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1. 发明授权

US07436521B2 Optical measuring apparatus and operating method for imaging error correction in an optical imaging system 有权
标题翻译：光学成像系统中用于成像误差校正的光学测量装置和操作方法
公开(公告)号：US07436521B2
公开(公告)日：2008-10-14
申请号：US11271806
申请日：2005-11-14
申请人： Wolfgang Emer , Ulrich Wegmann , Martin Schriever , Rainer Hoch
发明人： Wolfgang Emer , Ulrich Wegmann , Martin Schriever , Rainer Hoch
IPC分类号： G01B9/02 , G01B11/02 , G03B27/42
CPC分类号： G01M11/0264 , G01M11/0271 , G03F7/706 , G03F7/70875 , G03F7/70891
摘要： A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imaging errors, having a mask structure arrangement which contains a measurement pattern, and a device for detection and evaluation of the interference information which is indicative of imaging errors; also a method for operation of the optical imaging system including imaging error correction. The apparatus further includes a heating irradiation arrangement for radiation heating of the optical imaging system during measurement operation such that the heating effect of the radiation which is applied to the optical imaging system to be measured equals, within a tolerance range which can be predetermined, the heating effect of the radiation which is passed through the useful pattern during imaging operation of the optical imaging system.
摘要翻译：用于光学，例如干涉测量光学成像系统的测量装置，成像操作中有用图案的成像，包括用于产生辐射信息的装置，例如指示成像误差的干扰信息，具有一个包含测量图案的掩模结构布置，以及用于检测和评估指示成像误差的干扰信息的装置; 也是包括成像误差校正的光学成像系统的操作方法。该装置还包括用于在测量操作期间对光学成像系统进行辐射加热的加热辐射装置，使得施加到待测量的光学成像系统的辐射的加热效应等于在可以预定的公差范围内在光学成像系统的成像操作期间通过有用图案的辐射的加热效果。

2. 发明授权

US07286245B2 Method and apparatus for determining the influencing of the state of polarization by an optical system; and an analyser 有权
标题翻译：用于确定光学系统对偏振状态的影响的方法和装置; 和分析仪
公开(公告)号：US07286245B2
公开(公告)日：2007-10-23
申请号：US10628431
申请日：2003-07-29
申请人： Ulrich Wegmann , Michael Hartl , Markus Mengel , Manfred Dahl , Helmut Haidner , Martin Schriever , Michael Totzeck
发明人： Ulrich Wegmann , Michael Hartl , Markus Mengel , Manfred Dahl , Helmut Haidner , Martin Schriever , Michael Totzeck
IPC分类号： G01B9/02
CPC分类号： G03F7/70566 , G01J4/04 , G01M11/0271 , G01M11/0285 , G02B27/0025 , G03F7/70591
摘要： A method and an apparatus for determining the influencing of the state of polarization of optical radiation by an optical system under test, wherein radiation with a defined entrance state of polarization is directed onto the optical system, the exit-side state of polarization is measured, and the influencing of the state of polarization is determined by the optical system with the aid of evaluation of the exit state of polarization with reference to the entrance state of polarization. An analyser arrangement which can be used for this purpose is also disclosed. The method and the apparatus are used, e.g., to determine the influencing of the state of polarization of optical radiation by an optical imaging system of prescribable aperture, the determination being performed in a pupil-resolved fashion.
摘要翻译：一种用于通过被测光学系统确定光辐射的偏振状态的影响的方法和装置，其中具有限定的入射极化状态的辐射被引导到光学系统上，测量出射侧的偏振态，并且通过参考偏振的入射状态来评估偏振的退出状态，由光学系统确定极化状态的影响。还公开了可用于此目的的分析装置。使用该方法和装置，例如通过具有规定孔径的光学成像系统来确定光学辐射的偏振状态的影响，该确定以瞳孔分辨的方式执行。

3. 发明申请

US20060023193A1 Projection exposure system for microlithography and method for generating microlithographic images 有权
公开(公告)号：US20060023193A1
公开(公告)日：2006-02-02
申请号：US11248684
申请日：2005-10-11
申请人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
发明人： Karl-Heinz Schuster , Christian Wagner , Martin Schriever
IPC分类号： G03B27/72
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/28 , G03B27/72 , G03F7/70125 , G03F7/70225 , G03F7/70566
摘要： A method and an arrangement for microlithographic projection exposure at high aperture achieve a contrast increase by the polarization of the light perpendicular to the plane of incidence on the resist. Arrangements are provided which influence the tangential polarization or the linear polarization adapted to the dipole illumination in the illuminating system and in the reduction objective.

4. 发明授权

US08120763B2 Device and method for the optical measurement of an optical system by using an immersion fluid 有权
标题翻译：通过使用浸液进行光学系统的光学测量的装置和方法
公开(公告)号：US08120763B2
公开(公告)日：2012-02-21
申请号：US12489639
申请日：2009-06-23
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
IPC分类号： G01B9/00 , G01B9/02 , G03B27/42
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.
摘要翻译：提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。浸没流体与至少一个测试光学部件相邻。还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

5. 发明申请

US20090257049A1 DEVICE AND METHOD FOR THE OPTICAL MEASUREMENT OF AN OPTICAL SYSTEM BY USING AN IMMERSION FLUID 有权
标题翻译：通过使用浸没液对光学系统进行光学测量的装置和方法
公开(公告)号：US20090257049A1
公开(公告)日：2009-10-15
申请号：US12489639
申请日：2009-06-23
申请人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
发明人： Ulrich Wegmann , Uwe Schellhorn , Joachim Stuehler , Albrecht Ehrmann , Martin Schriever , Markus Goeppert , Helmut Haidner
IPC分类号： G01B9/00 , G03B27/80
CPC分类号： G03F7/2041 , G03F7/70341 , G03F7/706
摘要： A device for the optical measurement of an optical system, in particular an optical imaging system, is provided. The device includes at least one test optics component arranged on an object side or an image side of the optical system. An immersion fluid is adjacent to at least one of the test optics components. A container for use in this device, a microlithography projection exposure machine equipped with this device, and a method which can be carried out with the aid of this device are also provided. The device and method provide for optical measurement of microlithography projection objectives with high numerical apertures by using wavefront detection with shearing or point diffraction interferometry, or a Moiré measuring technique.
摘要翻译：提供了一种用于光学系统，特别是光学成像系统的光学测量的装置。该装置包括布置在光学系统的物体侧或像侧上的至少一个测试光学部件。浸没流体与至少一个测试光学部件相邻。还提供了一种用于该装置的容器，配备有该装置的微光投影曝光机以及可借助该装置进行的方法。该装置和方法通过使用具有剪切或点衍射干涉测量的波前检测或莫尔测量技术来提供具有高数值孔径的微光刻投影物镜的光学测量。

6. 发明授权

US07570345B2 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US07570345B2
公开(公告)日：2009-08-04
申请号：US11808316
申请日：2007-06-08
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

7. 发明申请

US20080036982A1 Method For Structuring A Substrate Using Multiple Exposure 审中-公开
标题翻译：使用多重曝光构造基板的方法
公开(公告)号：US20080036982A1
公开(公告)日：2008-02-14
申请号：US11547909
申请日：2005-04-11
申请人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
发明人： Ulrich Wegmann , Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Aksel Goehnermeier
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70466 , G03F7/2022 , G03F7/70258 , G03F7/70266 , G03F7/706
摘要： 1. Method for patterning a substrate using multiple exposure.2.1. The invention relates to a method for patterning a substrate using exposure processes of an adjustable optical system, a multiple exposure being used for producing a structure image on the substrate.2.2. According to the invention, for at least one of the plurality of exposures, the imaging quality of the optical system is determined by means of a respective measurement step and at least one parameter of the optical system that influences the imaging quality is set depending on this.2.3. Use e.g. for the patterning of semiconductor wafers in microlithography projection exposure apparatuses.
摘要翻译： 1.使用多次曝光来图案化衬底的方法。 2.1。本发明涉及使用可调节光学系统的曝光工艺对衬底进行图案化的方法，多次曝光用于在衬底上产生结构图像。 2.2。根据本发明，对于多个曝光中的至少一个，通过相应的测量步骤确定光学系统的成像质量，并且根据这一点设置影响成像质量的光学系统的至少一个参数。 2.3。使用例如用于微光刻投影曝光设备中的半导体晶片的图案化。

8. 发明申请

US20080007706A1 Method of optimizing imaging performance 有权
标题翻译：优化成像性能的方法
公开(公告)号：US20080007706A1
公开(公告)日：2008-01-10
申请号：US11808316
申请日：2007-06-08
申请人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
发明人： Gerd Reisinger , Manfred Maul , Paul Graeupner , Martin Schriever , Ulrich Wegmann
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G03B27/52 , G03F7/70216
摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.
摘要翻译：提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

9. 发明申请

US20070046912A1 INTERFEROMETRIC MEASURING DEVICE AND PROJECTION EXPOSURE INSTALLATION COMPRISING SUCH MEASURING DEVICE 审中-公开
标题翻译：包含这种测量装置的平均测量装置和投影曝光装置
公开(公告)号：US20070046912A1
公开(公告)日：2007-03-01
申请号：US11469786
申请日：2006-09-01
申请人： Martin Schriever , Ulrich Wegmann , Helmut Haidner
发明人： Martin Schriever , Ulrich Wegmann , Helmut Haidner
IPC分类号： G03B27/52
CPC分类号： G02B5/0221 , G02B5/0252 , G03F7/70075 , G03F7/706
摘要： A measuring device for interferometric measurement of an optical imaging system that is provided for projecting a useful pattern, provided on a mask, into the image plane of the imaging system, includes a wavefront source for generating at least one wavefront traversing the imaging system; a diffraction grating, arrangeable downstream of the imaging system, for interacting with the wavefront reshaped by the imaging system; and a spatially resolving detector, assigned to the diffraction grating, for acquiring interferometric information. The wavefront source has at least one measuring pattern that is formed on the mask in addition to the useful pattern. The useful pattern may represent the structure of a layer of a semiconductor component in a specific fabrication step. The measuring pattern may be formed as a coherence-forming structure periodic in one or two dimensions.
摘要翻译：一种用于光学成像系统的干涉测量的测量装置，其被设置用于将设置在掩模上的有用图案投影到成像系统的图像平面中，包括用于产生穿过成像系统的至少一个波前的波前源; 衍射光栅，其布置在成像系统的下游，用于与由成像系统重新形成的波前相互作用; 以及分配给衍射光栅的空间分辨检测器，用于获取干涉信息。除了有用的图案之外，波前源还具有形成在掩模上的至少一个测量图案。有用的图案可以表示特定制造步骤中的半导体部件的层的结构。测量图案可以形成为一维或二维周期性的相干形成结构。

10. 发明申请

US20060231731A1 Method of determining optical properties and projection exposure system comprising a wavefront detection system 有权
标题翻译：确定光学特性的方法和包括波前检测系统的投影曝光系统
公开(公告)号：US20060231731A1
公开(公告)日：2006-10-19
申请号：US11387945
申请日：2006-03-24
申请人： Steffen Lauer , Ulrich Wegmann , Wolfgang Emer , Harald Sakowski , Martin Schriever
发明人： Steffen Lauer , Ulrich Wegmann , Wolfgang Emer , Harald Sakowski , Martin Schriever
IPC分类号： G01J1/20 , G01B11/02
CPC分类号： G03F7/706 , G03F7/70258
摘要： A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (λ1) and a second wavelength (λ2), wherein a first ratio is defined as an intensity of light λ2 to an intensity of light λ1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least λ1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of λ2 to an intensity of light of λ1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
摘要翻译：描述了一种确定投影曝光系统的至少一种光学特性的方法，其中曝光系统包括具有光源的光束传送系统，该光源用于产生具有第一波长（λ< SUB＆gt;）和第二波长（λ2 SUB），其中第一比率被定义为光λ2的光强度λ1， / SUB>曝光光束。该方法包括向投影光学系统提供包括至少λ1的光的至少一个测量光束，检测已经穿过投影光学系统的波前，以及根据检测到的波前来确定光学特性其中，所述测量光束中的λ2的光强度与λ1的光强度的第二比率入射在所述波前检测系统的检测器上小于第一比例。

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