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1. 发明申请

US20080015812A1 Parallel profile determination for an optical metrology system 失效
公开(公告)号：US20080015812A1
公开(公告)日：2008-01-17
申请号：US11485046
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qui
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qui
IPC分类号： G01B11/24 , G06F19/00
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.

2. 发明授权

US07469192B2 Parallel profile determination for an optical metrology system 失效
标题翻译：光学测量系统的平行轮廓确定
公开(公告)号：US07469192B2
公开(公告)日：2008-12-23
申请号：US11485046
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
IPC分类号： G06F19/00 , G01B11/00
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
摘要翻译：包括衍射信号处理器，衍射信号分配器和多个轮廓搜索服务器，用于处理从一个或多个晶片上形成的多个结构的光学测量测量的晶圆结构轮廓确定的请求的系统。衍射信号处理器被配置为获得多个结构的多个测量的衍射信号。衍射信号分配器耦合到衍射信号处理器。衍射信号处理器被配置为将多个测量的衍射信号传输到衍射信号分配器。多个轮廓搜索服务器耦合到衍射信号分配器。衍射信号分配器被配置为将多个测量的衍射信号分布到多个简档搜索服务器。轮廓搜索服务器被配置为并行处理多个测量的衍射信号，以确定与多个测量的衍射信号相对应的多个结构的轮廓。

3. 发明申请

US20080013108A1 Parallel profile determination in optical metrology 失效
标题翻译：光学计量学中的平行轮廓确定
公开(公告)号：US20080013108A1
公开(公告)日：2008-01-17
申请号：US11485048
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances of a profile search module. The plurality of instances of the profile search model is activated in one or more processing threads of one or more computer systems. The plurality of measured diffraction signals is processed in parallel using the plurality of instances of the profile search module to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
摘要翻译：在从光学测量测量处理对晶片结构轮廓确定的请求中，获得了形成在一个或多个晶片上的多个结构的多个测量的衍射信号。多个测量的衍射信号被分配到简档搜索模块的多个实例。简档搜索模型的多个实例在一个或多个计算机系统的一个或多个处理线程中被激活。使用轮廓搜索模块的多个实例来并行处理多个测量的衍射信号，以确定对应于多个测量的衍射信号的多个结构的轮廓。

4. 发明授权

US07515283B2 Parallel profile determination in optical metrology 失效
标题翻译：光学计量学中的平行轮廓确定
公开(公告)号：US07515283B2
公开(公告)日：2009-04-07
申请号：US11485048
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey Alexander Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey Alexander Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
IPC分类号： G01B11/14 , G06F15/00
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances of a profile search module. The plurality of instances of the profile search model is activated in one or more processing threads of one or more computer systems. The plurality of measured diffraction signals is processed in parallel using the plurality of instances of the profile search module to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
摘要翻译：在从光学测量测量处理对晶片结构轮廓确定的请求中，获得了形成在一个或多个晶片上的多个结构的多个测量的衍射信号。多个测量的衍射信号被分配到简档搜索模块的多个实例。简档搜索模型的多个实例在一个或多个计算机系统的一个或多个处理线程中被激活。使用轮廓搜索模块的多个实例来并行处理多个测量的衍射信号，以确定对应于多个测量的衍射信号的多个结构的轮廓。

5. 发明申请

US20080013107A1 Generating a profile model to characterize a structure to be examined using optical metrology 审中-公开
标题翻译：使用光学计量产生轮廓模型来表征要检查的结构
公开(公告)号：US20080013107A1
公开(公告)日：2008-01-17
申请号：US11484974
申请日：2006-07-11
申请人： Jeffrey A. Chard , Junwei Bao , Joerg Bischoff , Shifang Li , Wei Liu , Hong Qiu , Sylvio Rabello , Vi Vuong
发明人： Jeffrey A. Chard , Junwei Bao , Joerg Bischoff , Shifang Li , Wei Liu , Hong Qiu , Sylvio Rabello , Vi Vuong
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/8883 , G01N2021/95615
摘要： In generating a profile model to characterize a structure to be examined using optical metrology, a view canvas is displayed, with the profile model being generated displayed in the view canvas. A profile shape palette is displayed adjacent to the view canvas. A plurality of different profile shape primitives is displayed in the profile shape palette. Each profile shape primitive in the profile shape palette is defined by a set of profile parameters. When a user selects a profile shape primitive from the profile shape palette, drags the selected profile shape primitive from the profile shape palette, and drops the selected profile shape primitive into the view canvas, the selected profile shape primitive is incorporated into the profile model being generated and displayed in the view canvas.
摘要翻译：在生成轮廓模型以使用光学计量学来表征要检查的结构时，显示视图画布，其中生成的轮廓模型显示在视图画布中。在视图画布附近显示一个轮廓形状调色板。在轮廓形状调色板中显示多个不同的轮廓形状基元。轮廓形状调色板中的每个轮廓形状基元由一组轮廓参数定义。当用户从轮廓形状调色板中选择轮廓形状基元时，从轮廓形状调色板中拖动所选择的轮廓形状基元，并将所选择的轮廓形状基元拖放到视图画布中，将所选择的轮廓形状原语合并到轮廓模型中生成并显示在视图画布中。

6. 发明申请

US20080089574A1 Data flow management in generating different signal formats used in optical metrology 失效
标题翻译：生成用于光学计量学的不同信号格式的数据流管理
公开(公告)号：US20080089574A1
公开(公告)日：2008-04-17
申请号：US11580716
申请日：2006-10-12
申请人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey A. Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
发明人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey A. Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
IPC分类号： G06K9/00
CPC分类号： G01N21/4788 , G01B11/24 , Y10S707/953
摘要： To manage data flow in generating different signal formats for use in optical metrology, a project data object is created. A first option data object is created. The first option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. A version number is associated with the first option data object. The first option data object is linked with the project data object. At least a second option data object is created. The second option data object has a set of signal parameters. Different settings of the set of signal parameters correspond to different signal formats for diffraction signals. The set of signal parameters of the first option data object and the set of signal parameters of the second option data object are set differently. Another version number is associated with the second option data object. The second option data object is linked with the project data object. The project data object, the first option data object, and the second option data object are stored. The version numbers associated with the first option data object and the second option data object are stored. The link between the first option data object and the project data object is stored. The link between the second option data object and the project data object is stored.
摘要翻译：为了管理生成用于光学测量的不同信号格式的数据流，创建了一个项目数据对象。创建第一个选项数据对象。第一个选项数据对象具有一组信号参数。信号参数组的不同设置对应于衍射信号的不同信号格式。版本号与第一选项数据对象相关联。第一个选项数据对象与项目数据对象链接。至少创建第二个选项数据对象。第二个选项数据对象具有一组信号参数。信号参数组的不同设置对应于衍射信号的不同信号格式。第一选项数据对象的信号参数集合和第二选项数据对象的信号参数集合设置不同。另一个版本号与第二个选项数据对象相关联。第二个选项数据对象与项目数据对象链接。存储项目数据对象，第一选项数据对象和第二选项数据对象。存储与第一选项数据对象和第二选项数据对象相关联的版本号。存储第一个选项数据对象和项目数据对象之间的链接。存储第二选项数据对象与项目数据对象之间的链接。

7. 发明申请

US20080091724A1 Data flow management in generating profile models used in optical metrology 有权
标题翻译：生成光学计量学中使用的轮廓模型的数据流管理
公开(公告)号：US20080091724A1
公开(公告)日：2008-04-17
申请号：US11580570
申请日：2006-10-12
申请人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey A. Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
发明人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey A. Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
IPC分类号： G06F17/00
CPC分类号： G01B11/24 , Y10S707/953
摘要： To manage data flow in generating profile models for use in optical metrology, a project data object is created. A first profile model data object is created. The first profile model data object corresponds to a first profile model defined using profile parameters. A version number is associated with the first profile model data object. The first profile model data object is linked with the project data object. At least a second profile model data object is created. The second profile model data object corresponds to a second profile model defined using profile parameters. The first and second profile models are different. Another version number is associated with the second profile model data object. The second profile model data object is linked with the project data object. The project data object, the first profile model data object, and the second profile model data object are stored. The version numbers associated with the first profile model data object and the second profile model data object are stored. The link between the first profile model data object and the project data object is stored. The link between the second profile model data object and the project data object is stored.
摘要翻译：为了管理生成用于光学测量的轮廓模型中的数据流，创建了一个项目数据对象。创建第一个配置文件模型数据对象。第一个轮廓模型数据对象对应于使用轮廓参数定义的第一轮廓模型。版本号与第一个轮廓模型数据对象相关联。第一个配置文件模型数据对象与项目数据对象链接。至少创建一个第二个轮廓模型数据对象。第二轮廓模型数据对象对应于使用轮廓参数定义的第二轮廓模型。第一个和第二个轮廓模型是不同的。另一个版本号与第二个配置文件模型数据对象相关联。第二个配置文件模型数据对象与项目数据对象链接。存储项目数据对象，第一个轮廓模型数据对象和第二个轮廓模型数据对象。存储与第一轮廓模型数据对象和第二轮廓模型数据对象相关联的版本号。存储第一轮廓模型数据对象与项目数据对象之间的链接。存储第二轮廓模型数据对象与项目数据对象之间的链接。

8. 发明申请

US20080071504A1 LIBRARY ACCURACY ENHANCMENT AND EVALUATION 失效
标题翻译：图书馆精确度增强与评估
公开(公告)号：US20080071504A1
公开(公告)日：2008-03-20
申请号：US11946821
申请日：2007-11-28
申请人： Shifang Li , Junwei Bao , Wei Liu
发明人： Shifang Li , Junwei Bao , Wei Liu
IPC分类号： G06F15/00
CPC分类号： G01B11/24 , G03F7/70625
摘要： The accuracy of a library of simulated-diffraction signals for use in optical metrology of a structure formed on a wafer is evaluated by utilizing an identity relationship inherent to simulated diffraction signals. Each simulated diffraction signal contains at least one set of four reflectivity parameters for a wavelength and/or angle of incidence. One of the four reflectivity parameters is selected. A value for the selected reflectivity parameter is determined using the identity relationship and values of the remaining three reflectivity parameters. The determined value for the selected reflectivity parameter is compared to the value in the obtained set of four reflectivity parameters to evaluate and improve the accuracy of the library. The identity relationship can also be used to reduce the data storage in a library.
摘要翻译：通过利用模拟衍射信号固有的身份关系来评估用于在晶片上形成的结构的光学计量学中的模拟衍射信号库的精度。每个模拟衍射信号包含用于波长和/或入射角的至少一组四个反射率参数。选择四个反射率参数之一。使用身份关系和剩余的三个反射率参数的值确定所选反射率参数的值。将所选反射率参数的确定值与获得的四个反射率参数组中的值进行比较，以评估和提高库的准确性。身份关系也可用于减少库中的数据存储。

9. 发明申请

US20070225940A1 Library accuracy enhancement and evaluation 有权
标题翻译：图书馆精确度增强和评估
公开(公告)号：US20070225940A1
公开(公告)日：2007-09-27
申请号：US11390798
申请日：2006-03-27
申请人： Shifang Li , Junwei Bao , Wei Liu
发明人： Shifang Li , Junwei Bao , Wei Liu
IPC分类号： G06F19/00
CPC分类号： G01B11/24 , G03F7/70625
摘要： The accuracy of a library of simulated-diffraction signals for use in optical metrology of a structure formed on a wafer is evaluated by utilizing an identity relationship inherent to simulated diffraction signals. Each simulated diffraction signal contains at least one set of four reflectivity parameters for a wavelength and/or angle of incidence. One of the four reflectivity parameters is selected. A value for the selected reflectivity parameter is determined using the identity relationship and values of the remaining three reflectivity parameters. The determined value for the selected reflectivity parameter is compared to the value in the obtained set of four reflectivity parameters to evaluate and improve the accuracy of the library. The identity relationship can also be used to reduce the data storage in a library.
摘要翻译：通过利用模拟衍射信号固有的身份关系来评估用于在晶片上形成的结构的光学计量学中的模拟衍射信号库的精度。每个模拟衍射信号包含用于波长和/或入射角的至少一组四个反射率参数。选择四个反射率参数之一。使用身份关系和剩余的三个反射率参数的值确定所选反射率参数的值。将所选反射率参数的确定值与获得的四个反射率参数组中的值进行比较，以评估和提高库的准确性。身份关系也可用于减少库中的数据存储。

10. 发明授权

US07783669B2 Data flow management in generating profile models used in optical metrology 有权
标题翻译：生成光学计量学中使用的轮廓模型的数据流管理
公开(公告)号：US07783669B2
公开(公告)日：2010-08-24
申请号：US11580570
申请日：2006-10-12
申请人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey Alexander Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
发明人： Hong Qiu , Junwei Bao , Wei Liu , Jeffrey Alexander Chard , Miao Liu , Gang He , Hemalatha Erva , Vi Vuong
IPC分类号： G06Q50/00
CPC分类号： G01B11/24 , Y10S707/953
摘要： To manage data flow in generating profile models for use in optical metrology, a project data object is created. A first profile model data object is created. The first profile model data object corresponds to a first profile model defined using profile parameters. A version number is associated with the first profile model data object. The first profile model data object is linked with the project data object. At least a second profile model data object is created. The second profile model data object corresponds to a second profile model defined using profile parameters. The first and second profile models are different. Another version number is associated with the second profile model data object. The second profile model data object is linked with the project data object. The project data object, the first profile model data object, and the second profile model data object are stored. The version numbers associated with the first profile model data object and the second profile model data object are stored. The link between the first profile model data object and the project data object is stored. The link between the second profile model data object and the project data object is stored.
摘要翻译：为了管理生成用于光学测量的轮廓模型中的数据流，创建了一个项目数据对象。创建第一个配置文件模型数据对象。第一个轮廓模型数据对象对应于使用轮廓参数定义的第一轮廓模型。版本号与第一个轮廓模型数据对象相关联。第一个配置文件模型数据对象与项目数据对象链接。至少创建一个第二个轮廓模型数据对象。第二轮廓模型数据对象对应于使用轮廓参数定义的第二轮廓模型。第一个和第二个轮廓模型是不同的。另一个版本号与第二个配置文件模型数据对象相关联。第二个配置文件模型数据对象与项目数据对象链接。存储项目数据对象，第一个轮廓模型数据对象和第二个轮廓模型数据对象。存储与第一轮廓模型数据对象和第二轮廓模型数据对象相关联的版本号。存储第一轮廓模型数据对象与项目数据对象之间的链接。存储第二轮廓模型数据对象与项目数据对象之间的链接。

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