧的密封件。另外，接触环通常包括被配置为将流体供应到第一密封件和第二密封件之间的体积的流体入口。

6. 外观设计

USD425919S Electrostatic chuck with improved spacing mask and workpiece detection device 失效
公开(公告)号：USD425919S
公开(公告)日：2000-05-30
申请号：US79585
申请日：1997-11-14
申请人： Vincent E. Burkhart , Allen Flanigan , Steven Sansoni
设计人： Vincent E. Burkhart , Allen Flanigan , Steven Sansoni

7. 发明授权

US5764471A Method and apparatus for balancing an electrostatic force produced by an electrostatic chuck 失效
公开(公告)号：US5764471A
公开(公告)日：1998-06-09
申请号：US639841
申请日：1996-05-08
申请人： Vincent E. Burkhart
发明人： Vincent E. Burkhart
IPC分类号： B23Q3/15 , H01L21/683 , H02N13/00
CPC分类号： H01L21/6833 , H02N13/00 , Y10T279/23
摘要： An electrostatic chuck containing apparatus, and a concomitant method, for balancing the electrostatic force that the chuck imparts upon a workpiece. More specifically, the electrostatic chuck contains a chuck body having a pair of coplanar electrodes embedded therein and a wafer spacing mask containing a plurality of conductive support members deposited upon a support surface of the chuck body. The support members maintain a wafer, or other workpiece, in a spaced-part relation with respect to the support surface of the chuck body. Each electrode within the chuck is respectively connected to a terminal dual voltage power supply having a center tap. The center tap of the power supply is connected to the wafer spacing mask. As such, variations in the distance between the wafer and the electrodes due to variations in dielectric thickness, wafer backside roughness, chuck surface roughness, chuck surface conductivity or other physical variations that may cause changes in the electrostatic force are balanced by having the spacing mask connected to the center tap of the power supply.

8. 发明申请

US20120285658A1 HIGH TEMPERATURE ELECTROSTATIC CHUCK WITH RADIAL THERMAL CHOKES 有权
标题翻译：带温度范围的高温静电止回阀
公开(公告)号：US20120285658A1
公开(公告)日：2012-11-15
申请号：US13467861
申请日：2012-05-09
申请人： Shambhu N. Roy , Vincent E. Burkhart , Scott J. Fields
发明人： Shambhu N. Roy , Vincent E. Burkhart , Scott J. Fields
IPC分类号： F28F9/007
CPC分类号： H01L21/67109 , H01L21/6831 , H01L21/68785 , H01L2924/0002 , H01L2924/00
摘要： A wafer support assembly including a wafer support and cooling plate with radial thermal chokes is provided. The cooling plate and wafer support may have limited contact and may not contact each other outside of certain limited thermal contact patches. The thermal contact patches may generally define one or more radial thermal choke regions. In some implementations, high- and low-temperature cooling systems may be placed at one or more locations across the cooling plate to assist in temperature management.
摘要翻译：提供了一种晶片支撑组件，其包括具有径向热扼流圈的晶片支撑件和冷却板。冷却板和晶片支撑件可能具有有限的接触，并且在某些有限的热接触片之外可能不会彼此接触。热接触片通常可以限定一个或多个径向热扼流圈区域。在一些实施方式中，高温和低温冷却系统可以放置在穿过冷却板的一个或多个位置以辅助温度管理。

9. 发明授权

US07736473B2 Magnetron having continuously variable radial position 有权
标题翻译：磁控管具有连续可变的径向位置
公开(公告)号：US07736473B2
公开(公告)日：2010-06-15
申请号：US11226858
申请日：2005-09-14
申请人： Keith A. Miller , Anantha K. Subramani , Maurice E. Ewert , Tza-Jing Gung , Hong S. Yang , Vincent E. Burkhart
发明人： Keith A. Miller , Anantha K. Subramani , Maurice E. Ewert , Tza-Jing Gung , Hong S. Yang , Vincent E. Burkhart
IPC分类号： C23C14/35
CPC分类号： H01J37/3455 , C23C14/35 , H01J37/3408
摘要： A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern.
摘要翻译：一种连续可变的多位磁控管，其以可自由选择的半径在溅射靶的背面绕中心轴旋转。该位置从外部动态地控制，例如通过连接在支撑磁控管的枢转臂和固定到轴的臂之间的液压致动器，通过两个独立可从外部控制的同轴轴并且通过青蛙支撑磁控管机构或连接在枢转臂之间并由外部滑块移动的电缆。磁控管可以以两个，三个或更多个离散的半径旋转或以连续的螺旋图案移动。

10. 发明授权

US06377060B1 Method and apparatus for wafer detection 有权
标题翻译：晶圆检测方法及装置
公开(公告)号：US06377060B1
公开(公告)日：2002-04-23
申请号：US09552458
申请日：2000-04-18
申请人： Vincent E. Burkhart , Deepak Manaoharlal
发明人： Vincent E. Burkhart , Deepak Manaoharlal
IPC分类号： G01R3102
CPC分类号： H01L21/67288 , H01L21/67259 , H01L21/68 , H02N13/00
摘要： An apparatus and a method for detecting the presence and position of a wafer upon a semiconductor wafer support pedestal surface. Specifically, a wafer detector comprising a plurality of electrodes on a surface of the wafer support pedestal. The electrodes are coupled to a capacitance measurement circuit that measures the capacitance between the electrodes and generates a signal corresponding to a wafer's presence, location and chucking condition. The wafer's presence completes an electrical circuit between the electrodes, increasing the capacitance between the electrodes. As such, the presence of a wafer, the position of the wafer, and the condition of the wafer, i.e., wafer damage, can be detected upon a wafer support pedestal during wafer processing.
摘要翻译：一种用于在半导体晶片支撑基座表面上检测晶片的存在和位置的装置和方法。具体地，晶片检测器在晶片支撑基座的表面上包括多个电极。电极耦合到电容测量电路，其测量电极之间的电容，并产生对应于晶片存在，位置和夹持条件的信号。晶圆的存在完成了电极之间的电路，增加了电极之间的电容。因此，在晶片处理期间可以在晶片支撑基座上检测晶片的存在，晶片的位置和晶片的状态，即晶片损坏。

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