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    • 3. 发明申请
    • HIGH DENSITY, HARD TIP ARRAYS
    • 高密度,硬尖端阵列
    • WO2012158838A2
    • 2012-11-22
    • PCT/US2012038206
    • 2012-05-16
    • NANOINK INCHENNING ALBERT KSHILE RAYMOND ROGERFRAGALA JOSEPH SAMRO NABIL AHAAHEIM JASON R
    • HENNING ALBERT KSHILE RAYMOND ROGERFRAGALA JOSEPH SAMRO NABIL AHAAHEIM JASON R
    • B81C99/00
    • B81C99/009B82Y10/00B82Y40/00G03F7/0002Y10T156/10Y10T156/1052
    • Improved high density, hard tip arrays for use in patterning including an article comprises a handle chip; and a silicon nitride membrane bonded to at least a portion of the handle chip. The silicon nitride membrane comprises an array of a plurality of silicon nitride tips extending directly from a surface of the silicon nitride membrane. A method comprises preparing a silicon nitride membrane comprising an array of a plurality of silicon nitride tips extending directly from a surface of the silicon nitride membrane; preparing a handle wafer; and bonding the silicon nitride membrane to at least a portion of the handle wafer to form an bonded tip array. Another article comprises an elastomeric backing member; and an array of tips disposed on the elastomeric backing member. The tips of the array comprise a refractory material. Another method comprises providing at least one mold for a tip array comprising a plurality of mold regions for tips; filling or coating the mold regions for tips with a refractory material, to form an array of tips comprising a refractory material; and disposing a liquid elastomer precursor material in contact with the refractory material of the tips.
    • 用于包括制品的图案化中的改进的高密度硬尖头阵列包括手柄芯片; 以及结合到手柄芯片的至少一部分的氮化硅膜。 氮化硅膜包括直接从氮化硅膜的表面延伸的多个氮化硅尖端的阵列。 一种方法包括制备氮化硅膜,其包括直接从氮化硅膜的表面延伸的多个氮化硅尖端的阵列; 准备一个处理晶圆; 以及将所述氮化硅膜结合到所述处理晶片的至少一部分以形成接合的尖端阵列。 另一制品包括弹性体背衬构件; 以及布置在弹性体背衬构件上的尖端阵列。 阵列的尖端包括耐火材料。 另一种方法包括提供至少一个用于尖端阵列的模具,其包括用于尖端的多个模具区域; 用耐火材料填充或涂覆用于尖端的模具区域,以形成包括耐火材料的尖端阵列; 并且将液体弹性体前体材料设置成与尖端的耐火材料接触。
    • 8. 发明专利
    • IMPROVED CANTILEVERS FOR DEPOSITION
    • CA2795920A1
    • 2011-10-20
    • CA2795920
    • 2011-04-13
    • NANOINK INC
    • FRAGALA JOSEPH SSHILE R ROGERROZHOK SERGEY V
    • G03F7/00B82B3/00
    • Cantilever design for patterning from a cantilever tip can be improved with, for example, a recessed area surrounding the cantilever tip. A device for printing nanoscopic and microscopic patterns includes at least one cantilever having a front surface, a first side edge, a second side edge, and a first end which is a free end and a second end which is a non-free end. The front surface includes at least one first sidewall disposed at the first cantilever side edge and at least one second sidewall disposed at the second cantilever side edge opposing the first cantilever side edge, at least one channel, adapted to hold a fluid, disposed between the first and second sidewalls, wherein the channel, the first sidewall, and the second sidewall extend toward the cantilever free end but do not reach the free end, and a base region having a boundary defined by the first edge, the second edge, and the cantilever free end and also the first sidewall, second sidewall, and the channel, wherein the base region comprises a tip extending away from the cantilever front surface. Improved deposition can result. Fluidic inks comprising biomolecules can be patterned successfully.