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1. 发明授权

US08132580B2 Substrate processing system and substrate cleaning apparatus including a jetting apparatus 有权
标题翻译：基板处理系统和基板清洗装置，包括喷射装置
公开(公告)号：US08132580B2
公开(公告)日：2012-03-13
申请号：US12057807
申请日：2008-03-28
申请人： Tsuyoshi Moriya , Tadashi Onishi , Ryo Nonaka , Eiichi Nishimura
发明人： Tsuyoshi Moriya , Tadashi Onishi , Ryo Nonaka , Eiichi Nishimura
IPC分类号： B08B3/00
CPC分类号： H01L21/67051 , H01L21/6708
摘要： A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined processing on the substrate. A substrate cleaning apparatus cleans the substrate at least one of before and after the predetermined processing. A jetting apparatus jets a cleaning substance in two phases of a gas phase and a liquid phase and a high-temperature gas towards the rear surface or the periphery of the substrate.
摘要翻译：能够完全除去附着在基板的背面或周围的异物的基板处理系统。基板处理装置对基板进行规定的处理。基板清洁装置在预定处理之前和之后清洁基板。喷射装置将气相和液相以及高温气体的两相中的清洗物质喷射到基板的后表面或周边。

2. 发明授权

US08585831B2 Substrate cleaning method 失效
标题翻译：基材清洗方法
公开(公告)号：US08585831B2
公开(公告)日：2013-11-19
申请号：US13255723
申请日：2010-03-10
申请人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
发明人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
IPC分类号： B08B3/00
CPC分类号： H01L21/02101 , H01L21/02071 , H01L21/67051 , H01L21/67109
摘要： There is provided a substrate cleaning method capable of cleaning a substrate on which a fine pattern is being formed in a short time with a simple configuration without having a harmful influence on the fine pattern. In the method, the substrate is transferred from a processing chamber for performing a process on the surface of the substrate therein to a cleaning chamber for cleaning the substrate therein. The substrate is cooled to a temperature in the cleaning chamber. A superfluid is supplied to the surface of the substrate, and contaminant components in the fine pattern are flowed out along with the superfluid as the superfluid flows over from the surface of the substrate.
摘要翻译：提供一种基板清洗方法，其能够以简单的构造在短时间内清洁其上形成微细图案的基板，而不会对微细图案产生有害影响。在该方法中，将基板从用于在基板表面上进行处理的处理室转移到用于清洁基板的清洁室。将基板冷却至清洁室内的温度。将超流体供给到基板的表面，并且当超流体从基板的表面流过时，精细图案中的污染物成分与超流体一起流出。

3. 发明授权

US08210742B2 Method and apparatus for detecting foreign matter attached to peripheral edge of substrate, and storage medium 有权
标题翻译：用于检测附着于基板周边的异物的方法和装置以及存储介质
公开(公告)号：US08210742B2
公开(公告)日：2012-07-03
申请号：US12506440
申请日：2009-07-21
申请人： Tsuyoshi Moriya , Eiichi Nishimura
发明人： Tsuyoshi Moriya , Eiichi Nishimura
IPC分类号： G01N25/72 , G01N21/94 , G01N21/952 , H01L21/302 , H01L21/66
CPC分类号： G01M99/002 , H01L22/12 , H01L22/24 , H01L2924/0002 , H01L2924/00
摘要： A foreign matter detecting method of detecting foreign matter attached to a peripheral edge of a substrate, which makes it possible to accurately detect foreign matter attached to the peripheral edge of the substrate even if the foreign matter is of a minute size below the detection limit of an existing measuring instrument, and which is highly versatile and suitable for mass production of substrates. The substrate is cooled to condense moisture around the foreign matter attached to the peripheral edge of the substrate, and then the condensed moisture is iced to grow an ice crystal. Then, the foreign matter attached to the peripheral edge of the substrate, which is emphasized by the ice crystal, is detected.
摘要翻译：检测附着于基板的周缘的异物的异物检测方法，即使异物的检测极限低于检测限的微小尺寸，也能够准确地检测附着在基板的周缘的异物现有的测量仪器，并且是高度通用性的并且适合于大量生产基板。将基板冷却以冷凝附着在基板的周边边缘的异物，然后冷凝的水分被冰化以生长冰晶。然后，检测附着在基板的周缘的异物，其被冰晶强调。

4. 发明申请

US20120031434A1 SUBSTRATE CLEANING METHOD 失效
标题翻译：基板清洗方法
公开(公告)号：US20120031434A1
公开(公告)日：2012-02-09
申请号：US13255723
申请日：2010-03-10
申请人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
发明人： Hidefumi Matsui , Tsuyoshi Moriya , Eiichi Nishimura , Shinichi Kawaguchi , Jun Yamawaku , Kunio Miyauchi
IPC分类号： B08B7/00 , B08B3/08 , H01L21/02
CPC分类号： H01L21/02101 , H01L21/02071 , H01L21/67051 , H01L21/67109
摘要： There is provided a substrate cleaning method capable of cleaning a substrate on which a fine pattern is being formed in a short time with a simple configuration without having a harmful influence on the fine pattern. In the method, the substrate is transferred from a processing chamber for performing a process on the surface of the substrate therein to a cleaning chamber for cleaning the substrate therein. The substrate is cooled to a temperature in the cleaning chamber. A superfluid is supplied to the surface of the substrate, and contaminant components in the fine pattern are flowed out along with the superfluid as the superfluid flows over from the surface of the substrate.
摘要翻译：提供一种基板清洗方法，其能够以简单的构造在短时间内清洁其上形成微细图案的基板，而不会对微细图案产生有害影响。在该方法中，将基板从用于在基板表面上进行处理的处理室转移到用于清洁基板的清洁室。将基板冷却至清洁室内的温度。将超流体供给到基板的表面，并且当超流体从基板的表面流过时，精细图案中的污染物成分与超流体一起流出。

5. 发明授权

US09022225B2 Filtration filter and production method therefor 有权
标题翻译：过滤过滤器及其生产方法
公开(公告)号：US09022225B2
公开(公告)日：2015-05-05
申请号：US14006177
申请日：2012-03-13
申请人： Tsuyoshi Moriya , Asao Yamashita
发明人： Tsuyoshi Moriya , Asao Yamashita
IPC分类号： B01D25/00 , B01D29/62 , B01D29/46 , B01D63/08 , B01D39/16 , B01D39/20 , B01D61/02 , B01D61/04 , B01D69/10 , B01D29/00 , B01D61/24 , B01D65/02
CPC分类号： B01D29/62 , A61M2205/7563 , B01D29/46 , B01D39/16 , B01D39/1692 , B01D39/2003 , B01D39/2027 , B01D39/2055 , B01D39/2068 , B01D61/025 , B01D61/04 , B01D61/243 , B01D63/084 , B01D65/02 , B01D69/10 , B01D2311/04 , B01D2311/06 , B01D2313/02 , B01D2313/14 , B01D2321/04 , Y10T29/49826 , B01D2311/2642 , B01D2311/2626 , B01D2311/12 , B01D2311/2692
摘要： Provided is a filtration filer with which a stable opening size during filtration is obtained, and which can be easily regenerated when clogged and used repeatedly. The filtration filter (10) comprises: a substrate stack wherein substrates (11) that have a through hole that penetrates from front to back are stacked; stoppers (15) that define the spacing between the substrates (11); and pillars (16) with a larger thermal expansion coefficient than the stoppers (15). The spacing between the substrates (11) at normal temperature is defined at least by the stoppers (15), and the spacing when heated is defined by the thermally expanded pillars (16). The gaps between the substrates (11) form the filtration surface that traps contaminants contained in the liquid that is being treated A.
摘要翻译：提供了一种过滤器，其在过滤期间具有稳定的开口尺寸，并且可以在被堵塞并重复使用时容易地再生。过滤器（10）包括：基板叠层，其中具有从前到后穿透的通孔的基板（11）被堆叠; 限定基板（11）之间的间隔的止动件（15）; 和具有比止动件（15）更大的热膨胀系数的柱（16）。在正常温度下，基板（11）之间的间隔至少由止挡件（15）限定，加热时的间隔由热膨胀的支柱（16）限定。基板（11）之间的间隙形成了捕获正在处理的液体中的污染物的过滤表面。

6. 发明授权

US08854625B2 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring 有权
标题翻译：包括颗粒监测单元，颗粒监测方法和程序的真空装置以及用于颗粒监测的窗口部件
公开(公告)号：US08854625B2
公开(公告)日：2014-10-07
申请号：US12985099
申请日：2011-01-05
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama
IPC分类号： G01N21/00 , C23C14/00 , H01J37/32 , B08B9/08 , G01N15/02 , G01N15/06
CPC分类号： H01J37/32935 , B08B9/08 , G01N15/0272 , G01N15/06 , G01N2015/0693 , Y10T428/30 , Y10T428/315 , Y10T428/8305
摘要： A particle monitoring apparatus includes a housing disposed on a gas exhaust line, a laser beam source for emitting a laser beam to particles in the gas exhaust line, a window member disposed at the housing for monitoring the particles in the gas exhaust line. The window member has a transparent base which is formed of a transparent resin or glass containing silicon and has a gas contact surface which faces a gas within the gas exhaust line, and a surface treatment layer formed on the gas contact surface of the transparent base, wherein the surface treatment layer contains one material selected from the group consisting of yttrium and calcium fluoride.
摘要翻译：粒子监测装置包括：设置在排气管上的壳体，用于向气体排出管线中的颗粒发射激光束的激光束源;设置在壳体处的用于监测排气管线中的颗粒的窗口部件。窗构件具有由透明树脂或含硅的玻璃形成的透明基底，并且具有与气体排出管线内的气体相对的气体接触面，以及形成在透明基底的气体接触面上的表面处理层，其中所述表面处理层含有选自钇和氟化钙的一种材料。

7. 发明授权

US08498911B2 Particle generation factor determining system, charging method and storage medium 有权
标题翻译：粒子生成因子决定系统，计费方法和存储介质
公开(公告)号：US08498911B2
公开(公告)日：2013-07-30
申请号：US12820692
申请日：2010-06-22
申请人： Tsuyoshi Moriya
发明人： Tsuyoshi Moriya
IPC分类号： G06Q40/00
CPC分类号： G06Q30/06 , G06Q30/0283 , G06Q30/04 , H01L22/12
摘要： Provided is a charging method capable of offering a user an incentive to use a particle generation factor determining system. In the particle generation factor determining system including a user interface device 11 through which a user inputs a particle map and a server 13, the server 13 calculates accuracy of each of multiple particle generation factors based on the particle map; the user interface device 11 displays the calculated accuracy or a title of generation-factor-relevant information 27 on each particle generation factor corresponding to this accuracy; the server 13 provides the generation-factor-relevant information 27 to the user interface device 11; a charged fee for providing particle generation-factor-relevant information 27 is determined based on accuracy of a particle generation factor corresponding to the provided generation-factor-relevant information 27.
摘要翻译：提供了一种能够向用户提供使用粒子生成因子确定系统的激励的计费方法。在包括用户通过其输入粒子映射的用户界面装置11和服务器13的粒子生成因子确定系统中，服务器13基于粒子图计算多个粒子生成因子中的每一个的精度; 用户界面装置11对与该精度对应的每个粒子生成因子显示计算出的生成因子相关信息27的精度或标题; 服务器13向用户接口设备11提供生成因子相关信息27; 基于与所提供的生成因子相关信息27相对应的粒子生成因子的精度，确定用于提供粒子生成因子相关信息27的收费。

8. 发明授权

US08243265B2 Method and apparatus for detecting foreign materials and storage medium 有权
标题翻译：检测异物和储存介质的方法和装置
公开(公告)号：US08243265B2
公开(公告)日：2012-08-14
申请号：US12617235
申请日：2009-11-12
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hideaki Yakushiji
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hideaki Yakushiji
IPC分类号： G01N21/00
CPC分类号： H01L21/67288 , G01N21/91 , G01N21/94 , G01N21/9501
摘要： A foreign material detecting method for detecting a foreign material attached to a substrate surface includes a spraying step of spraying an organic solvent or an oil-phase material containing a halogen element to the substrate surface, a condensing step of emphasizing the foreign material by condensing the sprayed organic solvent or oil-phase material around the foreign material attached to the substrate surface by controlling a temperature of the substrate surface, and a surface inspecting step of detecting the foreign material emphasized by the condensation of the organic solvent or the oil-phase material by a surface inspecting device.
摘要翻译：用于检测附着在基板表面上的异物的异物检测方法包括：向基板表面喷射含有卤素元素的有机溶剂或油相材料的喷射步骤，通过冷凝来强调异物的冷凝步骤通过控制基板表面的温度，附着于基板表面的异物附近的喷涂有机溶剂或油相材料，以及检测由有机溶剂或油相材料的冷凝强调的异物的表面检查步骤通过表面检查装置。

9. 发明授权

US08236109B2 Component cleaning method and storage medium 失效
标题翻译：组件清洗方法和存储介质
公开(公告)号：US08236109B2
公开(公告)日：2012-08-07
申请号：US12639586
申请日：2009-12-16
申请人： Tsuyoshi Moriya , Akitaka Shimizu
发明人： Tsuyoshi Moriya , Akitaka Shimizu
IPC分类号： B08B6/00
CPC分类号： H01L21/02057 , H01J37/32862 , Y10S438/905 , Y10S438/906
摘要： A method for cleaning a component in a substrate processing apparatus including a processing chamber, foreign materials being attached to the component, at least a part of the component being exposed inside the processing chamber, and the substrate processing apparatus being adapted to load and unload a foreign material adsorbing member into and from the processing chamber. The method includes loading the foreign material adsorbing member into the processing chamber; generating a plasma nearer the component than the foreign material adsorbing member; extinguishing the plasma; and unloading the foreign material adsorbing member from the processing chamber, wherein the generation and the extinguishment of the plasma are repeated alternately and the foreign material adsorbing member has a positive potential at least during the extinguishment of the plasma.
摘要翻译：一种清洗基板处理装置中的部件的方法，所述基板处理装置包括处理室，异物附着在所述部件上，所述部件的至少一部分暴露在所述处理室内部，所述基板处理装置适于加载和卸载异物吸附构件进出处理室。该方法包括将异物吸附构件装载到处理室中; 产生比异物吸附部件更靠近部件的等离子体; 熄灭等离子体; 并且从所述处理室卸载所述异物吸附构件，其中所述等离子体的产生和熄灭交替地重复，并且所述异物吸附构件至少在所述等离子体熄灭期间具有正电位。

10. 发明授权

US08208802B2 Focusing position determining apparatus, imaging apparatus and focusing position determining method 有权
标题翻译：聚焦位置确定设备，成像设备和聚焦位置确定方法
公开(公告)号：US08208802B2
公开(公告)日：2012-06-26
申请号：US12548570
申请日：2009-08-27
申请人： Yuki Endo , Toshiyuki Tanaka , Toshihiro Hamamura , Tsuyoshi Moriya , Naoki Takafuji
发明人： Yuki Endo , Toshiyuki Tanaka , Toshihiro Hamamura , Tsuyoshi Moriya , Naoki Takafuji
IPC分类号： G03B3/00
CPC分类号： G03B13/00
摘要： Provided are a focusing position determining apparatus, an imaging apparatus, and a focusing position determining method, the method including setting an aperture to a first aperture value; driving a focus lens through a first range of positions as a first drive; during the first drive, obtaining images periodically, and calculating a first sampling of contrast values from the obtained images; calculating a first focus position from the first sampling of contrast values; setting the aperture to a second aperture value; driving a focus lens through a second range of positions as a second drive, the second range of positions being based on the first focus position; during the second drive, obtaining images periodically, and calculating a second sampling of contrast values from the obtained images; calculating a focusing position from the second sampling of contrast values; and driving the focus lens to the calculated focusing position.
摘要翻译：提供了一种聚焦位置确定装置，成像装置和聚焦位置确定方法，该方法包括将光圈设置为第一光圈值; 通过第一范围的位置驱动聚焦透镜作为第一驱动; 在第一驱动期间，周期性地获得图像，并从所获得的图像中计算对比度值的第一采样; 从对比度值的第一取样计算第一焦点位置; 将光圈设置为第二光圈值; 通过第二范围的位置驱动聚焦透镜作为第二驱动，所述第二位置范围基于所述第一对焦位置; 在第二驱动期间，周期性地获取图像，并且从所获得的图像中计算对比度值的第二采样; 从对比度值的第二取样计算聚焦位置; 并将聚焦透镜驱动到计算出的聚焦位置。

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