专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07469192B2 Parallel profile determination for an optical metrology system 失效
标题翻译：光学测量系统的平行轮廓确定
公开(公告)号：US07469192B2
公开(公告)日：2008-12-23
申请号：US11485046
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
IPC分类号： G06F19/00 , G01B11/00
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
摘要翻译：包括衍射信号处理器，衍射信号分配器和多个轮廓搜索服务器，用于处理从一个或多个晶片上形成的多个结构的光学测量测量的晶圆结构轮廓确定的请求的系统。衍射信号处理器被配置为获得多个结构的多个测量的衍射信号。衍射信号分配器耦合到衍射信号处理器。衍射信号处理器被配置为将多个测量的衍射信号传输到衍射信号分配器。多个轮廓搜索服务器耦合到衍射信号分配器。衍射信号分配器被配置为将多个测量的衍射信号分布到多个简档搜索服务器。轮廓搜索服务器被配置为并行处理多个测量的衍射信号，以确定与多个测量的衍射信号相对应的多个结构的轮廓。

2. 发明申请

US20080013108A1 Parallel profile determination in optical metrology 失效
标题翻译：光学计量学中的平行轮廓确定
公开(公告)号：US20080013108A1
公开(公告)日：2008-01-17
申请号：US11485048
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
IPC分类号： G01B11/14
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances of a profile search module. The plurality of instances of the profile search model is activated in one or more processing threads of one or more computer systems. The plurality of measured diffraction signals is processed in parallel using the plurality of instances of the profile search module to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
摘要翻译：在从光学测量测量处理对晶片结构轮廓确定的请求中，获得了形成在一个或多个晶片上的多个结构的多个测量的衍射信号。多个测量的衍射信号被分配到简档搜索模块的多个实例。简档搜索模型的多个实例在一个或多个计算机系统的一个或多个处理线程中被激活。使用轮廓搜索模块的多个实例来并行处理多个测量的衍射信号，以确定对应于多个测量的衍射信号的多个结构的轮廓。

3. 发明申请

US20080015812A1 Parallel profile determination for an optical metrology system 失效
公开(公告)号：US20080015812A1
公开(公告)日：2008-01-17
申请号：US11485046
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qui
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey A. Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qui
IPC分类号： G01B11/24 , G06F19/00
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： A system to process requests for wafer structure profile determination from optical metrology measurements off a plurality of structures formed on one or more wafer includes a diffraction signal processor, a diffraction signal distributor, and a plurality of profile search servers. The diffraction signal processor is configured to obtain a plurality of measured diffraction signals of the plurality of structures. The diffraction signal distributor is coupled to the diffraction signal processor. The diffraction signal processor is configured to transmit the plurality of measured diffraction signals to the diffraction signal distributor. The plurality of profile search servers is coupled to the diffraction signal distributor. The diffraction signal distributor is configured to distribute the plurality of measured diffraction signals to the plurality of profile search servers. The profile search servers are configured to process in parallel the plurality of measured diffraction signals to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.

4. 发明授权

US07515283B2 Parallel profile determination in optical metrology 失效
标题翻译：光学计量学中的平行轮廓确定
公开(公告)号：US07515283B2
公开(公告)日：2009-04-07
申请号：US11485048
申请日：2006-07-11
申请人： Tri Thanh Khuong , Junwei Bao , Jeffrey Alexander Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
发明人： Tri Thanh Khuong , Junwei Bao , Jeffrey Alexander Chard , Wei Liu , Ying Zhu , Sachin Deshpande , Pranav Sheth , Hong Qiu
IPC分类号： G01B11/14 , G06F15/00
CPC分类号： G01B11/24 , G01N21/4788 , G01N21/95607 , G01N2021/95615 , G03F7/70625
摘要： In processing requests for wafer structure profile determination from optical metrology measurements, a plurality of measured diffraction signal of a plurality of structures formed on one or more wafers is obtained. The plurality of measured diffraction signals is distributed to a plurality of instances of a profile search module. The plurality of instances of the profile search model is activated in one or more processing threads of one or more computer systems. The plurality of measured diffraction signals is processed in parallel using the plurality of instances of the profile search module to determine profiles of the plurality of structures corresponding to the plurality of measured diffraction signals.
摘要翻译：在从光学测量测量处理对晶片结构轮廓确定的请求中，获得了形成在一个或多个晶片上的多个结构的多个测量的衍射信号。多个测量的衍射信号被分配到简档搜索模块的多个实例。简档搜索模型的多个实例在一个或多个计算机系统的一个或多个处理线程中被激活。使用轮廓搜索模块的多个实例来并行处理多个测量的衍射信号，以确定对应于多个测量的衍射信号的多个结构的轮廓。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式