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1. 发明申请

US20060008659A1 Materials with enhanced properties for shallow trench isolation/premetal dielectric applications 失效
标题翻译：具有增强性能的浅沟槽隔离/金属前介质应用的材料
公开(公告)号：US20060008659A1
公开(公告)日：2006-01-12
申请号：US10886247
申请日：2004-07-07
申请人： Victor Lu , Lei Jin , Arlene Suedmeyer , Denis Endisch , Paul Apen , Brian Daniels , Deling Zhou , Ananth Naman
发明人： Victor Lu , Lei Jin , Arlene Suedmeyer , Denis Endisch , Paul Apen , Brian Daniels , Deling Zhou , Ananth Naman
IPC分类号： B32B13/04
CPC分类号： H01L21/02118 , H01L21/02318 , H01L21/3105 , H01L21/316
摘要： The present invention relates to semiconductor device fabrication and more specifically to a method and material for forming high density shallow trench isolation structures in integrated circuits capable of withstanding wet etch treatments. A silica dielectric film is formed on a substrate. The silica dielectric film has a density of from about 1.0 to about 2.3 g/ml, a SiC:SiO bond ratio of about 0.015 or more, a dielectric constant of about 4.0 or less, a breakdown voltage of about 2 MV/cm or more, and a wet etch resistance in a 100:1 by volume mixture of water and hydrogen fluoride of about 30 Å/minute or less.
摘要翻译：本发明涉及半导体器件制造，更具体地涉及一种用于在能够承受湿蚀刻处理的集成电路中形成高密度浅沟槽隔离结构的方法和材料。在基板上形成石英电介质膜。二氧化硅电介质膜的密度为约1.0至约2.3g / ml，SiC：SiO键比为约0.015或更大，介电常数为约4.0或更小，击穿电压为约2MV / cm以上，并且在100:1体积比的水和氟化氢的混合物中具有约30 /分钟或更少的湿蚀刻电阻。

2. 发明申请

US20060057855A1 Method for making toughening agent materials 有权
公开(公告)号：US20060057855A1
公开(公告)日：2006-03-16
申请号：US10940686
申请日：2004-09-15
申请人： Teresa Ramos , Robert Roth , Anil Bhanap , Paul Apen , Denis Endisch , Brian Daniels , Ananth Naman , Nancy Iwamoto , Roger Leung
发明人： Teresa Ramos , Robert Roth , Anil Bhanap , Paul Apen , Denis Endisch , Brian Daniels , Ananth Naman , Nancy Iwamoto , Roger Leung
IPC分类号： H01L21/311 , H01L21/302
CPC分类号： H01L21/02216 , H01L21/02126 , H01L21/316 , H01L21/31695 , H01L21/76814 , H01L21/76826
摘要： A toughening agent composition for increasing the hydrophobicity of an organosilicate glass dielectric film when applied to said film. It includes a component capable of alkylating or arylating silanol moieties of the organosilicate glass dielectric film via silylation, and an activating agent selected from the group consisting of an amine, an onium compound and an alkali metal hydroxide.

3. 发明申请

US20060141641A1 Repair and restoration of damaged dielectric materials and films 有权
标题翻译：损坏的介质材料和薄膜的修复和修复
公开(公告)号：US20060141641A1
公开(公告)日：2006-06-29
申请号：US10543347
申请日：2004-01-26
申请人： Wenya Fan , Victor Lu , Michael Thomas , Brian Daniels , Tiffany Nguyen , De-Ling Zhou , Ananth Naman , Lei Jin , Anil Bhanap
发明人： Wenya Fan , Victor Lu , Michael Thomas , Brian Daniels , Tiffany Nguyen , De-Ling Zhou , Ananth Naman , Lei Jin , Anil Bhanap
IPC分类号： H01L21/00 , H01L21/31
CPC分类号： H01L21/31058 , H01L21/3105 , H01L21/76801 , H01L2924/0002 , H01L2924/00
摘要： Methods of repairing voids in a material are described herein that include: a) providing a material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c) chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. Methods of carbon restoration in a material are also described that include: a) providing a carbon-deficient material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c)chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. In addition, methods are described herein for reducing the condensation of a film and/or a carbon-deficient film that include: a) providing a film having a plurality of reactive silanol groups; b) placing the film into a plasma chamber; c) introducing a plurality of reactive organic moieties-containing silanes into the chamber; and d) allowing the silanes to react with at least some of the reactive silanol groups. Dielectric materials and low-k dielectric materials are described herein that comprise: a) an inorganic material having a plurality of silicon atoms; and b) a plurality of organic moiety-containing silane compounds, wherein the silane compounds are coupled to the inorganic material through at least some of the silicon atoms.
摘要翻译：本文描述了修复材料中空隙的方法，其包括：a）提供具有多个反应性硅烷醇基团的材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。还描述了材料中碳修复的方法，其包括：a）提供具有多个反应性硅烷醇基团的缺碳材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。此外，本文描述了用于减少膜和/或碳缺乏膜的冷凝的方法，其包括：a）提供具有多个反应性硅烷醇基团的膜; b）将膜放入等离子体室中; c）将多个含反应性有机部分的硅烷引入所述室中; 和d）允许硅烷与至少一些反应性硅烷醇基团反应。介质材料和低k介电材料在本文中描述，其包括：a）具有多个硅原子的无机材料; 和b）多个含有机部分的硅烷化合物，其中硅烷化合物通过至少一些硅原子与无机材料偶联。

4. 发明授权

US07915181B2 Repair and restoration of damaged dielectric materials and films 有权
标题翻译：损坏的介质材料和薄膜的修复和修复
公开(公告)号：US07915181B2
公开(公告)日：2011-03-29
申请号：US10543347
申请日：2004-01-26
申请人： Wenya Fan , Victor Lu , Michael Thomas , Brian Daniels , Tiffany Nguyen , De-Ling Zhou , Ananth Naman , Lei Jin , Anil Bhanap
发明人： Wenya Fan , Victor Lu , Michael Thomas , Brian Daniels , Tiffany Nguyen , De-Ling Zhou , Ananth Naman , Lei Jin , Anil Bhanap
IPC分类号： H01L21/31
CPC分类号： H01L21/31058 , H01L21/3105 , H01L21/76801 , H01L2924/0002 , H01L2924/00
摘要： Methods of repairing voids in a material are described herein that include: a) providing a material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c) chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. Methods of carbon restoration in a material are also described that include: a) providing a carbon-deficient material having a plurality of reactive silanol groups; b) providing at least one reactive surface modification agent; and c)chemically capping at least some of the plurality of reactive silanol groups with the at least one of the reactive surface modification agents. In addition, methods are described herein for reducing the condensation of a film and/or a carbon-deficient film that include: a) providing a film having a plurality of reactive silanol groups; b) placing the film into a plasma chamber; c) introducing a plurality of reactive organic moieties-containing silanes into the chamber; and d) allowing the silanes to react with at least some of the reactive silanol groups. Dielectric materials and low-k dielectric materials are described herein that comprise: a) an inorganic material having a plurality of silicon atoms; and b) a plurality of organic moiety-containing silane compounds, wherein the silane compounds are coupled to the inorganic material through at least some of the silicon atoms.
摘要翻译：本文描述了修复材料中空隙的方法，其包括：a）提供具有多个反应性硅烷醇基团的材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。还描述了材料中碳修复的方法，其包括：a）提供具有多个反应性硅烷醇基团的缺碳材料; b）提供至少一种反应性表面改性剂; 和c）使所述多个反应性硅烷醇基团中的至少一些与至少一种反应性表面改性剂化学封端。此外，本文描述了用于减少膜和/或碳缺乏膜的冷凝的方法，其包括：a）提供具有多个反应性硅烷醇基团的膜; b）将膜放入等离子体室中; c）将多个含反应性有机部分的硅烷引入所述室中; 和d）允许硅烷与至少一些反应性硅烷醇基团反应。介质材料和低k介电材料在本文中描述，其包括：a）具有多个硅原子的无机材料; 和b）多个含有机部分的硅烷化合物，其中硅烷化合物通过至少一些硅原子与无机材料偶联。

5. 发明申请

US20060216952A1 Vapor phase treatment of dielectric materials 失效
标题翻译：介电材料的气相处理
公开(公告)号：US20060216952A1
公开(公告)日：2006-09-28
申请号：US11086010
申请日：2005-03-22
申请人： Anil Bhanap , Robert Roth , Kikue Burnham , Brian Daniels , Denis Endisch , Ilan Golecki
发明人： Anil Bhanap , Robert Roth , Kikue Burnham , Brian Daniels , Denis Endisch , Ilan Golecki
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/02126 , C23C16/56 , H01L21/02203 , H01L21/02216 , H01L21/02219 , H01L21/02222 , H01L21/02282 , H01L21/02337 , H01L21/02359 , H01L21/3105 , H01L21/76814
摘要： The invention concerns a method for applying a surface modification agent composition for organosilicate glass dielectric films. More particularly, the invention pertains to a method for treating a silicate or organosilicate dielectric film on a substrate, which film either comprises silanol moieties or has had at least some previously present carbon containing moieties removed therefrom. The treatment adds carbon containing moieties to the film and/or seals surface pores of the film, when the film is porous.
摘要翻译：本发明涉及一种用于涂覆有机硅酸盐玻璃介电薄膜的表面改性剂组合物的方法。更具体地说，本发明涉及一种在底物上处理硅酸盐或有机硅酸盐电介质膜的方法，该膜包含硅烷醇部分或已从其中除去至少一些先前存在的含碳部分。当膜是多孔的时，该处理向膜中加入含碳部分并且/或密封膜的表面孔。

6. 发明授权

US08707339B2 System and method for detecting hacked modems 有权
标题翻译：检测黑客调制解调器的系统和方法
公开(公告)号：US08707339B2
公开(公告)日：2014-04-22
申请号：US12847180
申请日：2010-07-30
申请人： Joe Godas , John Pomeroy , Brian Daniels
发明人： Joe Godas , John Pomeroy , Brian Daniels
IPC分类号： H04N7/173
CPC分类号： H04L63/1466 , G06F17/30598 , G06F17/30864 , H04N21/2347 , H04N21/2396 , H04N21/6118 , H04N21/6168 , H04W12/00
摘要： A system, method, and computer program product are provided for detecting hacked modems in a cable network system. A cable Internet service provider can provide the disclosed heuristic to determine whether a particular cable modem has likely been hacked by obtaining a score corresponding to this likelihood. This score, as well as information regarding failure and success of various tests, can be used to generate a report identifying the likelihood that various modems have been hacked.
摘要翻译：提供了一种系统，方法和计算机程序产品，用于检测有线网络系统中的黑客调制解调器。有线互联网服务提供商可以提供所公开的启发式，以通过获得与该可能性相对应的分数来确定特定电缆调制解调器是否可能被黑客入侵。该分数以及关于各种测试的失败和成功的信息可用于生成识别各种调制解调器被入侵的可能性的报告。

7. 发明申请

US20100322214A1 WIRELESS NETWORK POLLING AND DATA WAREHOUSING 有权
标题翻译：无线网络浏览和数据仓库
公开(公告)号：US20100322214A1
公开(公告)日：2010-12-23
申请号：US12490153
申请日：2009-06-23
申请人： Reginald N. WORKMAN , Edward J. Keenan, JR. , Brian Daniels , Christopher Cioffi , John Nicastro
发明人： Reginald N. WORKMAN , Edward J. Keenan, JR. , Brian Daniels , Christopher Cioffi , John Nicastro
IPC分类号： H04W8/00
CPC分类号： H04W24/08 , H04L43/04 , H04L43/0882 , H04L43/10 , H04L67/18 , H04L67/20 , H04W4/02 , H04W4/029 , H04W64/006
摘要： Methods and systems are provided to collect and update data on client devices connected to WiFi access points is provided. An inventory of WiFi cable modems and WiFi access points coupled to the WiFi cabled modems within a specific network is periodically collected. Internet Protocol (IP) addresses of WiFi cable modems and WiFi access points coupled to the WiFi cabled modems are periodically updated. Traps are periodically received from the WiFi access points. The traps are parsed to collect an inventory of client devices wirelessly connected to the WiFi access points and a time at which a client device connected to the WiFi access point. The WiFi access points are periodically polled to collect data on client devices, the data including a period of time that a client device has been connected to a WiFi access point and a physical location of the client device.
摘要翻译：提供方法和系统来收集和更新连接到WiFi接入点的客户端设备上的数据。定期收集与特定网络中的WiFi电缆调制解调器耦合的WiFi电缆调制解调器和WiFi接入点的清单。周期性地更新WiFi电缆调制解调器和耦合到WiFi电缆调制解调器的WiFi接入点的互联网协议（IP）地址。定期从WiFi接入点收到陷阱。陷阱被解析以收集无线连接到WiFi接入点的客户端设备的清单以及连接到WiFi接入点的客户端设备的时间。周期性地轮询WiFi接入点以在客户端设备上收集数据，数据包括客户端设备已经连接到WiFi接入点的时间段和客户端设备的物理位置。

8. 发明申请

US20060083909A1 Easy-open dough packages and related methods of manufacture 审中-公开
标题翻译：易开口面团包装及相关制造方法
公开(公告)号：US20060083909A1
公开(公告)日：2006-04-20
申请号：US10968620
申请日：2004-10-19
申请人： David Matthews , Eric Plourde , Brian Daniels
发明人： David Matthews , Eric Plourde , Brian Daniels
IPC分类号： B31B45/00 , B65D85/00
CPC分类号： B65D75/66 , B65B61/02 , B65D85/36 , Y10T428/249923
摘要： A generally tube-shaped package that has a tear strip joined to a web of packaging film, the tear strip incorporating an encapsulated tear notch. The package is filled with cookie or bread dough. In accordance with one embodiment, the tear strip is part of a tape that is joined to a web of packaging film. Preferably, the tear strip has a tear bead. Optionally, tearing off of the tear strip provides access to a peel seal, which in turn must be sundered to gain access to the dough. In accordance with another embodiment, the tear strip comprises a portion of a web of packaging film, which portion is bounded by a pair of mutually parallel capped tear lines. A tear bead is disposed between the tear lines. Methods of manufacturing such packages are disclosed.
摘要翻译：一种通常为管状的包装，其具有连接到包装膜的幅材的撕裂条，所述撕裂条包括封装的撕裂缺口。包装充满了饼干或面包面团。根据一个实施例，撕条是连接到包装薄膜网的带的一部分。优选地，撕条具有泪珠。任选地，撕裂撕条可以进入剥离密封件，剥离密封件又必须被清洗以便进入面团。根据另一个实施例，撕条包括一部分包装膜的腹板，该部分由一对相互平行的覆盖撕裂线限定。泪珠设置在撕裂线之间。公开了制造这种包装的方法。

9. 发明申请

US20130038971A1 ARC FAULT DETECTOR FOR AC OR DC INSTALLATIONS 有权
标题翻译：用于交流或直流安装的ARC故障检测器
公开(公告)号：US20130038971A1
公开(公告)日：2013-02-14
申请号：US13642996
申请日：2011-05-27
申请人： Patrick Ward , Brian Daniels
发明人： Patrick Ward , Brian Daniels
IPC分类号： H02H3/20
CPC分类号： H02H3/33 , H02H1/0015
摘要： An arc fault detector comprises a current transformer (CT) having a primary winding and a secondary winding (W1), the primary winding being formed by at least one conductor (L) of an AC or DC supply circuit. The inductance of the CT is selected so that the CT has a lower frequency operating point (LFOP) of at least 10 KHz. The detector also comprises circuitry (10, 12, SW) for disconnecting the supply if the voltage induced in the secondary winding meets predetermined criteria as to magnitude and duration.
摘要翻译：电弧故障检测器包括具有初级绕组和次级绕组（W1）的电流互感器（CT），初级绕组由AC或DC电源电路的至少一个导体（L）形成。选择CT的电感，使得CT具有至少10KHz的较低频率工作点（LFOP）。如果次级绕组中感应的电压满足关于幅度和持续时间的预定标准，则检测器还包括用于断开电源的电路（10,12，SW）。

10. 发明授权

US08743513B2 Arc fault detector for AC or DC installations 有权
标题翻译：用于交流或直流安装的电弧故障检测器
公开(公告)号：US08743513B2
公开(公告)日：2014-06-03
申请号：US13642996
申请日：2011-05-27
申请人： Patrick Ward , Brian Daniels
发明人： Patrick Ward , Brian Daniels
IPC分类号： H02H3/26
CPC分类号： H02H3/33 , H02H1/0015
摘要： An arc fault detector comprises a current transformer (CT) having a primary winding and a secondary winding (W1), the primary winding being formed by at least one conductor (L) of an AC or DC supply circuit. The inductance of the CT is selected so that the CT has a lower frequency operating point (LFOP) of at least 10 KHz. The detector also comprises circuitry (10, 12, SW) for disconnecting the supply if the voltage induced in the secondary winding meets predetermined criteria as to magnitude and duration.
摘要翻译：电弧故障检测器包括具有初级绕组和次级绕组（W1）的电流互感器（CT），初级绕组由AC或DC电源电路的至少一个导体（L）形成。选择CT的电感，使得CT具有至少10KHz的较低频率工作点（LFOP）。如果次级绕组中感应的电压满足关于幅度和持续时间的预定标准，则检测器还包括用于断开电源的电路（10,12，SW）。

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