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    • 6. 发明申请
    • Exposure apparatus, exposure method, and device manufacturing method
    • 曝光装置,曝光方法和装置制造方法
    • US20070291243A1
    • 2007-12-20
    • US11785715
    • 2007-04-19
    • Kousuke Suzuki
    • Kousuke Suzuki
    • G03B27/52
    • G03F7/70875G03F7/70225G03F7/70258G03F7/70783
    • An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical axis center of the projection optical system is set to a position different from that of the center of the projection area onto which the pattern is projected. The exposure apparatus further includes a magnification modification device, which modifies the projection magnification of the projection optical system; a calculation device, which calculates a shift length of the center of the projection area associated with modification of the projection magnification; and a correction device, which corrects the position information of the exposure area based on the shift length of the center of the projection area.
    • 曝光装置包括投影光学系统,其以规定的投影倍率将掩模的图案投影到基板上的规定的曝光区域上。 将投影光学系统的光轴中心设定为与投影图案的投影区域的中心不同的位置。 所述曝光装置还具备能够改变所述投影光学系统的投影倍率的倍率变更装置, 计算装置,其计算与投影倍率的修改相关联的投影区域的中心的移动长度; 以及校正装置,其基于投影区域的中心的移动长度校正曝光区域的位置信息。