专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08120763B2 Device and method for the optical measurement of an optical system by using an immersion fluid 有权
标题翻译：通过使用浸液进行光学系统的光学测量的装置和方法
公开(公告)号：US08120763B2
公开(公告)日：2012-02-21
申请号：US12489639
申请日：2009-06-23
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
IPC分类号： G01B9/00 , G01B9/02 , G03B27/42
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.
摘要翻译：提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。浸没流体与至少一个测试光学部件相邻。还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

2. 发明申请

US20090257049A1 DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM BY USING AN IMMERSION FLUID 有权
标题翻译：通过使用浸没液对光学系统进行光学测量的装置和方法
公开(公告)号：US20090257049A1
公开(公告)日：2009-10-15
申请号：US12489639
申请日：2009-06-23
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
IPC分类号： G01B9/00 , G03B27/80
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.
摘要翻译：提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。浸没流体与至少一个测试光学部件相邻。还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

3. 发明申请

US20120113429A1 DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM BY USING AN IMMERSION FLUID 审中-公开
标题翻译：通过使用浸没液对光学系统进行光学测量的装置和方法
公开(公告)号：US20120113429A1
公开(公告)日：2012-05-10
申请号：US13351710
申请日：2012-01-17
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
IPC分类号： G01B9/02
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.
摘要翻译：提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。浸没流体与至少一个测试光学部件相邻。还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

4. 发明申请

US20090021726A1 DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM BY USING AN IMMERSION FLUID 审中-公开
公开(公告)号：US20090021726A1
公开(公告)日：2009-01-22
申请号：US12147034
申请日：2008-06-26
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
IPC分类号： G01B9/00
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.

5. 发明申请

US20050243328A1 Device and method for the optical measurement of an optical system, a container therefor, and a microlithography projection exposure machine 有权
标题翻译：用于光学系统的光学测量的装置和方法，其容器以及微光刻投影曝光机
公开(公告)号：US20050243328A1
公开(公告)日：2005-11-03
申请号：US11080525
申请日：2005-03-16
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Helmut Haidner , Albrecht Ehrmann , Martin Schriever , Markus Gobppert
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Helmut Haidner , Albrecht Ehrmann , Martin Schriever , Markus Gobppert
IPC分类号： G03F7/20 , G01B9/02
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device and a method for the optical measurement of an optical system (1), in particular an optical imaging system. The device includes one or more object-side test optics components (2a, 2b) arranged in front of the optical system to be measured, and/or one or more image-side test optics components (3, 4, 5) arranged behind the optical system to be measured. A container for use in such a device, a microlithography projection exposure machine equipped with such a device, and a method which can be carried out with the aid of this device are also disclosed. An immersion fluid is introduced adjacent to at least one of the one or more object-side test optics components and/or image-side test optics components. Such device and method provide for optical measurement by microlithography projection objectives of high numerical aperture using wavefront detection with shearing or point diffraction interferometry or a Moiré measuring technique.
摘要翻译：一种用于光学系统（1）的光学测量的装置和方法，特别是光学成像系统。该装置包括布置在待测量的光学系统前面的一个或多个物体侧测试光学部件（2a，2b）和/或一个或多个图像侧测试光学部件（3,4,5）在要测量的光学系统后面。还公开了一种用于这种装置的容器，配备有这种装置的微光刻投影曝光机以及可借助该装置进行的方法。相邻于一个或多个物体侧测试光学部件和/或图像侧测试光学部件中的至少一个被引入浸没流体。这种装置和方法通过使用具有剪切或点衍射干涉测量或莫尔测量技术的波前检测的高数值孔径的微光刻投影物镜提供光学测量。

6. 发明授权

US07408652B2 Device and method for the optical measurement of an optical system by using an immersion fluid 有权
标题翻译：通过使用浸液进行光学系统的光学测量的装置和方法
公开(公告)号：US07408652B2
公开(公告)日：2008-08-05
申请号：US11080525
申请日：2005-03-16
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Helmut Haidner , Albrecht Ehrmann , Martin Schriever , Markus Gobppert
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Helmut Haidner , Albrecht Ehrmann , Martin Schriever , Markus Gobppert
IPC分类号： G01B9/02 , G02B27/40
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.
摘要翻译：提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。浸没流体与至少一个测试光学部件相邻。还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

7. 发明申请

US20050007602A1 Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry 有权
标题翻译：通过相移干涉法对光学成像系统进行波前测量的装置和方法
公开(公告)号：US20050007602A1
公开(公告)日：2005-01-13
申请号：US10816896
申请日：2004-04-05
申请人： Helmut Haidner , Wolfgang Emer , Rainer Hoch , Ulrich Wegmann , Martin Schriever , Markus Goeppert
发明人： Helmut Haidner , Wolfgang Emer , Rainer Hoch , Ulrich Wegmann , Martin Schriever , Markus Goeppert
IPC分类号： G01B9/02 , G01J9/04
CPC分类号： G03F7/706 , G01J9/04 , G01M11/0264 , G01M11/0271
摘要： Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.
摘要翻译：用于通过相移干涉测量法对光学成像系统进行波前测量的装置和方法，具有要布置在物体侧的掩模结构（6a）和/或要布置在像侧的光栅结构（7a）。物体侧掩模结构包括一个或多个一维掩模结构图案，并且图像侧光栅结构包括一个或多个二维光栅结构图案。或者，相反地，掩模结构包括一个或多个二维图案，并且光栅结构包括一个或多个一维图案。附加地或替代地，由掩模结构和检测器元件的横向相对移动引起的瞳孔位置偏移可以通过使用相关联的相移特性反向计算分别由检测器元件记录的干涉图来考虑，从记录的干涉图中获得的横向运动方向的波前衍生的计算校正。该方法和/或装置可以通过例如用于在使用剪切或点干涉测量的微光刻曝光机的高分辨率投影物镜的情况下确定像差。

8. 发明授权

US07336371B1 Apparatus and method for measuring the wavefront of an optical system 有权
标题翻译：用于测量光学系统的波前的装置和方法
公开(公告)号：US07336371B1
公开(公告)日：2008-02-26
申请号：US10766014
申请日：2004-01-29
申请人： Helmut Haidner , Markus Goeppert , Martin Schriever , Ulrich Wegmann
发明人： Helmut Haidner , Markus Goeppert , Martin Schriever , Ulrich Wegmann
IPC分类号： G01B9/02
CPC分类号： G01M11/0271 , G03F7/706
摘要： A device and a method for wavefront measurement of an optical system (7), in particular by an interferometric measurement technique. A dynamic range correction element (12, 12a) is arranged in the beam path upstream of the detector arrangement (11) and is designed such that the variation in the spatially dependent characteristic of a phase of the wavefront forming the interference pattern is kept below a prescribed limit value throughout a detection area. In addition or as an alternative, a set of several diffraction structures of different period length can be used with a shearing interferometry technique and/or a set of several pairs of a reference pinhole and a signal passage opening with different hole spacings can be used with a point diffraction interferometry technique for different sub-areas of the detection area. A remaining distortion error can be taken into account by determining a corresponding distortion transformation and applying the inverse distortion transformation.
摘要翻译：一种用于光学系统（7）的波前测量的装置和方法，特别是通过干涉测量技术。动态范围校正元件（12,12a）被布置在检测器装置（11）的上游的光束路径中，并且被设计成使得形成干涉图案的波阵面的相位的空间相关特性的变化保持在在整个检测区域的规定的极限值。另外或作为替代，可以使用剪切干涉测量技术的一组不同周期长度的几种衍射结构，和/或一组几对参考针孔和具有不同孔间距的信号通道开口可以与用于检测区域的不同子区域的点衍射干涉测量技术。可以通过确定相应的失真变换并应用逆失真变换来考虑剩余的失真误差。

9. 发明授权

US07417745B2 Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry 有权
标题翻译：通过相移干涉法对光学成像系统进行波前测量的装置和方法
公开(公告)号：US07417745B2
公开(公告)日：2008-08-26
申请号：US10816896
申请日：2004-04-05
申请人： Helmut Haidner , Wolfgang Emer , Rainer Hoch , Ulrich Wegmann , Martin Schriever , Markus Goeppert
发明人： Helmut Haidner , Wolfgang Emer , Rainer Hoch , Ulrich Wegmann , Martin Schriever , Markus Goeppert
IPC分类号： G01B9/02
CPC分类号： G03F7/706 , G01J9/04 , G01M11/0264 , G01M11/0271
摘要： Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometry, having a mask structure (6a) to be arranged on the object side, and/or a grating structure (7a) to be arranged on the image side. The object-side mask structure includes one or more one-dimensional mask structure patterns, and the image-side grating structure includes one or more two-dimensional grating structure patterns. Alternatively, conversely, the mask structure includes one or more two-dimensional patterns, and the grating structure includes one or more one-dimensional patterns. Additionally or alternatively, a pupil position offset caused by a lateral relative movement of the mask structure and detector element can be taken into account by back calculating the interferogram, respectively recorded by the detector element, using an associated phase-shift characteristic, or by a computational correction of wavefront derivatives, obtained from the recorded interferograms, in the direction of lateral movement. The method and/or the device can by used, for example, for determining aberration in the case of high-resolution projection objectives of microlithography exposure machines using shearing or point interferometry.
摘要翻译：用于通过相移干涉测量法对具有要布置在物体侧的掩模结构（6a）的光学成像系统的波前测量的装置和方法和/或布置在物体侧上的光栅结构（7a）形象一面物体侧掩模结构包括一个或多个一维掩模结构图案，并且图像侧光栅结构包括一个或多个二维光栅结构图案。或者，相反地，掩模结构包括一个或多个二维图案，并且光栅结构包括一个或多个一维图案。附加地或替代地，由掩模结构和检测器元件的横向相对移动引起的瞳孔位置偏移可以通过使用相关联的相移特性反向计算分别由检测器元件记录的干涉图来考虑，从记录的干涉图中获得的横向运动方向的波前衍生的计算校正。该方法和/或装置可以通过例如用于在使用剪切或点干涉测量的微光刻曝光机的高分辨率投影物镜的情况下确定像差。

10. 发明授权

US07286245B2 Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser 有权
标题翻译：用于确定光学系统对偏振状态的影响的方法和装置; 和分析仪
公开(公告)号：US07286245B2
公开(公告)日：2007-10-23
申请号：US10628431
申请日：2003-07-29
申请人： Ulrich Wegmann , Michael Hartl , Markus Mengel , Manfred Dahl , Helmut Haidner , Martin Schriever , Michael Totzeck
发明人： Ulrich Wegmann , Michael Hartl , Markus Mengel , Manfred Dahl , Helmut Haidner , Martin Schriever , Michael Totzeck
IPC分类号： G01B9/02
CPC分类号： G03F7/70566 , G01J4/04 , G01M11/0271 , G01M11/0285 , G02B27/0025 , G03F7/70591
摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.
摘要翻译：一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态，并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。还公开了可用于此目的的分析装置。使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式