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1. 发明专利

JP2008001955A Sliding member 有权
标题翻译：滑动会员
公开(公告)号：JP2008001955A
公开(公告)日：2008-01-10
申请号：JP2006173986
申请日：2006-06-23
申请人： Toyota Industries Corp , 株式会社豊田自動織機
发明人： HATSUTORI SHINYA , MURASE KIMITOSHI , SHIMO TOSHIHISA , HORI MINORU , MURAMATSU KOHEI
IPC分类号： C23C14/06 , C10M103/02 , C10M103/04 , C10M103/06 , C10M177/00 , C10N10/08 , C10N10/12 , C10N30/06 , C10N40/02 , C10N40/30 , C10N70/00 , C22C1/10 , C22C29/00 , F16C33/24
摘要： PROBLEM TO BE SOLVED: To provide a sliding member provided with a sliding layer, which has a new constitution making slidability and wear resistance compatible.
SOLUTION: The sliding member is provided with: a base material 30; and a sliding layer 31 formed at least on a part of the surface of the base material 30 and brought into slidable contact with a mating member. The sliding layer 31 is composed of: the first sliding layer 311 composed of C, MoS
2 and/or WS
2 , and Ti and/or Cr, formed on the surface of the base material 30, and comprising 5 to 20 at% Ti and/or Cr; and the second sliding layer 312 stacked on the first sliding layer 311, and comprising Ti and/or Cr with a concentration gradient in the thickness direction in such a manner that the concentration of the first sliding layer 311 is made the highest one. The first sliding layer 311 is the hard one comprising 5 to 20 at% Ti and/or Cr, and its wear resistance upon sliding is secured. The second sliding layer 312 in which the concentration of Ti and/or Cr is gradient exhibits excellent initial fitness, and has excellent slidability.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供具有滑动层的滑动构件，其具有与滑动性和耐磨性相容的新构造。滑动构件设置有：基材30; 以及至少形成在基材30的表面的一部分上并与配合构件滑动接触的滑动层31。滑动层31由以下组成：由C，MoS 2 和/或WS 2 组成的第一滑动层311，和形成在表面上的Ti和/或Cr 的基材30，并且包含5至20原子％的Ti和/或Cr; 并且第二滑动层312堆叠在第一滑动层311上，并且以使得第一滑动层311的浓度最高的方式包括在厚度方向上具有浓度梯度的Ti和/或Cr。第一滑动层311是包含5至20原子％的Ti和/或Cr的硬质层，并且其滑动时的耐磨性得到确保。其中Ti和/或Cr的浓度为梯度的第二滑动层312表现出优异的初始适应性，并且具有优异的滑动性。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2007217766A Low friction compound film deposition method, and low friction sliding member 审中-公开
标题翻译：低摩擦化合物膜沉积方法和低摩擦滑动构件
公开(公告)号：JP2007217766A
公开(公告)日：2007-08-30
申请号：JP2006041304
申请日：2006-02-17
申请人： Osaka Shinku Kogyo Kk , Toyota Industries Corp , 大阪真空工業株式会社 , 株式会社豊田自動織機
发明人： BABA TAKAAKI , SHIMO TOSHIHISA , MURASE KIMITOSHI , ADACHI NAOSUKE , HORI MINORU , MURAMATSU KOHEI
IPC分类号： C23C14/06
摘要： PROBLEM TO BE SOLVED: To provide a film deposition method of a low friction compound film having low friction coefficient and excellent seizure resistance.
SOLUTION: In the film deposition method of the low friction compound film for manufacturing a sliding component for a compressor, a sputtering apparatus is used, which comprises a film deposition furnace, a target fixing means 10 in which a carbon target 11 consisting of at least carbon, sulfide targets 12, 14 consisting of sulfide, and a metal target 13 containing metal atoms are arrayed in a ring in the film deposition furnace, a base material holding means 20 which holds base materials (A, B), and continuously changes the targets 11-14 facing the base materials by moving the base materials, and a power supply device which is connected to at least the target fixing means 10 to discharge the targets 11-14. The targets 11-14 are discharged by operating the power supply device, the base materials are moved by the base material holding means 10, and amorphous carbon, atoms constituting the sulfide and metal atoms are successively deposited on the surface of the base material microscopically and periodically.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供具有低摩擦系数和优异的耐发泡性的低摩擦化合物膜的膜沉积方法。解决方案：在用于制造用于压缩机的滑动部件的低摩擦化合物膜的薄膜沉积方法中，使用溅射装置，其包括成膜炉，靶固定装置10，其中包括碳靶11 至少含有硫化物的硫化物靶12,14以及含有金属原子的金属靶13在成膜炉中排列成环，保持基材（A，B）的基材保持机构20和通过移动基底材料来连续地改变面向基材的目标11-14，以及连接到至少目标固定装置10以排出靶11-14的电源装置。目标11-14通过操作电源装置而被排出，基材由基体保持装置10移动，构成硫化物和金属原子的无定形碳，原子依次沉积在基底材料的表面上，微观地和定期。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2007217768A Manufacturing method of sliding component for compressor, and sliding component for compressor 审中-公开
标题翻译：压缩机滑动部件的制造方法和压缩机的滑动部件
公开(公告)号：JP2007217768A
公开(公告)日：2007-08-30
申请号：JP2006041319
申请日：2006-02-17
申请人： Toyota Industries Corp , 株式会社豊田自動織機
发明人： BABA TAKAAKI , SHIMO TOSHIHISA , MURASE KIMITOSHI , ADACHI NAOSUKE , HORI MINORU , MURAMATSU KOHEI
IPC分类号： C23C14/06
摘要： PROBLEM TO BE SOLVED: To provide a method for manufacturing a sliding component having seizure resistance and low friction coefficient and excellent in applications for a compressor.
SOLUTION: In the method for manufacturing a sliding component for a compressor, a sputtering apparatus is used, which comprises a film deposition furnace, a target fixing means 10 in which a carbon target 11 consisting of at least carbon, sulfide targets 12, 14 consisting of sulfide, and a metal target 13 containing metal atoms are arrayed in a ring in the film deposition furnace, a component holding means 20 which holds component bodies (A, B), and continuously changes the targets 11-14 facing the component bodies by moving the component bodies, and a power supply device which is connected to at least the target fixing means 10 to discharge the targets 11-14. The targets 11-14 are discharged by operating the power supply device, the component bodies are moved by the component holding means 10, and amorphous carbon, atoms constituting the sulfide and metal atoms are successively deposited on the surface of the component bodies microscopically and periodically.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种具有耐发泡性和低摩擦系数以及压缩机应用优异的滑动部件的制造方法。解决方案：在用于制造压缩机用滑动部件的方法中，使用溅射装置，其包括成膜炉，靶固定装置10，其中至少由碳组成的碳靶11，硫化物靶12 由硫化物组成的金属靶13和含有金属原子的金属靶13在成膜炉中排列成环，保持部件体（A，B）的部件保持装置20，并且将靶11,11面向通过移动部件主体的部件体，以及与至少目标固定装置10连接以对靶11-14进行排出的电源装置。目标11-14通过操作供电装置而被排出，组分体被组分保持装置10移动，并且构成硫化物和金属原子的无定形碳，微观和周期地依次沉积在组分体的表面上。版权所有（C）2007，JPO＆INPIT

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