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    • 1. 发明专利
    • METHOD AND DEVICE FOR SUPPLYING LOW-MELTING-POINT MATERIAL TO BE VAPORIZED IN VAPOR DEPOSITION APPARATUS
    • JPH01234560A
    • 1989-09-19
    • JP5641688
    • 1988-03-11
    • ULVAC CORP
    • OSHII KIYOSHI
    • B01J4/00C23C14/24
    • PURPOSE:To prevent the deterioration in the quality of a vaporization source and to improve productivity by heating and melting a low-melting-point material to be vaporized in a melting vessel in a melting chamber, pressurizing the melting chamber with an inert gas, and supplying the molten material to the vaporization source in the vaporization chamber through a supply pipe. CONSTITUTION:The vaporization source 4 in the vaporization chamber 3 separated from the vapor deposition chamber 1 of a vapor deposition apparatus by a gate valve 2 and the melting vessel 10 in the melting chamber 9 are connected by the supply pipe 11. The melting vessel 10 is heated by a heater 13 to melt a low-melting-point material to be vaporized in the vessel 10. A fixed amt. of an inert gas such as Ar is introduced into the melting chamber 9 through a gas flow controller 15 to pressurize the chamber 9. Consequently, the molten material in the vessel 10 is supplied to the vaporization source 4 through the supply pipe 11. In this case, one end of the pipe 11 is opened above the source 4, and the other end is opened below the surface of the molten material in the vessel 10. The pipe 11 is heated by a heater 12 at a temp. higher than the m.p. of the material while the material is delivered.
    • 2. 发明专利
    • Device for exhaust system in plasmatic cvd device
    • 等离子体CVD装置中排气系统的装置
    • JPS5943519A
    • 1984-03-10
    • JP15254882
    • 1982-09-03
    • Ulvac Corp
    • FUJIOKA TOSHIAKIOSHII KIYOSHI
    • H01L21/31C23C16/44H01L21/205H01L21/285
    • C23C16/44C23C16/4412
    • PURPOSE:To eliminate the hazard of generation of fire on the subject CVD device by a method wherein an exhaust system is composed of a rough exhaust system and a gas exhaust system which can be separated to each other. CONSTITUTION:A reaction gas introducing port 2 and an atmosphere air introducing port 3 are provided in a reaction chamber 1 respectively, an exhaust system 4 connected to said reaction chamber is provided for the purpose of exhausting the reaction chamber and another exhaust system 5, which can be separated from the exhaust system 4, is provided. The exhaust system 4 is used exclusively for exhaustion, and the exhaust system 5 is exclusively used for rough exhaustion. The exhaust system 5 consists of a mechanical booster pump 5a to be used in the former stage, for example, and an oil revolution pump 5b to be used in the latter stage. When the reaction chamber 1 is decompressed to several Torrs or several tens of Torrs from atmospheric pressure by operating the exhaust system 5 and then the exhaust system 4 is operated, certain quantity of gas remains in the exhaust system 4, but no air is introduced therein, thereby enabling to prevent the danger of producing fire due to the contact of gas and air.
    • 目的:通过排气系统由粗排气系统和彼此分离的排气系统组成的方法,消除了本发明CVD装置产生火灾的危险。 构成:反应气体导入口2和大气导入口3分别设置在反应室1内,为了排出反应室和另一个排气系统5而设置与反应室连接的排气系统4, 可以与排气系统4分离。 排气系统4专门用于排气,排气系统5专门用于粗耗。 排气系统5由例如前一级中使用的机械增压泵5a和用于后级的油旋泵5b组成。 当通过操作排气系统5将反应室1从大气压力减压到几个Torrs或几十Torrs,然后排气系统4运行时,一定量的气体保留在排气系统4中,但没有空气被引入 从而能够防止由于气体和空气的接触而产生火灾的危险。