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1. 发明专利

JP2014237085A 塗布装置审中-公开
标题翻译：涂装装置
公开(公告)号：JP2014237085A
公开(公告)日：2014-12-18
申请号：JP2013120521
申请日：2013-06-07
申请人：株式会社ブイ・テクノロジー , V Technology Co Ltd
发明人： ARAI TOSHINARI , HASHIMOTO KAZUSHIGE
IPC分类号： B05C5/02 , B05C11/10 , B05D1/26 , H01L21/027
摘要：【課題】液晶ディスプレイ等のガラス基板にレジスト等の塗布液を塗布する際に、ガラス基板の裏面のレジストによる汚れを防止し、ガラス基板上の全面にレジストを塗布し、ガラス基板の無駄を少なくする基板塗布装置を提供する。【解決手段】角型テーブル2の各側面に上面に平行な方向に気体を噴射する噴射口20が設けられ、該噴射口20に圧縮空気を供給する空気圧縮装置と、角型テーブル側面を取り囲む吸引ノズル9と、吸引用ノズル9に接続された真空装置と、基板上に塗布材を塗布するスリット状の吐出口を有し、該スリットの長さが角型テーブル2の一辺の長さより長い塗布ノズルと、角型テーブル2を塗布用ノズルに対し相対的に移動させる移動手段とを有することを特徴とする。【選択図】図3
摘要翻译：要解决的问题：提供一种基板涂布装置，其中当诸如抗蚀剂的涂布液涂覆在诸如液晶显示器的玻璃基板上时，防止了玻璃基板的后表面与抗蚀剂的污染，抗蚀剂被涂覆在玻璃基板上的整个区域上，并且玻璃基板无用。可以降低基板涂覆装置。空气压缩装置包括：空气压缩装置，角台2的每个侧面设置有喷射头20 用于在平行于顶面的方向上喷射气体，并将压缩空气供给到喷射嘴20; 围绕所述角台的侧面的吸嘴9; 连接到吸嘴9的真空单元; 涂料喷嘴，其具有用于将涂料涂覆在基材上的狭缝状排出口，所述狭缝的长度比所述角度台2的一个边缘长; 以及用于将角台2相对于涂布喷嘴传送的传送装置。

2. 发明专利

JP2014098853A Inspection device for lamination position of polarizing film 审中-公开
标题翻译：偏光膜层压位置检查装置
公开(公告)号：JP2014098853A
公开(公告)日：2014-05-29
申请号：JP2012251454
申请日：2012-11-15
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： ARAI TOSHINARI , HASHIMOTO KAZUSHIGE , TOMIZUKA YOSHIHIRO
IPC分类号： G02B5/30 , G01M11/00 , G02F1/13 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To provide an inspection device for a lamination position of a polarizing film, configured in such a manner that a lamination position of a polarizing film with a liquid crystal display panel is inspected after laminating these components in a lamination step, the polarizing film is replaced by another film if necessary, and thereby, a liquid crystal display panel having a lamination failure is prevented from being delivered to the succeeding manufacturing process, and that, it is unnecessary to increase a width of a black matrix for accepting misalignment of a lamination position between a polarizing film and a liquid crystal display panel.SOLUTION: In an inspection device 1 for a lamination position of a polarizing film, pattern surfaces of a polarizing film 3 and of a color filter substrate 6 can be observed from a single image, and thereby, the number of inspection for photographing a plurality of images can be reduced. Further, as focus adjustment onto the pattern surface of the color filter substrate 6 after focusing onto the polarizing film 3 is unnecessary, inspection with high accuracy and high throughput can be performed.
摘要翻译：要解决的问题：为了提供一种偏振膜的层叠位置的检查装置，其以在层压这些部件之后检查偏振膜与液晶显示面板的层压位置的方式配置，如果需要，偏光膜被另一薄膜代替，从而防止具有层压失败的液晶显示面板被输送到后续的制造过程中，并且不需要增加用于接受未对准的黑矩阵的宽度在偏振膜和液晶显示面板之间的层压位置。解决方案：在用于偏振膜的层叠位置的检查装置1中，可以从偏振膜3和滤色器基板6的图案表面观察偏振膜3和滤色器基板6的图案表面。因此，可以减少拍摄多张图像的检查次数。此外，由于不需要在聚焦到偏光膜3上之后对滤色器基板6的图案表面进行焦点调整，因此可以进行高精度和高通量的检查。

3. 发明专利

JP2014038178A Photo-alignment exposure apparatus 审中-公开
标题翻译：照相曝光装置
公开(公告)号：JP2014038178A
公开(公告)日：2014-02-27
申请号：JP2012179963
申请日：2012-08-14
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： HASHIMOTO KAZUSHIGE , ARAI TOSHINARI
IPC分类号： G02F1/1337 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To eliminate alignment disturbance near a boundary in a division region of a unit image region when a photo-alignment exposure system is applied to a multi-domain method.SOLUTION: A photo-alignment exposure apparatus 10 is provided, for dividing each unit image region of a liquid crystal display element into a plurality of division regions and photo-aligning an alignment material film in each division region in a direction different from others. The apparatus includes a light source unit 11 emitting exposure light, a mask pattern M corresponding to one division region of the plurality of division regions, and an optical system for irradiating an exposure target surface Bs with light emitting from the light source unit 11 through the mask pattern M. The optical system sets a first imaging plane F1 on a light emitting plane Ms of the mask pattern M and a second imaging plane F2 on the exposure target surface Bs, and includes a reflective imaging optical system 13 between the first imaging plane F1 and the second imaging plane F2.
摘要翻译：要解决的问题：当将光取向曝光系统应用于多畴方法时，消除单位图像区域的分割区域的边界附近的取向扰动。解决方案：提供光取向曝光装置10，用于将液晶显示元件的单位图像区域分割为多个分割区域，并且在各分割区域中沿与其他方向不同的方向对准取向膜。该装置包括发射曝光的光源单元11，与多个划分区域中的一个划分区域相对应的掩模图案M，以及用于通过光源单元11从光源单元11发射的光照射曝光目标表面Bs的光学系统掩模图案M.光学系统在掩模图案M的发光面M s和曝光对象面Bs上的第二成像面F2上设置第一成像面F1，并且在第一成像面 F1和第二成像平面F2。

4. 发明专利

JP2013083838A Film exposure device 有权
标题翻译：电影曝光装置
公开(公告)号：JP2013083838A
公开(公告)日：2013-05-09
申请号：JP2011224387
申请日：2011-10-11
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： ARAI TOSHINARI , HASHIMOTO KAZUSHIGE
IPC分类号： G03F7/24 , G02B5/30 , G02F1/1335 , G02F1/1337 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a film exposure device in which degradation of formation accuracy of a polarization portion caused by vertical vibration of a thin film is prevented and occurence of wrinkling can be prevented, and that is capable of obtaining a polarization film of which a polarization portion is formed with high accuracy.SOLUTION: A film 10 with an alignment material applied thereon is wound around a back roll 5 and is then fed to a winder of a polarization film. The film 10 is supported with wrinkling being stretched by the back roll 5. In a moving region of the film, a mask 7 and a slit mask 17 are arranged. Through an aperture of the mask 7, exposure light of CW circular polarization from an exposure light source 6 is projected on almost all of a surface of the film 10, and through a plurality of slits of the slit mask 17, exposure light of CCW circular polarization from an exposure light source 16 is projected in a strip shape on the film 10.
摘要翻译：要解决的问题：提供一种胶片曝光装置，其中可以防止由薄膜的垂直振动引起的偏振部分的形成精度的降低，并且可以防止起皱的发生，并且能够获得极化以高精度形成偏振部分的胶片。解决方案：将涂覆有取向材料的薄膜10缠绕在后辊5上，然后被送入偏光膜卷绕机。薄膜10由后辊5拉伸起皱。支撑在薄膜10的移动区域中，配置有荫罩7和狭缝掩模17。通过掩模7的光圈，来自曝光光源6的CW圆偏振的曝光光投影在膜10的几乎所有表面上，并且通过狭缝掩模17的多个狭缝，CCW圆形的曝光光来自曝光光源16的偏振在薄膜10上投影成带状。（C）版权所有（C）2013，JPO＆INPIT

5. 发明专利

JP2012173641A Scanning exposure apparatus 有权
标题翻译：扫描曝光装置
公开(公告)号：JP2012173641A
公开(公告)日：2012-09-10
申请号：JP2011037515
申请日：2011-02-23
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , ARAI TOSHINARI , TAKESHITA TAKURO
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a scanning exposure apparatus that can be reduced in size in its entirety and allows reduction in length of a substrate transfer system, thereby allowing the transfer system to be assembled as a single device.SOLUTION: A light source 37 in a first exposure region 22 outputs exposure light 25 to be inclined from the vertical direction in the forward direction with respect to the substrate transfer direction. The exposure light 25 is reflected by a reflection member 33 to be applied to a mask 31 disposed upstream of the substrate transfer direction with respect to this reflection member 33 as light inclined to extend toward the upstream of the substrate transfer direction with respect to the vertical direction. A light source 38 in a second exposure region 23 outputs exposure light 26 to be inclined from the vertical direction in the direction opposite to the substrate transfer direction. The exposure light 25 and the exposure light 26 as being parallel to each other are applied to a substrate 1.
摘要翻译：要解决的问题：提供一种整体尺寸减小的扫描曝光装置，并且可以减小基板传送系统的长度，从而允许将传送系统组装成单个装置。解决方案：第一曝光区域22中的光源37输出相对于基板传送方向在垂直方向上倾斜的曝光光25。曝光光25被反射构件33反射，被施加到相对于该反射构件33设置在基板传送方向上游的掩模31，作为倾斜于相对于垂直方向朝向基板传送方向的上游延伸的光方向。在第二曝光区域23中的光源38输出沿与基板传送方向相反的方向从垂直方向倾斜的曝光光26。将曝光光25和曝光光26彼此平行地施加到基板1上。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2012141367A Exposing device, polarization converting member and exposing method 审中-公开
标题翻译：曝光装置，偏光转换构件和曝光方法
公开(公告)号：JP2012141367A
公开(公告)日：2012-07-26
申请号：JP2010292624
申请日：2010-12-28
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： ARAI TOSHINARI , HASHIMOTO KAZUSHIGE
IPC分类号： G03F7/20 , G02B5/30 , G02F1/1337 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an exposing device, a polarization converting member and an exposing method using them by which an exposure pattern forming region may be prevented from having an unexposed portion remained when a member for converting exposure light into linearly polarized light of P-polarized light or S-polarized light includes a plurality of rod-like polarization converting elements.SOLUTION: In an exposing device 1, an exposed member 2 is supplied to a position irradiated with exposure light so as to continuously expose an exposure material formed on the exposed member. The exposing device 1 comprises a light source 11 for emitting the exposure light; a polarization converting member 15 for linearly polarizing and transmitting the exposure light; and a mask part 12. In the polarization converting member 15, a plurality of rod-like polarization converting members transmitting specific linearly polarized exposure light alone are disposed to be in contact with one another along their widthwise direction and to have their boundary surfaces inclined against a moving direction of the exposed member 2.
摘要翻译：要解决的问题：为了提供一种曝光装置，偏振转换构件和使用它们的曝光方法，当用于将曝光光转换成线性偏振的构件时，可以防止曝光图案形成区域具有未曝光部分 P偏振光或S偏振光的光包括多个棒状偏振转换元件。解决方案：在曝光装置1中，暴露部件2被供给到用曝光光照射的位置，以便连续曝光形成在曝光部件上的曝光材料。曝光装置1包括用于发射曝光光的光源11; 用于线性偏振和透射曝光光的偏振转换元件15; 以及掩模部分12.在偏振转换部件15中，多个透射特定的线性偏振曝光光的棒状偏光转换部件沿其宽度方向彼此接触并且使其边界面倾斜曝光构件2的移动方向。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2009251572A Substrate for multiple exposure 审中-公开
标题翻译：用于多次曝光的基板
公开(公告)号：JP2009251572A
公开(公告)日：2009-10-29
申请号：JP2008103402
申请日：2008-04-11
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： ISHII DAISUKE , ARAI TOSHINARI
IPC分类号： G02F1/13 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a substrate for multiple exposure which supplies an exposure substrate to a proximity exposure device exposing the exposure substrate using a plurality of exposure masks smaller in area than that of an exposure region of the exposure substrate , the exposure mask facing the exposure substrate. SOLUTION: This substrate for multiple exposure supplies an exposure substrate to the proximity exposure device exposing the exposure substrate using the plurality of exposure masks smaller in area than that of the exposure region of the exposure substrate, the exposure mask facing the exposure substrate. The substrate for multiple exposure has a plurality of active regions and a plurality of inactive regions, where the dimension of each inactive region is integer multiple of the pixel pitch of the active region. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种用于多次曝光的基板，其将曝光基板提供给使用比曝光基板的曝光区域小的面积的多个曝光掩模曝光曝光基板的接近曝光装置，曝光掩模面向曝光基板。解决方案：用于多次曝光的该衬底将曝光衬底提供给使用比曝光衬底的曝光区域更小面积的多个曝光掩模曝光曝光衬底的曝光衬底，曝光掩模面向曝光衬底。用于多次曝光的基板具有多个有源区域和多个非活性区域，其中每个非活性区域的尺寸是有源区域的像素间距的整数倍。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2014021239A Exposure device 有权
标题翻译：曝光装置
公开(公告)号：JP2014021239A
公开(公告)日：2014-02-03
申请号：JP2012158850
申请日：2012-07-17
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： ARAI TOSHINARI , SATO TAKAYUKI
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To enable high-precision positional adjustments of a mask and a film even in a case where an alignment mark is formed by an ink in the vicinity of a region targeted for coating an oriented film formation material and where an oriented film formation material is coated on the region targeted for coating.SOLUTION: An exposure device 100 comprises: a film conveying unit 15; a marking unit 4 for forming an alignment mark with an ink within a marking region in the vicinity of a coating target region on which a liquid oriented film formation material including an organic solution is to be coated; a slit coater 5 for coating the liquid oriented film formation material including the organic solution onto the region targeted for coating the oriented film formation material atop the film 2 on which the alignment mark has been formed; a drying device 6 for drying the alignment mark and oriented film formation material; and an exposure unit 7 for executing exposure following the positional adjustment of the oriented film formation material atop the film 2 and a photomask. The drying device 6 is arrayed at a position capable of drying the alignment mark prior to the smear of the alignment mark due to the dissolution of the oriented film formation material.
摘要翻译：要解决的问题：即使在用于涂布取向膜形成材料的目标区域附近由油墨形成对准标记的情况下，也能够进行掩模和膜的高精度位置调整，并且定向膜成膜材料涂覆在涂覆目标的区域上。曝光装置100包括：胶片输送单元15; 用于在其上涂覆有包含有机溶液的液体取向膜形成材料的涂覆目标区域附近的标记区域内的油墨形成对准标记的标记单元4; 用于将包含有机溶液的液体取向膜形成材料涂覆在其上形成有对准标记的膜2顶上的用于涂覆取向膜形成材料的区域上的狭缝涂布机5; 用于干燥对准标记和取向膜形成材料的干燥装置6; 以及曝光单元7，用于在膜2上方的取向成膜材料的位置调整和光掩模之间进行曝光。干燥装置6排列在能够在由于取向膜形成材料的溶解引起的对准标记的拖尾之前干燥对准标记的位置。

9. 发明专利

JP2014016379A Photo-aligning exposure method and photo-aligning exposure device 有权
标题翻译：照相曝光方法和照相曝光装置
公开(公告)号：JP2014016379A
公开(公告)日：2014-01-30
申请号：JP2012151629
申请日：2012-07-05
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： KAJIYAMA KOICHI , HASHIMOTO KAZUSHIGE , ARAI TOSHINARI
IPC分类号： G02F1/1337
CPC分类号： G02F1/133788 , G02F1/133753 , G02F2001/133757
摘要： PROBLEM TO BE SOLVED: To eliminate alignment disturbance near a boundary in a divided region of a unit image region when an alignment exposure system is applied to a multidomain method.SOLUTION: A photo-alignment exposure method is provided, in which each unit image region Pa of a liquid crystal display element is divided into a plurality of divided regions Da1 and Da2, and alignment material films in the divided regions are aligned by light into different directions from each other. The method includes: a first exposure step of irradiating the whole exposure target surface of the unit image region Pa with light inclined at an irradiation angle θ1; and a second exposure step of irradiating one region (a second divided region Da2) of the divided regions with light inclined at an irradiation angle θ2 that is different from the irradiation angle in the first exposure step. In the second exposure step, the light is projected through a mask pattern corresponding to the one region (the second divided region Da2) of the divided regions, and transmitted light from the mask pattern is condensed by condensing means 13 to irradiate the second divided region Da2 to be exposed.
摘要翻译：要解决的问题：当将取向曝光系统应用于多畴方法时，消除单位图像区域的分割区域中的边界附近的取向扰动。解决方案：提供了一种光取向曝光方法，其中每个单位图像区域液晶显示元件的Pa被分成多个分割区域Da1和Da2，并且分割区域中的取向材料膜彼此以不同的方向被光排列。该方法包括：第一曝光步骤，用以照射角度θ倾斜的光照射单位图像区域Pa的整个曝光目标表面; 以及第二曝光步骤，用与第一曝光步骤中的照射角度不同的照射角度θ的光照射分割区域的一个区域（第二分割区域Da2）。在第二曝光步骤中，光通过与分割区域的一个区域（第二分割区域Da2）对应的掩模图案投射，并且来自掩模图案的透射光被聚光装置13会聚，以照射第二分割区域 Da2被暴露。

10. 发明专利

JP2013167832A Polarized light irradiation method, manufacturing method of exposed material, and exposure apparatus 审中-公开
标题翻译：极光照射方法，曝光材料的制造方法和曝光装置
公开(公告)号：JP2013167832A
公开(公告)日：2013-08-29
申请号：JP2012032183
申请日：2012-02-16
申请人： V Technology Co Ltd , 株式会社ブイ・テクノロジー
发明人： HASHIMOTO KAZUSHIGE , ARAI TOSHINARI , HATANAKA MAKOTO
IPC分类号： G03F7/20 , G02F1/1337 , G09F9/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a polarized light irradiation method or the like, which has a uniform polarization axis angle on an irradiated surface.SOLUTION: The polarized light irradiation method according to the invention comprises: a first uniformization step of uniformizing light intensity distribution of light from a light source; a first collimating step of converting, to parallel light, light having the light intensity distribution uniformized by the first uniformization step; a second uniformization step of receiving the light having the uniform light intensity distribution and converted to the parallel light by the first collimating step, and uniformizing light intensities of a plural pieces of incident light that are focused at respective incident points with respect to a polarization element in order to uniformize the incident angles of the pieces of light incident to the respective incident points; a second collimating step of converting, to the parallel light, the light in which the light intensities of the plural pieces of the incident light are uniformized by the second uniformization step; and an irradiation step of splitting the light converted to the parallel light by the second collimating step in accordance with a polarization component by the polarization element, and irradiating an irradiation object with the polarized light.
摘要翻译：要解决的问题：提供在照射表面上具有均匀的偏振轴角度的偏振光照射方法等。解决方案：根据本发明的偏振光照射方法包括：使光强分布均匀化的第一均匀化步骤来自光源的光; 将具有由第一均匀化步骤均匀化的光强度分布的光转换为平行光的第一准直步骤; 第二均匀化步骤，通过第一准直步骤接收具有均匀的光强度分布并转换成平行光的光，并且使相对于偏振元件的各个入射点聚焦的多个入射光的光强度均匀化; 以使入射到各个入射点的光的入射角均匀化; 第二准直步骤，通过第二均匀化步骤将多个入射光的光强度均匀化的光转换成平行光; 以及照射步骤，通过第二准直步骤根据偏振元件的偏振分量分割转换成平行光的光，并用偏振光照射照射对象。

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