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1. 发明专利

JPH0416146B2 失效
公开(公告)号：JPH0416146B2
公开(公告)日：1992-03-23
申请号：JP4554384
申请日：1984-03-12
申请人： ULVAC CORP
发明人： TAKEI HIROSANE , TSUKIJI TAKASHI , TAKEDA HIROSHI
IPC分类号： F26B15/00 , A23L3/44 , F26B5/06 , F26B15/14

2. 发明专利

JPS6040497B2 失效
公开(公告)号：JPS6040497B2
公开(公告)日：1985-09-11
申请号：JP9168980
申请日：1980-07-07
申请人： ULVAC CORP
发明人： TAKEI HIROSANE , OOKUBO OSAMU
IPC分类号： F27D7/06 , C21D1/773

3. 发明专利

JPS59215729A Cleaning method of substrate for semiconductor or magnetic recording medium, etc. and device therefor 失效
标题翻译：用于半导体或磁记录介质的衬底的清洁方法等及其设备
公开(公告)号：JPS59215729A
公开(公告)日：1984-12-05
申请号：JP8838883
申请日：1983-05-21
申请人： Ulvac Corp
发明人： TAKEI HIROSANE , SUDOU AKIRA
IPC分类号： B08B3/02 , G11B5/84 , G11B5/85 , H01L21/304 , H01L21/02
CPC分类号： H01L21/3046
摘要： PURPOSE:To remove nearly completely contamination of substrates for semiconductors according to kinetic energy of a jetting detergent by a method wherein the liquid or gaseous detergent is jetted to the substrates. CONSTITUTION:When carriers 3 fitted with substrates 5 are carried in a cleaning chamber 1 through a door valve 2, steam is jetted from the nozzle group 6b of a header 8b, and the header 8b descends in succession according to the rotation of a chain 7. The nozzle group 6a of a header 8a descends together with the group 6b jetting a detergent aqueous solution directly after jetting of the nozzle group 6b. After the prescribed time, jetting is stopped totally, and both the nozzle groups return to the original positions. Then the nozzle group 6a descends jetting a hot water, and the detergent is washed to be flown out. After the hot water is stopped, the nozzle 6a ascends and descends jetting steam. After the prescribed time, dry N2 gas is jetted from nozzles 16, and the wet parts remaining on the substrates and the carriers are dried. Contamination of the substrates can be removed nearly completely according to this construction. Moreover, when the device is so constructed as to make the detergent nozzles to face with the substrates, and as to make the nozzles and the substrates transference freely relatively, construction of the cleaning chamber can be formed in a small type to enable to be established in a series with a high vacuum chamber, and treatment having favorable efficiency can be attained.
摘要翻译：目的：根据喷射洗涤剂的动能，通过将液体或气态洗涤剂喷射到基底上的方法，去除半导体基底的几乎完全的污染。构成：当装载有基板5的载体3通过门阀2被携载在清洁室1中时，从集管8b的喷嘴组6b喷射蒸汽，并且集管8b根据链7的旋转而相继下降集管8a的喷嘴组6a与喷嘴组6b喷射后直接喷射洗涤剂水溶液的组6b一起下降。在规定的时间之后，喷射完全停止，两个喷嘴组返回原来的位置。然后，喷嘴组6a下降喷射热水，洗涤剂被洗出来流出。热水停止后，喷嘴6a上升并下降喷射蒸汽。规定时间后，从喷嘴16喷出干燥的N 2气体，残留在基板和载体上的湿部被干燥。可以根据这种结构几乎完全去除基板的污染。此外，当该装置被构造成使得洗涤剂喷嘴与基板相对时，并且为了使喷嘴和基板自由地转移，清洁室的结构可以形成为小型，以便能够建立具有高真空室的系列，并且可以获得具有良好效率的处理。

4. 发明专利

JPS54153787A ALUMINUM AND ZINC DOUBLE LAYER PLATING STEEL PLATE AND ITS PRODUCTION 失效
公开(公告)号：JPS54153787A
公开(公告)日：1979-12-04
申请号：JP6229478
申请日：1978-05-26
申请人： ULVAC CORP , MITSUBISHI HEAVY IND LTD , NISSHIN STEEL CO LTD
发明人： IMAMURA JIYUSABUROU , TSUJI KEINOSUKE , TAKEI HIROSANE , HIRABAYASHI RIYOUJI
IPC分类号： C23C14/06 , C23C14/02 , C23C14/14 , C23C14/16
摘要： PURPOSE:To produce an Al-Zn dual plating steel plate free of flaking or powdering, vacuum metallizing is used to plate Al and succeeding Zn layers on the steel plate. CONSTITUTION:A steel plate substrate is plated with Al by use of vacuum metallizing or ion plating. The same procedures are used to plate Zn on the Al layer to provide an Al-Zn dual plated steel plate. The so produced plate, when heated by spot welding, etc., form a very thin Fe-Al alloy or Fe-Zn-Al alloy layer. This prohibits rapid and drastic Fe-Zn diffusion, further hole development by diffusion is prevented, so that machining and shock cause no flaking of plating layer peeling off.

5. 发明专利

JPS54120448A ANTICORROSIVE TREATING METHOD OF HEAT EXCHANGER IN ALUMINUM 失效
公开(公告)号：JPS54120448A
公开(公告)日：1979-09-19
申请号：JP2717978
申请日：1978-03-11
申请人： ULVAC CORP , TOYO RAJIEETAA KK
发明人： TAKEI HIROSANE , IWATA RIYOUICHI , AMINO KATSUSHI
IPC分类号： F28F19/06

6. 发明专利

JPS54118358A PRODUCTION OF ALUMINUM HEAT EXCHANGER 失效
公开(公告)号：JPS54118358A
公开(公告)日：1979-09-13
申请号：JP2559878
申请日：1978-03-07
申请人： ULVAC CORP , TOYO RAJIEETAA KK
发明人： HORIUCHI TOSHIYUKI , YUMITA HATAO , MIYAZAKI SOUICHIROU , TAKEI HIROSANE
IPC分类号： F28F1/30 , B23K1/19 , B23K1/20 , B23K31/02 , C23G5/00
摘要： PURPOSE:Aluminum-made heat exchanger is effectively, and quickly manufactured by introducing assembly member into vacuum chamber, replacing with nonoxidizing layer, gas, raising temperature, removing oil and oxide film layer, reheating, and brazing the assembling member in the vacuum. CONSTITUTION:Assembling member 1 coated with brazing material is introduced into the cleaning chamber 5 of the vacuum chamber 2. The cleaning chamber 5 and the vacuum brazing chamber 6 are exhausted. Nonoxidizing gas is admitted through the gas feed pipe 32 into the cleaning chamber 5, the heater 13a-13c are energized to heat the assembling member 1 to 200 to 250 deg.C, thereby removing oil and oxide layer deposited on the surface of the member 1. Then, the member 1 is transferred to the vacuum brazing chamber 6, where the heater 14a-14c are energized to heat the member 1 to a temperature of about 600 deg.C, thereby effecting the member brazing in vacuum. Such process saves heat energy, effecting quick, efficient total working.

7. 发明专利

JPS53113743A MANUFACTURE OF ALUMINUM MADE HEAT EXCHANGER 失效
公开(公告)号：JPS53113743A
公开(公告)日：1978-10-04
申请号：JP2803277
申请日：1977-03-16
申请人： ULVAC CORP , TOYO RAJIEETAA KK
发明人： YAMANE MINORU , TAKEI HIROSANE
IPC分类号： F28F1/30 , B23K1/00 , B23K31/02 , B23K35/38 , F28D1/053
摘要： PURPOSE:To prevent the aluminum surface from the formation of oxide coating on purpose to perform a perfect brazing, by cladding the brazing material on the aluminum made heat-exchanger-assembly which is then heated to melt the brazing material in the vacuum furnace, and then, by brazing after sticking Mg on the surface.

8. 发明专利

JPH0116309B2 失效
公开(公告)号：JPH0116309B2
公开(公告)日：1989-03-23
申请号：JP16262483
申请日：1983-09-06
申请人： ULVAC CORP
发明人： TAKEI HIROSANE , CHIBA TSUGIO
IPC分类号： B08B3/02 , B01D47/06 , C23C14/00 , C23C14/22 , C23C16/44 , H01L21/02

9. 发明专利

JPS6055611A CLEANING METHOD FOR INSIDE OF VACUUM CHAMBER 失效
公开(公告)号：JPS6055611A
公开(公告)日：1985-03-30
申请号：JP16262483
申请日：1983-09-06
申请人： ULVAC CORP
发明人： TAKEI HIROSANE , CHIBA TSUGIO
IPC分类号： B08B3/02 , B01D47/06 , C23C14/00 , C23C14/22 , C23C16/44 , H01L21/02
摘要： PURPOSE:To remove dust generated in a vacuum chamber simply and quickly by jetting a stream of cleaning fluid using a nozzle provided in the vacuum chamber to clean the inside of the vacuum chamber. CONSTITUTION:Nozzles 4 turnably provided at corners in a vacuum chamber 1 having an evaporation source 2 in the lower part and a drive device 3 for a substrate in the upper part is supplied with cleaning fluid from a cleaning fluid circulation device 5 via a feed pipe 6. A cleaning fluid which jets into the inside of the vacuum chamber 1 washes off dust such as evaporated substances attached to inner wall surface 1a and the drive device 3 and returns to a tank 8 via a discharge pipe 14 in the lower part by the help of a discharge pump 12. Hereinafter, gas for drying is supplied to the nozzles 4 from a gas source 13 to dry the wet inside of the vacuum chamber 1. This allows the number of dust in the vacuum chamber to be largely reduced with comparative simplicity and a short time and without overhauls.

10. 发明专利

JPS5933161B2 JPS5933161B2 - 失效
公开(公告)号：JPS5933161B2
公开(公告)日：1984-08-14
申请号：JP10111180
申请日：1980-07-25
申请人： Ulvac Corp
发明人： TAKEI HIROSANE , YONEDA YOSHUKI
IPC分类号： B22F9/10

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