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1. 发明申请

US20060250611A1 Wafer edge inspection 有权
标题翻译：晶圆边缘检查
公开(公告)号：US20060250611A1
公开(公告)日：2006-11-09
申请号：US11365221
申请日：2006-03-01
申请人： Vamsi Velidandla , Anoop Somanchi , Ronny Soetarman , Steven Meeks
发明人： Vamsi Velidandla , Anoop Somanchi , Ronny Soetarman , Steven Meeks
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01B11/303 , G01B11/306 , G01N21/21 , G01N21/211 , G01N21/55 , G01N21/9501 , G01N21/9503 , G01N2021/556 , H01L22/12
摘要： In one embodiment, a system to inspect an edge region of a wafer, comprises a surface analyzer assembly comprising a radiation targeting assembly that targets a radiation beam onto a surface of the wafer; a reflected radiation collection assembly to collect radiation reflected from a surface of the wafer; means for rotating the surface analyzer assembly about an edge surface of the wafer; and means for detecting one or more defects in the edge region of the wafer.
摘要翻译：在一个实施例中，检查晶片的边缘区域的系统包括表面分析器组件，其包括将辐射束对准到晶片表面上的辐射瞄准组件; 用于收集从晶片表面反射的辐射的反射辐射收集组件; 用于使表面分析器组件围绕晶片的边缘表面旋转的装置; 以及用于检测晶片边缘区域中的一个或多个缺陷的装置。

2. 发明申请

US20070127016A1 WAFER EDGE INSPECTION 有权
标题翻译： WAFER EDGE检查
公开(公告)号：US20070127016A1
公开(公告)日：2007-06-07
申请号：US11560477
申请日：2006-11-16
申请人： Steven Meeks , Rusmin Kudinar , William Wheeler , Hung Nguyen , Vamsi Velidandla , Anoop Somanchi , Ronny Soetarman
发明人： Steven Meeks , Rusmin Kudinar , William Wheeler , Hung Nguyen , Vamsi Velidandla , Anoop Somanchi , Ronny Soetarman
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01B11/303 , G01B11/306 , G01N21/21 , G01N21/211 , G01N21/55 , G01N21/9501 , G01N21/9503 , G01N2021/556 , H01L22/12
摘要： In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a radial motor to move an optical head in a radial direction to detect defects at locations displaced from the edge of the wafer, and a rotational motor to rotate the optical head around the edge of the wafer to detect defects on the edge of the wafer.
摘要翻译：在一个实施例中，使用单个工具测量晶片表面和晶片边缘上的缺陷的系统包括径向马达以沿径向方向移动光学头以检测从晶片边缘移位的位置处的缺陷以及旋转电动机，用于围绕晶片的边缘旋转光学头以检测晶片边缘上的缺陷。

3. 发明授权

US07161669B2 Wafer edge inspection 有权
标题翻译：晶圆边缘检查
公开(公告)号：US07161669B2
公开(公告)日：2007-01-09
申请号：US11365221
申请日：2006-03-01
申请人： Vamsi Velidandla , Anoop Somanchi , Ronny Soetarman , Steven W. Meeks
发明人： Vamsi Velidandla , Anoop Somanchi , Ronny Soetarman , Steven W. Meeks
IPC分类号： G01N21/88
CPC分类号： G01N21/94 , G01B11/303 , G01B11/306 , G01N21/21 , G01N21/211 , G01N21/55 , G01N21/9501 , G01N21/9503 , G01N2021/556 , H01L22/12
摘要： In one embodiment, a system to inspect an edge region of a wafer, comprises a surface analyzer assembly comprising a radiation targeting assembly that targets a radiation beam onto a surface of the wafer; a reflected radiation collection assembly to collect radiation reflected from a surface of the wafer; means for rotating the surface analyzer assembly about an edge surface of the wafer; and means for detecting one or more defects in the edge region of the wafer.
摘要翻译：在一个实施例中，检查晶片的边缘区域的系统包括表面分析器组件，其包括将辐射束对准到晶片表面上的辐射瞄准组件; 用于收集从晶片表面反射的辐射的反射辐射收集组件; 用于使表面分析器组件围绕晶片的边缘表面旋转的装置; 以及用于检测晶片边缘区域中的一个或多个缺陷的装置。

4. 发明授权

US07532318B2 Wafer edge inspection 有权
标题翻译：晶圆边缘检查
公开(公告)号：US07532318B2
公开(公告)日：2009-05-12
申请号：US11560477
申请日：2006-11-16
申请人： Steven W. Meeks , Rusmin Kudinar , William R. Wheeler , Hung Phi Nguyen , Vamsi Velidandla , Anoop Somanchi , Ronny Soetarman
发明人： Steven W. Meeks , Rusmin Kudinar , William R. Wheeler , Hung Phi Nguyen , Vamsi Velidandla , Anoop Somanchi , Ronny Soetarman
IPC分类号： G01N21/00
CPC分类号： G01N21/94 , G01B11/303 , G01B11/306 , G01N21/21 , G01N21/211 , G01N21/55 , G01N21/9501 , G01N21/9503 , G01N2021/556 , H01L22/12
摘要： In one embodiment, a system to measure defects on a surface of a wafer and an edge of the wafer using a single tool comprises a radial motor to move an optical head in a radial direction to detect defects at locations displaced from the edge of the wafer, and a rotational motor to rotate the optical head around the edge of the wafer to detect defects on the edge of the wafer.
摘要翻译：在一个实施例中，使用单个工具测量晶片表面和晶片边缘上的缺陷的系统包括径向马达以沿径向方向移动光学头以检测从晶片边缘移位的位置处的缺陷以及旋转电动机，用于围绕晶片的边缘旋转光学头以检测晶片边缘上的缺陷。

5. 发明申请

US20060103073A1 Mechanical seal having a single-piece, perforated mating ring 有权
标题翻译：机械密封件具有单件式穿孔配合环
公开(公告)号：US20060103073A1
公开(公告)日：2006-05-18
申请号：US10987352
申请日：2004-11-12
申请人： Michael Khonsari , Anoop Somanchi
发明人： Michael Khonsari , Anoop Somanchi
IPC分类号： F16J15/34
CPC分类号： F16J15/3404
摘要： A mechanical seal (e.g., single mechanical seals, double mechanical seals, tandem mechanical seals, bellows, pusher mechanical seals, and all types of rotating and reciprocating machines) with reduced contact surface temperature, reduced contact surface wear, or increased life span. The mechanical seal comprises a rotating ring and a single-piece, perforated mating ring, which improves heat transfer by controllably channeling coolant flow through the single-piece mating ring such that the coolant is in substantially uniform thermal contact with a substantial portion of the interior surface area of the seal face, while maintaining the structural integrity of the mechanical seal and minimizing the potential for coolant flow interruptions to the seal face caused by debris or contaminants (e.g., small solids and trash) in the coolant.
摘要翻译：具有降低的接触表面温度，减少的接触表面磨损或增加的寿命的机械密封件（例如，单机械密封件，双机械密封件，串联机械密封件，波纹管，推进器机械密封件和所有类型的旋转和往复机器）。机械密封件包括旋转环和单件式穿孔配合环，其通过可控地将冷却剂流动通过单件式配合环来改善热传递，使得冷却剂与内部的大部分基本均匀地热接触密封面的表面积，同时保持机械密封的结构完整性，并最大限度地减少由冷却剂中的碎屑或污染物（例如小固体和垃圾）引起的冷却液流向密封面的中断的可能性。

6. 发明申请

US20050082765A1 MECHANICAL SEAL HAVING A DOUBLE-TIER MATING RING 有权
标题翻译：机械密封具有双重环形环
公开(公告)号：US20050082765A1
公开(公告)日：2005-04-21
申请号：US10689406
申请日：2003-10-20
申请人： Michael Khonsari , Anoop Somanchi
发明人： Michael Khonsari , Anoop Somanchi
IPC分类号： F16J15/34
CPC分类号： F16J15/3404
摘要： An apparatus and method to enhance the overall performance of mechanical seals in one of the following ways: by reducing seal face wear, by reducing the contact surface temperature, or by increasing the life span of mechanical seals. The apparatus is a mechanical seal (e.g., single mechanical seals, double mechanical seals, tandem mechanical seals, bellows, pusher mechanical seals, and all types of rotating and reciprocating machines) comprising a rotating ring and a double-tier mating ring. In a preferred embodiment, the double-tier mating ring comprises a first and a second stationary ring that together form an agitation-inducing, guided flow channel to allow for the removal of heat generated at the seal face of the mating ring by channeling a coolant entering the mating ring to a position adjacent to and in close proximity with the interior surface area of the seal face of the mating ring.
摘要翻译：通过以下方式之一提高机械密封的整体性能的装置和方法：通过减少密封面磨损，减小接触表面温度，或通过增加机械密封件的使用寿命来实现。该装置是包括旋转环和双层配合环的机械密封（例如，单机械密封，双机械密封，串联机械密封，波纹管，推进器机械密封以及所有类型的旋转和往复运动机械）。在优选实施例中，双层配合环包括第一和第二固定环，其一起形成搅动诱导的引导流动通道，以允许通过引导冷却剂来移除在配合环的密封面处产生的热量将配合环进入与配合环的密封面的内表面相邻且紧密相邻的位置。

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