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1. 发明专利

JP2013182085A Polarization exposure device 有权
标题翻译：极化曝光装置
公开(公告)号：JP2013182085A
公开(公告)日：2013-09-12
申请号：JP2012044698
申请日：2012-02-29
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： ARAI TOSHINARI , SATO TAKAYUKI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To simply and highly accurately change a polarization axis direction.SOLUTION: A polarization exposure device 1 includes a polarization irradiation part 2 including a light source 20 and a polarizer 21 provided to extend along the light source 20 and irradiating a surface W1 to be exposed with light emitted from the light source 20 through the polarizer 21, a rotary drive part 3 rotationally driving the polarization irradiation part 2 around a rotation axis R, a polarization axis setting part 4 provided on the rotation axis R on the rear side of the surface W1 to be exposed and setting the direction of a polarization axis 21a of the polarizer 21, and a control part 5 controlling the rotary drive part 3, according to the setting of the polarization axis setting part 4. The polarization axis setting part 4 includes a rotatable and adjustable analyzer 40 and a received light quantity detector 41 receiving the light after passing through the analyzer 40, to set the direction of the polarization axis by the rotational direction of the analyzer 40 and the control part 5 controls the rotary drive part 3 so as to make the output of the received light quantity detector 41 maximum.
摘要翻译：要解决的问题：简单且高精度地改变偏振轴方向。解决方案：偏振曝光装置1包括偏光照射部分2，该偏振照射部分2包括光源20和偏振器21，偏振器21设置成沿光源20延伸并照射表面 W1通过偏振片21从光源20发射的光被曝光;旋转驱动部3围绕旋转轴线R旋转驱动偏振光照射部2;偏振轴设定部4设置在后方的旋转轴线R上将偏光板21的偏光轴21a的方向设定在曝光面W1的一侧，以及根据偏光轴设定部4的设定来控制旋转驱动部3的控制部5.偏光轴设定部分4包括可旋转和可调节的分析器40和接收光量检测器41，其接收通过分析器40之后的光，以设置二通过分析器40和控制部分5的旋转方向对偏振轴进行调节，控制旋转驱动部分3，使接收光量检测器41的输出最大化。

2. 发明专利

JP2013097277A Film exposure device 审中-公开
标题翻译：电影曝光装置
公开(公告)号：JP2013097277A
公开(公告)日：2013-05-20
申请号：JP2011241687
申请日：2011-11-02
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： HASHIMOTO KAZUSHIGE , ARAI TOSHINARI , SATO TAKAYUKI
IPC分类号： G02B5/30
摘要： PROBLEM TO BE SOLVED: To provide a film exposure device having an inspection part that is able to inspect the width and position of a polarization part of an exposed portion and the polarization direction of the polarization part, in the process of film exposure following film movement and that prevents degradation in inspection accuracy resulting from vertical vibration of a thin film.SOLUTION: A film 11 after exposed is fed to a roll 20 of an inspection part as it is and wound around this roll 20. The roll 20 has a groove 20a extending in a roll shaft direction formed on the periphery thereof. A rod-like inspecting illumination light source 21 extending in the roll shaft direction and a polarizer 22 are arranged in this groove 20a. An inspection camera 25 for detecting illumination light, a λ/4 plate 23, and a polarizer 24 are arranged in an area right directly above the roll shaft of this roll 20. When the groove 20a of the roll 20 rotates up to the upper end of the roll, the light source 21 and the camera 25 are located directly opposite to each other on a vertical optical axis, and the polarization part of the film 11 can be inspected.
摘要翻译：要解决的问题：提供一种具有能够检查暴露部分的偏振部分的宽度和位置以及偏振部分的偏振方向的检查部分的胶片曝光装置，在胶片曝光过程中随后的膜移动并且防止由薄膜的垂直振动引起的检查精度的降低。解决方案：暴露后的薄膜11原样供给到检查部的辊20上，卷绕在该辊20上。辊20具有沿其周向形成的辊轴方向延伸的槽20a。在该槽20a中配置有沿辊轴方向延伸的杆状检查用照明光源21和偏振片22。用于检测照明光的检查照相机25，λ/ 4板23和偏振器24布置在该辊20的辊轴正上方的区域中。当辊20的槽20a旋转到上端光源21和照相机25在垂直光轴上彼此直接相对定位，并且可以检查胶片11的偏振部分。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2013076966A Exposure equipment 有权
标题翻译：曝光设备
公开(公告)号：JP2013076966A
公开(公告)日：2013-04-25
申请号：JP2012019170
申请日：2012-01-31
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： HASHIMOTO KAZUSHIGE , ARAI TOSHINARI , SATO TAKAYUKI
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To expose a prescribed position on a film with high accuracy without changing a mask even when the film which is exposure subject is deformed or biased in the width direction due to such as heat expansion, heat shrinkage and meandering of the film.SOLUTION: Exposure light emitted from light sources 5A, 5B to a film 1 which is exposure subject are respectively transmitted and radiated through an aperture 3A or masks 2A, 2B. A plurality of slits 2b inclining in the direction of the movement of the film are provided in a mask 2 and the width and the spacing of the slits are linearly varied along the moving direction of the film. An aperture 3 has an opening 3b extending in the direction orthogonal to the moving direction of the film and a control apparatus moves the mask 2 in the moving direction of the film relatively to the aperture 3 on the basis of the positions of a substrate alignment mark 1a and a mask alignment mark 2e detected by a camera 7.
摘要翻译：要解决的问题：即使当曝光对象的膜由于热膨胀，热收缩和曲折等而在宽度方向上变形或偏移时，即使在不改变掩模的情况下也能高精度地曝光胶片上的规定位置的电影。解决方案：从光源5A，5B发射到作为曝光对象的胶片1的曝光光分别透过孔3A或掩模2A，2B照射。沿着膜的移动方向倾斜的多个狭缝2b设置在掩模2中，狭缝的宽度和间距沿着膜的移动方向线性地变化。孔3具有在与膜的移动方向正交的方向上延伸的开口3b，并且控制装置基于基板对准标记的位置使膜2相对于孔3沿胶片移动方向移动 1a和由照相机7检测的掩模对准标记2e。（C）版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2014222746A 露光装置及び露光方法审中-公开
标题翻译：曝光装置和曝光方法
公开(公告)号：JP2014222746A
公开(公告)日：2014-11-27
申请号：JP2013102605
申请日：2013-05-14
申请人：株式会社ブイ・テクノロジー , V Technology Co Ltd
发明人： ARAI TOSHINARI , SATO TAKAYUKI
IPC分类号： H01L21/027 , G03F7/20 , G03F7/22
摘要：【課題】基板サイズが変わった場合にも、ショット数を変えずに全面に繰り返しパターンの露光処理を行い、基板サイズに拘わらず一定の露光処理時間で良好な生産性を確保することができる露光装置を提供する。【解決手段】露光装置は、ショット数設定領域As内の一つの1ショット分露光領域Bpを露光するために、ショット数設定領域As毎に配置されるマイクロレンズ4Aを設定配列ピッチで2次元的に複数配列したマイクロレンズアレイ4と、1ショット分露光領域Bpに繰り返しパターンを投影露光するマスクと、光を照射する光源と、1ショット分露光領域Bp毎の露光位置を順次シフトさせる露光位置シフト手段とを備え、露光位置シフト手段は、ショット数設定領域As内の一つの1ショット分露光領域Bpを露光した後、ショット数設定領域As内の隣接する1ショット分露光領域Bpを露光する動作を繰り返し、ショット数設定領域As内を全て露光する。【選択図】図4
摘要翻译：要解决的问题：提供一种曝光装置，即使在基板尺寸变化时也能够在不改变拍摄张数的情况下对整个区域进行重复图案的曝光处理，无论基板尺寸如何，都能通过一定的曝光处理时间实现高生产率。解决方案：曝光装置包括：微透镜阵列4，其中以每个喷射数量预置区域As布置的微透镜4A以预设的排列间距二维排列，用于在喷射数量预设中曝光一个单次曝光区域Bp 地区; 用于投影的掩模，用于在单次曝光区域Bp上曝光重复图案; 用于照射光的光源; 以及曝光位置偏移装置，用于相对于每个一次曝光区域Bp顺序移动曝光位置。曝光位置移动装置重复在曝光数量预设区域A 1中曝光一个曝光区域Bp之后的操作，以暴露拍摄数量预设区域中的相邻一次曝光区域Bp。为了曝光拍摄数量预设的整个区域区域As。

5. 发明专利

JP2013167831A Polarization exposure device and polarization exposure method 有权
标题翻译：极化曝光装置和极化曝光方法
公开(公告)号：JP2013167831A
公开(公告)日：2013-08-29
申请号：JP2012032159
申请日：2012-02-16
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： SATO TAKAYUKI
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To facilitate the adjustment of the angle of the polarization axis of a polarizer and an angle in the direction of exposure scanning when exposure is carried out on a target exposure surface via a mask.SOLUTION: A polarization exposure device comprises: a wide light source 2 along a direction intersecting one axis along the direction of exposure scanning; and a mask 3 having a width corresponding to the width of the light source 2. The mask 3 has mask patterns 31 on a face of a mask base material 30 which is not opposite the light source 2, and a polarizer layer 32 covering the mask patterns 31 and having a polarization axis angle, which is an angle set with respect to the one axis.
摘要翻译：要解决的问题：当通过掩模对目标曝光表面进行曝光时，便于调节偏光镜的偏振轴的角度和曝光扫描方向上的角度。解决方案：偏振曝光装置包括：沿着沿着曝光扫描方向与一个轴相交的方向的宽光源2; 以及具有对应于光源2的宽度的宽度的掩模3.掩模3在掩模基材30的与光源2不相对的表面上具有掩模图案31，并且覆盖掩模的偏振层32 图案31并且具有相对于一个轴设定的角度的偏振轴角度。

6. 发明专利

JP2013097276A Exposure device 审中-公开
标题翻译：曝光装置
公开(公告)号：JP2013097276A
公开(公告)日：2013-05-20
申请号：JP2011241671
申请日：2011-11-02
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： ARAI TOSHINARI , SATO TAKAYUKI
IPC分类号： G03F9/00 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide an exposure device capable of accurately correcting the position of a mask when the position of the mask is deviated in a direction orthogonal to a moving direction of an exposure object base material during exposure due to a secular change or the like of the exposure device.SOLUTION: A reference plate 4 is disposed to interpose between a light source and a mask 3. The reference plate 4 is provided with a first reference mark 41 showing a reference of a position where the mask 3 is to be disposed for every mask 3. A first reference mark 41 and a mask alignment mark (slit 32) are detected by a camera 51. A control section 7 detects a deviation of the mask 3 in a direction orthogonal to a film moving direction on the basis of a distance a between both the detected marks 41 and 32 and corrects the position of the mask 3 by a drive section 6.
摘要翻译：要解决的问题：提供一种能够在掩膜的位置沿着与曝光对象基材的移动方向正交的方向上偏移时由于世俗而在曝光期间能够精确地校正掩模的位置的曝光装置改变曝光装置等。
解决方案：参考板4设置成插入在光源和掩模3之间。参考板4设置有第一参考标记41，其示出了每个将要设置掩模3的位置的参考掩模3.第一参考标记41和掩模对准标记（狭缝32）由照相机51检测。控制部分7基于距离来检测掩模3在与胶片移动方向正交的方向上的偏差 a在两个检测标记41和32之间，并通过驱动部分6校正掩模3的位置。版权所有：（C）2013，JPO＆INPIT

7. 发明专利

JP2014021239A Exposure device 有权
标题翻译：曝光装置
公开(公告)号：JP2014021239A
公开(公告)日：2014-02-03
申请号：JP2012158850
申请日：2012-07-17
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： ARAI TOSHINARI , SATO TAKAYUKI
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To enable high-precision positional adjustments of a mask and a film even in a case where an alignment mark is formed by an ink in the vicinity of a region targeted for coating an oriented film formation material and where an oriented film formation material is coated on the region targeted for coating.SOLUTION: An exposure device 100 comprises: a film conveying unit 15; a marking unit 4 for forming an alignment mark with an ink within a marking region in the vicinity of a coating target region on which a liquid oriented film formation material including an organic solution is to be coated; a slit coater 5 for coating the liquid oriented film formation material including the organic solution onto the region targeted for coating the oriented film formation material atop the film 2 on which the alignment mark has been formed; a drying device 6 for drying the alignment mark and oriented film formation material; and an exposure unit 7 for executing exposure following the positional adjustment of the oriented film formation material atop the film 2 and a photomask. The drying device 6 is arrayed at a position capable of drying the alignment mark prior to the smear of the alignment mark due to the dissolution of the oriented film formation material.
摘要翻译：要解决的问题：即使在用于涂布取向膜形成材料的目标区域附近由油墨形成对准标记的情况下，也能够进行掩模和膜的高精度位置调整，并且定向膜成膜材料涂覆在涂覆目标的区域上。曝光装置100包括：胶片输送单元15; 用于在其上涂覆有包含有机溶液的液体取向膜形成材料的涂覆目标区域附近的标记区域内的油墨形成对准标记的标记单元4; 用于将包含有机溶液的液体取向膜形成材料涂覆在其上形成有对准标记的膜2顶上的用于涂覆取向膜形成材料的区域上的狭缝涂布机5; 用于干燥对准标记和取向膜形成材料的干燥装置6; 以及曝光单元7，用于在膜2上方的取向成膜材料的位置调整和光掩模之间进行曝光。干燥装置6排列在能够在由于取向膜形成材料的溶解引起的对准标记的拖尾之前干燥对准标记的位置。

8. 发明专利

JP2013044971A Film exposure device 审中-公开
标题翻译：电影曝光装置
公开(公告)号：JP2013044971A
公开(公告)日：2013-03-04
申请号：JP2011183132
申请日：2011-08-24
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KANAO MASAYASU , SATO TAKAYUKI , TOMIZUKA YOSHIHIRO
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To suppress winkles occurring on an exposure surface to form a mask pattern with high accuracy on the exposure surface, in an exposure device which exposes a mask pattern on a film-shaped object to be exposed.SOLUTION: A film exposure device 1 includes: a film conveyance section 2, a photomask 3, a mask holding section 4 and a light irradiation section 5. The photomask 3 includes a first mask pattern 31 and a second mask pattern 32 which are arranged in a conveyance direction of an object F to be exposed. The mask holding section 4 includes a light-shielding plate 41 which is extended to cross the conveyance direction of the object F to be exposed between the first mask pattern 31 and the second mask pattern 32 and is erected from an exposure surface a, and air blowing ports 42 (42A and 42B) which blow air in an extension direction of the light-shielding plate 41 and cool the photomask 3 through an opening 4a.
摘要翻译：要解决的问题：为了抑制在曝光表面上以高精度形成掩模图案的曝光表面上发生的闪光，在曝光的薄膜状物体上露出掩模图案的曝光装置中。＆lt; P＆gt;解决方案：胶片曝光装置1包括：胶片输送部2，光掩模3，掩模保持部4和光照射部5.光掩模3包括第一掩模图案31和第二掩模图案32，被布置在要暴露的物体F的输送方向上。掩模保持部4包括遮光板41，该遮光板41与第一掩模图案31和第二掩模图案32之间暴露在物体F的传送方向上延伸并从曝光表面a竖立，并且空气吹送端口42（42A和42B），其沿遮光板41的延伸方向吹动空气，并通过开口4a冷却光掩模3。版权所有（C）2013，JPO＆INPIT

9. 发明专利

JP2012103361A Exposure device 有权
标题翻译：曝光装置
公开(公告)号：JP2012103361A
公开(公告)日：2012-05-31
申请号：JP2010250089
申请日：2010-11-08
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： SATO TAKAYUKI , KANAO MASAYASU
IPC分类号： G03F9/00 , G02F1/13 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide an exposure device capable of accurately adjusting the position of a mask with respect to an exposure object member by changing an alignment mark for mask position adjustment corresponding to the meandering of the exposure object member even when the exposure object member is continuously supplied, and capable of highly accurately and stably performing exposure.SOLUTION: An exposure device 1 is provided in which an alignment mark forming part 13 is disposed on the upstream side from an irradiation position of exposure light and an alignment mark 2a in which an intermittent index is applied in the moving direction of an exposure object member 2 is formed. A detection part 14 detects a position in the index position of the alignment mark 2a in the direction crossing the moving direction of the exposure object member 2. Then, a meandering amount of the alignment mark 2a is calculated from the detection results of the detection part 14 to move the alignment mark forming part 13. Alternatively, the position of a mask 12 is adjusted when the detection part 14 is disposed so as to correspond to the irradiation position of exposure light.
摘要翻译：要解决的问题：提供一种曝光装置，其能够通过改变对应于曝光对象构件的曲折的掩模位置调整的对准标记，即使在曝光对象构件被连续地供给，并且能够高度准确和稳定地进行曝光。解决方案：设置曝光装置1，其中对准标记形成部分13设置在从曝光光的照射位置的上游侧，以及对准标记2a，其中沿着移动方向施加间歇指数形成曝光物体2。检测部14检测对准标记2a的指示位置与曝光对象部件2的移动方向交叉的方向的位置。然后，从检测部的检测结果算出对准标记2a的曲折量 14，移动对准标记形成部13.或者，当检测部14配置为与曝光光的照射位置对应时，调整掩模12的位置。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2013182210A Manufacturing device and manufacturing method of three-dimensional liquid crystal display device 有权
标题翻译：三维液晶显示装置的制造装置和制造方法
公开(公告)号：JP2013182210A
公开(公告)日：2013-09-12
申请号：JP2012047207
申请日：2012-03-02
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： SATO TAKAYUKI , TOMIZUKA YOSHIHIRO
IPC分类号： G02F1/13363 , G02B5/30 , G02F1/13
CPC分类号： G09G3/00 , G02B27/26 , G02F1/1303 , G02F2001/133631 , G03F7/2022 , G09G3/003 , H04N13/0409 , H04N13/0497
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing device and a manufacturing method of a three-dimensional liquid crystal display device, capable of preventing quality decline of stereoscopic images due to sticking accuracy without the need of sticking a liquid crystal display panel and a retardation plate together by forming a retardation layer directly on the liquid crystal display panel.SOLUTION: When an alignment layer is formed at a polarization part for a right eye and a polarization part for a left eye while matching positions of photomasks 3a and 3b with a pixel line of a liquid crystal display panel 1 with an alignment mark 9 of the liquid crystal display panel 1 as a reference, and a liquid crystal film is formed further, a retardation layer is formed directly on the liquid crystal display panel 1. In such a manner, since the retardation layer is formed directly on the liquid crystal display panel in the present invention, the need of sticking the liquid crystal display panel 1 and the retardation plate together is eliminated, and the polarization part for a right eye of the retardation layer is piled up on a pixel for a right eye of the liquid crystal display panel 1 and the polarization part for a left eye of the retardation layer is piled up on a pixel for a left eye of the liquid crystal display panel 1 with excellent accuracy.
摘要翻译：要解决的问题：为了提供一种三维液晶显示装置的制造装置和制造方法，能够防止由于粘贴精度导致的立体图像的质量下降，而不需要粘附液晶显示面板和相位差板一起通过在液晶显示面板上直接形成延迟层。解决方案：当在光栅3a和3b的位置与像素线匹配的同时，在用于右眼的偏振部分和左眼的偏振部分上形成取向层时，以液晶显示面板1的对准标记9为基准的液晶显示面板1进一步形成液晶膜，直接在液晶显示面板1上形成延迟层。以这种方式由于在本发明中由于延迟层直接形成在液晶显示面板上，所以需要粘贴液晶显示面板消除了相位差板，将相位差层的右眼的偏振部分堆积在液晶显示面板1的右眼的像素和延迟层的左眼的偏振部分以高精度堆积在液晶显示面板1的左眼的像素上。

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