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    • 1. 发明授权
    • Device and method for measuring a characteristic of an optical element
    • 用于测量光学元件的特性的装置和方法
    • US5768150A
    • 1998-06-16
    • US833522
    • 1997-04-07
    • Tunehiko SonodaMasahiro OonoMasato Noguchi
    • Tunehiko SonodaMasahiro OonoMasato Noguchi
    • G01B11/255G01M11/02G01B9/02G01B11/00G01B11/24G01M11/00
    • G01M11/0271G01B11/255
    • A device for measuring a characteristic of an optical element which forms an interference fringe pattern using a reference light beam reflected from a reference surface and a test light beam that is guided from the optical element by a light refracting element. The interference fringe pattern is detected and data corresponding to the interference fringe pattern is output. The outputted data is processed such that information of wave front aberration representative of the interference fringe pattern is output. The information includes mathematical terms representative of position errors and of the characteristic of the optical element. The mathematical terms are calculated, and the mathematical terms representative of the characteristic of the optical element are corrected based on a value of at least one of the mathematical terms representative of the position errors. The corrected mathematical terms are then displayed.
    • 一种用于测量使用从参考表面反射的参考光束和由光折射元件从光学元件引导的测试光束形成干涉条纹图案的光学元件的特性的装置。 检测干涉条纹图案,并输出对应于干涉条纹图案的数据。 处理输出的数据,从而输出表示干涉条纹图案的波前像差的信息。 该信息包括表示位置误差和光学元件的特性的数学术语。 计算数学项,并且基于代表位置误差的数学术语中的至少一个的值校正表示光学元件的特性的数学术语。 然后显示校正的数学术语。
    • 3. 发明授权
    • Beam protecting device
    • 梁保护装置
    • US5991102A
    • 1999-11-23
    • US562827
    • 1995-11-27
    • Masahiro OonoMasato HaraTunehiko SonodaKoichi Maruyama
    • Masahiro OonoMasato HaraTunehiko SonodaKoichi Maruyama
    • G01C15/00G02B26/06G02B27/09G02B7/02
    • G02B27/09G01C15/004G02B19/0028G02B19/0052G02B19/0085G02B26/06G02B27/0972
    • A beam projecting apparatus which includes a light source emitting a laser beam; and a beam projecting device which includes a beam projecting portion from which the laser beam is projected outwardly so that the laser beam has a beam waist position at a predetermined position apart from the beam projecting apparatus. The beam projecting apparatus further includes a beam waist position adjusting optical system which is disposed along a light path from the light source to the beam projecting portion, at least one lens element of the beam waist position adjusting optical system being movable along an optical axis thereof; a temperature detecting device for detecting a temperature in the beam projecting apparatus; and a controller for controlling a movement of the at least one lens element in association with the temperature detected by the temperature detecting device so that a deviation of the beam waist position from the predetermined position due to a temperature change is minimized.
    • 一种投影装置,包括发射激光束的光源; 以及射束投影装置,其包括光束突出部分,激光束从该突出部分向外突出,使得激光束具有远离光束投射装置的预定位置处的光束腰部位置。 光束投射装置还包括:光束腰位置调整光学系统,其沿着从光源到光束突出部分的光路设置,所述光束腰部位置调整光学系统的至少一个透镜元件可沿其光轴移动 ; 温度检测装置,用于检测光束投射装置中的温度; 以及控制器,用于与由温度检测装置检测的温度相关联地控制至少一个透镜元件的运动,使得光束腰部位置与由于温度变化引起的预定位置的偏差最小化。