专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2016172030A1 SEMICONDUCTOR MANUFACTURING DEVICE WITH EMBEDDED FLUID CONDUITS 审中-公开
标题翻译：具有嵌入式流体导体的半导体制造装置
公开(公告)号：WO2016172030A1
公开(公告)日：2016-10-27
申请号：PCT/US2016/028076
申请日：2016-04-18
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： ABESHAUS, Joshua M. , TYE, Jordan B.
IPC分类号： H01L21/265 , H01J37/317
CPC分类号： B22F3/1055 , B22F2005/005 , B29C64/00 , B33Y10/00 , B33Y80/00 , H01J37/3171 , H01J2237/002 , H01J2237/0041 , H01J2237/061 , H01J2237/2001 , Y02P10/295
摘要： Provided herein are approaches for forming a conduit embedded within a component of a semiconductor manufacturing device (e.g., an ion implanter) using an additive manufacturing process (e.g., 3-D printing), wherein the conduit is configured to deliver a fluid throughout the component to provide heating, cooling, and gas distribution thereof. In one approach, the conduit includes a set of raised surface features formed on an inner surface of the conduit for varying fluid flow characteristics within the conduit. In another approach, the conduit may be formed in a helical configuration. In another approach, the conduit is formed with a polygonal cross section. In another approach, the component of the ion implanter includes at least one of an ion source, a plasma flood gun, a cooling plate, a platen, and/or an arc chamber base.
摘要翻译：本文提供了使用添加剂制造工艺（例如，3-D印刷）形成嵌入在半导体制造装置（例如，离子注入机）的部件内的导管的方法，其中所述导管构造成在整个部件以提供其加热，冷却和气体分布。在一种方法中，导管包括形成在管道的内表面上的一组凸起表面特征，用于改变管道内的流体流动特性。在另一种方法中，导管可以形成为螺旋形构造。在另一种方法中，导管形成有多边形横截面。在另一方法中，离子注入机的部件包括离子源，等离子体喷枪，冷却板，压板和/或电弧室基底中的至少一个。

2. 发明申请

WO2017105910A1 SELECTIVE AREA IMPLANT OF A WORKPIECE 审中-公开
标题翻译：工件的选择区域植入
公开(公告)号：WO2017105910A1
公开(公告)日：2017-06-22
申请号：PCT/US2016/065061
申请日：2016-12-06
申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
发明人： TYE, Jordan B. , AMATO, Mark R.
IPC分类号： H01L21/265 , H01J37/317 , H01L21/04 , H01L21/225 , H01L21/3115
CPC分类号： H01J37/3171 , H01J2237/31703 , H01L21/26506 , H01L21/68764
摘要： Apparatus and methods for the selective implanting of the outer portion of a workpiece are disclosed. A mask is disposed between the ion beam and the workpiece, having an aperture through which the ion beam passes. The aperture may have a concave first edge, forming using a radius equal to the inner radius of the outer portion of the workpiece. Further, the mask is affixed to a roplat such that the platen is free to rotate between a load/unload position and an operational position without moving the mask. In certain embodiments, the mask is affixed to the base of the roplat and has a first portion with an aperture that extends vertically upward from the base, and a second portion that is shaped so as not to interfere with the rotation of the platen. In other embodiments, the mask may be affixed to the arms of the roplat.
摘要翻译：公开了用于选择性注入工件外部的设备和方法。掩模设置在离子束和工件之间，具有离子束穿过的孔。该孔可以具有凹入的第一边缘，其使用等于工件外部的内半径的半径形成。此外，面罩被固定到压板上，使得压板在加载/卸载位置和操作位置之间自由旋转而不移动面罩。在某些实施例中，面罩被固定到罗皮的底部并且具有第一部分和第二部分，第一部分具有从底座垂直向上延伸的孔，并且第二部分被成形为不干扰压板的旋转。在其他实施例中，面罩可以被固定到手术刀的臂上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式