专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06230652B1 Apparatus and methods for upgraded substrate processing system with microwave plasma source 有权
标题翻译：具有微波等离子体源的升级基板处理系统的装置和方法
公开(公告)号：US06230652B1
公开(公告)日：2001-05-15
申请号：US09480923
申请日：2000-01-11
申请人： Tsutomu Tanaka , Mukul Kelkar , Kevin Fairbairn , Hari Ponnekanti , David Cheung
发明人： Tsutomu Tanaka , Mukul Kelkar , Kevin Fairbairn , Hari Ponnekanti , David Cheung
IPC分类号： C23C1600
CPC分类号： H01J37/32862 , C23C16/511 , C23C16/52 , H01J37/32192 , H01J37/32357
摘要： An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. In a preferred embodiment, the remote microwave plasma source efficiently provides a plasma without need for liquid-cooling the plasma applicator tube. In another embodiment, the present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a plasma with the ability to efficiently clean the chamber when needed.
摘要翻译：根据具体实施例的用于提供用于有效清洁腔室的等离子体的升级CVD系统的装置和方法。使用本发明的升级的CVD系统也可以实现在基板上的蚀刻或沉积层。在一个具体实施方案中，本发明提供了一种易于拆卸，方便处理且相对便宜的微波等离子体源，作为对现有CVD设备的改进或可移除的添加。在优选实施例中，远程微波等离子体源有效地提供等离子体，而不需要等离子体施加管的液体冷却。在另一个实施方案中，本发明提供了一种改进的CVD装置或改进现有的CVD装置，其能够产生等离子体，其能够在需要时有效地清洁腔室。

2. 发明授权

US6045618A Microwave apparatus for in-situ vacuum line cleaning for substrate processing equipment 失效
标题翻译：微波设备用于原位真空管线清洗用于基板加工设备
公开(公告)号：US6045618A
公开(公告)日：2000-04-04
申请号：US741241
申请日：1996-10-30
申请人： Sebastien Raoux , Tsutomu Tanaka , Mukul Kelkar , Hari Ponnekanti , Kevin Fairbairn , David Cheung
发明人： Sebastien Raoux , Tsutomu Tanaka , Mukul Kelkar , Hari Ponnekanti , Kevin Fairbairn , David Cheung
IPC分类号： B01D45/06 , B01D53/32 , B01D53/46 , B01J19/08 , B01J19/12 , B01J19/24 , C23C16/44 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/31 , H05H1/24 , B01D53/00
CPC分类号： H01J37/3244 , B01D45/06 , B01D53/32 , B01D53/46 , B01J19/08 , B01J19/088 , B01J19/126 , B01J19/249 , C23C16/4405 , C23C16/4412 , H01J37/32844 , H05H1/46 , B01D2257/206 , B01D2259/818 , B01J2219/2453 , B01J2219/2458 , B01J2219/2461 , B01J2219/2467 , B01J2219/247 , B01J2219/2474 , B01J2219/2475 , B01J2219/2487 , B01J2219/2493 , B01J2219/2496 , H01J2237/022 , H05H2001/4622 , H05H2001/4667 , H05H2245/1215 , Y02C20/30 , Y10S55/30
摘要： An apparatus for minimizing deposition in an exhaust line of a substrate processing chamber. The apparatus includes first and second members having opposing surfaces that define a fluid conduit between them. The fluid conduit includes an inlet, an outlet and a collection chamber between the inlet and the outlet. The apparatus is connected at its inlet to receive the exhaust of the substrate processing chamber, and the collection chamber is structured and arranged to collect particulate matter flowing through the fluid conduit and to inhibit egress of the particulate matter from the collection chamber. A microwave plasma generation system supplies microwave energy within the fluid conduit to form a plasma from etchant gases within the fluid conduit. Constituents from the plasma react with the particulate matter collected in the collection chamber to form gaseous products that may be pumped out of the fluid conduit. The apparatus may further include an electrostatic collector to enhance particle collection in the collection chamber and to further inhibit egress of the particulate matter.
摘要翻译：一种用于最小化衬底处理室的排气管线中沉积的装置。该装置包括具有在它们之间限定流体导管的相对表面的第一和第二构件。流体导管包括在入口和出口之间的入口，出口和收集室。该设备在其入口处连接以接收基板处理室的排气，并且收集室被构造和布置成收集流过流体管道的颗粒物质并且抑制颗粒物质从收集室排出。微波等离子体产生系统在流体导管内提供微波能量以从流体导管内的蚀刻剂气体形成等离子体。来自等离子体的成分与收集室中收集的颗粒物质发生反应，形成可以从流体导管泵出的气体产物。该装置还可以包括静电收集器以增强收集室中的颗粒收集并进一步抑制颗粒物质的排出。

3. 发明授权

US06361707B1 Apparatus and methods for upgraded substrate processing system with microwave plasma source 有权
标题翻译：具有微波等离子体源的升级基板处理系统的装置和方法
公开(公告)号：US06361707B1
公开(公告)日：2002-03-26
申请号：US09660322
申请日：2000-09-12
申请人： Tsutomu Tanaka , Mukul Kelkar , Kevin Fairbairn , Hari Ponnekanti , David Cheung
发明人： Tsutomu Tanaka , Mukul Kelkar , Kevin Fairbairn , Hari Ponnekanti , David Cheung
IPC分类号： H01L2100
CPC分类号： H01J37/32862 , C23C16/511 , C23C16/52 , H01J37/32192 , H01J37/32357
摘要： An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. In a preferred embodiment, the remote microwave plasma source efficiently provides a plasma without need for liquid-cooling the plasma applicator tube. In another embodiment, the present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a plasma with the ability to efficiently clean the chamber when needed.
摘要翻译：根据具体实施例的用于提供用于有效清洁腔室的等离子体的升级CVD系统的装置和方法。使用本发明的升级的CVD系统也可以实现在基板上的蚀刻或沉积层。在一个具体实施方案中，本发明提供了一种易于拆卸，方便处理且相对便宜的微波等离子体源，作为对现有CVD设备的改进或可移除的添加。在优选实施例中，远程微波等离子体源有效地提供等离子体，而不需要等离子体施加管的液体冷却。在另一个实施方案中，本发明提供了一种改进的CVD装置或改进现有的CVD装置，其能够产生等离子体，其能够在需要时有效地清洁腔室。

4. 发明授权

US6039834A Apparatus and methods for upgraded substrate processing system with microwave plasma source 失效
公开(公告)号：US6039834A
公开(公告)日：2000-03-21
申请号：US811627
申请日：1997-03-05
申请人： Tsutomu Tanaka , Mukul Kelkar , Kevin Fairbairn , Hari Ponnekanti , David Cheung
发明人： Tsutomu Tanaka , Mukul Kelkar , Kevin Fairbairn , Hari Ponnekanti , David Cheung
IPC分类号： H05H1/46 , C23C16/50 , C23C16/511 , C23C16/52 , H01J37/32 , H01L21/205 , H01L21/31 , H05H1/00
CPC分类号： H01J37/32862 , C23C16/511 , C23C16/52 , H01J37/32192 , H01J37/32357
摘要： An apparatus and methods for an upgraded CVD system that provides a plasma for efficiently cleaning a chamber, according to a specific embodiment. Etching or depositing a layer onto a substrate also may be achieved using the upgraded CVD system of the present invention. In a specific embodiment, the present invention provides an easily removable, conveniently handled, and relatively inexpensive microwave plasma source as a retrofit for or a removable addition to existing CVD apparatus. In a preferred embodiment, the remote microwave plasma source efficiently provides a plasma without need for liquid-cooling the plasma applicator tube. In another embodiment, the present invention provides an improved CVD apparatus or retrofit of existing CVD apparatus capable of producing a plasma with the ability to efficiently clean the chamber when needed.

5. 发明授权

US6079426A Method and apparatus for determining the endpoint in a plasma cleaning process 失效
标题翻译：用于确定血浆清洁过程中的终点的方法和装置
公开(公告)号：US6079426A
公开(公告)日：2000-06-27
申请号：US887165
申请日：1997-07-02
申请人： Sudhakar Subrahmanyam , Tsutomu Tanaka , Mukul Kelkar
发明人： Sudhakar Subrahmanyam , Tsutomu Tanaka , Mukul Kelkar
IPC分类号： H05H1/46 , C23C16/44 , C23G5/028 , C23G5/04 , H01J37/32 , H01L21/205 , H01L21/31 , B08B6/00 , G01L21/30
CPC分类号： H01J37/32935 , C23C16/4405 , H01J37/32963 , H01J2237/335 , Y10S156/916
摘要： Apparatus and methods are disclosed for utilizing a plasma cleaning operation of a CVD system incorporating cleaning process endpoint detection. In one embodiment, the cleaning process is performed at a constant exhaust capacity and the endpoint detection is in response to a specified rate of change of chamber pressure. In another embodiment, a servo-controlled exhaust system maintains a controlled chamber pressure and the endpoint detection is in response to a specified control signal. In a preferred embodiment, nitrogen trifluoride is converted into a plasma containing free fluorine radicals in a magnetron-powered remote microwave plasma generator. The remotely produced free fluorine radicals are used to remove silicon nitride deposits from a substrate processing chamber. The use of such a remote plasma system provides an efficient cleaning process that takes as little as half the time compared to similar in situ plasma cleaning processes. The incorporation of endpoint detection provides optimal cleaning time for the remote plasma cleaning process.
摘要翻译：公开了利用包含清洁过程端点检测的CVD系统的等离子体清洁操作的装置和方法。在一个实施例中，清洁过程以恒定的排气量执行，并且端点检测响应于室压力的指定变化率。在另一个实施例中，伺服控制的排气系统保持受控的室压力，并且端点检测响应于指定的控制信号。在优选的实施方案中，在由磁控管供电的远程微波等离子体发生器中将三氟化氮转化成含有游离氟自由基的等离子体。远程产生的自由氟基团用于从衬底处理室去除氮化硅沉积物。使用这样的远程等离子体系统提供了有效的清洁过程，与类似的原位等离子体清洁过程相比，其需要的时间只有时间的一半。结合端点检测为远程等离子体清洗过程提供了最佳的清洗时间。

6. 发明授权

US07479777B2 Circuitry and method to measure a duty cycle of a clock signal 有权
标题翻译：测量时钟信号占空比的电路和方法
公开(公告)号：US07479777B2
公开(公告)日：2009-01-20
申请号：US11648488
申请日：2006-12-28
申请人： Mukul Kelkar , Andrew M. Volk , Rajesh Kanakath , Vui Y. Liew
发明人： Mukul Kelkar , Andrew M. Volk , Rajesh Kanakath , Vui Y. Liew
IPC分类号： G06M1/10 , H03L7/00 , H03L7/08 , G01R25/00
CPC分类号： G01R31/31727
摘要： In some embodiments, a chip includes clock generation circuitry to create a clock signal, and reference signal oscillator circuitry to produce a reference signal with a higher frequency than the clock signal. The chip includes a counter to change a count value in response to changes in the reference signal; and count logic circuitry to cause count storage circuitry to read the count value in response to at least some changes in the clock signal and to make at least some of the values in the count storage circuitry related to a duty cycle of the clock signal available to an external tester. Other embodiments are described and claimed.
摘要翻译：在一些实施例中，芯片包括用于产生时钟信号的时钟产生电路和参考信号振荡器电路，以产生具有比时钟信号更高的频率的参考信号。芯片包括响应于参考信号变化而改变计数值的计数器; 以及计数逻辑电路，以使得计数存储电路响应于所述时钟信号中的至少一些变化来读取所述计数值，并且使所述计数存储电路中的至少一些值与所述时钟信号的占空比相关，外部测试仪描述和要求保护其他实施例。

7. 发明申请

US20070229106A1 Measuring and identifying analog characteristics of a microelectronic component at a wafer level and a platform level 失效
标题翻译：在晶圆级和平台级测量和识别微电子元件的模拟特性
公开(公告)号：US20070229106A1
公开(公告)日：2007-10-04
申请号：US11393468
申请日：2006-03-29
申请人： Mukul Kelkar , Jonathan Kenton , Andrew Volk , Iris Wong
发明人： Mukul Kelkar , Jonathan Kenton , Andrew Volk , Iris Wong
IPC分类号： G01R31/02
CPC分类号： G01R31/318511
摘要： A die includes circuit components to perform normal operations and duplicated components of selective ones of the circuit components. Each end of the duplicated components is connected to a pad on the die to allow access by measurement devices. The measurement devices apply electricity to the pads to measure analog characteristics of the duplicated components.
摘要翻译：芯片包括用于执行正常操作的电路部件和选择性电路部件的复制部件。复制组件的每一端连接到管芯上的焊盘，以允许测量设备访问。测量装置向焊盘施加电能以测量重复部件的模拟特性。

8. 发明授权

US06960950B2 Circuit and method for generating a clock signal 有权
标题翻译：用于产生时钟信号的电路和方法
公开(公告)号：US06960950B2
公开(公告)日：2005-11-01
申请号：US10400147
申请日：2003-03-25
申请人： Prasanna C. Shah , Tom J. Schneider , Andrew M. Volk , Mukul Kelkar
发明人： Prasanna C. Shah , Tom J. Schneider , Andrew M. Volk , Mukul Kelkar
IPC分类号： H03L7/00 , H03L7/06 , H03L7/085 , H03L7/099
CPC分类号： H03L7/085 , H03L7/0997
摘要： In some embodiments, a circuit includes an oscillator circuit and a control circuit. The oscillator circuit generates a clock signal and includes a plurality of selectable delay circuits. The control circuit receives the clock signal from the oscillator and a reference signal. The control circuit provides a control signal to the oscillator circuit to activate one or more of the plurality of selectable delay circuits to change the frequency of the clock signal. In some embodiments, a method includes generating a clock signal in an oscillator circuit, processing the clock signal to generate a control signal, and activating one or more of a plurality of selectable delay circuits in the oscillator circuit, in response to the control signal.
摘要翻译：在一些实施例中，电路包括振荡器电路和控制电路。振荡器电路产生时钟信号并且包括多个可选延迟电路。控制电路接收来自振荡器的时钟信号和参考信号。控制电路向振荡器电路提供控制信号以激活多个可选延迟电路中的一个或多个以改变时钟信号的频率。在一些实施例中，一种方法包括：响应于控制信号，在振荡器电路中产生时钟信号，处理时钟信号以产生控制信号，以及激活振荡器电路中的多个可选延迟电路中的一个或多个。

9. 发明授权

US07705620B2 Measuring and identifying analog characteristics of a microelectronic component at a wafer level and a platform level 失效
标题翻译：在晶圆级和平台级测量和识别微电子元件的模拟特性
公开(公告)号：US07705620B2
公开(公告)日：2010-04-27
申请号：US11393468
申请日：2006-03-29
申请人： Mukul Kelkar , Jonathan Kenton , Andy Volk , Iris Wong
发明人： Mukul Kelkar , Jonathan Kenton , Andy Volk , Iris Wong
IPC分类号： G01R31/02
CPC分类号： G01R31/318511
摘要： A die includes circuit components to perform normal operations and duplicated components of selective ones of the circuit components. Each end of the duplicated components is connected to a pad on the die to allow access by measurement devices. The measurement devices apply electricity to the pads to measure analog characteristics of the duplicated components.
摘要翻译：芯片包括用于执行正常操作的电路部件和选择性电路部件的复制部件。复制组件的每一端连接到管芯上的焊盘，以允许测量设备访问。测量装置向焊盘施加电能以测量重复部件的模拟特性。

10. 发明申请

US20080162062A1 Circuitry and method to measure a duty cycle of a clock signal 有权
标题翻译：测量时钟信号占空比的电路和方法
公开(公告)号：US20080162062A1
公开(公告)日：2008-07-03
申请号：US11648488
申请日：2006-12-28
申请人： Mukul Kelkar , Andrew M. Volk , Rajesh Kanakath , Vui Y. Liew
发明人： Mukul Kelkar , Andrew M. Volk , Rajesh Kanakath , Vui Y. Liew
IPC分类号： G01R29/02 , G01F15/06
CPC分类号： G01R31/31727
摘要： In some embodiments, a chip includes clock generation circuitry to create a clock signal, and reference signal oscillator circuitry to produce a reference signal with a higher frequency than the clock signal. The chip includes a counter to change a count value in response to changes in the reference signal; and count logic circuitry to cause count storage circuitry to read the count value in response to at least some changes in the clock signal and to make at least some of the values in the count storage circuitry related to a duty cycle of the clock signal available to an external tester. Other embodiments are described and claimed.
摘要翻译：在一些实施例中，芯片包括用于产生时钟信号的时钟产生电路和参考信号振荡器电路，以产生具有比时钟信号更高的频率的参考信号。芯片包括响应于参考信号变化而改变计数值的计数器; 以及计数逻辑电路，以使得计数存储电路响应于所述时钟信号中的至少一些变化来读取所述计数值，并且使所述计数存储电路中的至少一些值与所述时钟信号的占空比相关，外部测试仪描述和要求保护其他实施例。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式