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1. 发明授权

US06905776B1 Conductive transparent layers and method for their production 有权
标题翻译：导电透明层及其制造方法
公开(公告)号：US06905776B1
公开(公告)日：2005-06-14
申请号：US09686417
申请日：2000-10-11
申请人： Johannes Stollenwerk , Andreas Klöppel , Marcus Bender
发明人： Johannes Stollenwerk , Andreas Klöppel , Marcus Bender
IPC分类号： C03C17/36 , B32B3/00 , B05D3/02 , B32B15/00 , B32B15/04 , B32B19/00
CPC分类号： C03C17/3618 , C03C17/36 , C03C17/3671 , Y10T428/31678
摘要： On a glass substrate, a base layer of indium cerium oxide is deposited, and on this a thin copper-containing silver layer, both produced by means of DC sputtering. On top there is another indium cerium oxide layer, which is produced by means of AC-superimposed DC sputter deposition. This layer system boasts very low surface resistivity combined with high transparency in the visible part of the spectrum, which means it has a high Haacke quality factor.
摘要翻译：在玻璃基板上沉积氧化铟镓的基底层，并在其上形成薄的含铜银层，均由DC溅射制成。在顶部还有另一个氧化铟铈层，它通过AC叠加的DC溅射沉积法生产。该层系统具有非常低的表面电阻率，并且在可见光谱部分具有高透明度，这意味着它具有较高的Haacke品质因数。

2. 发明授权

US06623607B1 Substrate coated with an MGO-layer 失效
标题翻译：涂有MGO层的基材
公开(公告)号：US06623607B1
公开(公告)日：2003-09-23
申请号：US08985880
申请日：1997-12-05
申请人： Johannes Stollenwerk , Christoph Daube , Achim Gürke
发明人： Johannes Stollenwerk , Christoph Daube , Achim Gürke
IPC分类号： C23C1434
CPC分类号： C23C14/228 , C03C17/245 , C03C2217/228 , C03C2218/155 , C23C14/0057 , C23C14/0063 , C23C14/081
摘要： A method and apparatus for producing a substrate which is coated with a Mgo-layer, includes a pair of Mg targets which define a slit and which have a target purity of at least 99 percent. A working gas flows along the slit. Oxygen is provided in an area between the slit and the substrate to be coated. The temperature of the substrate is set by heating or cooling the substrate during the coating process.
摘要翻译：用于制造涂有Mgo层的基材的方法和装置包括一对限定狭缝并且目标纯度至少为99％的Mg靶。工作气体沿狭缝流动。氧气设置在狭缝和待涂覆的基材之间的区域中。通过在涂布过程中加热或冷却基底来设定基底的温度。

3. 发明授权

US07165506B2 Method and device for plasma-treating the surface of substrates by ion bombardment 失效
标题翻译：通过离子轰击等离子体处理衬底表面的方法和装置
公开(公告)号：US07165506B2
公开(公告)日：2007-01-23
申请号：US10204618
申请日：2001-02-26
申请人： Johannes Stollenwerk
发明人： Johannes Stollenwerk
IPC分类号： H01L21/00
CPC分类号： H01J37/32055 , H01J37/3266 , H05H1/48 , H05H2001/3426
摘要： In an ion etching method for reducing a substrate thickness, an electric arc is generated in a vacuum chamber such that the electric arc is locally separated from the substrate and circulates about the substrate. A plasma of a supplied etching gas is produced by the electric arc, and the ions of the etching gas are accelerated onto the substrate by an electric potential. The employed device has a vacuum chamber, an etching gas supply, and first and second electrodes supplied with direct or alternating voltage for generating the electric arc that produces the plasma of the etching gas. The first electrode is ring-shaped and the second electrode is arranged centrally to the ring of the first electrode. A magnetic coil creates a migrating magnetic field such that the electric arc is locally separated from the substrate and circulates about the substrate in a carousel fashion.
摘要翻译：在用于降低基板厚度的离子蚀刻方法中，在真空室中产生电弧，使得电弧与基板局部分离并在基板周围循环。通过电弧产生供给的蚀刻气体的等离子体，蚀刻气体的离子通过电位被加速到基板上。所采用的装置具有真空室，蚀刻气体源，以及供给直接或交流电压的第一和第二电极，用于产生产生蚀刻气体的等离子体的电弧。第一电极是环形的，第二电极布置在第一电极的环的中心。电磁线圈产生迁移磁场，使得电弧与衬底局部分离，并以转盘方式围绕衬底循环。

4. 发明授权

US06740207B2 Electric supply unit and method for reducing arcing during sputtering 有权
标题翻译：用于减少溅射期间电弧的电源单元和方法
公开(公告)号：US06740207B2
公开(公告)日：2004-05-25
申请号：US10108666
申请日：2002-03-28
申请人： Andreas Kloeppel , Christoph Daube , Johannes Stollenwerk , Thomas Linz
发明人： Andreas Kloeppel , Christoph Daube , Johannes Stollenwerk , Thomas Linz
IPC分类号： C23C1434
CPC分类号： H01J37/3444 , H01J37/34
摘要： Sparking is suppressed during high-frequency sputtering by a high-frequency generator (5) which has a controlled switching unit (13) that is connected upstream in relation to the output of the generator. A high-frequency supply signal that is generated at the output of the high-frequency generator is stopped for plasma discharge (PL) for a short time, by the switching unit.
摘要翻译：通过高频发生器（5）在高频溅射期间抑制火花，该高频发生器具有相对于发生器的输出端连接到上游的受控切换单元（13）。在高频发生器的输出处产生的高频电源信号通过开关单元停止等离子体放电（PL）短时间。

5. 发明授权

US06676814B1 Substrate coated with an MgO layer 失效
标题翻译：基材涂有MgO层
公开(公告)号：US06676814B1
公开(公告)日：2004-01-13
申请号：US09687845
申请日：2000-10-13
申请人： Johannes Stollenwerk , Christoph Daube , Achim Gürke
发明人： Johannes Stollenwerk , Christoph Daube , Achim Gürke
IPC分类号： C23C1434
CPC分类号： C23C14/228 , C03C17/245 , C03C2217/228 , C03C2218/155 , C23C14/0057 , C23C14/0063 , C23C14/081
摘要： A method for manufacturing a display panel substrate has the steps of flowing a working gas along and out of a slit defined between two sputtering targets of Mg and toward the substrate thereby selecting the purity of the Mg material of the targets to be at least 99% and thereby blowing sputtered-off material out of the slit and toward the substrate. Introduction, in an area between the slit and the substrate, of a reactive gas containing oxygen, follows, and reacting the sputtered-off material with the reactive gas results in depositing on the substrate, an MgO layer. The method also includes setting the temperature of the substrate during the coating process.
摘要翻译：一种制造显示面板基板的方法，其特征在于，使工作气体沿着Mg两个溅射靶之间限定的狭缝流过基板，从而将靶材的Mg材料的纯度选择为99％以上，从而将溅出的材料吹出狭缝并朝向基板。在狭缝和衬底之间的区域中介绍含有氧的反应性气体，随后将溅射材料与反应性气体反应，导致在衬底上沉积MgO层。该方法还包括在涂覆过程中设置衬底的温度。

6. 发明授权

US6150030A Substrate coated with an MgO-layer 失效
标题翻译：衬底涂有MgO层
公开(公告)号：US6150030A
公开(公告)日：2000-11-21
申请号：US203918
申请日：1998-12-02
申请人： Johannes Stollenwerk , Christoph Daube , Achim Gurke
发明人： Johannes Stollenwerk , Christoph Daube , Achim Gurke
IPC分类号： C03C17/245 , C23C14/08 , B32B17/00
CPC分类号： C23C14/228 , C03C17/245 , C23C14/081 , C03C2217/228 , C03C2218/155
摘要： A substrate coated has at least one MgO-layer and an extent of at least 100 mm.times.100 mm. The layer has a predominant peak in the measuring diagram of the .THETA.-2.THETA.-method and the density of the material of the layer is at least 80% of the density of stoichiometric MgO-bulk material, which is .rho.=3.58 g/cm.sup.3.
摘要翻译：涂覆的基材具有至少一个MgO层和至少100mm×100mm的程度。该层在THETA -2 THETA方法的测量图中具有主要峰值，并且该层的材料的密度是化学计量的MgO-散体材料的密度的至少80％，其为r = 3.58g / cm 3 。

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