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1. 发明申请

US20080150989A1 Method of printing smooth micro-scale features 有权
标题翻译：打印平滑微尺度功能的方法
公开(公告)号：US20080150989A1
公开(公告)日：2008-06-26
申请号：US11642146
申请日：2006-12-20
申请人： Uma Srinivasan , David Stephen White , Eric J. Shrader , Steven E. Ready , Scott Jong Ho Limb
发明人： Uma Srinivasan , David Stephen White , Eric J. Shrader , Steven E. Ready , Scott Jong Ho Limb
IPC分类号： B41J29/38
CPC分类号： H05K3/125 , H05K1/0266 , H05K2203/013 , H05K2203/162
摘要： A method of jet-printing smooth micro-scale features is presented. The desired feature prior to being printed is masked by various decimation filters and the decimation is performed at various pitches. The subsequently printed image is then scanned and analyzed to determine the roughness of the lines. The optimum decimation pitch is determined by the feature that exhibits the least amount of droplet spreading and has the lowest edge roughness. The optimum decimation pitch may also be calculated from the material properties and the dynamics of fluids.
摘要翻译：提出了一种喷墨打印平滑微尺度特征的方法。在打印之前的期望特征被各种抽取滤波器遮蔽，并且以各种间距进行抽取。然后扫描并分析随后打印的图像以确定线的粗糙度。最佳抽取间距由表现出最小量的液滴扩散并具有最低边缘粗糙度的特征决定。也可以根据流体的材料性质和动力学来计算最佳抽取间距。

2. 发明授权

US07524015B2 Method of printing smooth micro-scale features 有权
标题翻译：打印平滑微尺度功能的方法
公开(公告)号：US07524015B2
公开(公告)日：2009-04-28
申请号：US11642146
申请日：2006-12-20
申请人： Uma Srinivasan , Stephen David White , Eric J. Shrader , Steven E. Ready , Scott Jong Ho Limb
发明人： Uma Srinivasan , Stephen David White , Eric J. Shrader , Steven E. Ready , Scott Jong Ho Limb
IPC分类号： B41J29/393
CPC分类号： H05K3/125 , H05K1/0266 , H05K2203/013 , H05K2203/162
摘要： A method of jet-printing smooth micro-scale features is presented. The desired feature prior to being printed is masked by various decimation filters and the decimation is performed at various pitches. The subsequently printed image is then scanned and analyzed to determine the roughness of the lines. The optimum decimation pitch is determined by the feature that exhibits the least amount of droplet spreading and has the lowest edge roughness. The optimum decimation pitch may also be calculated from the material properties and the dynamics of fluids.
摘要翻译：提出了一种喷墨打印平滑微尺度特征的方法。在打印之前的期望特征被各种抽取滤波器遮蔽，并且以各种间距进行抽取。然后扫描并分析随后打印的图像以确定线的粗糙度。最佳抽取间距由表现出最小量的液滴扩散并具有最低边缘粗糙度的特征决定。也可以根据流体的材料性质和动力学来计算最佳抽取间距。

3. 发明申请

US20080241712A1 Method and system for patterning a mask layer 有权
标题翻译：图案化掩模层的方法和系统
公开(公告)号：US20080241712A1
公开(公告)日：2008-10-02
申请号：US11731689
申请日：2007-03-30
申请人： Scott Jong Ho Limb , Eric J. Shrader , Uma Srinivasan
发明人： Scott Jong Ho Limb , Eric J. Shrader , Uma Srinivasan
IPC分类号： G03F1/00
CPC分类号： G03F7/2018 , H05K3/0023 , H05K3/0082 , H05K3/28 , H05K2203/0551
摘要： The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.
摘要翻译：目前描述的实施例使用打印过程，例如。蜡印刷技术，用于对例如印刷电路的掩模层（例如焊接掩模层）进行图案化。可以维持开发焊接掩模和曝光工艺中的所有其他常规工艺。根据目前描述的实施例，每个印刷电路将具有匹配均匀和非均匀跳动的独特图案。在一种形式中，图案由具有特定间隙的蜡单滴组成，以使得该过程对于当前行业实践是透明的。此外，单滴可以用于大小区域而没有任何显影时间差。在至少一种形式中，间隙中的蜡图案和焊接掩模在显影期间被去除。

4. 发明授权

US08968985B2 Method and system for patterning a mask layer 有权
标题翻译：图案化掩模层的方法和系统
公开(公告)号：US08968985B2
公开(公告)日：2015-03-03
申请号：US11731689
申请日：2007-03-30
申请人： Scott Jong Ho Limb , Eric J. Shrader , Uma Srinivasan
发明人： Scott Jong Ho Limb , Eric J. Shrader , Uma Srinivasan
IPC分类号： G03F7/20 , H05K3/00 , H05K3/28
CPC分类号： G03F7/2018 , H05K3/0023 , H05K3/0082 , H05K3/28 , H05K2203/0551
摘要： The presently described embodiments use a printing process, e.g. a wax printing technique, to pattern a mask layer (such as a soldermask layer) of, for example, a printed circuit. Substantially all other conventional processes in developing soldermask and exposure processes can be maintained. According to the presently described embodiments, each printed circuit will have a unique pattern that matches uniform and non-uniform runout. In one form, the pattern is comprised of wax single drops having a specified gap to make the process transparent to the current industry practice. Furthermore, the single drops can be used for both large and small areas without any development time differences. In at least one form, the wax pattern and the soldermask in the gap are removed during development.
摘要翻译：目前描述的实施例使用打印过程，例如。蜡印刷技术，用于对例如印刷电路的掩模层（例如焊接掩模层）进行图案化。可以维持开发焊接掩模和曝光工艺中的所有其他常规工艺。根据目前描述的实施例，每个印刷电路将具有匹配均匀和非均匀跳动的独特图案。在一种形式中，图案由具有特定间隙的蜡单滴组成，以使得该过程对于当前行业实践是透明的。此外，单滴可以用于大小区域，而没有任何显影时间差。在至少一种形式中，间隙中的蜡图案和焊接掩模在显影期间被去除。

5. 发明授权

US08211617B2 Solid inks for printed masks 有权
标题翻译：用于印刷面罩的固体油墨
公开(公告)号：US08211617B2
公开(公告)日：2012-07-03
申请号：US12542171
申请日：2009-08-17
申请人： Norine E. Chang , C. Wayne Jaeger , Scott Jong Ho Limb , Eric J. Shrader , Francisco E. Torres , Kris Schmidt
发明人： Norine E. Chang , C. Wayne Jaeger , Scott Jong Ho Limb , Eric J. Shrader , Francisco E. Torres , Kris Schmidt
IPC分类号： G03F7/00 , G03F7/26 , G03F7/40 , G04F7/004
CPC分类号： G03F7/2018 , C09D11/30 , C09D11/36
摘要： A printed mask derived from a composition comprised of at least one compound including at least one alkaline-hydrolyzable group, and at least one compound including at least one ethylene oxide group. The printed mask is removable using an alkaline solution in about 30 seconds or less.
摘要翻译：由包含至少一种包含至少一个碱可水解基团的化合物和至少一种包含至少一个环氧乙烷基团的化合物组成的组合物的印刷掩模。印刷的面罩可在约30秒或更短时间内使用碱性溶液除去。

6. 发明申请

US20110039193A1 SOLID INKS FOR PRINTED MASKS 有权
标题翻译：固体油墨印刷
公开(公告)号：US20110039193A1
公开(公告)日：2011-02-17
申请号：US12542171
申请日：2009-08-17
申请人： Norine E. Chang , C. Wayne Jaeger , Scott Jong Ho Limb , Eric J. Shrader , Francisco E. Torres , Kris Schmidt
发明人： Norine E. Chang , C. Wayne Jaeger , Scott Jong Ho Limb , Eric J. Shrader , Francisco E. Torres , Kris Schmidt
IPC分类号： G03F1/00
CPC分类号： G03F7/2018 , C09D11/30 , C09D11/36
摘要： A printed mask derived from a composition comprised of at least one compound including at least one alkaline-hydrolyzable group, and at least one compound including at least one ethylene oxide group. The printed mask is removable using an alkaline solution in about 30 seconds or less.
摘要翻译：由包含至少一种包含至少一个碱可水解基团的化合物和至少一种包含至少一个环氧乙烷基团的化合物组成的组合物的印刷掩模。印刷的面罩可在约30秒或更短时间内使用碱性溶液除去。

7. 发明授权

US09035673B2 Method of in-process intralayer yield detection, interlayer shunt detection and correction 有权
标题翻译：过程中内部产量检测，层间分流检测和校正方法
公开(公告)号：US09035673B2
公开(公告)日：2015-05-19
申请号：US12693019
申请日：2010-01-25
申请人： Michael Yu Tak Young , Scott Jong Ho Limb , William S. Wong , Robert A. Street
发明人： Michael Yu Tak Young , Scott Jong Ho Limb , William S. Wong , Robert A. Street
IPC分类号： G01R31/14 , G11C29/02 , G01R31/28 , H01L21/66 , G11C29/04
CPC分类号： G11C29/025 , G01R31/2853 , G11C2029/0403 , H01L22/14 , H01L22/20
摘要： A system and method for in-process yield evaluation and correction in an array type of device are provided. The system and method include measuring electrical resistance between individual GATE lines, DATA lines, a DATA bus I/O pad, and a GATE bus I/O pad; and analyzing the measured electrical resistance to identify at least one of the following: GATE line open defects, GATE line bridge defects, DATA line open defects, DATA line bridge defects, and interlayer shunt defects.
摘要翻译：提供了一种用于阵列型设备中的过程中产量评估和校正的系统和方法。该系统和方法包括测量各个GATE线路，DATA线路，DATA总线I / O焊盘和GATE总线I / O焊盘之间的电阻; 并分析测量的电阻以识别以下至少之一：GATE线路开路缺陷，GATE线路桥梁缺陷，DATA线路开路缺陷，DATA线路桥梁缺陷和层间分流缺陷。

8. 发明授权

US08359748B2 Method of forming micromachined fluid ejectors using piezoelectric actuation 有权
标题翻译：使用压电驱动形成微机械流体喷射器的方法
公开(公告)号：US08359748B2
公开(公告)日：2013-01-29
申请号：US12273573
申请日：2008-11-19
申请人： Baomin Xu , Steven A. Buhler , Stephen D. White , Scott Jong Ho Limb
发明人： Baomin Xu , Steven A. Buhler , Stephen D. White , Scott Jong Ho Limb
IPC分类号： B21D53/76 , H04R17/00
CPC分类号： B41J2/14233 , B41J2/161 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1634 , B41J2/1639 , B41J2/1642 , B41J2/1643 , B41J2/1646 , B41J2002/14475 , Y10T29/42 , Y10T29/49401
摘要： A method of forming a fluid ejector includes forming a recess well into a silicon wafer on a first side of the silicon wafer, and filling the recess well with a sacrificial material. A thin layer structure is deposited onto the first side of a silicon wafer covering the filled recess well. Then a thin film piezoelectric is bonded or deposited to the thin layer structure, and a hole is formed in the thin layer structure exposing at least a portion of the sacrificial material. The sacrificial material is removed from the recess well, wherein the hole in the thin layer in the recess well with the sacrificial material removed, form a fluid inlet. An opening area in the silicon wafer is formed on a second side of the silicon wafer. Then a nozzle plate is formed having a recess portion and an aperture within the recess portion. The nozzle plate is attached to the second side of the silicon wafer, with the recess portion positioned within the open area. The thin layer structure and the recess portion of the nozzle plate define a depth of a fluid cavity defined by the thin layer structure, the recess portion of the nozzle plate and the sidewalls of the silicon wafer.
摘要翻译：形成流体喷射器的方法包括在硅晶片的第一侧上将凹槽形成凹槽，并用牺牲材料填充凹槽。在覆盖填充的凹槽的硅晶片的第一侧上沉积薄层结构。然后，薄膜压电体被结合或沉积到薄层结构上，并且在该薄层结构中形成一个露出至少一部分牺牲材料的孔。牺牲材料从凹槽中移除，其中凹槽中的薄层中的孔与除去牺牲材料的孔形成流体入口。硅晶片的开口区域形成在硅晶片的第二侧上。然后形成在凹部内具有凹部和孔的喷嘴板。喷嘴板附接到硅晶片的第二侧，凹部位于开放区域内。喷嘴板的薄层结构和凹部限定由薄层结构，喷嘴板的凹部和硅晶片的侧壁限定的流体腔的深度。

9. 发明授权

US07998868B2 Self-aligned masks using multi-temperature phase-change materials 有权
标题翻译：使用多温度相变材料的自对准面罩
公开(公告)号：US07998868B2
公开(公告)日：2011-08-16
申请号：US12713704
申请日：2010-02-26
申请人： Scott Jong Ho Limb
发明人： Scott Jong Ho Limb
IPC分类号： H01L21/311
CPC分类号： H01L29/66742 , H01L21/0332 , H01L27/1288
摘要： A method of forming a pattern includes forming a first layer on a substrate, forming a second layer on the first layer, depositing a multi-temperature phase-change material on the second layer, patterning the second layer using the multi-temperature phase-change material as a mask, reflowing the multi-temperature phase-change material, and patterning the first layer using the reflowed multi-temperature phase-change material as a mask.
摘要翻译：形成图案的方法包括在基板上形成第一层，在第一层上形成第二层，在第二层上沉积多温度相变材料，使用多温度相变来图案化第二层材料作为掩模，回流多温度相变材料，并使用回流多温度相变材料作为掩模对第一层进行图案化。

10. 发明授权

US07901130B2 Method and apparatus for calibrating a thermistor 有权
标题翻译：用于校准热敏电阻的方法和装置
公开(公告)号：US07901130B2
公开(公告)日：2011-03-08
申请号：US12497993
申请日：2009-07-06
申请人： Scott Jong Ho Limb , Michael Yu Tak Young , Karl A. Littau
发明人： Scott Jong Ho Limb , Michael Yu Tak Young , Karl A. Littau
IPC分类号： G01K15/00
CPC分类号： G01K7/223 , G01K15/00 , Y10T29/49085
摘要： The presently described embodiments are directed to a calibration method and system for thin film thermistors that are locally heated with integrated thin film heaters. Initially, print head temperature is either measured or referenced. Then, transient thermistor resistances are measured and used to determine the thermistor resistance at a higher temperature. Notably, this calibration method is advantageously implemented as a step of an existing process without having to expose the print heads to operating temperatures. In some implementations of the presently described embodiments, trimming of the thermistors may be required once calibrated.
摘要翻译：目前描述的实施例涉及用集成薄膜加热器局部加热的薄膜热敏电阻的校准方法和系统。最初，打印头温度是测量或参考。然后，测量瞬态热敏电阻电阻并用于确定较高温度下的热敏电阻电阻。值得注意的是，该校准方法有利地被实现为现有工艺的步骤，而不必将打印头暴露于工作温度。在目前描述的实施例的一些实施方案中，一旦校准就可能需要修整热敏电阻。

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