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1. 发明申请

US20010023042A1 Test object for detecting aberrations of an optical imaging system 失效
标题翻译：用于检测光学成像系统的像差的测试对象
公开(公告)号：US20010023042A1
公开(公告)日：2001-09-20
申请号：US09844122
申请日：2001-04-27
申请人： U. S. PHILIPS CORPORATION
发明人： Peter Dirksen , Casparus A.H. Juffermans
IPC分类号： G03F009/00 , G03C005/00
CPC分类号： G03F7/706 , G03F7/70241 , G03F7/70358
摘要： Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure (22) on a photoresist (PR), developing the resist and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each of several possible aberrations, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other. The new method may be used for measuring a projection system for a lithographic projection apparatus.
摘要翻译：可以通过成像系统在光致抗蚀剂（PR）上成像圆形相结构（22），以准确和可靠的方式检测成像系统（PL）的像差，显影抗蚀剂并用扫描扫描检测装置（SEM），其耦合到图像处理器（IP）。圆形相结构被成像为环形结构（25），并且几个可能的像差中的每一个像昏迷，散光，三点像差等都导致内部轮廓（CI）和外部轮廓的形状的特定变化（CE）和/或这些轮廓之间的距离的变化，使得可以彼此独立地检测像差。该新方法可用于测量光刻投影装置的投影系统。

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