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    • 6. 发明申请
    • Continuous OLED coating machine
    • 连续式OLED涂布机
    • US20070009652A1
    • 2007-01-11
    • US11406806
    • 2006-04-19
    • Dieter ManzMarcus BenderUwe HoffmannDieter HaasUlrich EnglertHeino LehrAchim Gurke
    • Dieter ManzMarcus BenderUwe HoffmannDieter HaasUlrich EnglertHeino LehrAchim Gurke
    • B05D5/12C23C16/00C23C14/00
    • C23C14/042C23C14/20C23C14/568
    • Aspects of the present invention concern a device and a process for continuous production of substrates provided with organic electroluminescent materials (OLED), especially OLED displays, screens, panels or other lighting elements, in which the device has a vacuum space and a transport device for transporting the substrates to be coated, which is at least partially arranged along the vacuum space and comprises carriers for the substrates, with the transport device comprising at least one endless loop for transport of the carriers and with the vacuum space being divided at least into two with a first part, in which is provided a first section of the transport device for transporting the carriers in a first direction (substrate-transport direction), and with a second part, in which is provided a second section of the transport device for transport of the carriers in a second direction (carrier-return-transport direction). Correspondingly, the masks necessary for structuring the OLED coatings are cleaned advantageously directly during return transport and no mask stockpiling is required.
    • 本发明的方面涉及一种用于连续生产具有有机电致发光材料(OLED),特别是OLED显示器,屏幕,面板或其它照明元件的衬底的器件和方法,其中该器件具有真空空间和用于 运送待被涂覆的基底,其至少部分地沿着真空空间布置并且包括用于基底的载体,所述输送装置包括至少一个用于输送载体的无端环,并且真空空间至少分成两部分 具有第一部分,其中设置有用于沿第一方向(基板输送方向)传送载体的输送装置的第一部分,以及第二部分,其中设置有运输装置的第二部分 的载体在第二方向(载体返回传输方向)上。 相应地,用于构造OLED涂层所需的掩模有利地直接在返回传送期间被清洁,并且不需要掩模储存。
    • 8. 发明申请
    • SPUTTER DEPOSITION SYSTEM AND METHOD
    • 溅射沉积系统和方法
    • US20110100799A1
    • 2011-05-05
    • US12612651
    • 2009-11-04
    • Andreas LoppMarcus Bender
    • Andreas LoppMarcus Bender
    • C23C14/35
    • H01J37/3405C23C14/351H01J37/347
    • A sputter deposition system adapted for depositing a thin film onto a substrate surface is provided. The system includes a cathode assembly having at least two cathode targets opposing the substrate surface and adapted for providing cathode material for forming the thin film. A plasma source is adapted for generating a plasma for sputtering cathode material off the at least two cathode targets. A magnetic field generator is adapted for providing a magnetic field which is controllable independently of the plasma source such that such that a difference between high deposition rate portions and low deposition rate portions is compensated by the action of the magnetic field on charged particle movements.
    • 提供了一种适用于将薄膜沉积到衬底表面上的溅射沉积系统。 该系统包括阴极组件,其具有与衬底表面相对的至少两个阴极靶,并适于提供用于形成薄膜的阴极材料。 等离子体源适于产生用于将阴极材料溅射出至少两个阴极靶的等离子体。 磁场发生器适于提供可独立于等离子体源控制的磁场,使得通过磁场对带电粒子运动的作用来补偿高沉积速率部分和低沉积速率部分之间的差异。