会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明申请
    • HIGH PERFORMANCE ORGANIC THIN FILM TRANSISTOR
    • 高性能有机薄膜晶体管
    • WO2007005618A2
    • 2007-01-11
    • PCT/US2006025598
    • 2006-06-30
    • UNIV CALIFORNIAYANG YANGCHU CHIH-WEILI SHENG-HAN
    • YANG YANGCHU CHIH-WEILI SHENG-HAN
    • H01L51/00
    • H01L51/0525H01L21/31604H01L51/0052
    • An organic thin film transistor has a gate electrode, a gate insulator formed on the gate electrode, a layer of organic semiconducting material formed on the gate insulator, a source electrode formed on the layer of organic semiconducting material, and a drain electrode formed on the layer of organic semiconducting material. The source electrode and/or the drain electrode have a layer of transition-metal oxide formed on the organic semiconducting material and a layer of metal formed on the layer of transition-metal oxide. A method of producing an organic thin film transistor includes providing a gate electrode, forming a gate insulator on the gate electrode, forming a layer of semiconducting material on the gate insulator, forming a source electrode on the layer of organic semiconducting material, and forming a drain electrode on the layer of organic semiconducting material. Forming the source electrode and/or forming the drain electrode include forming a layer of transition-metal oxide on the organic semiconducting material and forming a layer of metal on the layer of transition-metal oxide.
    • 有机薄膜晶体管具有栅电极,形成在栅电极上的栅极绝缘体,形成在栅极绝缘体上的有机半导体材料层,形成在有机半导体材料层上的源电极和形成在栅极绝缘体上的漏电极 有机半导体材料层。 源电极和/或漏极具有形成在有机半导体材料上的过渡金属氧化物层和形成在过渡金属氧化物层上的金属层。 制造有机薄膜晶体管的方法包括提供栅电极,在栅电极上形成栅极绝缘体,在栅极绝缘体上形成半导体材料层,在有机半导体材料层上形成源电极,并形成 有机半导体材料层上的漏电极。 形成源电极和/或形成漏极包括在有机半导体材料上形成过渡金属氧化物层并在过渡金属氧化物层上形成金属层。
    • 4. 发明申请
    • A SIMPLE ROUTE FOR ALKALI METAL INCORPORATION IN SOLUTION-PROCESSED CRYSTALLINE SEMICONDUCTORS
    • 溶液加工晶体半导体中碱金属纳入简单路线
    • WO2011075728A3
    • 2011-10-06
    • PCT/US2010061323
    • 2010-12-20
    • UNIV CALIFORNIAYANG YANGHOU WEI-JENLI SHENG-HANTUNG CHUN-CHIH
    • YANG YANGHOU WEI-JENLI SHENG-HANTUNG CHUN-CHIH
    • H01L21/205
    • H01L21/02551H01L21/02568H01L21/02628H01L31/0322H01L31/0725H01L31/0749H01L31/18Y02E10/541
    • A precursor solution for producing a semiconductor includes at least one of an alkali metal or an alkali metal compound dissolved in a solvent, and a metal chalcogenide dissolved in the solvent. A method of producing a precursor solution for producing a semiconductor includes preparing a first precursor solution that has at least one of an alkali metal or an alkali metal compound dissolved in a first solvent, preparing a second precursor solution that has a metal chalcogenide dissolved in a second solvent, and combining the first and second precursor solutions to obtain the precursor solution for producing the semiconductor. A method of producing a semiconductor device includes providing a precursor solution for producing a semiconductor layer on a substructure, and forming a layer of the precursor solution on the substructure. The precursor solution includes at least one of an alkali metal or an alkali metal compound dissolved in a solvent, and a metal chalcogenide dissolved in the solvent.
    • 用于制造半导体的前体溶液包括溶解在溶剂中的碱金属或碱金属化合物和溶解在溶剂中的金属硫属元素化物中的至少一种。 生产用于生产半导体的前体溶液的方法包括:制备第一前体溶液,其具有溶解在第一溶剂中的碱金属或碱金属化合物中的至少一种;制备第二前体溶液,其具有溶解在第一溶剂中的金属硫属元素化物 第二溶剂,并且合并第一和第二前体溶液以获得用于生产半导体的前体溶液。 一种制造半导体器件的方法包括:提供用于在子结构上制造半导体层的前体溶液,以及在该子结构上形成前体溶液层。 前体溶液包括溶解在溶剂中的碱金属或碱金属化合物中的至少一种以及溶解在溶剂中的金属硫族化合物。