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    • 6. 发明授权
    • Patterning microelectronic features without using photoresists
    • 图案化微电子特征,而不使用光致抗蚀剂
    • US06452110B1
    • 2002-09-17
    • US09897889
    • 2001-07-05
    • Lawrence A. ClevengerLouis L. HsuCarl J. RadensLi-Kong WangKeith Kwong Hon Wong
    • Lawrence A. ClevengerLouis L. HsuCarl J. RadensLi-Kong WangKeith Kwong Hon Wong
    • H05K109
    • H05K3/02H01L21/288H01L21/32134H01L21/76885Y10T29/49155Y10T29/49156
    • A method and structure for producing metallic polymer conductor lines comprising of an alternative methodology to a traditional damascene approach, called a cloisonne or inverse damascene approach. The cloisonne approach comprises the steps of coating a photosensitive polymer such as pyrrole or aniline with a silver salt on a semiconductor substrate. Using standard photolithography and resist developing techniques, the conducting polymer is exposed to a wet chemical developer, removing a portion of the exposed conducting polymer region, leaving only conducting polymer lines on top of the substrate. Next, an insulating dielectric layer is deposited over the entire structure and a chemical mechanical polish planarization of the insulator is performed creating the conducting polymer lines. Included in another aspect of the invention is a method and structure for a self-planarizing interconnect material comprising a conductive polymer thereby reducing the number of processing steps relative to the prior art.
    • 一种用于生产金属聚合物导体线的方法和结构,其包括传统大马士革方法的替代方法,称为景泰蓝或逆大马士革方法。 景泰蓝方法包括在半导体衬底上用银盐将光敏聚合物如吡咯或苯胺涂覆的步骤。 使用标准光刻和抗蚀显影技术,将导电聚合物暴露于湿化学显影剂,除去暴露的导电聚合物区域的一部分,仅在基底顶部留下导电聚合物线。 接下来,在整个结构上沉积绝缘电介质层,并进行绝缘体的化学机械抛光平面化,产生导电聚合物线。 包括在本发明的另一方面中的是一种用于自平坦化互连材料的方法和结构,其包括导电聚合物,从而减少相对于现有技术的加工步骤的数量。