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1. 发明申请

WO2012129162A3 METHODS OF MAKING PATTERNED STRUCTURES OF MATERIALS, PATTERNED STRUCTURES OF MATERIALS, AND METHODS OF USING SAME 审中-公开
标题翻译：制作材料图案结构的方法，材料的图案结构及其使用方法
公开(公告)号：WO2012129162A3
公开(公告)日：2013-01-24
申请号：PCT/US2012029653
申请日：2012-03-19
申请人： UNIV CORNELL , SCHWARTZ EVAN L , CHAN WEI MIN , LEE JIN-KYUN , TIWARI SANDIP , OBER CHRISTOPHER K
发明人： SCHWARTZ EVAN L , CHAN WEI MIN , LEE JIN-KYUN , TIWARI SANDIP , OBER CHRISTOPHER K
IPC分类号： G03F7/00 , G03F7/16 , H01L21/027 , H01L51/50
CPC分类号： G03F7/16 , B81C1/00031 , B81C2201/0149 , G03F7/0002 , G03F7/038 , H01L21/027 , Y10T428/24851
摘要： A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.
摘要翻译：一种形成有机聚合物材料图案的方法。该方法可用于形成具有两个图案化有机聚合物材料的层。在光致抗蚀剂沉积和去除步骤中使用的光致抗蚀剂和溶剂基本上不影响有机聚合物材料。

2. 发明申请

WO2009143357A2 ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES 审中-公开
标题翻译：在电子和电气设备中使用的有机材料的正交加工
公开(公告)号：WO2009143357A2
公开(公告)日：2009-11-26
申请号：PCT/US2009044863
申请日：2009-05-21
申请人： UNIV CORNELL , OBER CHRISTOPHER K , MALLIARAS GEORGE , LEE JIN-KYUN , ZAKHIDOV ALEXANDER , CHATZICHRISTIDI MARGARITA , TAYLOR PRISCILLA
发明人： OBER CHRISTOPHER K , MALLIARAS GEORGE , LEE JIN-KYUN , ZAKHIDOV ALEXANDER , CHATZICHRISTIDI MARGARITA , TAYLOR PRISCILLA
IPC分类号： G03F7/32
CPC分类号： G03F7/20 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/16 , G03F7/30 , G03F7/325 , G03F7/40 , H01L51/0018 , Y02E10/549 , Y10T428/24802
摘要： An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process. The combination of the fluorinated photoresist and the fluorinated solvent provides a robust, orthogonal process that is yet to be achieved by methods or devices known in the art.
摘要翻译：公开了光刻图案化有机结构的正交方法。所公开的方法使用氟化溶剂或超临界CO 2作为溶剂，使得有机导体和半导体的性能不会受其它侵蚀性溶剂的不利影响。一种公开的方法也可以与HFE溶剂一起使用氟化光致抗蚀剂，但也可以使用其它氟化溶剂。在一个实施方案中，氟化光致抗蚀剂是间苯二酚，但是也可以使用各种氟化聚合物光致抗蚀剂和氟化分子玻璃光致抗蚀剂。例如，甲基丙烯酸全氟癸基酯共聚物（FDMA）和甲基丙烯酸2-硝基苄酯（NBMA）是在光刻工艺中与氟化溶剂和超临界二氧化碳一起使用的合适的正交氟化光致抗蚀剂。氟化光致抗蚀剂和氟化溶剂的组合提供了通过本领域已知的方法或装置尚未实现的鲁棒的正交方法。

3. 发明申请

WO2011139774A3 METHOD FOR FORMING AN ORGANIC DEVICE 审中-公开
标题翻译：形成有机装置的方法
公开(公告)号：WO2011139774A3
公开(公告)日：2012-03-15
申请号：PCT/US2011034145
申请日：2011-04-27
申请人： ORTHOGONAL INC , OBER CHRISTOPHER K , LEE JIN-KYUN , ZAKHIDOV ALEXANDER , CHATZICHRISTIDI MARGARITA , TAYLOR PRISCILLA , DEFRANCO JOHN
发明人： OBER CHRISTOPHER K , LEE JIN-KYUN , ZAKHIDOV ALEXANDER , CHATZICHRISTIDI MARGARITA , TAYLOR PRISCILLA , DEFRANCO JOHN
IPC分类号： G03F7/00 , H01L21/027 , H01L51/50
CPC分类号： H01L51/0002 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/325 , G03F7/40 , H01L51/0018 , H01L51/0023 , H01L51/56 , Y02E10/549
摘要： The present invention provides a method for forming an organic device having a patterned conductive layer that includes providing a substrate, depositing organic materials over the substrate to form one or more organic layers, coating a photoresist solution over the one or more organic layers to form a photo-patternable layer, wherein the solution includes a fluorinated photoresist material and a first fluorinated solvent, selectively exposing portions of the photo-patternable layer to radiation to form a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, exposing the substrate to a second fluorinated solvent to develop the photo-patternable layer, removing the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, coating one or more conductive layers over the one or more organic layers and removing a portion of the one or more of the conductive layers to form a pattern. Particular embodiments of the present invention for forming arrays of top contact TFTs and a pixilated organic device are also provided.
摘要翻译：本发明提供一种用于形成具有图案化导电层的有机器件的方法，该有机器件包括提供衬底，在衬底上沉积有机材料以形成一个或多个有机层，在一个或多个有机层上涂覆光致抗蚀剂溶液以形成光刻图层，其中所述溶液包括氟化光致抗蚀剂材料和第一氟化溶剂，选择性地将可光可图层的部分暴露于辐射以形成暴露的氟化光致抗蚀剂材料的第一图案和未曝光的氟化光致抗蚀剂材料的第二图案，将基板暴露于第二氟化溶剂以显影光可图案层，除去未曝光的氟化光致抗蚀剂材料的第二图案，而不去除暴露的氟化光致抗蚀剂材料的第一图案，在一个或多个有机层上涂覆一个或多个导电层，以及去除一部分或一部分 e的导电层以形成图案。还提供了用于形成顶部接触TFT阵列和像素化有机器件的本发明的特定实施例。

4. 发明申请

WO2011139771A3 METHOD FOR FORMING A MULTICOLOR OLED DEVICE 审中-公开
标题翻译：用于形成多媒体OLED器件的方法
公开(公告)号：WO2011139771A3
公开(公告)日：2012-02-23
申请号：PCT/US2011034141
申请日：2011-04-27
申请人： ORTHOGONAL INC , OBER CHRISTOPHER K , LEE JIN-KYUN , ZAKHIDOV ALEXANDER , CHATZICHRISTIDI MARGARITA , TAYLOR PRISCILLA , DEFRANCO JOHN
发明人： OBER CHRISTOPHER K , LEE JIN-KYUN , ZAKHIDOV ALEXANDER , CHATZICHRISTIDI MARGARITA , TAYLOR PRISCILLA , DEFRANCO JOHN
IPC分类号： H01L51/56 , H01L51/50 , H05B33/10
CPC分类号： H01L51/0016 , G03F7/0046 , G03F7/325 , H01L27/3206 , H01L27/3211 , H01L27/3281 , H01L51/0018 , H01L51/504 , H01L51/56 , H05B33/10
摘要： A method is provided for forming a multi-color OLED device that includes providing a substrate, coating the substrate with a fluorinated photoresist solution to form a first photo-patternable layer and exposing it to produce a first pattern of exposed fluorinated photoresist material and a second pattern of unexposed fluorinated photoresist material, developing the photo-patternable layer with a fluorinated solvent to remove the second pattern of unexposed fluorinated photoresist material without removing the first pattern of exposed fluorinated photoresist material, depositing a first organic light-emitting material over the substrate to form a first organic light-emitting layer for emitting a first color of light and applying the first pattern of exposed fluorinated photoresist material to control the removal of a portion of the first organic light-emitting layer. A second fluorinated photoresist solution is then coated over the first patterened organic light- emitting layer and exposed to form a third pattern of exposed fluorinated photoresist material having a pattern different from the first pattern and a fourth pattern of unexposed fluorinated photoresist material, and developing the photo-patternable layer in a fluorinated solvent to remove the fourth pattern of unexposed fluorinated photoresist material without removing the third pattern of exposed fluorinated photoresist material, depositing at least a second light-emitting material to form a second light-emitting layer for emitting a second color of light that is different than the first color of light and applying the third pattern of exposed fluorinated photoresist material to control the removal of a portion of the second organic light- emitting layer.
摘要翻译：提供了一种用于形成多色OLED器件的方法，其包括提供衬底，用氟化光致抗蚀剂溶液涂覆衬底以形成第一可光刻图层并使其暴露以产生暴露的氟化光致抗蚀剂材料的第一图案，并且第二未曝光的氟化光致抗蚀剂材料的图案，用氟化溶剂显影光图案层以除去未曝光的氟化光致抗蚀剂材料的第二图案，而不去除暴露的氟化光致抗蚀剂材料的第一图案，将第一有机发光材料沉积在衬底上形成用于发射第一颜色的光的第一有机发光层，并施加暴露的氟化光致抗蚀剂材料的第一图案以控制去除第一有机发光层的一部分。然后将第二氟化光致抗蚀剂溶液涂覆在第一光刻有机发光层上并暴露以形成具有不同于第一图案的图案和未曝光的氟化光致抗蚀剂材料的第四图案的曝光的氟化光致抗蚀剂材料的第三图案，在氟化溶剂中的光图案化层，以去除未曝光的氟化光致抗蚀剂材料的第四图案，而不去除暴露的氟化光致抗蚀剂材料的第三图案，沉积至少第二发光材料以形成第二发光层，用于发射第二与第一颜色的光不同的光的颜色，并施加暴露的氟化光致抗蚀剂材料的第三图案，以控制去除第二有机发光层的一部分。

5. 发明申请

WO2009111023A2 TRIBLOCK POLYMERS AND POLYMER COATINGS 审中-公开
标题翻译：聚合物聚合物和聚合物涂料
公开(公告)号：WO2009111023A2
公开(公告)日：2009-09-11
申请号：PCT/US2009001373
申请日：2009-03-04
申请人： UNIV CORNELL , OBER CHRISTOPHER K , WEINMAN CRAIG JONATHAN , PARK DAE WON , HANDLIN DALE L , WILLIS CARL LESLEY
发明人： OBER CHRISTOPHER K , WEINMAN CRAIG JONATHAN , PARK DAE WON , HANDLIN DALE L , WILLIS CARL LESLEY
IPC分类号： C08F212/08
CPC分类号： C08F297/04 , C08F8/00 , C09D5/1668 , C09D5/1693 , C09D153/025 , Y10T428/31504 , Y10T428/3154 , Y10T428/31663 , Y10T428/31938 , C08F8/08 , C08F8/04 , C08F297/046
摘要： The invention provides novel polymers, including triblock polymers, as well as methods of preparing the polymers, and compositions that include such polymers. The polymers can include at least three blocks, the first block that includes poly(styrene), the second block that includes a random arrangement of poly(ethylene) and poly(butylene), and a third block that includes functionalized poly(isoprene). Units of the functionalized poly(isoprene) block can include hydroxyl groups and one or more ether linked side chains comprising R1, R2, R3, R4, R5, R6, as defined herein, or a combination thereof. The polymers can be used to provide antifouling coatings, for example, for marine ship hulls.
摘要翻译：本发明提供新颖的聚合物，包括三嵌段聚合物，以及制备聚合物的方法，以及包括这些聚合物的组合物。聚合物可以包括至少三个嵌段，第一嵌段包括聚（苯乙烯），第二嵌段包括聚（乙烯）和聚（丁烯）的随机排列，以及包括官能化聚（异戊二烯）的第三嵌段。官能化聚（异戊二烯）嵌段的单元可以包括羟基和一个或多个包含如本文定义的R 1，R 2，R 3，R 4，R 5，R 6，或其组合的醚连接的侧链。聚合物可用于提供防污涂料，例如用于海洋船体。

6. 发明申请

WO2007124092A3 PHOTOACID GENERATOR COMPOUNDS AND COMPOSITIONS 审中-公开
标题翻译：光电发生器化合物和组合物
公开(公告)号：WO2007124092A3
公开(公告)日：2007-12-13
申请号：PCT/US2007009714
申请日：2007-04-23
申请人： CORNELL RES FOUNDATION INC , OBER CHRISTOPHER K , YI YI , AYOTHI RAMAKRISHNAN
发明人： OBER CHRISTOPHER K , YI YI , AYOTHI RAMAKRISHNAN
IPC分类号： A01N41/10 , A61K31/10
CPC分类号： C07D307/33 , C07C309/06 , C07C309/10 , C07C381/12 , C07C2602/42 , Y10S430/106 , Y10S430/114
摘要： The invention provides various ionic and non-ionic photoacid generator compounds. Photoresist compositions that include the novel ionic and non-ionic photoacid generator compounds are also provided. The invention further provides methods of making and using the photoacid generator compounds and photoresist compositions disclosed herein. The compounds and compositions are useful as photoactive components in chemically amplified resist compositions for various microfabrication applications.
摘要翻译：本发明提供各种离子和非离子光致酸发生剂化合物。还提供了包含新型离子和非离子光酸产生剂化合物的光致抗蚀剂组合物。本发明还提供了制备和使用本文公开的光致酸产生剂化合物和光致抗蚀剂组合物的方法。化合物和组合物可用作用于各种微细加工应用的化学放大抗蚀剂组合物中的光活性组分。

7. 发明公开

EP2297613A4 ORTHOGONAL PROCESSING OF ORGANIC MATERIALS USED IN ELECTRONIC AND ELECTRICAL DEVICES 有权
标题翻译：电子及电器安排ORTHOGONALVERARBEITUNG使用的有机材料
公开(公告)号：EP2297613A4
公开(公告)日：2012-07-11
申请号：EP09751585
申请日：2009-05-21
申请人： UNIV CORNELL
发明人： OBER CHRISTOPHER K , MALLIARAS GEORGE , LEE JIN-KYUN , ZAKHIDOV ALEXANDER , CHATZICHRISTIDI MARGARITA , TAYLOR PRISCILLA
IPC分类号： G03F7/32 , H01L51/00
CPC分类号： G03F7/20 , G03F7/0046 , G03F7/0048 , G03F7/0392 , G03F7/16 , G03F7/30 , G03F7/325 , G03F7/40 , H01L51/0018 , Y02E10/549 , Y10T428/24802
摘要： An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process. The combination of the fluorinated photoresist and the fluorinated solvent provides a robust, orthogonal process that is yet to be achieved by methods or devices known in the art.

8. 发明公开

EP2274348A4 TRIBLOCK POLYMERS AND POLYMER COATINGS 失效
标题翻译：三嵌段和聚合物涂层
公开(公告)号：EP2274348A4
公开(公告)日：2011-08-24
申请号：EP09718378
申请日：2009-03-04
申请人： UNIV CORNELL , KRATON POLYMERS
发明人： OBER CHRISTOPHER K , WEINMAN CRAIG JONATHAN , PARK DAEWON , HANDLIN DALE L , WILLIS CARL LESLEY
IPC分类号： C08F212/08 , B32B27/30 , C08F8/00 , C08F8/18 , C08F210/02 , C08F210/08 , C08F210/14 , C08F297/00 , C08F297/04 , C09D5/16 , C09D123/28 , C09D125/08 , C09D153/02
CPC分类号： C08F297/04 , C08F8/00 , C09D5/1668 , C09D5/1693 , C09D153/025 , Y10T428/31504 , Y10T428/3154 , Y10T428/31663 , Y10T428/31938 , C08F8/08 , C08F8/04 , C08F297/046

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