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1. 发明授权

US06500971B2 Ester compounds having alicyclic and oxirane structures and method for preparing the same 有权
标题翻译：具有脂环和环氧乙烷结构的酯化合物及其制备方法
公开(公告)号：US06500971B2
公开(公告)日：2002-12-31
申请号：US09873193
申请日：2001-06-05
申请人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Takeru Watanabe , Takeshi Kinsho , Koji Hasegawa , Tsunehiro Nishi , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C07D30316
CPC分类号： C08G65/22 , C07D303/48 , G03F7/0395
摘要： An ester compound of formula (1) is provided. R1 is H or methyl, R2 is tertiary C4-20 alkyl, and k=0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance and substrate adhesion, and is suited for micropatterning using electron beams or deep-UV.
摘要翻译：提供式（1）的酯化合物.R1是H或甲基，R2是叔C4-20烷基，k = 0或1.包含作为基础树脂的抗蚀剂组合物由酯化合物产生的聚合物敏感高能量辐射，具有优异的灵敏度，分辨率，耐蚀刻性和基板粘合性，适用于使用电子束或深紫外线的微图案。

2. 发明授权

US06492090B2 Polymers, resist compositions and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06492090B2
公开(公告)日：2002-12-10
申请号：US09842113
申请日：2001-04-26
申请人： Tsunehiro Nishi , Seiichiro Tachibana , Mutsuo Nakashima , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Jun Hatakeyama
发明人： Tsunehiro Nishi , Seiichiro Tachibana , Mutsuo Nakashima , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： G03F7/039 , C08F222/06 , C08F222/40 , C08F232/08 , G03F7/0045 , C08F2220/1866 , C08F232/04 , C08F234/04 , C08F232/00
摘要： A polymer comprising units of formulas (1) and (2) and having a Mw of 1,000-500,000 is provided. R1 is H, CH3 or CH2CO2R3, R2 is H, CH3 or CO2R3, R3 is alkyl, R4 is H, alkyl, alkoxyalkyl or acyl, R5 is alkyl or aryl, Y is a divalent hydrocarbon group which may contain a hetero atom and which forms a ring with the carbon atom, Z is a trivalent hydrocarbon group, k is 0 or 1, and W is —O— or —(NR)— wherein R is H or alkyl. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译：提供了包含式（1）和（2）单元并且Mw为1,000-500,000的聚合物。 R1是H，CH3或CH2CO2R3，R2是H，CH3或CO2R3，R3是烷基，R4是H，烷基，烷氧基烷基或酰基，R5是烷基或芳基，Y是可以含有杂原子的二价烃基，与碳原子形成环，Z为三价烃基，k为0或1，W为-O-或 - （NR） - ，其中R为H或烷基。包含作为基础树脂的聚合物的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于电子束或深紫外线的微图案化。

3. 发明授权

US06448420B1 Acid-decomposable ester compound suitable for use in resist material 有权
标题翻译：适用于抗蚀材料的酸分解酯化合物
公开(公告)号：US06448420B1
公开(公告)日：2002-09-10
申请号：US09572975
申请日：2000-05-18
申请人： Takeshi Kinsho , Tsunehiro Nishi , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
IPC分类号： C07J900
CPC分类号： C07C69/753 , C07C69/013 , C07C2602/42 , C07C2603/68 , C07C2603/74 , G03F7/0045 , G03F7/038 , G03F7/039
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester as the acid-decomposable site is used as a dissolution regulator to formulate a resist composition having a high sensitivity, resolution, etching resistance and storage stability.
摘要翻译：使用具有外型2-烷基双环[2.2.1]庚-2-基酯作为酸可分解部位的新型酯化合物作为溶解调节剂，以配制具有高灵敏度，分辨率，耐蚀刻性和储存稳定性。

4. 发明授权

US06312867B1 Ester compounds, polymers, resist compositions and patterning process 有权
公开(公告)号：US06312867B1
公开(公告)日：2001-11-06
申请号：US09431139
申请日：1999-11-01
申请人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Koji Hasegawa , Takeru Watanabe , Osamu Watanabe , Mutsuo Nakashima , Takanobu Takeda , Jun Hatakeyama
发明人： Takeshi Kinsho , Tsunehiro Nishi , Hideshi Kurihara , Koji Hasegawa , Takeru Watanabe , Osamu Watanabe , Mutsuo Nakashima , Takanobu Takeda , Jun Hatakeyama
IPC分类号： G03F7004
CPC分类号： C07C69/56 , C07C69/013 , C07C69/533 , C07C69/54 , C07C69/593 , C07C69/60 , C07C2602/42 , C07C2603/68 , C07C2603/86 , C08F20/18 , G03F7/0045 , G03F7/039 , Y02P20/55
摘要： A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

5. 发明授权

US06531627B2 Ester compounds, polymers, resist compositions and patterning process 有权
标题翻译：酯化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06531627B2
公开(公告)日：2003-03-11
申请号：US09842007
申请日：2001-04-26
申请人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Tsunehiro Nishi , Koji Hasegawa , Takeru Watanabe , Takeshi Kinsho , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C07C6974
CPC分类号： G03F7/039 , C07C69/716 , C08G61/08 , G03F7/0045
摘要： An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, R4 is branched or cyclic, tertiary C5-C20 alkyl group, Z is a divalent C1-C10 hydrocarbon group, and k is 0 or 1. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron beams or deep-UV.
摘要翻译：提供下式（1）的酯化合物：R 1是H，甲基或CH 2 CO 2 R 3，R 2是H，甲基或CO 2 R 3，R 3是C 1 -C 15烷基，R 4是支链或环状的，叔C5-C20烷基，Z 是二价C1-C10烃基，k为0或1.含有由酯化合物得到的聚合物作为基础树脂的抗蚀剂组合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，以及适用于使用电子束或深紫外线的微图案。

6. 发明授权

US06444396B1 Ester compounds, polymers, resist composition and patterning process 有权
标题翻译：酯化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06444396B1
公开(公告)日：2002-09-03
申请号：US09630810
申请日：2000-08-02
申请人： Takeru Watanabe , Takeshi Kinsho , Tsunehiro Nishi , Mutsuo Nakashima , Koji Hasegawa , Jun Hatakeyama
发明人： Takeru Watanabe , Takeshi Kinsho , Tsunehiro Nishi , Mutsuo Nakashima , Koji Hasegawa , Jun Hatakeyama
IPC分类号： G03F7039
CPC分类号： G03F7/039 , C07C69/753 , C07C2601/08 , C07C2601/10 , C07C2601/14 , C07C2601/16 , C07C2602/42 , C07C2603/86 , C08F32/08 , G03F7/0045 , Y02P20/55 , Y10S430/106
摘要： A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
摘要翻译：提供了具有烷基环烷基或烷基环烯基作为保护基的新型酯化合物以及包含酯化合物单元的聚合物。聚合物用作基础树脂以配制具有比常规抗蚀剂组合物更高的灵敏度，分辨率和耐蚀刻性的抗蚀剂组合物。

7. 发明授权

US06677101B2 Polymers, resist materials, and pattern formation method 有权
标题翻译：聚合物，抗蚀剂材料和图案形成方法
公开(公告)号：US06677101B2
公开(公告)日：2004-01-13
申请号：US10050478
申请日：2002-01-16
申请人： Tsunehiro Nishi , Koji Hasegawa , Mutsuo Nakashima
发明人： Tsunehiro Nishi , Koji Hasegawa , Mutsuo Nakashima
IPC分类号： G03F7039
CPC分类号： C08G61/06 , G03F7/0395 , G03F7/0397
摘要： An object of the present invention is to provide a polymer which has excellent reactivity, rigidity and adhesion to the substrate, and undergoes a low degree of swelling during development, a resist material which uses this polymer as the base resin and hence exhibits much higher resolving power and etching resistance than conventional resist materials, and a pattern formation method using this resist material. Specifically, the present invention provides a novel polymer containing repeating units represented by the following general formula (1-1) or (1-2) and having a weight-average molecular weight of 1,000 to 500,000, a resist material using the polymer as a base resin, and a pattern formation method using the resist material.
摘要翻译：本发明的目的是提供一种聚合物，其具有优异的反应性，刚性和对基材的粘合性，并且在显影期间发生低度膨胀，使用该聚合物作为基础树脂的抗蚀剂材料，因此表现出更高的分辨率功率和耐蚀刻性，以及使用该抗蚀剂材料的图案形成方法。具体地说，本发明提供一种含有下述通式（1-1）或（1-2）表示的重均单元，重均分子量为1000〜500,000的新型聚合物，使用该聚合物作为基树脂和使用抗蚀剂材料的图案形成方法。

8. 发明授权

US06596463B2 Ester compounds, polymers, resist compositions and patterning process 有权
标题翻译：酯化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06596463B2
公开(公告)日：2003-07-22
申请号：US09837219
申请日：2001-04-19
申请人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： C07C6974
CPC分类号： C08F220/18 , C07C69/013 , C07C69/54 , C07C69/753 , C08F222/06 , C08F232/08 , G03F7/0045 , G03F7/039
摘要： An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, k is 0 or 1, Z is a divalent C2-C20 hydrocarbon group which forms a single ring or bridged ring with the carbon atom and which may contain a hetero atom, m is 0 or 1, n is 0, 1, 2 or 3, and 2m+n=2 or 3. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and is suited for micropatterning using electron beams or deep-UV.
摘要翻译：提供下式（1）的酯化合物：R1是H，甲基或CH2CO2R3，R2是H，甲基或CO2R3，R3是C1-C15烷基，k是0或1，Z是二价C 2 -C 20烃与碳原子形成单环或桥环的基团，其可以含有杂原子，m为0或1，n为0,1,2或3,2m + n = 2或3.一种抗蚀剂组合物，其包含作为基础树脂，由酯化合物产生的聚合物对高能辐射敏感，具有优异的灵敏度，分辨率和耐蚀刻性，并且适用于使用电子束或深UV的微图案。

9. 发明授权

US06586157B2 Ester compounds, polymers, resist compositions and patterning process 有权
标题翻译：酯化合物，聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US06586157B2
公开(公告)日：2003-07-01
申请号：US09837378
申请日：2001-04-19
申请人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
发明人： Koji Hasegawa , Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Mutsuo Nakashima , Seiichiro Tachibana , Jun Hatakeyama
IPC分类号： G03F7038
CPC分类号： C08F220/18 , C07C69/013 , C07C69/54 , C07C69/753 , C08F222/06 , C08F232/08 , G03F7/0045 , G03F7/039
摘要： An ester compound of the following formula (1) is provided. R1 is H, methyl or CH2CO2R3, R2 is H, methyl or CO2R3, R3 is C1-C15 alkyl, Z is a divalent C2-C20 hydrocarbon group which forms a single ring or bridged ring with the carbon atom, m is 0 or 1, n is 0, 1, 2 or 3, and 2m+n=2 or 3. A resist composition comprising as the base resin a polymer resulting from the ester compound is sensitive to high-energy radiation, has excellent sensitivity and resolution, and is suited for micropatterning using electron beams or deep-UV.
摘要翻译：提供下式（1）的酯化合物：R 1是H，甲基或CH 2 CO 2 R 3，R 2是H，甲基或CO 2 R 3，R 3是C 1 -C 15烷基，Z是形成单环的二价C 2 -C 20烃基或与碳原子的桥环，m为0或1，n为0,1,2或3，2m + n = 2或3.含有由酯化合物得到的聚合物作为基础树脂的抗蚀剂组合物是敏感的对高能辐射，具有优异的灵敏度和分辨率，适用于使用电子束或深紫外线的微图案。

10. 发明授权

US06413695B1 Resist compositions and patterning process 有权
标题翻译：抗蚀剂组合物和图案化工艺
公开(公告)号：US06413695B1
公开(公告)日：2002-07-02
申请号：US09572973
申请日：2000-05-18
申请人： Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
发明人： Tsunehiro Nishi , Takeshi Kinsho , Takeru Watanabe , Koji Hasegawa , Mutsuo Nakashima , Jun Hatakeyama
IPC分类号： G03F7004
CPC分类号： C07C69/753 , C07C69/013 , C07C69/608 , C07C69/732 , C07C69/76 , C07C2602/42 , C07C2603/68 , C07C2603/74 , G03F7/0045 , G03F7/038 , G03F7/039
摘要： A resist composition comprising an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl ester compound as a dissolution regulator has a high sensitivity, resolution, etching resistance and storage stability and lends itself to micropatterning with electron beams or deep-UV rays.
摘要翻译：包含作为溶解调节剂的外型2-烷基双环[2.2.1]庚-2-基酯化合物的抗蚀剂组合物具有高灵敏度，分辨率，耐蚀刻性和储存稳定性，并且适用于电子束或深层的微图案，紫外线。

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