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1. 发明申请

US20060003259A1 Composition sensitive to visible light 失效
标题翻译：组合对可见光敏感
公开(公告)号：US20060003259A1
公开(公告)日：2006-01-05
申请号：US10523523
申请日：2003-08-20
申请人： Tsuguo Yamaoka , Katsuhiro Ito , Takeshi Iwasaki , Ikuo Shimizu
发明人： Tsuguo Yamaoka , Katsuhiro Ito , Takeshi Iwasaki , Ikuo Shimizu
IPC分类号： G03C1/73
CPC分类号： G03F7/0392
摘要： The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.
摘要翻译：本发明提供对可见光高度敏感的可见光敏组合物，可用作电子电路形成材料，平版印刷材料等，所述可见光敏组合物包含（a）包含由通式（I）表示的重复单元：其中R 1，R 2，R 3和R 3相同或不同，各自表示取代的或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或者R 1和R 2与邻接的碳原子一起形成环烷基， 4表示低级烷基，（b）通过可见光照射产生酸的化合物和（c）敏化染料。

2. 发明授权

US07294448B2 Composition sensitive to visible light 失效
标题翻译：组合对可见光敏感
公开(公告)号：US07294448B2
公开(公告)日：2007-11-13
申请号：US10523523
申请日：2003-08-20
申请人： Tsuguo Yamaoka , Katsuhiro Ito , Takeshi Iwasaki , Ikuo Shimizu
发明人： Tsuguo Yamaoka , Katsuhiro Ito , Takeshi Iwasaki , Ikuo Shimizu
IPC分类号： G03C1/00
CPC分类号： G03F7/0392
摘要： The present invention provides a visible light-sensitive composition which is highly sensitive to a visible light and is useful as an electronic circuit forming material, a lithographic printing material, etc., said visible light-sensitive composition comprising (a) a polymer comprising a repeating unit represented by general formula (I): wherein R1, R2, and R3 are the same or different and each represents substituted or unsubstituted alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted aralkyl, or alternatively R1 and R2 form cycloalkyl together with the adjacent carbon atom, and R4 represents lower alkyl, (b) a compound that generates an acid by visible light irradiation and (c) a sensitizing dye.
摘要翻译：本发明提供对可见光高度敏感的可见光敏组合物，可用作电子电路形成材料，平版印刷材料等，所述可见光敏组合物包含（a）包含由通式（I）表示的重复单元：其中R 1，R 2，R 3和R 3相同或不同，各自表示取代的或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或者R 1和R 2与邻接的碳原子一起形成环烷基， 4表示低级烷基，（b）通过可见光照射产生酸的化合物和（c）敏化染料。

3. 发明授权

US07358030B2 Process for producing ether compound 失效
标题翻译：生产醚化合物的方法
公开(公告)号：US07358030B2
公开(公告)日：2008-04-15
申请号：US11289706
申请日：2005-11-30
申请人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
发明人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
IPC分类号： G03C1/00
CPC分类号： G03F7/0392 , C07C67/04 , C07C69/54
摘要： The present invention provides the following process for production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.
摘要翻译：本发明提供以下制备醚化合物的方法，其可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少的副反应和高产率。制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2，和R 3分别具有与上述相同的含义。

4. 发明申请

US20060074262A1 Process for producing ether compound 失效
标题翻译：生产醚化合物的方法
公开(公告)号：US20060074262A1
公开(公告)日：2006-04-06
申请号：US11289706
申请日：2005-11-30
申请人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
发明人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
IPC分类号： C07C43/30
CPC分类号： G03F7/0392 , C07C67/04 , C07C69/54
摘要： The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield. A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above respectively.
摘要翻译：本发明提供了以下的制造方法，其能够生产可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少副反应和高反应性的醚化合物产量。制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2，和R 3分别具有与上述相同的含义。

5. 发明授权

US07015363B2 Process for producing ether compound 失效
标题翻译：生产醚化合物的方法
公开(公告)号：US07015363B2
公开(公告)日：2006-03-21
申请号：US10482111
申请日：2002-07-12
申请人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
发明人： Ikuo Shimizu , Katsuhiro Ito , Kazuyasu Osada , Tsuguo Yamaoka
IPC分类号： C07C41/54
CPC分类号： G03F7/0392 , C07C67/04 , C07C69/54
摘要： The present invention provides the following process for producing and the like, which enables the production of an ether compound, which is useful for chemical amplification type resist compositions, synthetic intermediates of pharmaceuticals, paints, or the like, with less side reaction and in high yield.A process for producing an ether compound having a group represented by the general formula (II) wherein R1, R2 and R3 may be the same or different, and represent substituted or unsubstituted alkyl, substituted or unsubstituted aryl or substituted or unsubstituted aralkyl, or R1 and R2 form cycloalkyl together with an adjacent carbon atom, which comprises allowing a compound having a hydroxyl group (including a carboxyl group) to react with an alkenyl ether represented by the general formula (I) wherein R1, R2 and R3 have the same significances as defined above, respectively.
摘要翻译：本发明提供了以下的制造方法，其能够生产可用于化学扩增型抗蚀剂组合物，药物，油漆等的合成中间体，具有较少副反应和高反应性的醚化合物产量。制备具有由通式（II）表示的基团的醚化合物的方法，其中R 1，R 2和R 3可以是并且表示取代或未取代的烷基，取代或未取代的芳基或取代或未取代的芳烷基，或R 1和R 2独立地与相邻碳原子一起形成环烷基，其包括使具有羟基（包括羧基）的化合物与由通式（I）表示的链烯基醚反应，其中R 1，R 2，和R 3分别具有与上述相同的含义。

6. 发明授权

US5527659A Chemical amplification resist composition containing photochemical acid generator, binder and squarylium compound 失效
标题翻译：含光化学酸产生剂，粘合剂和方酸盐化合物的化学增幅抗蚀剂组合物
公开(公告)号：US5527659A
公开(公告)日：1996-06-18
申请号：US331147
申请日：1994-10-28
申请人： Tsuguo Yamaoka , Kenichi Koseki , Mitsuharu Obara , Ikuo Shimizu , Yukiyoshi Ito
发明人： Tsuguo Yamaoka , Kenichi Koseki , Mitsuharu Obara , Ikuo Shimizu , Yukiyoshi Ito
IPC分类号： C08F2/50 , G03F7/004 , G03F7/031 , G03F7/038 , G03F7/039 , G03F7/021
CPC分类号： C08F2/50 , G03F7/0045 , G03F7/031 , G03F7/0382 , G03F7/0392 , Y10S430/115 , Y10S430/121
摘要： There is described a chemical amplification resist composition which comprises squarylium compounds represented by the formula (I): ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and represent substituted or unsubstituted aminophenyl, 9-julodidyl, Y.dbd.CH-- (wherein Y represents substituted or unsubstituted heterocyclic group containing nitrogen, or a group: ##STR2## (wherein Z.sup.1 and Z.sup.2 are the same or different and represent substituted or unsubstituted phenyl), photochemical acid generator and binders.
摘要翻译：描述了一种化学增幅抗蚀剂组合物，其包含由式（I）表示的方酸化合物：其中R 1和R 2相同或不同，表示取代或未取代的氨基苯基，9-果胶基，Y = CH- （其中Y表示取代或未取代的含氮杂环基或基团：其中Z 1和Z 2相同或不同，表示取代或未取代的苯基），光化学酸产生剂和粘合剂。

7. 发明授权

US07368224B2 Photopolymerizable composition 失效
标题翻译：可光聚合组合物
公开(公告)号：US07368224B2
公开(公告)日：2008-05-06
申请号：US10508528
申请日：2003-04-03
申请人： Tsuguo Yamaoka , Ikuo Shimizu , Hiroshi Toyoda , Motoharu Kinugasa , Masanori Ikuta , Kyoko Katagi
发明人： Tsuguo Yamaoka , Ikuo Shimizu , Hiroshi Toyoda , Motoharu Kinugasa , Masanori Ikuta , Kyoko Katagi
IPC分类号： G03C1/735 , G03F7/028 , C07D261/06 , C07D231/10
CPC分类号： C07D417/08 , C07D231/22 , C07D261/12 , C07D403/08 , C07D413/06 , C07D413/08 , C08F2/50 , G03F7/029 , Y10S430/117 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/124 , Y10S430/126 , Y10S430/127
摘要： The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond.The photopolymerizable composition of the present invention is advantageously used for a visible laser recording material such as a PS (Presensitized Plate) for laser direct plate-making, a dry film resist, a digital proof, a hologram, or the like, a panchromatic sensitive material (e.g., a sensitive material for a color hologram and a sensitive material used for full-color display and containing a photopolymerizable composition in a microcapsule), paints, adhesives, and so on.
摘要翻译：本发明提供具有高光敏性的可光聚合组合物，其包含方酸化合物的金属络合物，自由基产生剂和具有至少一个烯属不饱和双键的化合物。本发明的光聚合性组合物有利地用于可见激光记录材料，例如用于激光直接制版的PS（致敏板），干膜抗蚀剂，数字证明，全息图等，全色敏感材料（例如，用于彩色全息图的敏感材料和用于全色显示并在微胶囊中含有可光聚合组合物的敏感材料），油漆，粘合剂等。

8. 发明申请

US20050164120A1 Photopolymerizable composition 失效
标题翻译：可光聚合组合物
公开(公告)号：US20050164120A1
公开(公告)日：2005-07-28
申请号：US10508528
申请日：2003-04-03
申请人： Tsuguo Yamaoka , Ikuo Shimizu , Hiroshi Toyoda , Motoharu Kinugasa , Masanori Ikuta , Kyoko Katagi
发明人： Tsuguo Yamaoka , Ikuo Shimizu , Hiroshi Toyoda , Motoharu Kinugasa , Masanori Ikuta , Kyoko Katagi
IPC分类号： C07D231/22 , C07D261/12 , C07D403/08 , C07D413/06 , C07D413/08 , C07D417/08 , C08F2/50 , G03F7/029 , G03C1/492
CPC分类号： C07D417/08 , C07D231/22 , C07D261/12 , C07D403/08 , C07D413/06 , C07D413/08 , C08F2/50 , G03F7/029 , Y10S430/117 , Y10S430/12 , Y10S430/121 , Y10S430/122 , Y10S430/124 , Y10S430/126 , Y10S430/127
摘要： The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond. The photopolymerizable composition of the present invention is advantageously used for a visible laser recording material such as a PS (Presensitized Plate) for laser direct plate-making, a dry film resist, a digital proof, a hologram, or the like, a panchromatic sensitive material (e.g., a sensitive material for a color hologram and a sensitive material used for full-color display and containing a photopolymerizable composition in a microcapsule), paints, adhesives, and so on.
摘要翻译：本发明提供具有高光敏性的可光聚合组合物，其包含方酸化合物的金属络合物，自由基产生剂和具有至少一个烯属不饱和双键的化合物。本发明的光聚合性组合物有利地用于可见激光记录材料，例如用于激光直接制版的PS（致敏板），干膜抗蚀剂，数字证明，全息图等，全色敏感材料（例如，用于彩色全息图的敏感材料和用于全色显示并在微胶囊中含有可光聚合组合物的敏感材料），油漆，粘合剂等。

9. 发明授权

US6007965A Photopolymerizable compositions including squarylium compounds 失效
标题翻译：包含方酸化合物的光聚合组合物
公开(公告)号：US6007965A
公开(公告)日：1999-12-28
申请号：US946353
申请日：1997-10-07
申请人： Tsuguo Yamaoka , Kenichi Koseki , Mitsuharu Obara , Ikuo Shimizu , Yukiyoshi Ito , Hitoshi Kawato
发明人： Tsuguo Yamaoka , Kenichi Koseki , Mitsuharu Obara , Ikuo Shimizu , Yukiyoshi Ito , Hitoshi Kawato
IPC分类号： C08F2/50 , C08F222/10 , G03F7/031 , G03C1/73
CPC分类号： C08F2/50 , G03F7/031 , C08F2222/1026 , Y10S430/115 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/145
摘要： The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presensitized plate for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.
摘要翻译：本发明涉及包含具有至少一个烯键式不饱和双键的可加成聚合化合物的光聚合性组合物; 由式（I）表示的自由基产生剂和方酸盐化合物：该组合物对可见光和近红外光，特别是He-Ne激光，LED，二极管激光等具有高度敏感性，其具有波长范围 600nm以上，因此可用作全息图材料，用于激光直接工艺的预敏板，干膜抗蚀剂，数字证明，感光性微胶囊。

10. 发明授权

US5756258A Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound 失效
标题翻译：含有可加聚化合物，自由基产生剂和方酸化合物的光聚合性组合物
公开(公告)号：US5756258A
公开(公告)日：1998-05-26
申请号：US386468
申请日：1995-02-10
申请人： Tsuguo Yamaoka , Kenichi Koseki , Mitsuharu Obara , Ikuo Shimizu , Yukiyoshi Ito , Hitoshi Kawato
发明人： Tsuguo Yamaoka , Kenichi Koseki , Mitsuharu Obara , Ikuo Shimizu , Yukiyoshi Ito , Hitoshi Kawato
IPC分类号： C08F2/50 , C08F222/10 , G03F7/029 , G03F7/031 , G03C1/73
CPC分类号： C08F2/50 , G03F7/029 , G03F7/031 , C08F2222/1026 , Y10S430/115 , Y10S430/116 , Y10S430/117 , Y10S430/121 , Y10S430/145
摘要： The present invention relates to photopolymerizable compositions comprising an addition-polymerizable compound which has at least one ethylenically unsaturated double bond; a radical-producing agent and a squarylium compound represented by the formula (I): ##STR1## The compositions are highly sensitive to visible and near infrared lights, particularly He-Ne laser, LED, diode laser, etc. having oscillation wavelengths in a wavelength region of 600 nm or more, and thus are useful as materials for holograms, presentized plates for laser direct process, dry film resists, digital proofs, photosensitive microcapsules.
摘要翻译：本发明涉及包含具有至少一个烯键式不饱和双键的可加成聚合化合物的光聚合性组合物; （I）表示的自由基产生剂和方酸化合物：（I）该组合物对可见光和近红外光，特别是具有振荡的He-Ne激光，LED，二极管激光等具有高度敏感性波长在600nm以上的波长，因此可用作全息图材料，用于激光直接工艺的显示板，干膜抗蚀剂，数字证明，感光性微胶囊。

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